KR101057851B1 - Manufacturing Method Of Liquid Crystal Display - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a manufacturing method of a liquid crystal display device which improves image quality by improving alignment characteristics.

According to an aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device comprising the steps of: preparing a substrate having a stepped portion having a taper angle θ; Forming an alignment layer on the substrate; Rubbing on the alignment layer in a first direction; And irradiating light on the alignment layer so as to satisfy a relational expression of 0 <light irradiation angle <θ, in the second direction, wherein the first direction and the second direction are opposite to each other.

Accordingly, the present invention provides a method for manufacturing a liquid crystal display device in which the alignment film is uniformly oriented by using a rubbing method and a light irradiation method in which the stepped portion on the alignment film is irradiated obliquely in a direction opposite to the rubbing direction during the alignment treatment of the alignment film. It prevents light leakage and improves the color contrast ratio, thus improving the reliability of the product.

Polarized UV, inclined irradiation, rubbing, orientation, step, taper

Description

Manufacturing method of a liquid crystal display device {fabrication method for Liquid Crystal Display device}

1 is a cross-sectional view of a general transverse electric field liquid crystal display device.

2A and 2B are cross-sectional views illustrating operations of off and on states of a general transverse electric field type liquid crystal display device, respectively.

3 is a flowchart illustrating a method of manufacturing a transverse electric field liquid crystal display in detail.

4A and 4B are a cross-sectional view and a plan view showing a liquid crystal alignment of a stepped portion in a conventional transverse electric field type liquid crystal display device.

5 is a plan view schematically illustrating an array substrate for a transverse electric field type liquid crystal display device according to an exemplary embodiment of the present invention.

6A to 6E are flowcharts illustrating a manufacturing process of a transverse electric field type liquid crystal display device according to an exemplary embodiment of the present invention.

7A and 7B are cross-sectional views schematically showing the alignment of liquid crystals around a taper in the liquid crystal display according to the present invention.

Description of the Related Art [0002]

410: array substrate 412: gate wiring                 

414: gate electrode 417: common electrode

419 gate insulating film 424 data wiring

426: source electrode 427: semiconductor layer

428: drain electrode 430: pixel electrode

433, 533: Loving gun 438: protective film

465: spacer 470: color filter substrate

473: black matrix 475: color filter layer

477: Second alignment film 479: Overcoat layer

481: First alignment layer 488: Liquid crystal layer

500: substrate 530: electrode

551: alignment film

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a manufacturing method of a liquid crystal display device which improves image quality by improving alignment characteristics.

In general, the CRT (or CRT: Cathode Ray Tube) has been the most used display device for displaying image information on the screen, which is inconvenient to use because it is bulky and heavy compared to the display area. .                         

In addition, with the development of the electronics industry, display devices, which have been limitedly used for TV CRTs, have been widely used in personal computers, notebooks, wireless terminals, automobile dashboards, electronic displays, and the like, and transmit large amounts of image information with the development of information and communication technology. As it becomes possible, the importance of next-generation display devices that can process and implement them is increasing.

Such next-generation display devices should be able to realize light and small, high brightness, large screen, low power consumption, and low price, and one of them has recently attracted attention.

The liquid crystal display (LCD) has excellent display resolution than other flat panel display devices and exhibits a response speed that is higher than that of a CRT when implementing a moving image.

One of the liquid crystal display devices mainly used at present is a twisted nematic (TN) type liquid crystal display device. The twisted nematic method is a method of driving the liquid crystal director by installing electrodes on two substrates, arranging the liquid crystal directors to be twisted by 90 °, and then applying a voltage to the electrodes.

However, the TN (twisted nematic mode) liquid crystal display has a big disadvantage that the viewing angle is narrow.

Recently, researches on liquid crystal displays employing various new methods have been actively conducted to solve the narrow viewing angle problem. In this method, an in-plane switching mode (IPS) or an OCB is used. Optically compensated birefrigence mode.

