KR101178918B1 - An apparatus for treatment of Fluorine compound and method of treating for Fluorine compound gas - Google Patents

Abstract

In order to maximize the contact area between low temperature adsorbents and PFCs gas in the reactor structure, the present invention removes residual powder and foreign substances contained in the fluorine compound gas to reduce the pressure in the reactor and relatively low temperature of 200 ° C to 600 ° C. In the fluorine compound gas treatment apparatus for purifying the fluorine compound gas and a treatment method using the same.
The present invention maintains the temperature of the fluorine compound gas evenly at 200 ° C to 600 ° C as a whole, so that the adsorption efficiency is increased and the fluorine compound gas can be purified in an environmentally friendly manner.

Description

Low temperature adsorption fixation treatment device for fluorine compound gas and method for treating fluorine compound gas using the same {An apparatus for treatment of Fluorine compound and method of treating for Fluorine compound gas}

The present invention relates to a low temperature treatment apparatus for fluorine compound gas and a method for treating fluorine compound gas using the same, and in particular, a fluorine compound gas treating apparatus using a low temperature adsorbent for decomposing PFCs (Perfluorocarbon, perfluorocarbon) and environmentally friendly treatment. It relates to a fluorine compound gas treatment method used.

In order to reduce emissions of fluorine compound gas having a high warming coefficient, a method and apparatus for decomposing and treating used fluorine compound gas after an etching process and the like have been proposed.

For example, International Patent Publication No. WO94 / 05399 discloses a device using a combustion cracking process with fuel, and Japanese Patent Laid-Open No. 7-116466 discloses a thermal decomposition method using a reagent such as silica or zeolite. have. In addition, JP-A-10-286434 discloses a catalytic decomposition method under an alumina catalyst.

However, the gas to be treated in the above patents is a fluorine compound containing carbon, fluorine, chlorine, and hydrogen, and there is no method for treating gas such as PFCs. PFCs gas is secondary to the sulfur (S) compound and fluorine-based gas even after the first decomposition by the decomposition method, secondary treatment is required for this,

In addition, PFCs gas is known to be partly decomposed by arc discharge or the like during use, and the partly decomposed part reacts with moisture to generate acidic gas, thereby producing a secondary purified gas thereof. That is, PFCs are decomposed at high temperatures by discharge or arc, and are acidic gases such as HF, F ₂ , SiF ₄ , SOF ₂ , SO ₂ , H ₂ SO ₃ , SO ₂ F ₂ , SF ₄ , SF ₂ , and S ₂ F ₂ . And produces metal fluorides.

As a general method for treating PFCs gas, a combustion method, a heater method, and a plasma method using LNG, etc., have been applied. When these methods are used, CF ₄ decomposes the gas at a high temperature of 1,300 ° C. or higher. Energy is required, and there is a problem in that the reactor wall of the reactor is damaged due to the corrosive gas generated by decomposition of the fluorine compound. Therefore, there is a problem in that the secondary fluorine, sulfur compound, etc. have to be treated with water. .

4 is a cross-sectional view of a fluorine compound gas treating apparatus of the prior art. In order to solve the above problems, Patent Application No. 10-2008-73659 "Low temperature adsorption treatment agent of fluorine compound gas, fluorine compound gas treatment method and fluorine compound gas treatment device using the same" was invented,

The prior art is a heater 412 surrounding a part or all of the outer peripheral surface to heat the fluorine compound gas introduced from the inlet 10, and the first adsorption treatment agent filled with a low temperature adsorption treatment agent 411b is filled in the inner space Including a portion 411, the fluorine compound gas is in communication with the primary reactor 41 and the primary reactor 41 and the secondary reactor formed through the primary adsorbent filler 411 A fluorine compound gas including a secondary reactor 42 including a secondary adsorption agent filling unit 421 filled with an adsorption agent 421b and an outlet 50 through which the treated fluorine compound gas is discharged. Provided is a treatment apparatus and a fluorine compound treatment method using the same.

However, in the case of employing a heater that surrounds part or all of the outer circumferential surface to heat the introduced fluorine compound gas as described above, the central portion of the introduced fluorine compound gas does not reach the reaction temperature due to insufficient heat transfer. There was a problem that it did not disintegrate despite the contact.

