KR100852131B1 - Stamping foil - Google Patents
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- KR100852131B1 KR100852131B1 KR1020060064221A KR20060064221A KR100852131B1 KR 100852131 B1 KR100852131 B1 KR 100852131B1 KR 1020060064221 A KR1020060064221 A KR 1020060064221A KR 20060064221 A KR20060064221 A KR 20060064221A KR 100852131 B1 KR100852131 B1 KR 100852131B1
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- stamping foil
- acrylic resin
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- release force
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- 239000011888 foil Substances 0.000 title claims abstract description 41
- 230000008021 deposition Effects 0.000 claims abstract description 16
- 238000010030 laminating Methods 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims description 85
- 239000004925 Acrylic resin Substances 0.000 claims description 44
- 229920000178 Acrylic resin Polymers 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 23
- 239000001913 cellulose Substances 0.000 claims description 13
- 229920002678 cellulose Polymers 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 10
- 229920013716 polyethylene resin Polymers 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 3
- 238000004040 coloring Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 12
- -1 polypropylene Polymers 0.000 description 13
- 238000011109 contamination Methods 0.000 description 10
- 239000004698 Polyethylene Substances 0.000 description 9
- 229920000573 polyethylene Polymers 0.000 description 9
- 239000012790 adhesive layer Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- 229920001228 polyisocyanate Polymers 0.000 description 4
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- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000011254 layer-forming composition Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- BMTAFVWTTFSTOG-UHFFFAOYSA-N Butylate Chemical compound CCSC(=O)N(CC(C)C)CC(C)C BMTAFVWTTFSTOG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 206010038743 Restlessness Diseases 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229940079938 nitrocellulose Drugs 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/005—Colour cards; Painting supports; Latent or hidden images, e.g. for games; Time delayed images
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/502—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording characterised by structural details, e.g. multilayer materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D101/00—Coating compositions based on cellulose, modified cellulose, or cellulose derivatives
- C09D101/08—Cellulose derivatives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
Abstract
본 발명은 스탬핑 호일에 관한 것으로, 기재필름상에 이형층, 착색층, 홀로그램 인각층 및 증착층을 포함하여 적층된 스탬핑 호일에 있어서, 다음의 수학식 1 및 2를 만족하는 것을 특징으로 하는 스탬핑 호일을 제공함으로써, 이형력을 적절하게 조절하여 인쇄가 양호하고, 쉼(shim)이 오염되지 않아 홀로그램 효과를 극대화할 수 있다.The present invention relates to a stamping foil, stamping foil laminated on the base film including a release layer, a colored layer, a holographic stamp layer and a deposition layer, stamping characterized in that the following equations (1) and (2) By providing the foil, the release force can be properly adjusted to print well, and the shim is not contaminated, thereby maximizing the hologram effect.
<수학식 1><Equation 1>
5gf/25㎜ ≤ A-B ≤ 18gf/25㎜5 g f / 25 mm ≤ AB ≤ 18 g f / 25 mm
상기 식에서, A는 기재필름상에 이형층 및 착색층을 적층한 후 측정한 이형력이고, B는 최종 스탬핑 호일의 이형력이다.In the above formula, A is the release force measured after laminating the release layer and the colored layer on the base film, and B is the release force of the final stamping foil.
<수학식 2><Equation 2>
1.5gf/25㎜ ≤ B ≤ 5gf/25㎜1.5 g f / 25 mm ≤ B ≤ 5 g f / 25 mm
상기 식에서, B는 최종 스탬핑 호일의 이형력이다.Where B is the release force of the final stamping foil.
스탬핑 호일, 이형력, 홀로그램, 인쇄성 Stamping foil, release force, hologram, printability
Description
본 발명은 스탬핑 호일에 관한 것이다.The present invention relates to stamping foils.
