KR101044549B1 - Fs mode liquid crystal display device and manufacturing method thereof - Google Patents

Abstract

The present invention provides an FFS mode liquid crystal having a second transparent electrode having a plurality of slits spaced apart from each other with a first transparent electrode and an insulating layer interposed therebetween in order to adjust a light transmission amount by applying a voltage to the liquid crystal layer. In the display device, a bar shape having a predetermined width in a direction substantially parallel to the longitudinal direction of the slit at a center portion of each slit of the second transparent electrode or a center portion of the space between the slits based on a planar arrangement Provided is an FFS mode liquid crystal display in which patterns are formed.

FFS, LCD, Reflectivity

Description

F-s mode liquid crystal display and manufacturing method thereof {FRINGE FIELD SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method of manufacturing the same. More specifically, the outdoor readability and screen quality of the FFS liquid crystal display device in the transmissive mode are improved. An improved FFS mode liquid crystal display device and a manufacturing method thereof are provided.

In general, the FFS mode liquid crystal display is proposed to improve the low aperture ratio and transmittance of the In-Plane Switching Mode (IPS mode) liquid crystal display.

In the FFS mode liquid crystal display, the common electrode and the pixel electrode are formed of a transparent conductor to increase the aperture ratio and transmittance as compared to the IPS mode liquid crystal display, while maintaining the gap between the common electrode and the pixel electrode between the upper and lower glass substrates. By forming a narrower, a fringe field is formed between the common electrode and the pixel electrode, so that all liquid crystal molecules existing on the electrodes can be operated to obtain more improved transmittance. Prior arts for FFS mode liquid crystal displays are disclosed, for example, in US Pat. Nos. 6,608,1,6226118 and the like, filed and registered by the present applicant.

The conventional FFS mode liquid crystal display device includes a lower substrate including a plurality of pixels including a transparent pixel electrode, a transparent common electrode, and a thin film transistor (TFT), corresponding to red (R), green (G), and blue ( It consists of an upper substrate composed of a color filter and a black matrix (BM), in which the color filter patterns of B) are alternately arranged.

The transparent pixel electrode generates a transparent common electrode and an electric field to control light transmittance with a liquid crystal interposed between the lower substrate and the upper substrate.

On the other hand, a liquid crystal display (LCD) can be generally classified into two types: a transmissive liquid crystal display using a backlight and a reflective liquid crystal display using natural light as a light source. The transmissive liquid crystal display uses a backlight as a light source, so that a bright image can be realized even in a dark environment. However, the use of a backlight has a disadvantage of high power consumption and poor readability outdoors. A reflective liquid crystal display does not use a backlight. Because it uses the natural light of the surrounding environment, the power consumption is small and can be used outdoors, but the disadvantage is that it is impossible to use when the surrounding environment is dark.

The paper "A Novel Outdoor Readability of Portable TFT-LCD with AFFS" published by the present applicant to solve the problems of the conventional transmissive and reflective liquid crystal display device (KH Lee et. Al., SID 06, 2006, p1079), an AFFS (Advanced FFS) mode liquid crystal display which is a transmissive FFS mode liquid crystal display having improved readability both indoors and outdoors has been proposed.

However, in the liquid crystal display device, the pixel electrode has an electric field formed appropriately at the boundary between the slit and the bar, and the liquid crystal is smoothly driven. However, the distance between the common electrodes is far from the center region of the slit and the bar. As liquid crystal driving is not smooth and disclination occurs, there is a demand for solving such a problem. Such a factor causes a lack of uniform alignment of liquid crystals, especially at high voltages, thereby degrading screen quality.

In addition, although the reflection area is configured to increase the outdoor visibility to increase the outdoor brightness through internal reflection, the remaining area except for the opening area is used as the reflection area, so the area contributing to the reflection is not so large that the expected effect is reduced. There was this.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to reduce the screening phenomena through a relatively simple process change without significantly changing the manufacturing process, thereby improving the screen quality. It is an object of the present invention to provide a display device and a method of manufacturing the same.