In order to maximize the contact area between the low temperature adsorbents and the PFCs gas in the reactor structure, the present invention removes residual powder and foreign matter contained in the fluorine compound gas by pretreatment to reduce the pressure in the reactor and to relatively reduce the pressure in the reactor. An object of the present invention is to provide a fluorine compound gas treating apparatus for purifying the fluorine compound gas at a low temperature.

In addition, an object of the present invention is to provide a fluorine compound gas treating apparatus which is preheated so that heat can be evenly transferred to the fluorine compound gas and is uniformly mixed by preventing vortices caused by the pressure of the preheating gas.

In addition, an object of the present invention is to provide a fluorine compound gas treatment device having improved resolution by maintaining a temperature of 200 ℃ to 600 ℃ not only the outer surface of the fluorine compound gas but also the central portion.

Another object of the present invention is to provide a fluorine compound gas treating apparatus for purifying unreacted gas and secondary products of the fluorine compound gas.

Another object of the present invention is to provide a fluorine compound gas treatment method using the fluorine compound gas treatment device.

The present invention and the inlet that the fluorine compound gas is introduced

A filter unit for removing residual powder and foreign substances contained in the fluorine compound gas introduced from the inlet;

Preheater for preheating the fluorine compound gas passing through the filter to 200 ℃ to 600 ℃ and

An adsorption treatment unit for adsorbing the fluorine compound gas passing through the preheater at a low temperature of 200 ° C. to 600 ° C .;

Characterized in that the fluorine compound gas treatment apparatus including a discharge portion for discharging the fluorine compound gas passing through the adsorption treatment unit.

The preheating unit of the present invention is a mixture of the inert gas or air consisting of at least one of argon, helium, and nitrogen and the fluorine compound gas to preheat the first preheating unit and the mixed fluorine compound gas at 200 ℃ to 300 ℃ 200 ℃ to And a second preheating unit for preheating to a temperature of 600 占 폚.

The first preheating unit of the present invention comprises a supply unit for introducing an inert gas or air made of at least one of the argon, helium and nitrogen, and a cyclone unit in which the gas or air discharged from the supply unit rotates along the circumferential surface thereof. It is characterized by a fluorine compound gas treatment device.

The adsorption treatment part of the present invention includes a first reactor in which one side end is in communication with the preheating part so that the fluorine compound gas is processed while passing through the first adsorption treatment agent filling part;

A heater installed in the first reactor and preheated to a reaction temperature of 200 ° C. to 600 ° C .;

A fluorine compound gas treatment apparatus includes a first adsorption treatment agent filling part formed by filling a low temperature adsorption treatment agent containing iron oxide or iron, and an alkali metal compound and an alkaline earth metal compound around the outer circumferential surface of the heater.

An alkali metal compound and an alkaline earth metal compound, which are in communication with the other end of the primary reactor of the present invention and further treat unreacted gas and secondary product of the fluorine compound passed through the primary reactor, A fluorine compound gas treating apparatus further comprises a secondary reactor having a secondary adsorption treatment agent filling part filled with a secondary adsorption treatment agent.

The first adsorption treatment agent filling unit and the second adsorption treatment agent filling unit of the present invention,

Inner perforated plate made of iron (Fe) formed with a plurality of through holes and

The low temperature adsorption treatment agent or the secondary adsorption treatment agent is characterized in that the fluorine compound gas treatment device characterized in that the stack is formed alternately.

The present invention comprises the steps of filtering the residual powder and foreign matter in the fluorine compound gas introduced by using the above device and preheating the fluorine compound gas at a temperature of 200 ℃ to 600 ℃ and iron oxide or iron (Fe) and alkali And a method of treating a fluorine compound gas comprising contacting a low temperature adsorption treatment agent comprising a metal compound and an alkaline earth metal compound with a fluorine compound gas at a temperature of 200 ° C to 600 ° C.

Preheating the fluorine compound gas at a temperature of 200 ° C to 600 ° C of the present invention may include preheating the fluorine compound gas at 200 ° C to 300 ° C and preheating the preheated fluorine compound gas at 200 ° C to 600 ° C. Preheating the car,

In the first preheating step, the gas and air discharged from the supply part generate a strong rotational force while passing through the cyclone part to be homogeneously mixed with the fluorine compound gas supplied from the upper part of the cyclone part to maintain a temperature of 200 to 300 ° C. overall. A method of treating a fluorine compound gas is characterized by the above-mentioned.

