KR100739421B1 - 화상형성장치 - Google Patents
화상형성장치 Download PDFInfo
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- KR100739421B1 KR100739421B1 KR1020040051727A KR20040051727A KR100739421B1 KR 100739421 B1 KR100739421 B1 KR 100739421B1 KR 1020040051727 A KR1020040051727 A KR 1020040051727A KR 20040051727 A KR20040051727 A KR 20040051727A KR 100739421 B1 KR100739421 B1 KR 100739421B1
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Accessory Devices And Overall Control Thereof (AREA)
Abstract
Description
Claims (9)
- 탑재위치에서 기록매체를 스테이지 부재에 탑재하여 고정한 상태에서, 그 스테이지 부재를 화상형성부로 통과시키면서 얼라이먼트 측정과 상기 기록매체에 화상기록을 행하고, 인출위치에서 화상이 형성된 기록매체를 상기 스테이지 부재로부터 인출하는 화상형성장치로서,상기 탑재위치로부터 상기 인출위치로 이동하는 2개의 주행체를 분리 결합가능하게 병렬로 설치하고, 각 주행체에, 이 주행체로부터 튀어 나오도록 상기 스테이지 부재를 설치함과 아울러 상기 스테이지 부재가 스쳐 지날 때에 서로 간섭하지 않도록 상기 스테이지 부재를 화상형성부에 대해서 접근ㆍ이간시키는 회피수단을 설치한 것을 특징으로 하는 화상형성장치.
- 삭제
- 제1항에 있어서, 상기 기록매체의 두께에 상관없이, 상기 기록매체의 기록면과 화상형성부의 거리가 일정하게 되도록 상기 스테이지 부재의 이동량을 조정하는 것을 특징으로 하는 화상형성장치.
- 제1항에 있어서, 상기 탑재위치와 상기 인출위치가 동일한 위치에 배치되어 있는 것을 특징으로 하는 화상형성장치.
- 기록매체에 화상을 형성하기 위한 화상형성부;상기 기록매체를 탑재하여 상기 화상형성부에 보내기 위한 2개의 스테이지 부재; 및상기 스테이지 부재 각각에 설치되고, 상기 스테이지 부재에 상기 기록매체를 탑재하는 탑재위치와, 상기 화상형성부에 의한 화상형성위치와, 상기 스테이지 부재로부터 상기 기록매체를 인출하는 인출위치 사이에서, 상기 스테이지 부재 각각의 적어도 스테이지면을 동일한 궤도로 순환이동시키는 2개의 이동기구를 구비하고:상기 이동기구 각각이 개별의 이동용 레일을 갖는 것을 특징으로 하는 화상형성장치.
- 제5항에 있어서, 상기 2개의 이동기구를 독립적으로 제어하는 제어부를 갖는 것을 특징으로 하는 화상형성장치.
- 제5항 또는 제6항에 있어서, 상기 2개의 스테이지 부재 및 상기 2개의 이동기구가 각각 서로 면대칭으로 배치되어 있는 것을 특징으로 하는 화상형성장치.
- 제5항 또는 제6항에 있어서, 상기 이동기구는 상기 스테이지 부재를 그 스테이지면과 평행한 방향으로 이동시키는 평행이동부와, 상기 스테이지 부재를 그 스테이지면과 수직인 방향으로 이동시키는 수직이동부를 갖는 것을 특징으로 하는 화상형성장치.