스탬핑 호일은 건식인쇄방식으로 피착체에 대한 열과 압력을 주어 글씨 또는 무늬를 전사하는 인쇄 매체의 일종이며, 기재필름에 이형층, 착색층, 홀로그램 인각층 및 증착층을 순차적으로 적층하여 이루어지는 것이 일반적이다. Stamping foil is a type of printing medium that transfers letters or patterns by giving heat and pressure to the adherend by dry printing method, and it is generally made by sequentially laminating a release layer, a colored layer, a holographic engraving layer, and a deposition layer on a base film. to be.
최근 보안 및 디자인의 명시성을 위하여 홀로그래픽 스탬핑 호일이 각종 인쇄에 다양하게 적용되고 있으며, 그 패턴 또한 무지개 모양, 깨진 유리창 모양 등 매우 다양하다. Recently, holographic stamping foils have been applied to various types of prints for the sake of security and design clarity. The patterns are also diverse, such as rainbow shapes and broken glass windows.
이를 위하여 착색층이나 증착층에 인각하면 홀로그램 무늬를 육안으로 관찰할 수 있게 된다. 따라서 착색층에 인각을 실시한 후 증착을 진행하거나 성막(成幕)을 한 후에 인각을 실시하게 된다. To this end, the holographic pattern can be visually observed by engraving the colored layer or the deposition layer. Therefore, after the engraving is performed on the colored layer, the deposition is performed or the film is formed after the deposition.
이러한 홀로그램 효과를 피착체에 균일하게 나타내기 위하여 현재 쉼(shim)을 이용한 인각공정이 적용되며, 인각공정이 고온에서 롤투롤 방식에 의하여 기재필름에 적층된 이형층 및 착색층의 조성물이 쉼(shim)의 디자인을 그대로 전사하여 홀로그램 효과를 나타내는데, 이 때 적절한 착색층 조성물 및 이형층 조성물이 적용되지 않으면 인각공정 중 고가의 쉼(shim)을 오염시켜 사용주기를 단축시키거나 인각 후 홀로그램 효과가 선명하게 나타나지 않는 등의 문제를 유발시키게 된다. 따라서 고온 인각시에도 쉼(shim) 오염없이 선명한 홀로그램 효과를 내는 이형층 조성물 및 착색층 조성물의 개발이 필요하나, 이러한 개발은 미흡한 실정이다.In order to display the hologram effect uniformly on the adherend, a stamping process using shims is currently applied, and the composition of the release layer and the colored layer laminated on the base film by the roll-to-roll method at a high temperature is a shim ( The design of the shim is transferred as it is, showing the hologram effect. If the proper colored layer composition and the release layer composition are not applied, the expensive shim may be contaminated during the engraving process to shorten the use cycle or the hologram effect after the engraving. It may cause problems such as not appearing clearly. Therefore, it is necessary to develop a release layer composition and a colored layer composition that produce a clear hologram effect without shim contamination even at high temperature engraving, but such development is insufficient.
대한민국 공개특허 제1999-56340호, 대한민국 공개특허 제1999-61725호 및 대한민국 공개특허 제1999-30661호에는 개선된 스탬핑 호일용 이형층 조성물 또는 착색층 조성물에 대하여 기재하고 있으나, 주요 개선특성을 이형력을 낮게 하면서 절단성, 내스크래치성, 내용제성, 내마모성 등을 보완하는데 두고 있어, 이러한 이형층 및 착색층의 조성물을 홀로그램용 스탬핑 호일에 적용하는데 많은 한계를 지니고 있어, 고온 인각 공정시 쉼(shim)을 오염시키고 홀로그램 인각효과가 적절히 구현되지 않는 등의 단점을 갖고 있다.Korean Patent Laid-Open Publication No. 1999-56340, Korean Patent Laid-Open Publication No. 1999-61725 and Korean Laid-Open Patent Publication No. 1999-30661 describe an improved release layer composition or colored layer composition for stamping foil, but the main improvement characteristics are released. In order to supplement cutting property, scratch resistance, solvent resistance, and abrasion resistance while lowering the force, it has many limitations in applying the composition of the release layer and the colored layer to the stamping foil for the hologram, so There are disadvantages such as contamination of shim) and incomplete hologram engraving effect.