The step of contacting the low temperature adsorption treatment agent of the present invention with the fluorine compound gas at a temperature of 200 ℃ to 600 ℃ is in contact with the fluorine compound gas preheated to a temperature of 200 ℃ to 600 ℃ on the outer peripheral surface of the heater and the heater is 200 ℃ to 600 It maintains the temperature of ℃, so a homogeneous temperature distribution is formed throughout.

The fluorine compound gas is characterized in that the adsorption area is increased through the reaction path that is introduced from the lower end of the primary reactor and discharged to the lower end of the other side, characterized in that the fluorine compound gas treatment method.

And further treating the gas contacted with the low temperature adsorption treatment agent of the present invention using a secondary adsorption treatment agent comprising an alkali metal compound and an alkaline earth metal compound. do.

The present invention is to reduce the pressure in the reactor to remove the residual powder and foreign matter contained in the fluorine compound gas and to increase the contact area between the low temperature adsorbents and the PFCs gas as much as possible, the fluorine compound gas at a relatively low temperature of 200 ℃ to 600 ℃ By decomposing in contact with the adsorption treatment agent, in particular, there is an effect of efficiently decomposing the PFCs gas at low temperatures, without the addition of additional materials such as water.

In addition, the present invention is to prevent the vortices generated when directly injected by the external gas or the external air of 200 to 300 ℃ rotates through the outer circumferential surface of the cyclone portion and the fluorine compound gas and nitrogen gas and the like is mixed as a whole By allowing heat to be transferred, there is an effect of more efficiently decomposing SF6 gas at low temperatures, without the addition of additional materials such as water.

In addition, the present invention by placing a heater of 200 ℃ to 600 ℃ in the center of the adsorption treatment unit to maintain the temperature of 200 ℃ to 600 ℃ not only the outer surface of the fluorine compound gas but also the center to improve the resolution when contacted with the low temperature adsorbent. This allows the PFCs to be decomposed more efficiently at low temperatures without the need for additional materials.

In addition, in the present invention, when the secondary adsorption treatment unit is used to contain sulfur fluoride compounds such as PFCs, F atoms generated by decomposition are fixed to the low temperature adsorbent in the form of alkaline earth metal fluoride salts and alkali metal fluoride salts. As a result, it is possible to prevent the generation of acidic gas containing fluoride, so that the dispersion of PFCs gas can be environmentally friendly at low temperature and without water added to the material.

1 is a view schematically showing a fluorine compound gas treatment process of an embodiment of the present invention.
Figure 2 is a schematic view showing a fluorine compound gas treatment apparatus of an embodiment of the present invention.
Figure 3 is a view showing a cyclone portion of an embodiment of the present invention.
4 is a cross-sectional view of a fluorine compound gas treating apparatus of the prior art.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a view schematically showing a fluorine compound gas treatment process according to an embodiment of the present invention, FIG. 2 is a view schematically showing a fluorine compound gas treating apparatus according to an embodiment of the present invention, and FIG. 3 is an embodiment of the present invention. The figure which shows the example cyclone part is shown.

The present invention and the inlet 10 through which the fluorine compound gas is introduced

Preheating to preheat the filter unit 20 to remove residual powder and foreign matter contained in the fluorine compound gas introduced from the inlet 10 and the fluorine compound gas passed through the filter unit 20 to 200 ℃ to 600 ℃ The fluorine compound gas passing through the unit 30 and the preheater 30 is adsorbed at a low temperature of 200 ° C. to 600 ° C., and the fluorine compound gas passed through the adsorption treatment unit 40 is discharged. Characterized in that the fluorine compound gas treatment apparatus including a discharge unit (50).

The filter installed in the filter unit 20 may be, for example, a fiberglass or ceramic-based porous filter as a strong corrosion resistant filter, but is not limited thereto.

The preheating unit 30 is a mixture of the first preheating unit 31 and the mixed fluorine compound gas preheated to 200 ~ 300 ℃ by mixing the inert gas or air consisting of at least one of argon, helium and nitrogen with the fluorine compound gas And a second preheating part 32 for preheating to a temperature of 200 ° C to 600 ° C.

The first preheating unit 31 includes a supply unit 311 for discharging an inert gas or air composed of at least one of argon, helium, and nitrogen, and a gas or air discharged from the supply unit 311 rotates along a circumferential surface thereof. It includes a clone portion 312.