Another object of the present invention is to provide an FFS mode liquid crystal display device and a method of manufacturing the same, which further improves outdoor visibility by additionally securing a reflection area.

In order to achieve the above object, a first aspect of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, wherein the lower substrate has gate lines and data lines formed to cross each other. In the FFS mode liquid crystal display device in which each pixel region is defined by a switching element, and a switching element is disposed at an intersection of the gate line and the data line.

In order to control the amount of light transmission by applying a voltage to the liquid crystal layer, the pixel region includes a second transparent electrode having a plurality of slits spaced apart from each other with a first transparent electrode interposed between the insulating layer and a planar arrangement. As a reference, a bar-shaped pattern having a predetermined width in a direction substantially parallel to the longitudinal direction of the slit is formed in the central portion of each of the slits or the central portion of the space between the slits of the second transparent electrode. An FFS mode liquid crystal display device is provided.

Preferably, the patterns are made of a material forming data lines, and the transparent common electrode may have a slit shape or a plate shape.

Preferably, each of the patterns has a structure in which the upper width is narrow and the lower width is wide with respect to the substrate.

In addition, an additional bar connecting the patterns may be provided at an edge region of the slit.

Preferably, the patterns are made of a material having high thermal conductivity.

The second aspect of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and each pixel region is defined by gate lines and data lines formed in the mutually intersecting direction on the lower substrate. A method of manufacturing an FFS mode liquid crystal display device having a switching element disposed at an intersection of the lines, the method comprising: forming a first transparent electrode on a substrate; And sequentially forming a gate line, a gate insulating film, an active layer, a data line, an insulating layer, and a second transparent electrode on the first transparent electrode, in the forming of the data line, based on a planar layout. In the center portion of each of the slits of the second transparent electrode or the center portion of the space between the slits, bar-shaped patterns having a predetermined width in a direction substantially parallel to the longitudinal direction of the slit are formed together with the data lines. A method of manufacturing a FFS mode liquid crystal display device is provided.

A third aspect of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and each pixel region is defined by gate lines and data lines formed in cross directions in the lower substrate. A method of manufacturing a FFS mode liquid crystal display device having a switching element disposed at an intersection of the lines, the method comprising: forming bar-shaped patterns having a predetermined width and a gate line on a substrate; And forming a gate insulating layer, an active layer, a first transparent electrode, a data line, an insulating layer, and a second transparent electrode on the structure, wherein the forming of the patterns comprises: a second planar arrangement; A method of manufacturing an FFS mode liquid crystal display device is provided in a center portion of each slit of a transparent electrode or a center portion of a space between the slits in a direction substantially parallel to a longitudinal direction of the slit.

According to the FFS mode liquid crystal display device and the manufacturing method thereof of the present invention as described above, it is possible to significantly reduce the declining caused by the liquid crystal drive is not smooth, especially the liquid crystal is not uniformly aligned at high voltage This can solve the problem of deteriorating the screen quality.

In addition, according to the present invention, by forming a pattern using a data line material, there is an effect of enabling uniform color expression in a relatively simple process.

In addition, according to the present invention, the reflection area can be additionally secured, so that indoor and outdoor readability can be significantly improved.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the following embodiments of the present invention may be modified into various other forms, and the scope of the present invention is not limited to the embodiments described below. The embodiments of the present invention are provided to enable those skilled in the art to more fully understand the present invention.

The liquid crystal display according to the exemplary embodiment of the present invention includes a lower substrate, an upper substrate, and a liquid crystal layer interposed between the lower substrate and the upper substrate, and the lower substrate is formed in a direction crossing each other to apply a voltage to the liquid crystal layer. Each pixel region is defined by the electrodes.

(First embodiment)

1 is a plan view illustrating a portion of a pixel area formed on a lower substrate of an FFS mode liquid crystal display according to an exemplary embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line II ′ of FIG. 1.

