KR100973644B1 - 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한액정표시장치 - Google Patents
착색 감광성 수지 조성물, 컬러필터 및 이를 구비한액정표시장치 Download PDFInfo
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- KR100973644B1 KR100973644B1 KR1020080018745A KR20080018745A KR100973644B1 KR 100973644 B1 KR100973644 B1 KR 100973644B1 KR 1020080018745 A KR1020080018745 A KR 1020080018745A KR 20080018745 A KR20080018745 A KR 20080018745A KR 100973644 B1 KR100973644 B1 KR 100973644B1
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/112—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/23—Photochromic filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- General Physics & Mathematics (AREA)
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- Materials For Photolithography (AREA)
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Abstract
Description
착색 재료(D) | C.I. 피그먼트 그린 36 | 5.51 부 |
C.I. 피그먼트 옐로우 150 | 2.43 부 | |
결합제 수지(A) | 수지 A(고형분 계산) | 6.59 부 |
광중합성 화합물(B) | 디펜타에리트리톨헥사아크릴레이트 (KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조) |
5.71 부 |
광중합 개시제(C) | 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 (Irgacure 369; Ciba Specialty Chemical 사 제조) |
1.46 부 |
4,4'-디(N,N'-디메틸아미노)-벤조페논 (EAB-F; 호도가야 카가꾸 ㈜ 제조) |
0.49 부 | |
용제(E) | 프로필렌글리콜모노메틸에테르아세테이트 | 76.00 부 |
첨가제(F) | 안료 분산제(폴리에스테르계) | 1.20 부 |
에폭시 수지(SUMI-EPOXY ESCN-195XL; 스미또모 카가꾸 고교 ㈜ 제조) | 0.51 부 | |
3-메타크릴옥시프로필트리메톡시실란 | 0.10 부 |
실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 | 비교예 2 | 비교예 3 | 비교예 4 | |
감도*1(mJ/cm2) | 40 | 40 | 40 | 60 | 60 | 80 | 50 |
기판상 현상 잔사*2 | ○ | ○ | ○ | ○ | ○ | X | X |
단면 형상*3 | ○ | ○ | ○ | ○ | ○ | ○ | ○ |
연필경도*4 | 5H | 5H | 5H | 4H | 4H | 3H | 5H |
아웃가스*5 | 40% | 41% | 25% | 100% | 110% | 60% | 60% |
현상성*6 | ○ | ○ | ○ | ○ | ○ | △ | △ |
Claims (6)
- 결합제 수지(A), 광중합성 화합물(B), 광중합 개시제(C), 착색 재료(D) 및 용제(E)를 포함하고,상기 결합제 수지(A)는 하기 (A1) 내지 (A3) 화합물을 공중합하여 얻어지는 공중합체에 (A4)를 더 반응시켜 얻어지는 불포화기 함유 수지이며,(A1): 주쇄에 고리(環)기를 형성시키는 불포화 결합을 갖는 화합물(A2): 비닐톨루엔(A3): 불포화 카르복실기를 갖는 화합물(A4): 1분자 중에 불포화 결합과 에폭시기를 갖는 화합물상기 (A1) 화합물이 주쇄에 테트라히드로피란계 고리를 형성시키는 화합물 및 화학식 2 로 표현되는 화합물 중에서 적어도 하나 이상 선택되는 것을 특징으로 하는 착색 감광성 수지 조성물:<화학식 2>(화학식 2 에서, R3는 벤질기이다.)
- 제1항에 있어서, 상기 불포화 카르복실기를 갖는 화합물(A3)은 아크릴산인 것을 특징으로 하는 착색 감광성 수지 조성물.
