KR101311596B1 - 다중 스펙트럼의 선택 반사성 구조체 - Google Patents
다중 스펙트럼의 선택 반사성 구조체 Download PDFInfo
- Publication number
- KR101311596B1 KR101311596B1 KR1020117006103A KR20117006103A KR101311596B1 KR 101311596 B1 KR101311596 B1 KR 101311596B1 KR 1020117006103 A KR1020117006103 A KR 1020117006103A KR 20117006103 A KR20117006103 A KR 20117006103A KR 101311596 B1 KR101311596 B1 KR 101311596B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- radar
- substrate
- microporous
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Images
Classifications
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- B32B2307/416—Reflective
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2327/00—Polyvinylhalogenides
- B32B2327/12—Polyvinylhalogenides containing fluorine
- B32B2327/18—PTFE, i.e. polytetrafluoroethylene
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2605/00—Vehicles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/14—Printing or colouring
- B32B38/145—Printing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249978—Voids specified as micro
- Y10T428/24998—Composite has more than two layers
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Laminated Bodies (AREA)
- Aiming, Guidance, Guns With A Light Source, Armor, Camouflage, And Targets (AREA)
Abstract
Description
도 2는 선택 반사성 구조체의 도식 단면도이다.
도 3은 선택 반사성 구조체의 도식 단면도이다.
도 4는 선택 반사성 구조체의 도식 단면도이다.
도 5는 선택 반사성 구조체의 도식 단면도이다.
도 6은 선택 반사성 구조체의 도식 단면도이다.
도 7은 선택 반사성 구조체의 도식 단면도이다.
도 8은 선택 반사성 구조체의 도식 단면도이다.
도 9는 250 ㎚ 내지 2,500 ㎚ 파장에서 구조체의 몇몇 예의 반사율 스펙트럼이다.
도 10은 3.O ㎛ 내지 5.O ㎛ 파장에서 구조체의 몇몇 예의 반사율 스펙트럼이다.
도 11은 8.O ㎛ 내지 12.O ㎛ 파장에서 구조체의 몇몇 예의 반사율 스펙트럼이다.
도 12는 레이더 위장층을 더 포함하는 선택 반사성 구조체의 도식 단면도이다.
Claims (42)
- 전면 및 후면,
제1 미세다공성 중합체 층 및 착색제를 포함하고, 상기 전면에 근접한 제1 면, 및 제2 면을 갖는 열 투과성의 시각적 불투명 기재, 및
상기 열 투과성의 시각적 불투명 기재의 제2 면에 인접하고, 상기 후면에 근접한, 저방사율 부재를 포함하는 열 반사층
을 포함하는 구조체로서,
(ⅰ) 전자기 스펙트럼의 400 ㎚∼600 ㎚ 파장 범위에서 70% 미만의 평균 반사율;
(ⅱ) 전자기 스펙트럼의 9 ㎛∼12 ㎛ 파장 범위에서 25% 초과의 평균 반사율; 및
(ⅲ) 레이더파의 1 GHz 내지 5 GHz 주파수 대역에서 90% 초과의 평균 레이더 투과율
을 갖는 구조체. - 제1항에 있어서, 전자기 스펙트럼의 700 ㎚∼1,000 ㎚ 파장 범위에서 70% 미만의 평균 반사율을 더 갖는 구조체.
- 제1항에 있어서, 레이더파의 1 GHz 내지 20 GHz 주파수 대역 전체에서 90% 초과의 평균 레이더 투과율을 갖는 구조체.
- 제1항에 있어서, 레이더파의 1 GHz 내지 20 GHz 주파수 대역에서 99% 초과의 평균 레이더 투과율을 갖는 구조체.
- 제1항에 있어서, 제1 미세다공성 중합체 층은 제1 미세다공성 발포 폴리테트라플루오로에틸렌(ePTFE)를 포함하는 것인 구조체.
- 제1항에 있어서, 열 반사층은 중합체 층을 포함하는 것인 구조체.
- 제6항에 있어서, 열 반사층은 금속 피복 중합체 층을 포함하는 것인 구조체.
- 제1항에 있어서, 열 반사층은 제2 미세다공성 중합체 층을 포함하는 것인 구조체.