1 and 2, the FFS mode liquid crystal display according to the exemplary embodiment of the present invention is arranged such that the gate line 120 and the data line 150 cross on the lower substrate 100, and the gate line ( A thin film transistor (TFT), which is a switching element, is disposed at an intersection of the 120 and the data line 150, and a transparent common electrode is formed in the unit pixel region defined by the gate line 120 and the data line 150. A transparent pixel electrode 170 having a plurality of slits formed at a predetermined angle with the gate line 120 is spaced apart from the transparent common electrode 110 with the insulating layer 160 interposed therebetween. In FIG. 1, a case in which the transparent common electrode 110 is manufactured in a plate shape is illustrated as an example, but the transparent common electrode 110 may also be configured in a shape having a plurality of slits.

In addition, the plurality of slits of the transparent pixel electrode 170 form a predetermined angle (for example, 2 to 30 ^° ) with the gate line 120, and the transparent common electrode 110 and the transparent pixel electrode 170 The insulating layer 160 is insulated from each other, and the gate insulating layer 130 is provided between the gate line 120 and the active layer 140.

On the other hand, the common bus line 122 is arranged parallel to the gate line 120 at the pixel edge portion spaced apart from the gate line 120, and the common bus line 122 is electrically connected to the transparent common electrode 110. Connected to apply a common signal to the transparent common electrode 110.

In addition, an upper substrate (not shown) is formed on the upper portion of the lower substrate 100 by a predetermined distance, and the upper substrate (not shown) includes a light blocking area, a color filter, and an overcoat layer, and a plurality of lower substrates 100. The liquid crystal layer containing the two liquid crystal molecules is bonded to each other.

According to the first embodiment, based on the planar arrangement as shown in FIG. 1, the center portion of each slit of the transparent pixel electrode 170 and the center portion of the slits (electrodes) are substantially in the longitudinal direction of the slit. Bar-shaped patterns 154 having a predetermined thickness in parallel directions are formed. In FIG. 1, the pattern 154 is formed in both the center portion of each slit and the center portion between the slits as an example, but in actual application, the pattern is formed only in the center portion of each slit or the center portion between the slits. It is also possible to form the field 154, and this case also has the effect of the present invention.

The pattern 154 may be manufactured using a variety of materials that are not particularly limited, and may be formed by depositing a film through a separate deposition process. In this embodiment, the pattern 154 may be manufactured by using a metal having a data line. It is easy to process.

In addition, recently, LCD products are being used outdoors, in which case outdoor visibility and power consumption are important factors. In order to reduce power consumption, lowering the driving voltage is one method, and development of a low voltage driving method is being studied. In this regard, in the embodiment of the present invention, the patterns formed in the center portion between the slits (electrodes) or the center portion between the slits may be formed of a material having high thermal conductivity. This will be described below.

In the FFS mode having the slit, the driving voltage may be changed for each position where the liquid crystal is disposed. That is, the center between the slits or the center of the slits has a relatively small horizontal electric field so that the liquid crystal is mainly rotated by the elastic torque in this region, so that the driving voltage is relatively higher than other regions. Therefore, when the pattern is formed of a material having high thermal conductivity in the center between the slits or the center of the slits, the liquid crystal temperature can be increased more quickly than other parts when the temperature increases due to outdoor sunlight. Through this, the driving voltage can be reduced. That is, when the liquid crystal temperature rises, the driving voltage decreases. In addition, when the temperature between the center portion of the slits or the center portion of the slits increases, the d ?? n of this region is also close to the optimum value and can also increase the transmittance.

As a material having high thermal conductivity, various metals, alloys or materials such as carbon nanotubes may be used. For example, the thermal conductivity of the metal is ^{Al 0.53 cal / cm 2 / sec} / o c, Cu 0.94 cal / cm 2 / sec / o c, Ni 0.22 cal / cm 2 / sec / o c, Fe 0.18 cal / cm High thermal conductivity of ² / sec / ^o c, etc. means that the thermal conductivity of the general metal level (for example, 0.1 cal / m ² / m / sec / ^o c or more).