Among these, the transverse electric field type liquid crystal display device forms two electrodes on the same substrate in order to drive the liquid crystal molecules in a horizontal state with respect to the substrate, and applies a voltage between the two electrodes to apply the voltage to the substrate. Generate an electric field in the direction. In other words, the long axis of the liquid crystal molecules does not stand on the substrate.

For this reason, the change of the birefringence of the liquid crystal with respect to the visual direction is small, and the viewing angle characteristic is much superior to the conventional TN type liquid crystal display device.

Hereinafter, a structure of a transverse electric field type liquid crystal display device according to the related art will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view of a general transverse electric field type liquid crystal display device.

A general transverse electric field type liquid crystal display device is formed by injecting a liquid crystal layer 130 between two substrates by bonding the first substrate 118 and the second substrate 119 to each other. First, the first substrate 118 is formed. After depositing a metal on the patterned patterning, the gate electrode 109 is formed at a plurality of gate wirings and the thin film transistors.

Next, the gate insulating layer 120 is formed on the entire surface including the gate electrode 109, and the semiconductor layer 115 forming the active layer 115a and the ohmic contact layer 115b is formed on the gate insulating layer 120. Form.

The data line 110 is formed on the gate insulating layer 120 to form a matrix structure with the gate line.

At this time, when the data line 110 is formed, the source / drain electrodes 116 and 117 of the thin film transistor are simultaneously formed.

The common wiring and the common electrode 113 are formed to be parallel to the gate wiring.

The protective film 128 is formed on the entire surface of the first substrate 118 formed as described above.

Thereafter, the data electrode 114 is formed to be electrically connected to the drain electrode 117 and parallel to the data line 110.

The first alignment layer 129 is formed on the entire surface of the first substrate 118 formed as described above.

On the other hand, a black matrix 121 is formed on the second substrate 119 to prevent light leakage, and red, green, and blue color filters are formed between the black matrices 121. The color filter layer 122 formed of a pattern is formed.

An overcoat layer 123 is formed on the color filter layer to planarize the surface and protect the color filter layer 122.

Next, a second alignment layer 126 is formed on the overcoat layer 123.

2A and 2B are cross-sectional views illustrating operations of an off state and an on state of a general transverse electric field type liquid crystal display device.

In FIG. 2A, since the horizontal electric field is not applied to the off state, the liquid crystal layer 211 does not move.                         

2B is a diagram illustrating an arrangement state of liquid crystals in an on state where a voltage is applied, and a phase change of the liquid crystal 211a at a position corresponding to the common electrode 217 and the pixel electrode 230 is shown. However, the liquid crystal 211b positioned in the section between the common electrode 217 and the pixel electrode 230 is horizontally formed by a horizontal electric field K formed by applying a voltage between the common electrode 217 and the pixel electrode 230. It is arranged in the same direction as the electric field K.

That is, the transverse electric field type liquid crystal display device has a characteristic that a viewing angle is widened because the liquid crystal moves by a horizontal electric field.

The method of manufacturing the transverse electric field type liquid crystal display device will be described in detail with reference to FIG. 3.

First, the upper and lower substrates of the transverse electric field type liquid crystal display device having the structure as described in FIG. 1 are manufactured (S100).

In order to remove the foreign matter on the substrate on which the various patterns are formed, a cleaning process (S110) is performed, and an alignment film printing process (S120) of printing polyimide (PI), which is an alignment film raw material solution, on the upper surface of the substrate using an alignment film printing apparatus. Go through

Next, an alignment film firing step (S130) is performed in which a high temperature heat is added to the alignment film raw material solution to dry and cure the solvent.

Subsequently, an alignment film rubbing process (S140) is performed to form a groove by rubbing the surface of the baked alignment film using a rubbing device in a predetermined direction.

After the alignment film forming process is completed, a seal pattern serving as an adhesive on the edge of the upper substrate is formed in the remaining regions except for the liquid crystal injection hole, and the spacers are scattered on the lower substrate (S150). .

Next, the two substrates are opposed to each other, and light is leaked out of a given margin so that a precision of about several micrometers (μm) is usually required (S160).