- 제8항에 있어서, 제2 미세다공성 중합체 층은 금속 피복된 것인 구조체.
- 제9항에 있어서, 제2 미세다공성 중합체 층은 금속 피복 ePTFE를 포함하는 것인 구조체.
- 제5항에 있어서, 열 반사층은 제2 미세다공성 발포 PTFE 층을 포함하고, 저방사율 부재는 제2 미세다공성 발포 PTFE 층의 금속 피복 면이 형성되도록 금속 피착되며, 금속 피복 면은 열 투과성의 시각적 불투명 기재의 제2 면에 인접하는 것인 구조체.
- 제11항에 있어서, 금속의 두께는 1 ㎛ 미만인 구조체.
- 제11항에 있어서, 금속의 두께는 500 ㎚ 미만인 구조체.
- 제11항에 있어서, 금속의 두께는 400 ㎚ 미만인 구조체.
- 제1항에 있어서, 열 반사층은 개재 접착층에 의해 열 투과성의 시각적 불투명 기재에 결합되는 것인 구조체.
- 제11항에 있어서, 저방사율 부재는 제2 미세다공성 발포 PTFE 층의 표면 상의 기상 증착 금속 입자를 포함하는 것인 구조체.
- 제5항에 있어서, 저방사율 부재는 제2 미세다공성 발포 PTFE 층의 표면 상의 금속 입자를 포함하는 분사 코팅을 포함하는 것인 구조체.
- 제1항에 있어서, 저방사율 부재는 알루미늄(Al)을 포함하는 것인 구조체.
- 제1항에 있어서, 저방사율 부재는 구리(Cu)를 포함하는 것인 구조체.
- 제1항에 있어서, 저방사율 부재는 금(Au)을 포함하는 것인 구조체.
- 제1항에 있어서, 저방사율 부재는 은(Ag), 니켈(Ni), 주석(Sn), 아연(Zn), 납(Pb), 크롬(Cr), 또는 이들의 합금으로부터 선택되는 것인 구조체.
- 제1항에 있어서, 열 투과성의 시각적 불투명 기재 반대쪽에 열 반사층에 인접하게 레이더 신호를 감쇠시키기 위한 레이더 위장층을 더 포함하는 구조체.
- 제22항에 있어서, 레이더 위장층은 레이더 흡수 부재를 포함하는 것인 구조체.
- 제22항에 있어서, 레이더 위장층은 레이더 반사 부재를 포함하는 것인 구조체.
- 제22항에 있어서, 레이더 위장층은 레이더 반사 부재로 이루어진 개별 구역 및 레이더 흡수 부재로 이루어진 개별 구역을 포함하는 것인 구조체.
- 제22항에 있어서, 레이더 위장층은 열 투과성의 시각적 불투명 기재 반대쪽에서 열 반사층에 적층되는 것인 구조체.
- 제1항에 있어서, 오일 평점(oil rating)이 1보다 큰 것인 구조체.
- 제1항에 있어서, 오일 평점이 2보다 큰 것인 구조체.
- 제1항에 있어서, 핸드(Hand) 값이 500 g 미만인 구조체.
- 제1항에 있어서, 핸드 값이 300 g 미만인 구조체.
- 제1항에 있어서, 핸드 값이 200 g 미만인 구조체.