Meanwhile, when the patterns 154 are formed of the data line material, when the metal is used as the data line material, the above-described effect may be naturally exerted, and if necessary, a separate thermal material having a higher thermal conductivity than the material of the data line may be used. When the patterns 154 are formed using a material, the above effects may be maximized.

Meanwhile, when the patterns 154 are formed together with the deposition and patterning of the data line 150 and the source drain electrode 152, the process may be performed without an additional process. When the distance between the slit and the slits is about 4-8 μm, the bar-shaped patterns 154 are preferably formed about 1-1.5 μm wide in consideration of the effective blocking of the disclination area and the influence of the reduction of the aperture ratio. However, the width of the patterns can be smaller if they only cover different process conditions. Meanwhile, the patterns 154 may extend to the edge of the slit to effectively block the disclination region.

A slight decrease in transmittance can be expected if the patterns 154 are formed but for example the visibility of the rainbow moire is significantly reduced. Even if these patterns are regular, the spacing is so narrow that the spread of light becomes excessively wide, resulting in a marked drop in rainbow moire visibility. In addition, since the transmissive region reflecting region is formed, the amount of light scattered into the transmissive region after reflection may be increased.

3 is an example of a pattern shape according to an embodiment of the present invention. The shape of the pattern shown in Figure 3 is a triangular shape. When the pattern has a structure having a narrow width at the top and a wide width at the bottom of the substrate, the pattern has an angle of inclination of 20 to 70 degrees, preferably 30 to 40 degrees, so that it causes effective diffuse reflection. Can be increased.

In addition, since the size of the pattern should be smaller than the interval between the slits, the width of the lower portion may be formed to about 1 to 3 μm, preferably, about 1 to 1.5 μm, and when forming the pattern by etching, triangles, trapezoids, and the like are possible.

On the other hand, according to the researches of the present inventors, the source-drain electrode can form a light-shielding reflector plate to secure a reflection area of about 30% more than the existing reflector plate area, and is actually formed as an inclined surface of the edges of patterns that contribute to diffuse reflection. In this case, it is confirmed that the reflection area can be improved by about 80%, which greatly contributes to the improvement of outdoor visibility. In FIG. 3, the pattern 154 is formed in both the center of each slit and the center of the slits (electrodes). For example, in the practical application, the center of each slit or between the slits is shown. As described above, the patterns 154 may be formed only in the center portions.

Hereinafter, a method of manufacturing an FFS mode liquid crystal display device according to an exemplary embodiment of the present invention will be described with reference to FIGS. 1 and 2.

First, a transparent conductive layer is deposited on the lower substrate 100 and patterned to form a transparent common electrode 110 having a plate shape.

In addition, after the opaque metal is deposited on the transparent common electrode 110, the gate line 120 is formed on one side of the transparent common electrode 110 through patterning, and covers a portion of the transparent common electrode 110. The common bus line 122 is formed as a structure.

Next, the gate insulating layer 130 is deposited on the entire surface of the patterned transparent common electrode 110, the lower substrate 100 on which the gate line 120 and the common bus line 122 are formed, and then the gate line 120. The active layer 140 is formed by patterning the a-Si layer and the n + a-Si layer on the upper gate insulating layer 130.

In addition, after the metal layer is deposited on the entire surface of the lower substrate 100 on which the active layer 140 is patterned, the data line 150 and the source-drain electrode 152 are formed through patterning. At this time, the bar-shaped patterns 154 having a predetermined thickness in a direction substantially parallel to the longitudinal direction of the slit at the center of each slit and the center of the space between the slits of the transparent pixel electrode 170 formed later. ) Is formed. An insulating layer 160 is deposited on the data line 150, the source-drain electrode 152, and the bar-shaped pattern 154.