In addition, the cell cutting process of cutting the oppositely bonded substrates into unit cells is performed as described above (S170). The cell cutting process is to cut two substrates that are completely bonded to the required size. A scribing process of forming a line and a brake process of separating a substrate by impacting the scribed lines.

Finally, when the liquid crystal is injected between the two substrates cut into the unit cells and the liquid crystal injection hole is sealed so that the liquid crystal does not flow out, the desired liquid crystal display device is completed (S180).

Here, the physical properties of the liquid crystal are changed by the molecular arrangement state, which causes a difference in response to external forces such as an electric field.

Due to the properties of the liquid crystal molecules described above, the arrangement control of the liquid crystal molecules is an essential technique not only for the study of liquid crystal properties but also for the configuration of the liquid crystal display device.

In particular, the rubbing process that enables the liquid crystal molecules to be uniformly aligned in a certain direction has been studied as an important factor in determining the normal driving of the liquid crystal display and the uniform display characteristics of the screen.

Here, the process of forming the alignment layer for determining the initial alignment direction of the conventional liquid crystal molecules will be described in more detail as follows.

First, the alignment film is formed by applying a polymer thin film and arranging the alignment film in a predetermined direction.

In general, a polyimide-based organic material is mainly used for the alignment layer, and a rubbing method is mainly used for arranging the alignment layer.

In such a rubbing method, a polyimide-based organic material is first applied onto a substrate, the solvent is blown and aligned at a temperature of about 60 to 80 ° C., and then cured at a temperature of about 80 to 200 ° C. to form a polyimide alignment layer. It is a method of forming the orientation direction by rubbing the alignment layer in a predetermined direction using a rubbing cloth wound with a velvet or the like.

Such a rubbing method has an advantage in that the alignment treatment is easy, suitable for mass production, and stable orientation.

However, in the rubbing method, when using a roller having a defective rubbing cloth attached to the rubbing process, a rubbing defect occurs.

That is, since the rubbing method using the rubbing cloth is performed through the direct contact between the alignment film and the rubbing cloth, the destruction of the TFT element previously installed on the substrate due to contamination of the liquid crystal cell due to particle generation and generation of static electricity. In addition, various problems such as the need for an additional cleaning process after rubbing and non-uniformity of the orientation in large-area applications occur, which may lower the yield in manufacturing the liquid crystal display.

Since the transverse electric field type liquid crystal display device manufactured with the above configuration has the same electrode pattern as the pixel electrode and the common electrode in the pixel region, a step difference is generated, as shown in FIG. 4.

4A and 4B are cross-sectional views and plan views illustrating a liquid crystal alignment of a stepped portion in a conventional transverse electric field type liquid crystal display device.

In particular, in recent years, the transverse electric field type liquid crystal display device uses a super transverse electric field type liquid crystal display device (S-IPS) to improve the viewing angle, and the transverse electric field type liquid crystal display device using 3 to 4 masks to reduce the number of processes. As the step is increased, the step height of the substrate is further increased, and thus there is a problem in that an orientation defect occurs at the time of rubbing.

As shown in FIGS. 4A and 4B, an alignment layer 351 is formed on a pixel electrode 330 patterned on a lower plate in a transverse electric field type liquid crystal display, and an edge of the pixel electrode 330 is formed. A step is formed in the part.

In addition, a color filter layer 360 and an alignment layer 352 are formed on an upper plate facing the lower plate, and a liquid crystal layer 390 is formed between the upper plate and the lower plate.

As described above, the step difference generated at the corner portion of the electrode pattern in the pixel area is not properly aligned, which causes a problem in driving the liquid crystal.

First, when the liquid crystal is in a normally black mode, it is displayed in black when no voltage is applied.                         

However, the region A shown in FIG. 4 generates light leakage when the gate voltage is in an off state.

That is, when no voltage is applied, the liquid crystals must be aligned in a state parallel to the rubbing directions of the alignment layers 351 and 352.