이에 본 발명자들은 상기와 같은 문제점들을 개선하기 위하여 연구한 결과, 이형층 및 착색층을 형성한 상태에서의 이형력과 홀로그램 인각 공정을 거친 후 최종 제품에서의 이형력을 적절하게 조절하여 쉼(shim)의 오염문제를 해결할 수 있어 홀로그램 효과를 극대화할 수 있으며, 홀로그램 인각 공정을 거친 최종 스탬핑 호일의 인쇄성이 양호한 스탬핑 호일을 제조할 수 있음을 확인하고 본 발명을 완성하게 되었다.Accordingly, the present inventors have studied to improve the above problems, and after the release force and hologram engraving process in the state of forming the release layer and the colored layer, the release force in the final product is properly adjusted to shim. It is possible to maximize the hologram effect to solve the contamination problem of the), it was confirmed that the stamping foil with good printability of the final stamping foil after the holographic stamping process can be prepared and completed the present invention.
따라서 본 발명은 고온 인각공정시 이형력을 조절할 수 있어 인각용 쉼(shim)의 오염을 최소화하여 홀로그램 효과를 극대화할 수 있는 스탬핑 호일을 제공하는데 그 목적이 있다.Therefore, an object of the present invention is to provide a stamping foil that can control the release force during the high-temperature stamping process to minimize the contamination of the shim for stamping to maximize the hologram effect.
또한 본 발명은 홀로그램이 인각된 최종 제품에서의 인쇄성이 양호한 스탬핑 호일을 제공하는데 그 목적이 있다.It is also an object of the present invention to provide a stamping foil having good printability in a final product in which the hologram is inscribed.
상기의 목적을 달성하기 위한 본 발명은 기재필름상에 이형층, 착색층, 홀로그램 인각층 및 증착층을 포함하여 적층된 스탬핑 호일에 있어서, 다음의 수학식 1 및 2를 만족하는 것을 특징으로 하는 스탬핑 호일을 제공한다. The present invention for achieving the above object in the stamping foil laminated on a base film including a release layer, a colored layer, a holographic stamp layer and a deposition layer, characterized in that the following formula 1 and 2 Provide stamping foil.
<수학식 1><Equation 1>
5gf/25㎜ ≤ A-B ≤ 18gf/25㎜5 g f / 25 mm ≤ AB ≤ 18 g f / 25 mm
상기 식에서, A는 기재필름상에 이형층 및 착색층을 적층한 후 측정한 이형력이고, B는 최종 스탬핑 호일의 이형력이다.In the above formula, A is the release force measured after laminating the release layer and the colored layer on the base film, and B is the release force of the final stamping foil.
<수학식 2><Equation 2>
1.5gf/25㎜ ≤ B ≤ 5gf/25㎜1.5 g f / 25 mm ≤ B ≤ 5 g f / 25 mm
상기 식에서, B는 최종 스탬핑 호일의 이형력이다.Where B is the release force of the final stamping foil.
상기 기재필름은 단층 또는 다층구조이면서 두께가 12~20㎛인 것을 특징으로 한다.The base film is characterized in that the thickness of 12 ~ 20㎛ single layer or multilayer structure.
상기 이형층은 아크릴 수지, 폴리에틸렌 수지 및 셀룰로오스 유도체를 주성분으로 하며, 상기 아크릴 수지는 이형층을 구성하는 조성물 중 총 고형분 중량에 대하여 50~80중량% 포함하는 것임을 특징으로 한다.The release layer is an acrylic resin, a polyethylene resin and a cellulose derivative as a main component, and the acrylic resin is characterized in that it comprises 50 to 80% by weight relative to the total solid weight of the composition constituting the release layer.