Next, after forming the contact hole CN to expose a portion of the source-drain electrode 152, a transparent conductive layer is deposited on the insulating layer 160. In this case, the transparent conductive layer is patterned to connect the source-drain electrode 152 and the transparent pixel electrode 170 through the contact hole CN to form a transparent pixel electrode 170 having a slit shape. Bar-shaped patterns 154 are formed at the center of each slit of the transparent pixel electrode 170 and the center of the space between the slits.

(Comparative Example)

4A and 4B are diagrams illustrating simulation results of a liquid crystal driving shape in an opening region at a high voltage to explain a comparative example with or without a pattern.

Referring to FIG. 4A, in the center region of the slit and bar of the electrode, the liquid crystal moves away from the influence of the electric field due to the applied pixel voltage, and thus does not rotate properly, and shows a non-uniform direction with other regions. As a result, the liquid crystal transmittance inside the same pixel is changed, and it is difficult to express the intended color, thereby degrading the screen quality.

On the other hand, FIG. 4B illustrates a situation in which a bar-shaped pattern 154 having a predetermined thickness in a direction substantially parallel to the longitudinal direction of the slit is formed in each slit center of the transparent pixel electrode and in the center of the space between the slits. In this case, it is confirmed that the screen quality can be improved by preventing the color deterioration caused by the unstable region by shielding the central regions of the slits and bars showing unstable liquid crystal directions using the source-drain electrodes.

5A and 5B are diagrams for describing a situation in which the disclination is reduced depending on whether a pattern is formed. In order to explain the comparative example, the results of the simulation of the liquid crystal drive shape in the opening region at high voltage are shown. In the structure in which the pattern is not formed, in the electric field region formed by the transparent common electrode 110 and the transparent pixel electrode 170, the intensity of the electric field is normal and the strength of the electric field is weak, causing the disclination. All backlight light is transmitted through the weak field. On the other hand, in the structure in which the patterns 154 are formed, by using the data line material to shield the backlight light transmitted through the field weakening area, it is possible to display a uniform color.

Meanwhile, the patterns 154 used as the light blocking film are used as the reflecting plate. As shown in FIG. 5B, by further expanding the reflection area as in the outdoor reflection path, it is possible to contribute to the increase in outdoor visibility.

(2nd Example)

Next, a second embodiment of the present invention will be described with reference to FIG.

6 is a plan view illustrating a portion of a pixel area formed on a lower substrate of an FFS mode liquid crystal display according to a second exemplary embodiment of the present invention.

Referring to FIG. 6, the difference between FIG. 1 and FIG. 1 will be described. The center portion of each of the slits of the transparent pixel electrode 170 and the center portion of the space between the slits have a predetermined thickness in a direction substantially parallel to the longitudinal direction of the slits. Bar-shaped patterns 154 are formed, and further, the patterns 154 connect each pattern 154 in a direction perpendicular to a direction substantially parallel to the longitudinal direction of the slit at the edge of the slit. Further has a connecting-bar 140c.

According to the additional connection bar (140c), there is an advantage that can reduce the declining occurs at the edge of the slit, and each pattern 154 is also formed by extending to the edge of the slit The area can be blocked effectively.

(Third Embodiment)

Hereinafter, a third embodiment of the present invention will be described, but for the convenience of description, the following description will focus on differences from the above-described embodiment.

FIG. 7 is a plan view showing a portion of a pixel area in a lower substrate of an FFS mode liquid crystal display according to a third exemplary embodiment of the present invention, FIG. 8 is a cross-sectional view taken along the line II ′ of FIG. 7, and FIG. It is sectional drawing along the II-II 'line | wire of 7.

7, 8, and 9, in the lower substrate 200, a gate line G made of an opaque metal and a data line 250 are arranged to vertically intersect to form a unit pixel. The transparent common electrode 270 and the transparent pixel electrode 230 are disposed under the insulating layer 260, and the transparent pixel electrode 230 is disposed on the same layer as the data line 250 in the form of a plate, for example. In addition, the transparent common electrode 270 is formed in the form of a plurality of combs by patterning the transparent conductive layer deposited on the insulating layer 260 and overlaps a predetermined region with the transparent pixel electrode 230.

