KR100828665B1 - 유체 분사노즐 - Google Patents
유체 분사노즐 Download PDFInfo
- Publication number
- KR100828665B1 KR100828665B1 KR1020060136306A KR20060136306A KR100828665B1 KR 100828665 B1 KR100828665 B1 KR 100828665B1 KR 1020060136306 A KR1020060136306 A KR 1020060136306A KR 20060136306 A KR20060136306 A KR 20060136306A KR 100828665 B1 KR100828665 B1 KR 100828665B1
- Authority
- KR
- South Korea
- Prior art keywords
- fluid
- flow path
- substrate
- plate
- chemical liquid
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
- B05C5/0212—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
- B05C5/0216—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles by relative movement of article and outlet according to a predetermined path
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nozzles (AREA)
Abstract
Description
Claims (6)
- 한 쌍의 플레이트로 이루어지고, 기판을 향해 유체가 토출되는 토출구를 가진 노즐 몸체와, 상기 노즐 몸체 내부에 형성되어 상기 토출구로 유체를 안내하는 유로를 포함하여 이루어지되,상기 토출구는 상기 유로의 단면적 보다 확장된 토출면적을 가지도록 형성되어 유로를 통해 유동되는 유속을 저감시켜 토출되도록 하는 유체 분사노즐.
- 제1 항에 있어서,상기 노즐 몸체는기판에 근접하게 배치된 제1 플레이트와,상기 제1 플레이트의 상측에 배치되어 상기 제1 플레이트와 결합되는 제2 플레이트를 포함하여 이루어지며, 상기 제1 플레이트의 단부가 제2 플레이트의 단부 보다 기판을 향해 더 돌출 형성된 유체 분사노즐.
- 제2 항에 있어서,상기 제1 플레이트의 토출구 측 단부에 곡면이 형성된 유체 분사 노즐.
- 제1 항에 있어서, 상기 유로는 유체의 흐름을 차단하는 경우, 유체와 유로내면 사이의 부착력에 의하여 유체를 정지시킬 수 있는 정도의 폭을 가지도록 형성된 유체 분사노즐.
- 제1 항 내지 제4 항 중 어느 한 항에 있어서,상기 유로 상에는 일정 용적을 가지도록 형성되어 상기 유로를 흐르는 유체가 일시적으로 저장된 후 다시 흐를 수 있도록 하는 챔버를 더 포함하는 유체 분사노즐.
- 제3 항에 있어서, 상기 토출구를 통하여 분사된 유체가 곡면을 따라 토출되어 상기 기판상에 선접촉하고, 상기 제1 플레이트의 저면이 상기 기판상의 유체에 접촉함으로써 유체가 기판상에 균일하게 도포되는 유체분사노즐.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060136306A KR100828665B1 (ko) | 2006-12-28 | 2006-12-28 | 유체 분사노즐 |
TW096143409A TWI329036B (en) | 2006-12-28 | 2007-11-16 | Nozzle for jetting fluid |
CN2007101949470A CN101209437B (zh) | 2006-12-28 | 2007-12-05 | 流体喷嘴 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060136306A KR100828665B1 (ko) | 2006-12-28 | 2006-12-28 | 유체 분사노즐 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100828665B1 true KR100828665B1 (ko) | 2008-05-09 |
Family
ID=39609792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060136306A KR100828665B1 (ko) | 2006-12-28 | 2006-12-28 | 유체 분사노즐 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100828665B1 (ko) |
CN (1) | CN101209437B (ko) |
TW (1) | TWI329036B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150060062A (ko) * | 2013-11-25 | 2015-06-03 | 세메스 주식회사 | 노즐 및 이를 갖는 기판 처리 장치 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110020507A (ko) * | 2009-08-24 | 2011-03-03 | 주식회사 디엠에스 | 유체 분사 장치 |
CN103472693B (zh) * | 2013-08-28 | 2016-01-20 | 清华大学深圳研究生院 | 一种用于芯片显影工艺的工艺喷嘴 |
CN107433233A (zh) * | 2017-08-18 | 2017-12-05 | 武汉华星光电技术有限公司 | 一种显影装置及其喷嘴 |
KR102045828B1 (ko) * | 2018-07-04 | 2019-11-18 | 주식회사 디엠에스 | 기판 처리장치 |
JP7593741B2 (ja) | 2020-03-26 | 2024-12-03 | ノードソン コーポレーション | ノズル、接着剤塗布ヘッド、接着剤塗布装置及びおむつ製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005349280A (ja) | 2004-06-09 | 2005-12-22 | Tokyo Ohka Kogyo Co Ltd | スリットノズル |
KR20060012958A (ko) * | 2004-08-05 | 2006-02-09 | 삼성전자주식회사 | 도포 장치용 노즐 |
JP2006106422A (ja) | 2004-10-06 | 2006-04-20 | Noritsu Koki Co Ltd | 感光材料処理装置 |
KR20060051708A (ko) * | 2004-10-04 | 2006-05-19 | 다이니폰 스크린 세이조우 가부시키가이샤 | 기판 처리 장치 및 기판 처리 방법 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100500756B1 (ko) * | 2003-06-27 | 2005-07-11 | 주식회사 디엠에스 | 평판 디스플레이 표면 처리용 유체분사장치 |
KR100648411B1 (ko) * | 2003-10-17 | 2006-11-24 | 주식회사 디엠에스 | 유체분사노즐 |
JP4324538B2 (ja) * | 2004-10-04 | 2009-09-02 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
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2006
- 2006-12-28 KR KR1020060136306A patent/KR100828665B1/ko active IP Right Grant
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2007
- 2007-11-16 TW TW096143409A patent/TWI329036B/zh active
- 2007-12-05 CN CN2007101949470A patent/CN101209437B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005349280A (ja) | 2004-06-09 | 2005-12-22 | Tokyo Ohka Kogyo Co Ltd | スリットノズル |
KR20060012958A (ko) * | 2004-08-05 | 2006-02-09 | 삼성전자주식회사 | 도포 장치용 노즐 |
KR20060051708A (ko) * | 2004-10-04 | 2006-05-19 | 다이니폰 스크린 세이조우 가부시키가이샤 | 기판 처리 장치 및 기판 처리 방법 |
JP2006106422A (ja) | 2004-10-06 | 2006-04-20 | Noritsu Koki Co Ltd | 感光材料処理装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150060062A (ko) * | 2013-11-25 | 2015-06-03 | 세메스 주식회사 | 노즐 및 이를 갖는 기판 처리 장치 |
KR102156740B1 (ko) * | 2013-11-25 | 2020-09-16 | 세메스 주식회사 | 노즐 및 이를 갖는 기판 처리 장치 |
Also Published As
Publication number | Publication date |
---|---|
TW200827034A (en) | 2008-07-01 |
TWI329036B (en) | 2010-08-21 |
CN101209437B (zh) | 2010-12-01 |
CN101209437A (zh) | 2008-07-02 |
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