However, in the region A, the liquid crystals are distorted in the liquid crystal non-uniform layer 391 due to the step at the edge portion of the electrode pattern, and the distortion is also caused in the liquid crystal uniform layer 392. Will appear.

Accordingly, the retardation of light occurs due to non-uniformly formed liquid crystals at the edges of the electrode, and the linearly polarized light transmitted by the phase retardation is changed to elliptical polarization, and the elliptical polarization is colored. Even in the uniform liquid crystal layer formed close to the filter side, a phase delay is generated to generate a larger phase delay.

As a result, when no voltage is applied in the normally black mode, the light of the backlight passes through the A region as it is, thereby causing light leakage in the dark state, thereby reducing the contrast ratio. It is difficult to achieve high picture quality.

In particular, in recent years, the transverse electric field type liquid crystal display device uses a super transverse electric field type liquid crystal display device (S-IPS) to improve the viewing angle. As the development of the substrate, the step height of the substrate is increasing more and more, there is a problem in that the occurrence of orientation defects increase.                         

Accordingly, since the liquid crystal alignment alignment is disturbed due to uneven rubbing of the rubbing or rubbing around the stepped portion, the image quality of the liquid crystal display, such as an increase in black brightness and an increase in color contrast ratio, is generated.

The present invention relates to a method of manufacturing a liquid crystal display device, in which a rubbing process is performed during an alignment process on an alignment layer, and then light irradiation is inclined in a direction opposite to the rubbing direction to improve uniformity of alignment and alignment characteristics. It is an object to provide a manufacturing method.

In order to achieve the above object, a method of manufacturing a liquid crystal display device according to the present invention comprises the steps of: preparing a substrate having a stepped portion having a taper angle? Forming an alignment layer on the substrate; Rubbing on the alignment layer in a first direction; And irradiating light on the alignment layer so as to satisfy a relational expression of 0 <light irradiation angle <θ in a second direction.

The first and second directions may be opposite directions.

The stepped portion may be a gate wiring, a data wiring, a common electrode, a pixel electrode, and a storage electrode.

The light is characterized in that it is linearly polarized light, partially polarized light.

The taper angle θ at the stepped portion is an angle formed with respect to the substrate in the first direction side.

Hereinafter, a method of manufacturing a liquid crystal display according to the present invention will be described in detail with reference to the accompanying drawings.

5 is a plan view schematically illustrating an array substrate for a transverse electric field type liquid crystal display device according to an exemplary embodiment of the present invention.

Hereinafter, the transverse electric field type liquid crystal display device has been described as an embodiment in order to explain the present invention, but the present invention is not limited thereto.

As shown in FIG. 5, the array substrate 410 for a transverse electric field type liquid crystal display device according to the present invention includes a plurality of gate wires 412 and one gate wire 412 formed in one direction in parallel with a predetermined interval therebetween. The common wiring 416 arranged in one direction in parallel with and parallel to the two lines, and the data wiring 424 which intersects the two wirings and particularly defines the pixel area P, is defined by the gate wiring 412.

A thin film transistor T including a gate electrode 414, a semiconductor layer (see 427 in FIG. 6), a source electrode 426, and a drain electrode 428 at the intersection of the gate line 412 and the data line 424. ), The source electrode 426 is connected to the data line 424, and the gate electrode 414 is connected to the gate line 412.

The pixel electrode 430 connected to the drain electrode 428 and the common electrode 417 formed in parallel with the pixel electrode 430 and connected to the common wiring 416 on the pixel area P. ) Is configured.

The pixel electrode 430 extends from the drain electrode 428 and is formed in parallel with the data line 424 and spaced apart from each other by a plurality of vertical portions 430b and an upper portion of the common line 416. It consists of a horizontal portion (430a) for connecting the vertical portion (430b) into one.

The common electrode 417 extends vertically downward from the common wiring 416, and includes a plurality of vertical portions 417b that are alternately arranged in parallel with the vertical portions 430b of the pixel electrode 430. It consists of a horizontal part 417a connecting the vertical parts 417b to one.