The active pattern 240 and the source / drain electrodes 250a and 250b in which an a-Si film and an n + a-Si film are sequentially deposited are deposited on the gate electrode 210 in the gate line G under the gate insulating film 220. To form a thin film transistor (TFT) (T). The drain electrode 250b is electrically connected to the transparent pixel electrode 230 to apply a data signal to the unit pixel.

According to the third embodiment, based on the planar arrangement, a predetermined thickness is formed at the center of each slit of the transparent common electrode 270 and the center of the slits (electrodes) in a direction substantially parallel to the longitudinal direction of the slit. The bar-shaped patterns 254 having are formed. In FIG. 7, the pattern 254 is formed in both the center portion of each slit and the center portion between the slits as an example. However, in actual application, the pattern is formed only in the center portion of each slit or the center portion between the slits. It is also possible to form the field 254, and in this case as well, there is an effect according to the present invention.

The material forming the patterns 254 is not particularly limited and can be variously applied, and it is also possible to deposit and use a separate layer separately, for example, when using a material for forming a gate electrode, the process can be simplified. There is an advantage.

7, the manufacturing method of the FFS mode liquid crystal display device of this invention is demonstrated in detail with reference to FIG.

7, 8, and 9, the gate line G including the gate electrode 210 is formed on the lower substrate 200. That is, the gate line G including the gate electrode 210 is formed on a portion of the lower substrate 200 of the TFT (T) formation part by depositing and patterning an opaque metal film on the lower substrate 200. Form. When forming the gate line G, the center portion of each slit of the transparent common electrode 270 to be formed later and the center portion between the slits (electrodes) have a predetermined thickness in a direction substantially parallel to the longitudinal direction of the slit. Bar-shaped patterns 254 are formed together.

Then, the gate insulating film 220 is deposited on the entire surface to cover the gate line G including the gate electrode 210, and then each pixel region is formed by depositing and patterning a transparent conductive layer on the gate insulating film 220. The plate-shaped transparent pixel electrode 230 is formed to be disposed therein.

Next, the a-Si film and the n + a-Si film are sequentially deposited on the substrate resultant, and then patterned to form an active pattern 240 on the gate insulating film 220 on the gate electrode 210.

Thereafter, a source / drain metal film is deposited and then patterned to form a data line 250 including the source / drain electrodes 250a and 250b, and through this, the thin film transistor TFT ( Constitute T). In this case, the drain electrode 250b is formed to be electrically connected to the transparent pixel electrode 230.

Subsequently, after the insulating layer 260, for example, of SiNx material, is coated on the resultant structure in which the thin film transistor T is formed, the transparent common electrode 270 having a comb shape is formed to overlap at least a portion of the transparent pixel electrode 230. Form. Subsequently, although not shown, the alignment layer is coated on the top of the substrate resultant on which the transparent common electrode 270 is formed to complete the fabrication of the array substrate.

Although a preferred embodiment of the above-described FFS mode liquid crystal display device and a method of manufacturing the same according to the present invention has been described, the present invention is not limited thereto, and various claims are made within the scope of the claims and the detailed description of the invention and the accompanying drawings. It is possible to carry out the transformation to this also belongs to the present invention.

1 is a plan view showing a portion of a pixel area formed on a lower substrate of an FFS mode liquid crystal display according to a first embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along the line II ′ of FIG. 1.

3 is an example of a pattern shape according to the first embodiment of the present invention.

4A and 4B are diagrams illustrating simulation results of a liquid crystal driving shape in an opening region at a high voltage to explain a comparative example with or without a pattern.

5A and 5B are diagrams for describing a situation in which the disclination is reduced depending on whether a pattern is formed.

6 is a plan view illustrating a portion of a pixel area formed on a lower substrate of an FFS mode liquid crystal display according to a second exemplary embodiment of the present invention.