- 제1항에 있어서, 상기 (A1)~(A3) 각각으로부터 유도되는 구성 성분의 비율이 상기 결합제 수지 구성 성분의 합계 몰수에 대하여,(A1)으로부터 유도되는 구성 단위 : 2 내지 50몰%,(A2)로부터 유도되는 구성 단위 : 2 내지 60몰%,(A3)로부터 유도되는 구성 단위 : 2 내지 70몰%,범위이고, (A3)로부터 유도되는 구성 성분에 대하여 (A4)를 5 내지 80몰% 반응시키는 것을 특징으로 하는 착색 감광성 수지 조성물.
- 기판 상부에 착색 감광성 수지 조성물을 도포하고, 소정의 패턴으로 노광, 현상하여 형성되는 컬러층을 포함하여 이루어진 컬러필터에 있어서,상기 착색 감광성 수지 조성물은 제1항 내지 제4항 중 어느 한 항의 착색 감광성 수지 조성물인 것을 특징으로 하는 컬러필터.
- 제5항에 기재된 컬러필터를 구비한 액정표시장치.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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TW097127227A TWI427414B (zh) | 2007-07-18 | 2008-07-17 | 染色感光性樹脂組成物、彩色濾光片及其所構成之液晶顯示裝置 |
JP2008187690A JP5250888B2 (ja) | 2007-07-18 | 2008-07-18 | 着色感光性樹脂組成物及びその着色感光性樹脂組成物を用いて得られるカラーフィルタ並びにそのカラーフィルタを備える液晶表示装置 |
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KR20070071936 | 2007-07-18 | ||
KR1020070071936 | 2007-07-18 |
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KR20090009084A KR20090009084A (ko) | 2009-01-22 |
KR100973644B1 true KR100973644B1 (ko) | 2010-08-02 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US9030620B2 (en) | 2013-06-14 | 2015-05-12 | Samsung Display Co., Ltd. | Display panel and method of manufacturing the same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20040030848A (ko) * | 2001-07-26 | 2004-04-09 | 시바 스페셜티 케미칼스 홀딩 인크. | 감광성 수지 조성물 |
KR20060092092A (ko) * | 2005-02-17 | 2006-08-22 | 스미또모 가가꾸 가부시끼가이샤 | 감광성 수지 조성물 |
KR20070014991A (ko) * | 2005-07-29 | 2007-02-01 | 스미또모 가가꾸 가부시끼가이샤 | 포토 스페이서용 감광성 수지 조성물 |
KR20070056962A (ko) * | 2005-11-29 | 2007-06-04 | 스미또모 가가꾸 가부시키가이샤 | 착색 감광성 수지 조성물 |
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JP2003035815A (ja) * | 2001-07-25 | 2003-02-07 | Mitsubishi Chemicals Corp | カラーフィルター用組成物及びカラーフィルター |
CN1918250A (zh) * | 2004-11-11 | 2007-02-21 | 三菱化学株式会社 | 色料分散液、着色树脂组合物、滤色片以及液晶显示装置 |
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- 2008-02-29 KR KR1020080018745A patent/KR100973644B1/ko active Active
- 2008-07-17 TW TW097127227A patent/TWI427414B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20040030848A (ko) * | 2001-07-26 | 2004-04-09 | 시바 스페셜티 케미칼스 홀딩 인크. | 감광성 수지 조성물 |
KR20060092092A (ko) * | 2005-02-17 | 2006-08-22 | 스미또모 가가꾸 가부시끼가이샤 | 감광성 수지 조성물 |
KR20070014991A (ko) * | 2005-07-29 | 2007-02-01 | 스미또모 가가꾸 가부시끼가이샤 | 포토 스페이서용 감광성 수지 조성물 |
KR20070056962A (ko) * | 2005-11-29 | 2007-06-04 | 스미또모 가가꾸 가부시키가이샤 | 착색 감광성 수지 조성물 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9030620B2 (en) | 2013-06-14 | 2015-05-12 | Samsung Display Co., Ltd. | Display panel and method of manufacturing the same |
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KR20090009084A (ko) | 2009-01-22 |
TWI427414B (zh) | 2014-02-21 |
TW200916958A (en) | 2009-04-16 |
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