In this case, the horizontal portion 430a of the pixel electrode 430 is formed on a portion of the horizontal portion 417a of the common wiring 416 with a gate insulating film (see 419 in FIG. 6) interposed therebetween. Together with 416, a storage capacitor C is configured.

The data line 424, the pixel electrode 430, and the common electrode 417 may have a zigzag structure having one or more bends thereof.

On the other hand, in the transverse electric field type liquid crystal display device, in order to improve the profile of the wiring, the electrode portion or the side wall of the wiring portion is formed to have a taper angle.

The manufacturing method of the transverse electric field liquid crystal display device configured as described above is as follows.

6A to 6E are flowcharts illustrating a manufacturing process of a transverse electric field type liquid crystal display device according to an exemplary embodiment of the present invention.                     

As shown in FIG. 6A, a low resistivity metal having low resistivity is deposited on the array substrate 410 and then patterned by photo lithography to form a gate wiring (see FIG. 5). And the gate electrode 414 of the thin film transistor branched from the gate wiring 412.

As the low resistance metal, copper (Cu), aluminum (Al), aluminum alloy (AlNd), molybdenum (Mo), chromium (Cr), titanium (Ti), tantalum (Ta), molybdenum-tungsten (MoW), etc. Use

When the gate line 412 and the gate electrode 414 are formed, a common line parallel to the gate line 412 (see 416 of FIG. 5) and a plurality of common electrodes branched from the common line 416 ( 417) at the same time.

Subsequently, an inorganic insulating material such as silicon nitride (SiNx) or silicon oxide (SiOx) is deposited on the entire surface including the gate wiring 412 by the PECVD (Plasma Enhanced Chemical Vapor Deposition) method to form a gate insulating film 419. do.

Subsequently, a material such as amorphous silicon is deposited on the gate insulating layer 419 and selectively removed to form a semiconductor layer 427 in an island shape on the gate insulating layer 419 on the gate electrode 414.

Although not shown, an ohmic contact layer in which impurity ions are implanted into the amorphous silicon may be further formed and patterned.

6B, metals such as Cr, Al, Cu, Mo, Ti, Ta, MoW, and Al alloys are deposited on the entire surface of the gate insulating layer 419 and then patterned by photolithography. And a data line 424 intersecting the gate line 412 in a vertical direction to define a pixel region, and source and drains respectively disposed at both ends of the semiconductor layer 427 simultaneously with the data line 424. Electrodes 426 and 428 are formed.

In addition, a silicon nitride film or BCB (benzocyclobutin), which is an organic insulating film, is coated on the entire surface of the array substrate 410 including the data line 424 to form a passivation layer 438, and a contact hole is formed in the drain electrode 428. Not shown).

In addition, a transparent conductive layer is deposited and patterned on the entire surface using indium tin oxide (ITO) or indium zinc oxide (IZO), which is connected to the drain electrode 428 and parallel to the data line 424. The plurality of pixel electrodes 430 are formed to be disposed between the common electrodes 417 and alternate with the common electrodes 417.

Here, when the pixel electrode 430 is formed of a metal material, although not shown in the drawing, the pixel electrode 430 is formed of the same material as the data line 424 and the data line 424 before forming the passivation layer 438. It may be formed.

As shown in FIG. 6C, an alignment layer material is formed on the entire surface including the pixel electrode 430. The polyimide resin having excellent heat resistance and affinity with liquid crystal is printed on a substrate and dried to form a first alignment layer. 481 is formed and subjected to a primary alignment treatment using a rubbing process.

In addition to the polyimide resin, polyamic acid, polyethyleneimine, polyvinyl alcohol, polyamide, and polyamide containing a polymer having a bond selectively cut upon UV irradiation as the alignment layer material , Polyethylene, polystylene, polyphenylenephthalamide, polyester, polyurethane, polymethylmethacrylate, and the like.

As shown in FIG. 6D, light is irradiated to the first alignment film 481 on which the primary alignment treatment has been performed to perform secondary alignment treatment.