상기 착색층은 아크릴 수지 및 셀룰로오스 유도체를 포함하며, 상기 아크릴 수지는 착색층을 구성하는 조성물 중 총 고형분 중량에 대하여 10~50중량% 포함하는 것임을 특징으로 한다.The colored layer comprises an acrylic resin and a cellulose derivative, wherein the acrylic resin is characterized in that it comprises 10 to 50% by weight based on the total solid weight in the composition constituting the colored layer.
상기 증착층은 두께가 100~400Å인 것임을 특징으로 한다.The deposition layer is characterized in that the thickness is 100 ~ 400Å.
이하, 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명은 기재필름상에 이형층, 착색층, 홀로그램 인각층 및 증착층을 포함하여 적층된 스탬핑 호일에 있어서, 다음의 수학식 1 및 2를 만족하는 것을 특징으로 하는 스탬핑 호일을 제공한다. The present invention provides a stamping foil characterized by satisfying the following equations (1) and (2) in a stamping foil laminated on a base film including a release layer, a colored layer, a holographic engraving layer, and a deposition layer.
<수학식 1><Equation 1>
5gf/25㎜ ≤ A-B ≤ 18gf/25㎜5 g f / 25 mm ≤ AB ≤ 18 g f / 25 mm
상기 식에서, A는 기재필름상에 이형층 및 착색층을 적층한 후 측정한 이형력이고, B는 최종 스탬핑 호일의 이형력이다.In the above formula, A is the release force measured after laminating the release layer and the colored layer on the base film, and B is the release force of the final stamping foil.
<수학식 2><Equation 2>
1.5gf/25㎜ ≤ B ≤ 5gf/25㎜1.5 g f / 25 mm ≤ B ≤ 5 g f / 25 mm
상기 식에서, B는 최종 스탬핑 호일의 이형력이다.Where B is the release force of the final stamping foil.
(A-B)값이 5gf/25㎜ 미만이면 쉼(shim)을 이용한 인각공정시 쉼(shim)이 오염되는 단점이 있으며, (A-B)값이 18gf/25㎜ 초과이면 착색층 및 이형층 코팅성 불량으로 스탬핑 호일 제품으로 적용하기 어려운 단점이 있다.If (AB) value is less than 5g f / 25㎜, the shim is contaminated during the engraving process using shim, and (AB) value is more than 18g f / 25㎜ coating of colored layer and release layer There is a disadvantage in that it is difficult to apply a stamping foil product due to poor properties.
그리고 B값이 1.5gf/25㎜ 미만이면 이형력이 너무 작아 고속 스탬핑시 절단성이 불리해지는 단점이 있으며, B값이 5gf/25㎜ 초과이면 고속 스탬핑시 절단성은 양호하나 전사성이 불리한 단점을 지니게 된다.And if the value of B is less than 1.5g f / 25㎜, the release force is too small, there is a disadvantage that the cutting ability at high-speed stamping disadvantage, and if the value of B is more than 5g f / 25㎜ the cutting property is good at high-speed stamping but the transferability is disadvantageous It has its drawbacks.
상기 기재필름으로는 폴리에스테르 필름 또는 폴리프로필렌 필름을 사용할 수 있으며, 단층 및 다층구조를 포함하고, 두께가 12~20㎛인 것이 바람직하다.A polyester film or a polypropylene film can be used as the base film, and a single layer and a multilayer structure are included, and the thickness is preferably 12 to 20 μm.
상기 이형층은 아크릴 수지, 폴리에틸렌 수지 및 셀룰로오스 유도체를 주성분으로 하며, 상기 아크릴 수지는 이형층을 구성하는 조성물 중 총 고형분 중량에 대하여 50~80중량% 포함하는 것이 바람직한데, 아크릴 수지의 함량이 이형층 형성용 조성물 중 총 고형분 중량에 대하여 50중량% 미만인 경우 고온 인각시 쉼(shim)이 오염되는 문제가 있다. The release layer is mainly composed of acrylic resin, polyethylene resin and cellulose derivative, and the acrylic resin preferably contains 50 to 80% by weight based on the total weight of solids in the composition constituting the release layer. If less than 50% by weight relative to the total solids weight of the layer-forming composition there is a problem that the shim (shim) at the time of high temperature engraving is contaminated.