FIG. 7 is a plan view showing a portion of a pixel area in a lower substrate of an FFS mode liquid crystal display according to a third exemplary embodiment of the present invention, FIG. 8 is a cross-sectional view taken along the line II ′ of FIG. 7, and FIG. It is sectional drawing along the II-II 'line | wire of 7.

Claims (15)

A lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, wherein each pixel region is defined by gate lines and data lines formed in an intersecting direction on the lower substrate, and the gate lines and the data. In the FFS mode liquid crystal display device in which a switching element is arranged at the intersection of the lines, A second transparent electrode having a plurality of slits and bars spaced apart from each other with a first transparent electrode and an insulating layer interposed therebetween in order to adjust a light transmission amount by applying a voltage to the liquid crystal layer, , Based on the planar arrangement, a predetermined width is provided at the center of each slit or the center of each bar of the second transparent electrode in a direction substantially parallel to the longitudinal direction of the slit in order to reduce visibility of the discretization. An FFS mode liquid crystal display device, wherein bar-shaped patterns are formed. The method of claim 1, And the patterns are formed of a material forming data lines. The method of claim 1, The first transparent electrode is a slit-shaped or plate-shaped FFS mode liquid crystal display device. The method according to claim 1, Each of the patterns has a narrower width as it moves away from the lower substrate, and has a wider structure as it moves closer to the lower substrate. The method according to claim 1, Each of the patterns is a FFS mode liquid crystal display device having a width of 1 to 1.5 ㎛ in the lower portion. The method according to claim 1, And an additional bar connecting the patterns to an edge region of the slit. The method according to claim 1, And the patterns are formed at the center of each slit and at the center of each bar. The method according to claim 1, The patterns are FFS mode liquid crystal display device made of a material of any one of metal, alloy or carbon nanotubes. Each pixel region is defined by a gate line and data lines that include a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and a gate line and data lines intersecting each other on the lower substrate, and the gate line and the data line. In the manufacturing method of the FFS mode liquid crystal display device, the switching element is arranged at the intersection of Forming a first transparent electrode on the lower substrate; And And sequentially forming a second transparent electrode having a gate line, a gate insulating film, an active layer, a data line, an insulating layer, and a plurality of slits and bars on the first transparent electrode, In the forming of the data line, in the center portion of each slit or the center portion of each bar of the second transparent electrode based on a planar arrangement, the length direction of the slit may be reduced so as to reduce visibility of the disclination. A method of manufacturing an FFS mode liquid crystal display device, comprising forming bar-shaped patterns having a predetermined width in a substantially parallel direction together with data lines. Each pixel region is defined by a gate line and data lines that include a lower substrate, an upper substrate, and a liquid crystal layer interposed between the substrates, and a gate line and data lines intersecting each other on the lower substrate, and the gate line and the data line. In the manufacturing method of the FFS mode liquid crystal display device, the switching element is arranged at the intersection of Forming bar-shaped patterns having a predetermined width and a gate line on the lower substrate; And Forming a second transparent electrode having a gate insulating layer, an active layer, a first transparent electrode, a data line, an insulating layer, and a plurality of slits and bars on the gate line and the bar-shaped patterns, The forming of the patterns may be performed in a direction substantially parallel to a longitudinal direction of the slit in a central portion of each slit or a center of each bar of the second transparent electrode based on a planar arrangement. A method of manufacturing an FFS mode liquid crystal display device. The method of claim 9 or 10, Each of the patterns has a narrower structure as the distance from the lower substrate becomes wider and becomes wider as the distance to the lower substrate becomes closer. The method of claim 9 or 10, The pattern is a manufacturing method of the FFS mode liquid crystal display device having a width of 1 to 1.5 ㎛ bottom. The method of claim 9, In the forming of the data line, forming an additional bar, which connects the patterns together with the data lines, at an edge region of the slit. The method of claim 9 or 10, And forming the patterns in the center portion of each slit and the center portion of each bar. The method of claim 9 or 10, The pattern is a method of manufacturing a FFS mode liquid crystal display device made of any one material of metal, alloy or carbon nanotubes.

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