More specifically, the first alignment treatment is performed by using a rubbing cloth 433 wound with velvet, rayon, nylon, etc. on the first alignment layer 481 made of polyimide. It is a rubbing method which forms an orientation direction by rubbing the orientation film 481 in a fixed direction.

Then, secondary alignment treatment is performed on the rubbed first alignment layer 481 using light irradiation.

The light may be linearly polarized light or partially polarized light.

The light is obliquely irradiated to the substrate, and is irradiated obliquely in a direction opposite to the rubbing direction during the primary alignment process.

At this time, when the alignment process is performed on the tapered stepped portion, if the taper angle of the side in the rubbing direction at the stepped portion has a θ angle with respect to the substrate, the light irradiation angle during the light irradiation is 0 <light irradiation with respect to the substrate. It is desirable to satisfy the relation of angle <

In this way, the side surface of the stepped portion rubbed by the primary alignment treatment can be prevented from deteriorating in alignment characteristics by preventing the side surface of the stepped portion from touching the light irradiated during the secondary alignment treatment.

As described above, when the second alignment treatment such as light irradiation or ion beam irradiation is applied to the first alignment film 481 subjected to the primary alignment treatment, the alignment is uniformly performed at the periphery of the tapered electrode portion.

The tapered stepped portion may be a gate line 412, a data line 424, a common electrode 417, a pixel portion 430, a wiring portion such as a storage electrode, and an electrode portion.

Meanwhile, the primary alignment treatment may be performed using light irradiation, and after the primary alignment treatment, a rubbing process, which is a secondary alignment treatment, may be performed to perform alignment treatment.

In addition, the primary alignment treatment and the secondary alignment treatment may be performed simultaneously.

In this case, preferably, the rubbing direction and the light alignment direction may be opposite to each other to maximize the effect of improving the alignment.

Thereafter, as illustrated in FIG. 6E, chromium (Cr) and chromium are prevented on the color filter substrate 470 in order to prevent light leakage from a portion where the liquid crystal cannot be controlled, that is, the gate wiring, the data wiring, and the thin film transistor portion. The black matrix 473 is formed using a highly reflective metal or black resin such as oxide (CrOx) or the like.

Thereafter, red (R), green (G), and blue (B) color filter layers 475 are formed between the black matrices 473 by using electrodeposition, pigment dispersion, and coating. Although not illustrated, an overcoat layer 479 may be formed on the entire surface including the color filter layer 475 to protect the color filter layer 375.

Next, a second alignment layer 477 is formed by printing a polyimide material having excellent affinity with liquid crystals and photosensitive characteristics on the overcoat layer 479, and perpendicular to the first alignment layer 481. An orientation direction is formed, and the second alignment layer 477 is formed through a primary alignment treatment, which is a rubbing process, and a secondary alignment treatment, which is light irradiation, as in the alignment treatment method of the first alignment film 481 described above.

Subsequently, after forming column spacers (not shown) on the array substrate 410 or the color filter substrate 470, a liquid crystal injection method or the like is applied to the display area of the array substrate 410 or the color filter 470 substrate. The liquid crystal layer 488 is formed by a liquid crystal dropping method, and a seal material is formed on an edge of the array substrate 410 or the color filter substrate 470 to vacuum the array substrate 410 and the color filter substrate 470. To join.

7A and 7B are cross-sectional views schematically illustrating liquid crystal alignment around a taper in the liquid crystal display according to the present invention.

Meanwhile, in order to improve the profile of the wiring in the liquid crystal display, the electrode portion or the sidewall of the wiring portion is formed to have a taper angle θ.

Here, the electrode portion or the wiring portion includes a gate wiring, a data wiring, a common electrode, a pixel electrode, a storage electrode, and the like formed on a substrate.

As shown in FIGS. 7A and 7B, in the transverse electric field type liquid crystal display device according to the present invention, an alignment-oriented alignment film is formed on an electrode or a wiring on which a taper is formed on a substrate 500.

As shown in FIG. 7A, the alignment layer 551 formed on the substrate 500 is formed by performing a primary alignment process.