- (a) 전면 및 후면,
상기 전면에 인접한 열 투과성의 시각적 불투명 기재, 및
상기 열 투과성의 시각적 불투명 기재에 인접한 저방사율 부재를 포함하는 열 반사층
을 포함하는 구조체로서,
(ⅰ) 전자기 스펙트럼의 400 ㎚∼600 ㎚ 파장 범위에서 70% 미만의 평균 반사율;
(ⅱ) 전자기 스펙트럼의 9 ㎛∼12 ㎛ 파장 범위에서 25% 초과의 평균 반사율; 및
(ⅲ) 레이더파의 1 GHz 내지 20 GHz 주파수 대역 전체에서 90% 초과의 평균 레이더 투과율
을 갖는 구조체를 형성하는 단계; 및
(b) 탐지기와 레이더 위장 차량 사이에, 상기 전면이 탐지기를 향해 배향되도록, 구조체를 배치하는 단계
를 포함하는, 레이더 위장 차량에 시각적 및 열적 위장을 제공하는 방법. - (a) 제1 면 및 제2 면을 갖는 열 투과성의 제1 미세다공성 중합체 물질을 포함하는 제1 기재를 제공하는 단계,
(b) 착색제를 제공하는 단계,
(c) 착색제를 제1 기재의 적어도 제1 면에 도포하여 열 투과성의 시각적 불투명 층을 형성하는 단계,
(d) 저방사율 부재를 포함하는 제2 기재를 제공하는 단계,
(e) 제2 기재의 저방사율 부재를 제1 기재의 제2 면을 향해 배향시키는 단계,
(f) 제1 기재와 제2 기재를 부착시켜 전자기 스펙트럼의 400 ㎚∼600 ㎚ 파장 범위에서 70% 미만의 평균 반사율, 전자기 스펙트럼의 9 ㎛∼12 ㎛ 파장 범위에서 25% 초과의 평균 반사율, 및 레이더파의 1 GHz 내지 20 GHz 주파수 대역에서 90% 초과의 레이더 투과율을 갖는 구조체를 형성하는 단계
를 포함하는, 레이더 투과성의 열적 및 시각적 위장 구조체의 제조 방법. - 제33항에 있어서, 열 투과성 중합체 물질은 ePTFE를 포함하는 것인 제조 방법.
- 제34항에 있어서, ePTFE 상에 착색제를 인쇄하여 열 투과성의 시각적 불투명 층을 형성하는 단계를 포함하는 제조 방법.
- 제33항에 있어서, 제2 기재는 제2 미세다공성 중합체 층을 포함하고, 상기 방법은 제2 미세다공성 층에 금속을 기상 증착시키는 단계를 더 포함하는 제조 방법.
- 제33항에 있어서, 제2 기재는 제2 미세다공성 중합체 층을 포함하고, 상기 방법은 제2 미세다공성 층에 금속을 분사하는 단계를 더 포함하는 제조 방법.
- 제36항에 있어서, 제1 미세다공성 층과 제2 미세다공성 층을 서로 부착시키는 단계를 포함하는 제조 방법.
- 제37항에 있어서, 접착제로서 금속 분사액을 도포하여 제1 미세다공성 층과 제2 미세다공성 층을 서로 부착시키는 단계를 포함하는 제조 방법.
- 제33항에 있어서, 구조체의 제2 기재에 근접한 측에 1개 이상의 추가 층을 적층하는 단계를 포함하는 제조 방법.
- 제40항에 있어서, 1개 이상의 추가 층은 텍스타일(textile) 층인 제조 방법.
- 제40항에 있어서, 1개 이상의 추가 층은 레이더 위장층인 제조 방법.
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US12/195,794 | 2008-08-21 | ||
US12/195,794 US8916265B1 (en) | 2007-11-09 | 2008-08-21 | Multi-spectral, selectively reflective construct |
US12/391,595 | 2009-02-24 | ||
US12/391,595 US9276324B2 (en) | 2007-11-09 | 2009-02-24 | Multi-spectral, selectively reflective construct |
PCT/US2009/002162 WO2010021644A1 (en) | 2008-08-21 | 2009-04-07 | Multi-spectral, selectively reflective construct |
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CN102159915B (zh) | 2015-05-06 |
JP2012500382A (ja) | 2012-01-05 |
CN102159915A (zh) | 2011-08-17 |
RU2476811C2 (ru) | 2013-02-27 |
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WO2010021644A1 (en) | 2010-02-25 |
US8779964B2 (en) | 2014-07-15 |
CA2734764C (en) | 2015-03-24 |
KR20110069011A (ko) | 2011-06-22 |
CA2734764A1 (en) | 2010-02-25 |
RU2011110431A (ru) | 2012-09-27 |
EP2313735A1 (en) | 2011-04-27 |
JP5285158B2 (ja) | 2013-09-11 |
CA2838354A1 (en) | 2010-02-25 |
HK1155509A1 (en) | 2012-05-18 |
CA2838354C (en) | 2015-08-18 |
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