The cyclone unit 312 is intended to prevent the phenomenon in which the heat of the exhaust gas and the air is not evenly transmitted when a vortex occurs when the gas and air discharged from the supply unit 311 directly collide with the fluorine compound gas. In that,

The exhaust gas and the air descend while rotating the outer wall of the cyclone portion 312 and at the same time cause a strong whirlwind to be homogeneously mixed with the fluorine compound gas supplied from the upper portion of the cyclone portion 312.

The second preheater 32 includes a heater 321 for preheating the fluorine compound gas homogeneously mixed with the exhaust gas or air to 200 ° C to 600 ° C.

The heater 321 is preheated to a temperature of 200 ° C. to 600 ° C., which is the reaction temperature in the adsorption treatment unit 40, and is 200 ° C. to 200 ° C. before the heater 321 is introduced into the adsorption treatment unit 40 through the heater 321. It can maintain 600 ℃ has the effect of improving the adsorption efficiency.

The adsorption treatment unit 40 is the first reactor 41 and the first side in communication with one side end of the preheater 30 so that the fluorine compound gas passes through the first adsorption treatment agent filling unit 411. Iron oxide or iron and alkali metal are formed in the primary reactor 41 and surround the outer circumferential surface of the heater 412 preheated to a reaction temperature of 200 ° C. to 600 ° C. and the heater 412 in the primary reactor 41. And a first adsorption treatment agent filling part 411 formed by filling the low temperature adsorption treatment agent 411b including the compound and the alkaline earth metal compound.

The low temperature adsorption treatment agent 411b is used to treat the fluorine compound gas at high temperature without any additional material such as water, and is environmentally friendly. The low temperature adsorption treatment agent 411b is a metal component of iron (Fe) or iron oxide contained in the low temperature adsorption treatment agent. Chemically decomposing fluorine compound gas, especially SF6 gas,

By treating the fluorine compound gas according to a mechanism for fixing the fluorine gas generated when the fluorine compound is decomposed by a compound containing an iron metal, an alkali metal compound, and an alkaline earth metal compound,

Since the low-temperature adsorption treatment agent 411b used in the present inventors application No. 10-2008-0073659 is used, detailed description thereof will be omitted.

The heater 412 is wrapped in a ceramic to improve direct durability of the heater 412 by preventing direct contact with the fluorine compound gas.

An alkali metal compound and an alkaline earth metal compound in communication with the other end of the primary reactor 41 and further treating unreacted gas and secondary products of the fluorine compound passed through the primary reactor 41 are included. And a secondary reactor 42 having a secondary adsorption agent filler 421 filled with the secondary adsorption agent 421b.

The primary adsorption treatment agent filling part 411a in the primary reactor 41 is a region where the reactant passes through the primary adsorption treatment part 411 under the reaction temperature and the first reaction occurs. The secondary adsorption treatment agent filling part 421 in 42 is a region where the secondary reaction with respect to the reactant which has undergone the first reaction occurs.

The lower end of the secondary reactor 42 includes a secondary adsorption treatment agent filling unit 421 and the exhaust gas measuring unit 422 for extracting a portion of the exhaust gas to measure its components.

The secondary adsorption treatment agent filling unit 421b is for treating the unreacted gas and secondary product of the fluorine compound gas generated secondary,

Although it can also be comprised similarly to the 1st adsorption treatment agent 411b, you may use the adsorption treatment agent which consists only of an alkaline earth metal compound and an alkali metal compound.

After the first and second reactions, the fluorine compound gas is connected to the discharge unit 50 through a discharge pipe connected to the upper portion of the second reactor 42, and an intake device is installed in the discharge unit 50 to discharge the gas. Can be discharged to the outside. Examples of the discharge device 51 include an intake motor and a fan.

The first adsorption treatment agent filling part 411 and the second adsorption treatment agent filling part 421 are perforated plates 411a and 421a made of iron (Fe) having a plurality of through holes, and the low temperature adsorption treatment agent 411b. Alternatively, the second adsorption treatment agent 421b is alternately stacked.

The iron punched plates 411a and 421a provided between the filled adsorption treatment agents 411b and 421b are preferably provided with at least one of the plurality of iron perforated plates 411a and 421b in order to smooth the flow of the reactants to increase the adsorption efficiency.

On the other hand, one embodiment of the present invention is the filter unit 20 and / or preheating unit 30 and the adsorption treatment unit 40 when the normal operation does not operate the fluorine compound gas introduced from the inlet 10, the filter unit It has a bypass (60) (60) to be introduced into the preheater 30 directly from the inlet (10) or discharged to the outside through the discharge unit 50 without passing through (20).