상기 아크릴 수지는 투명하고 광택 저하가 적다는 특성을 갖고 있으며, 내마모성 및 내알콜성 등이 양호하다. 폴리메틸메타아크릴레이트, 아크릴폴리올 및 아크릴폴리올폴리에스테를공중합체 중 선택된 1종 이상을 사용할 수 있으며, 폴리메틸메타아크릴레이트가 특히 바람직하다. The acrylic resin has a characteristic of being transparent and having low glossiness, and having good wear resistance, alcohol resistance, and the like. Polymethyl methacrylate, acryl polyol and acryl polyol polyester may be used at least one selected from copolymers, with polymethyl methacrylate being particularly preferred.
폴리에틸렌 수지는 아크릴 수지에 첨가됨으로써 슬립성을 증가시켜 내스크래치성을 개선하는 역할을 한다. 폴리에틸렌 수지의 함량은 이형층 형성용 조성물 중 총 고형분 중량에 대하여 10~20중량%가 바람직하다.Polyethylene resin is added to the acrylic resin to increase the slip resistance serves to improve the scratch resistance. The content of the polyethylene resin is preferably 10 to 20% by weight based on the total solids weight in the composition for forming a release layer.
또한 셀룰로오스 유도체는 이형력을 낮추는 역할을 하며, 셀룰로오스 아세테이트, 셀룰로오스 아세테이트 부틸레이트, 셀룰로오스 아세테이트 프로필레이트 및 나이트로 셀룰로오스 중 선택된 1종 이상을 사용할 수 있다. 셀룰로오스 유도체의 함량은 10~30중량%가 바람직하다.In addition, the cellulose derivative serves to lower the release force, and at least one selected from cellulose acetate, cellulose acetate butylate, cellulose acetate propylate, and nitro cellulose may be used. The content of the cellulose derivative is preferably 10 to 30% by weight.
이형층의 두께는 0.1~0.3㎛인 것이 바람직하다. 0.1㎛미만인 경우 스탬핑 호일을 보호하는 기능이 미약하고, 0.3㎛를 초과하면 스탬핑 호일의 보호기능이 일정 수준 이상 증가되는 것은 아니므로 비경제적이다. 상기 이형층은 이형층 형성용 조성물을 도포한 후 120~150℃에서 3초~15초동안의 건조과정을 통하여 형성된다.It is preferable that the thickness of a mold release layer is 0.1-0.3 micrometers. If the thickness is less than 0.1㎛, the function of protecting the stamping foil is weak, and if it exceeds 0.3㎛, the protection function of the stamping foil does not increase more than a certain level, which is uneconomical. The release layer is formed through a drying process for 3 seconds to 15 seconds at 120 ~ 150 ℃ after applying the composition for forming a release layer.
상기 착색층은 아크릴 수지 및 셀룰로오스 유도체를 포함하는데, 필요에 따라 폴리이소시아네이트를 포함할 수 있다. 폴리이소시아네이트는 절단성을 개선 및쉼(Shim)오염 방지기능을 수행하며 그 함량은 10~40중량%가 바람직하다. 그 함량이 10중량%이하이면 그 효과가가 미미하며 40중량%이상이면 착색층 물성저하의 원인이 된다.The colored layer includes an acrylic resin and a cellulose derivative, and may include polyisocyanate as necessary. Polyisocyanate improves cleavability and prevents shim contamination, and its content is preferably 10 to 40% by weight. If the content is less than 10% by weight, the effect is insignificant, if more than 40% by weight is the cause of the physical properties of the colored layer.