The primary alignment treatment is performed by fixing the alignment layer 551 using a rubbing cloth 533 wrapped with velvet, rayon, nylon, etc. on the alignment layer 551 made of an alignment material such as polyimide. It is a rubbing method which forms an orientation direction by rubbing in a direction.

At this time, when rubbing around the tapered electrode 530 or the wiring part on the substrate 500, the opposite side of the direction in which the rubbing cloth travels in the stepped portion does not touch the rubbing carriage alignment layer 551 so that the rubbing is not aligned or the rubbing cloth The rubbing of the rubbing cloth may occur while passing through the step, resulting in uneven alignment alignment. Here, the side corresponding to the direction in which the rubbing cloth travels may be defined as one side of the stepped portion, and the side opposite to the direction in which the rubbing cloth advances may be defined as the other side of the stepped portion.

Therefore, as shown in FIG. 7B, the secondary alignment treatment is performed by using light irradiation on a portion or the entire surface of the alignment layer 551 subjected to the primary alignment treatment on the substrate 500.

The light may be linearly polarized light or partially polarized light.

The light is obliquely irradiated onto the substrate 500 and is irradiated obliquely in a direction opposite to the rubbing direction during the primary alignment process.

At this time, when the alignment process is performed on the tapered electrode 530, the stepped light is assumed to have a θ angle with respect to the substrate 500 at the side of the rubbing direction in the electrode 530 portion. The irradiation angle preferably satisfies the relational expression of 0 <light irradiation angle <θ with respect to the substrate 500.

In this way, the side surface of the stepped portion rubbed by the primary alignment treatment can be prevented from coming into contact with the light irradiated during the secondary alignment treatment, thereby preventing the surface characteristics of the alignment film from deteriorating.

As described above, when the alignment layer 551 subjected to the primary alignment treatment is subjected to a secondary alignment treatment such as light irradiation or ion beam irradiation, the alignment is uniformly performed at the stepped portion around the electrode 530 which is tapered.

Meanwhile, the primary alignment treatment may be performed using light irradiation, and after the primary alignment treatment, a rubbing process, which is a secondary alignment treatment, may be performed to perform alignment treatment.

In addition, the primary alignment treatment and the secondary alignment treatment may be performed simultaneously.

In this case, preferably, the rubbing direction and the light alignment direction may be opposite to each other to maximize the alignment improvement effect.

As described above, the transverse electric field type liquid crystal display device according to the present invention may be manufactured by a simple patterning process using a printing method, and the transverse electric field type liquid crystal display device and the manufacturing method thereof according to the present invention are not limited thereto. It is apparent that modifications and improvements are possible by those skilled in the art within the technical idea of the present invention.

The present invention provides a method for manufacturing a liquid crystal display device by forming an alignment film that is uniformly oriented by using a rubbing method and a light irradiation method irradiated obliquely in a direction opposite to the rubbing direction on the stepped portion on the alignment film during the alignment processing of the alignment film. It prevents light leakage and improves the color contrast ratio, thus improving the reliability of the product.

Claims (6)

Preparing a substrate on which a stepped portion having a taper angle θ is formed; Forming an alignment layer on the substrate; Rubbing on the alignment layer in a first direction; Irradiating light on the alignment layer in a second direction so as to satisfy a relational expression of 0 <light irradiation angle <θ; The alignment layer corresponding to one side of the stepped portion is aligned by the rubbing, and the alignment layer corresponding to the other side of the stepped portion symmetrical to one side of the stepped portion is aligned by the light. Manufacturing method. The method of claim 1, And the first direction and the second direction are directions opposite to each other. The method of claim 1, And the stepped portion is a gate line, a data line, a common electrode, a pixel electrode, or a storage electrode. The method of claim 1, The light is a method of manufacturing a liquid crystal display device, characterized in that the linearly polarized light, partially polarized light. The method of claim 1, The taper angle (θ) in the stepped portion is an angle formed with respect to the substrate in the first direction side. The method of claim 1, The light irradiation angle is less than or equal to 90 ° manufacturing method of the liquid crystal display device.

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