- 제8항에 있어서, 상기 이동기구 각각의 상기 평행이동부가 나란히 배치되고, 상기 스테이지 부재는, 상기 스테이지면이 2개의 상기 평행이동부에 평면으로 바라봐서 겹치도록 배치되어 있는 것을 특징으로 하는 화상형성장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2003-00191118 | 2003-07-03 | ||
JP2003191118 | 2003-07-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050004135A KR20050004135A (ko) | 2005-01-12 |
KR100739421B1 true KR100739421B1 (ko) | 2007-07-13 |
Family
ID=33549832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040051727A Expired - Lifetime KR100739421B1 (ko) | 2003-07-03 | 2004-07-02 | 화상형성장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7280183B2 (ko) |
KR (1) | KR100739421B1 (ko) |
CN (1) | CN1578595A (ko) |
TW (1) | TWI246848B (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090101845A1 (en) * | 2005-04-02 | 2009-04-23 | Punch Graphix Prepress Germany Gmbh | Exposure Device for Printing Plates |
KR101707925B1 (ko) * | 2006-08-18 | 2017-02-17 | 브룩스 오토메이션 인코퍼레이티드 | 용량이 축소된 캐리어, 이송, 로드 포트, 버퍼 시스템 |
NL1036028A1 (nl) * | 2007-10-09 | 2009-04-15 | Asml Netherlands Bv | Servo control system, lithographic apparatus and control method. |
ES2326458B1 (es) | 2008-04-04 | 2010-07-26 | Consejo Superior De Investigaciones Cientificas (Csic) (85%) | Compuestos fluorescentes para diagnostico de infecciones, procedimiento de obtencion y sus aplicaciones. |
KR101560617B1 (ko) * | 2008-09-10 | 2015-10-16 | 삼성전자주식회사 | 광 발생 장치 및 그 제어 방법 |
EP2396701B1 (en) * | 2009-02-13 | 2015-04-08 | Micronic Mydata AB | Multi-table lithographic systems |
US9757963B2 (en) | 2010-11-01 | 2017-09-12 | Scodix Ltd. | System and method for transporting substrates |
WO2012059916A2 (en) | 2010-11-01 | 2012-05-10 | Scodix Ltd. | System and method for transporting substrates |
CN104386487A (zh) * | 2014-10-30 | 2015-03-04 | 昆山迈致治具科技有限公司 | 手表密封性测试治具 |
EP3156241B1 (en) * | 2015-10-12 | 2018-10-10 | Agfa Nv | A moving gantry flatbed table inkjet printer |
CN109143797A (zh) * | 2018-11-06 | 2019-01-04 | 苏州源卓光电科技有限公司 | 一种双台面直写式曝光机及其曝光方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5563682A (en) | 1994-07-29 | 1996-10-08 | Orc Manufacturing Co., Ltd. | Exposing apparatus with mask alignment system and method of aligning, exposing and transferring work |
KR0180925B1 (ko) * | 1994-02-18 | 1999-04-15 | 미타라이 하지메 | 스테이지장치 |
KR20010007613A (ko) * | 2000-09-08 | 2001-01-26 | 민병이 | 호오스 및 파이프의 연결조임장치 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5715064A (en) * | 1994-06-17 | 1998-02-03 | International Business Machines Corporation | Step and repeat apparatus having enhanced accuracy and increased throughput |
CN1244020C (zh) * | 1996-11-28 | 2006-03-01 | 株式会社尼康 | 曝光装置 |
TW448487B (en) * | 1997-11-22 | 2001-08-01 | Nippon Kogaku Kk | Exposure apparatus, exposure method and manufacturing method of device |
JP2000338432A (ja) | 1999-05-31 | 2000-12-08 | Dainippon Screen Mfg Co Ltd | レーザー露光装置及びその方法 |
JP2001160530A (ja) * | 1999-12-01 | 2001-06-12 | Nikon Corp | ステージ装置及び露光装置 |
TWI260154B (en) * | 2003-07-03 | 2006-08-11 | Fuji Photo Film Co Ltd | Image forming device |
-
2004
- 2004-06-29 TW TW093119057A patent/TWI246848B/zh not_active IP Right Cessation
- 2004-07-02 KR KR1020040051727A patent/KR100739421B1/ko not_active Expired - Lifetime
- 2004-07-05 CN CNA2004100621520A patent/CN1578595A/zh active Pending
- 2004-07-06 US US10/883,757 patent/US7280183B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0180925B1 (ko) * | 1994-02-18 | 1999-04-15 | 미타라이 하지메 | 스테이지장치 |
US5563682A (en) | 1994-07-29 | 1996-10-08 | Orc Manufacturing Co., Ltd. | Exposing apparatus with mask alignment system and method of aligning, exposing and transferring work |
KR20010007613A (ko) * | 2000-09-08 | 2001-01-26 | 민병이 | 호오스 및 파이프의 연결조임장치 |
Also Published As
Publication number | Publication date |
---|---|
TW200513109A (en) | 2005-04-01 |
US7280183B2 (en) | 2007-10-09 |
CN1578595A (zh) | 2005-02-09 |
KR20050004135A (ko) | 2005-01-12 |
TWI246848B (en) | 2006-01-01 |
US20050002006A1 (en) | 2005-01-06 |
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