상기 아크릴 수지는 착색층을 구성하는 조성물 중 총 고형분 중량에 대하여 10~50중량% 포함하는 것이 바람직한데, 아크릴 수지의 함량이 착색층을 구성하는 조성물 중 총 고형분 중량에 대하여 50중량% 초과인 경우 고온 인각시 쉼(shim)이 오염되는 문제가 있다. The acrylic resin is preferably contained 10 to 50% by weight relative to the total solids weight of the composition constituting the colored layer, when the content of the acrylic resin is more than 50% by weight relative to the total solids weight of the composition constituting the colored layer. There is a problem that shim is contaminated during high temperature engraving.
사용 가능한 아크릴 수지 및 셀룰로오스 유도체는 상기 이형층에서 설명한 바와 같다. 착색층에서 셀룰로오스 유도체의 함량은 착색층 형성용 조성물 중 총 고형분 함량에 대하여 20~80중량%가 바람직하다.Acrylic resin and cellulose derivative which can be used are as having demonstrated in the said release layer. The content of the cellulose derivative in the colored layer is preferably 20 to 80% by weight based on the total solids content in the colored layer forming composition.
착색층의 두께는 0.6~2.0㎛인 것이 바람직하다. 0.6㎛ 미만인 경우 인각특성에 문제가 있고, 2.0㎛를 초과하면 절단성 불량의 문제가 있다. 상기 착색층은 착색층 형성용 조성물을 도포한 후 120~150℃에서 3초~15초동안의 건조과정을 통하여 형성된다.It is preferable that the thickness of a colored layer is 0.6-2.0 micrometers. If the thickness is less than 0.6 mu m, there is a problem in the peeling characteristic, and if the thickness is more than 2.0 mu m, there is a problem of poor cutting property. The colored layer is formed through a drying process for 3 seconds to 15 seconds at 120 ~ 150 ℃ after applying the composition for forming a colored layer.
이후 인각공정을 실시하고 증착층을 형성하거나, 증착층을 형성한 후 인각공정을 실시할 수 있다.Thereafter, the engraving process may be performed and a deposition layer may be formed, or after the deposition layer is formed, the engraving process may be performed.
상기 인각공정은 140~190℃에서 수행하는 것이 바람직하다. 140℃ 미만에서 인각공정을 수행하는 경우 홀로그램 효과가 선명하게 나타나지 않고, 190℃를 초과하는 온도에서 인각공정을 수행하는 경우 기재필름의 변형을 야기시키는 문제가 있다.The engraving process is preferably carried out at 140 ~ 190 ℃. When the engraving process is performed below 140 ° C., the hologram effect does not appear clearly, and when the engraving process is performed at a temperature exceeding 190 ° C., there is a problem of causing deformation of the base film.
상기 증착층에 사용하는 금속으로는 알루미늄, 크롬 및 금 중 선택된 1종 이상을 사용하는 것이 바람직하다. 증착층의 두께는 100~400Å인 것이 바람직한데, 증착층의 두께가 100Å 미만인 경우 광택성 측면에서 불리하고, 증착층의 두께가 400Å을 초과하는 경우 최종 스탬핑 호일의 절단성면에서 불리하다.As the metal used for the deposition layer, it is preferable to use at least one selected from aluminum, chromium and gold. The thickness of the deposited layer is preferably 100 ~ 400 100, the disadvantage of gloss when the thickness of the deposited layer is less than 100Å, and disadvantageous in terms of cutting properties of the final stamping foil when the thickness of the deposited layer exceeds 400Å.