In the case where the low temperature adsorption fixed treatment apparatus for fluorine compound gas of one embodiment of the present invention operates normally, the introduced fluorine compound gas is discharged through the first valve V1, the second valve V2, and the third valve V3. It is discharged to the part 50.

However, if the pressure in the filter rises beyond the filtration capacity of the residual powder and foreign matter in the fluorine compound gas into which the filter unit 20 is introduced, a back pressure occurs in the filter unit 20 so that the fluorine compound gas does not flow. Therefore, when the pressure rises due to clogging of the filter, nitrogen (N ₂ ) gas is automatically introduced to shake off the remaining powder and foreign substances.

At the same time, the first valve V1 is shut off, and the fourth valve V4, in which the fluorine compound gas is no longer introduced into the filter unit 20 from the inlet 10 and closed, is opened, and the fluorine compound gas is bypassed. It is introduced into the preheating unit 30 through the unit 60.

In addition, even when the preheater 30 and / or the adsorption treatment unit 40 do not operate normally, the fluorine compound gas introduced into the preheater 30 is shut off and the fifth valve V5. ) Is introduced into the fluorine compound gas is discharged to the discharge unit 50 through the bypass unit (60).

The bypass unit 60 has an effect of preventing a safety accident such as an explosion that may occur when the low temperature adsorption fixed treatment apparatus for fluorine compound gas is not normally operated.

In addition, the present invention is the step of filtering the residual powder and foreign matter in the fluorine compound gas introduced by using the above device (S1) and the step of preheating the fluorine compound gas (S2) at 200 ℃ to 600 ℃ temperature and iron oxide Or contacting a low temperature adsorption treatment agent 411b containing iron (Fe), an alkali metal compound and an alkaline earth metal compound with a fluorine compound gas at a temperature of 200 ° C. to 600 ° C. (S3). It is characterized by.

Preheating the fluorine compound gas at the temperature of 200 ° C. to 600 ° C. (S2) includes first preheating the fluorine compound gas to 200 to 300 ° C., and converting the preheated fluorine compound gas to 200 ° C. to 600 ° C. 2. Preheating the car,

In the first preheating step, the gas and the air discharged from the supply part 311 generate a strong rotational force while passing through the cyclone part 312 and homogeneously mix with the fluorine compound gas supplied from the upper part of the cyclone part 312. It is characterized in that to maintain the overall temperature 200 to 300 ℃.

Contacting the low temperature adsorption treatment agent 411b with the fluorine compound gas at a temperature of 200 ° C. to 600 ° C. (S3) is contacted with a fluorine compound gas preheated to a temperature of 200 ° C. to 600 ° C. on the outer circumferential surface of the heater 412, and the center portion is Since the heater 412 maintains a temperature of 200 ° C to 600 ° C, a homogeneous temperature distribution is formed as a whole.

The fluorine compound gas is characterized in that the adsorption area is increased through a reaction path introduced from one lower end of the first reactor 41 and discharged to the other lower end.

The method may further include the step S4 of further treating the gas contacted with the low temperature adsorption treatment agent 411b using the secondary adsorption treatment agent 421b made of an alkali metal compound and an alkaline earth metal compound.

The present invention has been described above in detail with reference to preferred embodiments of the present invention, but the scope of the present invention is not limited to the above embodiments, but may be embodied in various forms of embodiments within the appended claims. have. Without departing from the gist of the invention as claimed in the claims, any person of ordinary skill in the art to the present invention is considered to be within the scope of the invention to the various possible modifications possible range.

10: inlet part, 20: filter part, 30: preheating part
31: first preheating unit, 311: supplying unit, 312: cyclone unit,
32: second preheating unit, 321: heater
40: adsorption treatment unit
41: primary reactor, 411 primary adsorbent filler, 412: heater
411a: perforated plate, 411b: primary adsorption treatment agent,
42: secondary reactor, 421 secondary adsorbent filler,
421a: perforated plate, 421b: second adsorbent treatment agent, 422: exhaust gas measuring unit
50: discharge part, 51: discharge device,
60: bypass section
S1: filtering step, S2: preheating step,
S3: first adsorption treatment step, S4: second adsorption treatment step

Claims (10)

