KR101027120B1 - 방사선 조사를 이용한 유/무기 복합막의 제조방법 및 이에 따라 제조되는 유/무기 복합막 - Google Patents
방사선 조사를 이용한 유/무기 복합막의 제조방법 및 이에 따라 제조되는 유/무기 복합막 Download PDFInfo
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- KR101027120B1 KR101027120B1 KR1020090108621A KR20090108621A KR101027120B1 KR 101027120 B1 KR101027120 B1 KR 101027120B1 KR 1020090108621 A KR1020090108621 A KR 1020090108621A KR 20090108621 A KR20090108621 A KR 20090108621A KR 101027120 B1 KR101027120 B1 KR 101027120B1
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- Prior art keywords
- organic
- inorganic
- composite membrane
- inorganic composite
- radiation
- Prior art date
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- 239000002131 composite material Substances 0.000 title claims abstract description 76
- 239000012528 membrane Substances 0.000 title claims abstract description 73
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- 230000005855 radiation Effects 0.000 title claims abstract description 26
- 239000010954 inorganic particle Substances 0.000 claims abstract description 46
- 239000005518 polymer electrolyte Substances 0.000 claims abstract description 36
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- -1 trimethoxysilin propyl methacrylate (trimethylsilyl) propylmethacrylate Chemical compound 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 18
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- 229920005569 poly(vinylidene fluoride-co-hexafluoropropylene) Polymers 0.000 claims description 8
- 229920000573 polyethylene Polymers 0.000 claims description 8
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- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 6
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- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 5
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- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 4
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 3
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- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 claims description 2
- LLLWMXQKXWIRDZ-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one Chemical compound C=CN1CCCC1=O.C=CN1CCCC1=O LLLWMXQKXWIRDZ-UHFFFAOYSA-N 0.000 claims description 2
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 claims description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 claims description 2
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 claims description 2
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 claims description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 2
- 229910002367 SrTiO Inorganic materials 0.000 claims description 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 claims description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 claims description 2
- DUDCYUDPBRJVLG-UHFFFAOYSA-N ethoxyethane methyl 2-methylprop-2-enoate Chemical compound CCOCC.COC(=O)C(C)=C DUDCYUDPBRJVLG-UHFFFAOYSA-N 0.000 claims description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 claims description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 2
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 claims description 2
- 229940073584 methylene chloride Drugs 0.000 claims description 2
- 229910003465 moissanite Inorganic materials 0.000 claims description 2
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- 229940113115 polyethylene glycol 200 Drugs 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- 239000005051 trimethylchlorosilane Substances 0.000 claims description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 claims 2
- 239000005020 polyethylene terephthalate Substances 0.000 claims 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 claims 1
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- WYHUWFDCOJZMPO-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;hydrochloride Chemical compound Cl.COC(=O)C(C)=C WYHUWFDCOJZMPO-UHFFFAOYSA-N 0.000 claims 1
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- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 21
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- 239000007773 negative electrode material Substances 0.000 description 4
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
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- 230000008901 benefit Effects 0.000 description 1
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- MYWGVEGHKGKUMM-UHFFFAOYSA-N carbonic acid;ethene Chemical compound C=C.C=C.OC(O)=O MYWGVEGHKGKUMM-UHFFFAOYSA-N 0.000 description 1
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- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
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- GELKBWJHTRAYNV-UHFFFAOYSA-K lithium iron phosphate Chemical compound [Li+].[Fe+2].[O-]P([O-])([O-])=O GELKBWJHTRAYNV-UHFFFAOYSA-K 0.000 description 1