본 발명의 스탬핑 호일은 상기 증착층 상에 기재와의 접착기능을 하는 접착층을 더 형성할 수 있으며, 접착층 형성용 조성물은 아크릴 수지, 글로리네이티드폴리올레핀, 폴리비닐클로라이드, 폴리비닐 아세테이트, 폴리비닐부티랄 및 폴리비닐아세테이트폴리비닐클로라이드공중합체 중 선택된 수지와 실리카 입자를 포함하며, 두께는 0.8~2.5㎛인 것이 바람직하다.The stamping foil of the present invention may further form an adhesive layer having an adhesive function with the substrate on the deposition layer, the composition for forming the adhesive layer is an acrylic resin, glominated polyolefin, polyvinyl chloride, polyvinyl acetate, polyvinyl buty Ral and polyvinylacetate polyvinyl chloride copolymer comprising a resin selected from the silica particles and the silica, the thickness is preferably 0.8 ~ 2.5㎛.
이하, 본 발명의 실시예로 더욱 상세히 설명하나, 본 발명의 범위가 이들 실시예로 한정되는 것은 아니다.Hereinafter, examples of the present invention will be described in more detail, but the scope of the present invention is not limited to these examples.
본 발명에서 사용된 필름의 평가방법은 하기와 같다.Evaluation method of the film used in the present invention is as follows.
(1) 이형력(1) release force
시료로 사용할 필름에 니또 31B 테이프를 25℃, 50%RH 조건에서 5㎏ 고무 롤러를 이용하여 합지한 후 시료를 2.54㎝ × 18㎝의 크기로 자른 후, 24시간동안 25℃, 50%RH 조건에서 보관하였다. 24시간 후 만능시험기(INSTRON)을 이용하여 니또 테이프쪽을 위측 로드셀에 물리고 폴리에스테르 필름쪽을 아래측 로드셀에 물리도록 조절한 후 300㎜/min의 속도로 T타입 박리 테스트를 실시하였다. 박리시 로드셀에 물리지 않은 꼬리부분은 테스트가 종료될 때 까지 수평을 유지하도록 하였다.The Nitto 31B tape was laminated on a film to be used as a sample using a 5 kg rubber roller at 25 ° C. and 50% RH, and then the sample was cut into a size of 2.54 cm × 18 cm, followed by 25 ° C. and 50% RH for 24 hours. Stored at. After 24 hours, the Nitto tape was clamped on the upper load cell and the polyester film was clamped on the lower load cell using an universal testing machine (INSTRON), and then a T-type peeling test was performed at a speed of 300 mm / min. When peeled off, the tail that was not bitten by the load cell was kept horizontal until the test was completed.
(2) 인각용 쉼(shim)의 오염도 평가(2) Evaluation of contamination level of stamp shim
최소 10,000M를 롤투롤 방법으로 인각한 후 쉼(shim)을 분리하여 쉼(shim)의 오염된 정도를 육안 평가하였으며, 육안 평가 결과 오염되어있지 않다면 합격, 오염되어있다면 불합격으로 평가하였다.After removing at least 10,000M by the roll-to-roll method, the shim was separated to visually evaluate the degree of contamination of the shim. If the result of the visual evaluation was not contaminated, the result was evaluated as pass.
(3) 인쇄성 평가(3) printability evaluation
업-다운스탬핑기를 이용하여 100~120℃온도에서 스탬핑해 전이되는 정도를 기준으로 인쇄성을 평가한다. 글짜 폭 1mm가 플레이크 없이 깨끗이 전이되면 합격, 플레이크가 발생하면 불합격으로 평가하였다.Printability is evaluated based on the degree of transfer by stamping at a temperature of 100-120 ° C. using an up-down stamping machine. When the width of 1 mm was clearly transferred without flakes, the result was evaluated as passing.
<실시예 1~5 및 비교예 1 및 2><Examples 1-5 and Comparative Examples 1 and 2>
하기 표 1에 나타낸 조성으로 스탬핑 호일을 제조하였으며, 제조한 방법은 다음과 같다.A stamping foil was prepared with the composition shown in Table 1 below, and the prepared method was as follows.