Inlet portion 10 through which the fluorine compound gas is introduced
A filter unit 20 for removing residual powder and foreign substances contained in the fluorine compound gas introduced from the inlet 10;
A preheater 30 for preheating the fluorine compound gas that has passed through the filter unit 20 to 200 ° C to 600 ° C;
Adsorption processing unit 40 that the fluorine compound gas passing through the preheater 30 is adsorbed at a low temperature of 200 ℃ to 600 ℃ and
Fluorine compound gas processing apparatus including a discharge unit 50 for discharging the fluorine compound gas passing through the adsorption treatment unit (40). The method according to claim 1,
The preheating unit 30 is a mixture of the first preheating unit 31 and the mixed fluorine compound gas preheated to 200 ~ 300 ℃ by mixing the inert gas or air consisting of at least one of argon, helium and nitrogen with the fluorine compound gas And a second preheating part (32) for preheating to a temperature of 200 to 600 ° C. The method of claim 2,
The first preheating unit 31 includes a supply unit 311 for introducing an inert gas or air including at least one of argon, helium, and nitrogen, and a gas or air discharged from the supply unit 311 to rotate along a circumferential surface thereof. Fluorine compound gas processing apparatus comprising a clone portion 312. The method of claim 3,
The adsorption treatment unit 40 may include a first reactor 41 in which one side end is in communication with the preheater 30 so that the fluorine compound gas passes through the first adsorption treatment agent filling unit 411.
A heater 412 installed in the first reactor 41 and preheated to a reaction temperature of 200 ° C. to 600 ° C .;
The first adsorption treatment agent filling is formed by surrounding the outer circumferential surface of the heater 412 in the primary reactor 41 and filled with a low temperature adsorption treatment agent 411b containing iron oxide or iron, an alkali metal compound and an alkaline earth metal compound. A fluorine compound gas processing apparatus comprising a portion 411. The method of claim 4,
An alkali metal compound and an alkaline earth metal compound in communication with the other end of the primary reactor 41 and further treating unreacted gas and secondary products of the fluorine compound passed through the primary reactor 41 are included. And a secondary reactor (42) having a secondary adsorption agent filler (421) formed by filling the secondary adsorption agent (421b). The method according to claim 5,
The first adsorption treatment agent filler 411 and the second adsorption treatment agent filler 421,
Internal perforated plates 411a and 421a made of iron (Fe) material having a plurality of through holes, and
The low temperature adsorption treatment agent (411b) or the secondary adsorption treatment agent (421b) are alternately laminated, characterized in that the fluorine compound gas treatment device. Filtering the remaining powder and foreign matter in the fluorine compound gas introduced by using the device of any one of claims 1 to 6 (S1) and the step of preheating the fluorine compound gas at a temperature of 200 ℃ to 600 (S2) and Contacting the low temperature adsorption treatment agent 411b containing iron oxide or iron (Fe), and an alkali metal compound and an alkaline earth metal compound with a fluorine compound gas at a temperature of 200 ° C to 600 ° C (S3). Treatment method. The method of claim 7,
Preheating the fluorine compound gas at the temperature of 200 ° C. to 600 ° C. (S2) includes first preheating the fluorine compound gas to 200 to 300 ° C., and converting the preheated fluorine compound gas to 200 ° C. to 600 ° C. 2. Preheating the car,
In the first preheating step, the gas and air discharged from the supply part 311 generate a strong whirlwind while passing through the cyclone part 312 so as to be homogeneous with the fluorine compound gas supplied from the upper part of the cyclone part 312. Method of treating fluorine compound gas, characterized in that the mixture is maintained at 200 to 300 ℃ temperature as a whole. The method according to claim 8,
Contacting the low temperature adsorption treatment agent 411b with the fluorine compound gas at a temperature of 200 ° C. to 600 ° C. (S3) is contacted with a fluorine compound gas preheated to a temperature of 200 ° C. to 600 ° C. on the outer circumferential surface of the heater 412, and the center portion is Since the heater 412 maintains a temperature of 200 ° C to 600 ° C, a homogeneous temperature distribution is formed as a whole.
The fluorine compound gas is a treatment method of the fluorine compound gas, characterized in that the adsorption area is increased through the reaction path flowing from the lower end of one side of the first reactor (41) and discharged to the lower end of the other side. The method according to claim 9,
The fluorine compound gas further comprises the step (S4) of further processing the gas in contact with the low temperature adsorption treatment agent (411b) using a secondary adsorption treatment agent (421b) made of an alkali metal compound and an alkaline earth metal compound. How to deal with

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