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- CJYZTOPVWURGAI-UHFFFAOYSA-N lithium;manganese;manganese(3+);oxygen(2-) Chemical compound [Li+].[O-2].[O-2].[O-2].[O-2].[Mn].[Mn+3] CJYZTOPVWURGAI-UHFFFAOYSA-N 0.000 description 1
- BFZPBUKRYWOWDV-UHFFFAOYSA-N lithium;oxido(oxo)cobalt Chemical compound [Li+].[O-][Co]=O BFZPBUKRYWOWDV-UHFFFAOYSA-N 0.000 description 1
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- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
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- C08J5/10—Reinforcing macromolecular compounds with loose or coherent fibrous material characterised by the additives used in the polymer mixture
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Abstract
Description
예 | 무기물/고분자 전해질(중량%) | 가교제(중량%) | 조사선량(kGy) |
실시예 1 | 90/10 | 2 | 150 |
실시예 2 | 95/5 | 2 | 150 |
비교예 1 | 없음 | 없음 | 0 |
비교예 2 | 90/10 | 없음 | 0 |
예 | 이온전도도(mS/㎝) |
실시예 1 | 1.06 |
실시예 2 | 1.29 |
비교예 1 | 0.96 |
비교예 2 | 0.94 |
Claims (13)
- 무기물 입자와 커플링제를 용매와 혼합한 후 중탕시켜 무기물 입자를 표면처리하는 단계(단계 1);상기 단계 1에서 제조된 무기물 입자를 용매에 녹인 고분자 전해질과 혼합한 후 가교제를 첨가하여 분산시키는 단계(단계 2);상기 단계 2에서 제조된 유/무기 슬러리에 다공성 분리막을 침지시킨 후 습도가 유지된 상태에서 건조시켜 유/무기 슬러리를 코팅시키는 단계(단계 3); 및상기 단계 3에서 제조된 다공성 유/무기 복합막에 방사선을 조사하는 단계(단계 4)를 포함하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 무기물 입자는 BaTiO3, SrTiO3, SnO2, CeO2, MgO, NiO, CaO, ZnO, ZrO2, Y2O3, Al2O3, TiO2 및 SiC로 이루어지는 군으로부터 선택되는 어느 하나 또는 이들의 혼합물인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제2항에 있어서, 상기 무기물 입자의 크기는 0.001 - 50 ㎛인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 1의 커플링제는 트리메톡시실린 프로필메타크릴레이트((3-trimethoxysilyl)propylmethacrylate), 트리메톡실릴에틸렌((trimethoxysilyl)ethylene), γ-메타크릴옥시프로필트리메톡시실란(γ-methacryloxypropyltrimethoxysilane) 및 트리메틸클로로실란(trimethylchlorosilane)로 이루어지는 군으로부터 선택되는 어느 하나인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 2의 고분자 전해질은 폴리비닐리덴플로라이드(polyvinylidenefluoride), 폴리비닐리덴플루오라이드 헥사플루오로프로필렌 공중합체 (polyvinylidenefluoride-co-hexafluoropropylene), 폴리비닐 클로라이드 (polyvinyl chloride), 폴리메틸메타크릴레이트(polymethylmethacrylate), 폴리아크릴로니트릴(polyacrylonitrile), 폴리에틸렌글리콜(polyethyleneglycol), 폴리에틸렌글리콜 아크릴레이트(polyethyleneglycol acrylate), 폴리에틸렌글리콜 디아크릴레이트(polyethylene glycol diacrylate), 폴리에틸렌글리콜 디메타아크릴레이트(polyethyleneglycol dimethacrylate) 및 폴리에틸렌글리콜 메틸에테르 메타크릴레이트(polyethyleneglycol methylether methacrylate)로 이루어지는 군으로부터 선택되는 어느 하나인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 2의 용매는 아세톤(acetone), 테트라하이드로퓨란(tetrahydrofuran), 메틸렌클로라이드(methylenechloride), 클로로포름(chloroform), 디메틸포름아미드(dimethylformamide), N-메틸-2-피롤리돈(N-methyl-2-pyrrolidone, NMP), 시클로헥산(cyclohexane) 및 물(H2O)로 이루어지는 군으로부터 선택되는 어느 하나 또는 이들의 혼합물인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 2의 무기물과 고분자 전해질의 혼합은 50~99:1~50 비로 혼합하고, 표면처리된 무기물과 고분자 용액이 10 - 40 중량%인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 2의 가교제는 폴리에틸렌글리콜 아크릴레이트 (polyethyleneglycol acrylate), 폴리에틸렌글리콜 디아크릴레이트(polyethylene glycol diacrylate), 폴리에틸렌글리콜 디메타아크릴레이트(polyethyleneglycol dimethacrylate), 테크라에틸렌글리콜 디아크릴레이트(tetra(ethyleneglycol) diacrylate), 트리알릴트리아진트리온(1,3,4-triallyl-1,3,5-tiriazine-2,4,6(1H,3H,5H)-trion), 폴리에틸렌글리콜 메틸에테르 메타크릴레이트(polyethylene glycol methyl ether methacrylate), 글리시딜 메타크릴레이트(Glycidyl methacrylate), 에틸 헥실 아세테이트(EHA(ethyl hexyl acrylate)), 비닐 필롤리돈(N-vinyl Pyrrolidone), 페녹시 에틸 아세테이트(phenoxy ethyl acrylate), 아크릴산(acrylic acid), 부틸 아세테이트(Butyl acrylate), 2-에틸 헥실 아세테이트(2-EHA), 2-하이드로에틸 메타크릴레이트(2-HEMA(hydroethyl methacrylate)), 2-하이드록시프로필 아세테이트(2-HPA(hydroxypropyl acrylate)), 2-하이드록시프로필 메타크릴레이트(2-HPMA(hydroxypropyl methacrylate)), 헥산디올 디아크릴레이트(hexanediol diacrylate), 1,4-부탄디올 디아크릴레이트(1,4-butanediol diacrylate), 트리프로필렌글리콜 디아크릴레이트(tripropyleneglycol diacrylate), 네오펜틸글리콜 디아크릴레이트(neopenthylglycol diacrylate), 폴리에틸렌글리콜 200(400) 디아클릴레이트(poly(ethyleneglycol 200(400)) diacrylate), 트리메틸롤프로판 트리아크릴레이트(trimethylolpropane triacrylate), 펜타에리트리톨 트리아크릴레이트(pentaerythritol triacrylate), 디펜타에리트리톨 헥사아크릴레이트(dipentaerythritol hexacrylate), 폴리에스터 아크릴레이트(Polyester acrylate), 폴리우레탄 아크릴레이트(polyurethane acrylate), 에폭시 아크릴레이트(epoxy acrylate) 및 폴레에테르 아크릴레이 트(polyether acrylate)로 이루어지는 군으로부터 선택되는 어느 하나 또는 이들의 혼합물인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 3의 다공성 분리막은 폴리에틸렌(polyethylene), 폴리프로필렌(polypropylene) 및 폴리에틸렌테레프탈레이트(polyethyleneterephthalate)로 이루어지는 군으로부터 선택되는 어느 하나 또는 이들의 혼합물인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 3의 건조는 상대습도를 15 - 60% 범위로 유지하여 수행되는 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항에 있어서, 상기 단계 4의 방사선 조사는 총조사선량이 10 - 200 kGy인 것을 특징으로 하는 방사선 조사를 이용한 유/무기 복합막의 제조방법.
- 제1항의 제조방법으로 제조되는 유/무기 복합막.
- 제12항에 있어서, 상기 유/무기 복합막은 내박리성, 내열성 및 이온전도도가 향상된 것을 특징으로 하는 유/무기 복합막.
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