16㎛ 두께의 기재필름상에 이형층 형성용 조성물을 건조 후의 두께가 0.2㎛ 되도록 도포하고 120℃에서 10초간 열풍건조하여 이형층을 형성하였다. 이형층 상에 착색층 형성용 조성물을 건조 후의 두께가 0.2㎛ 되도록 도포하고 120℃에서 10초간 열풍건조하여 착색층을 형성하였다. 이후 인각공정을 170℃에서 실시하고, 알루미늄 증착층을 진공장착법을 이용하여 형성하였다. 그리고 접착층 형성용 조성물을 두께가 1.5㎛ 되도록 도포하고 120℃에서 10초간 열풍건조하여 접착층을 형성하였다.The composition for forming a release layer was applied on a base film having a thickness of 16 μm so as to have a thickness of 0.2 μm after drying, followed by hot air drying at 120 ° C. for 10 seconds to form a release layer. On the mold release layer, the composition for colored layer formation was apply | coated so that the thickness after drying might be 0.2 micrometer, and hot air dried at 120 degreeC for 10 second, and the colored layer was formed. After the engraving process was carried out at 170 ℃, the aluminum deposition layer was formed using a vacuum mounting method. Then, the composition for forming an adhesive layer was applied to a thickness of 1.5 μm and dried by hot air at 120 ° C. for 10 seconds to form an adhesive layer.
이와 같이 제조된 스탬핑 호일에 대하여 상기와 같이 이형력, 쉼(shim) 오염도 및 인쇄성을 평가하여 그 결과를 하기 표 2에 나타내었다. The stamping foil thus prepared was evaluated for release force, shim contamination, and printability as described above, and the results are shown in Table 2 below.
상기 평가 결과, 기재필름상에 이형층 및 착색층까지 적층한 후의 이형력과 모든 공정을 거친 후의 이형력과의 차이가 5gf/25㎜ 이상 18gf/25㎜ 이하인 본 발명의 실시예들은 쉼(shim)이 오염되지 않았고, 인쇄성이 우수함을 볼 수 있다.The evaluation results, the embodiment of the difference between the releasing layer and the colored layer after the lamination to the release force and the release force after passing the whole process on the base material film present 5g f / f 25㎜ more than 18g / 25㎜ less invention are restless It is seen that the shim is not contaminated and the printability is excellent.
따라서 이형력이 적절하여 인쇄가 잘 되고, 쉼(shim)이 오염되지 않아 홀로그램 효과가 극대화될 수 있음을 알 수 있다.Therefore, the release force is appropriate to print well, the shim (shim) can be seen that the hologram effect can be maximized.
이상에서 설명한 바와 같이 본 발명은 이형층 및 착색층을 형성한 상태에서의 이형력과 홀로그램 인각 공정을 거친 후 최종 제품에서의 이형력을 적절하게 조절하여 쉼(shim)의 오염문제를 해결할 수 있어 홀로그램 효과를 극대화할 수 있는 스탬핑 호일을 제공할 수 있다.As described above, the present invention can solve the problem of contamination of shim by appropriately adjusting the release force in the final product after the release force and hologram engraving process in the state of forming the release layer and the colored layer. It is possible to provide a stamping foil to maximize the hologram effect.
또한 본 발명은 홀로그램 인각 공정을 거친 최종 스탬핑 호일의 인쇄성이 양호한 스탬핑 호일을 제공할 수 있다.The present invention can also provide a stamping foil having good printability of the final stamping foil which has undergone the hologram engraving process.
Claims (5)
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KR20040018147A (en) * | 2002-08-22 | 2004-03-02 | 린텍 가부시키가이샤 | Surface protecting film for polycarbonate |
KR20070073002A (en) * | 2006-01-03 | 2007-07-10 | 엘에스전선 주식회사 | Anisotropic conductive film with release film of different peel strength |
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KR20040018147A (en) * | 2002-08-22 | 2004-03-02 | 린텍 가부시키가이샤 | Surface protecting film for polycarbonate |
KR20070073002A (en) * | 2006-01-03 | 2007-07-10 | 엘에스전선 주식회사 | Anisotropic conductive film with release film of different peel strength |
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