KR100701143B1 - 유기 전계 발광 소자 - Google Patents
유기 전계 발광 소자 Download PDFInfo
- Publication number
- KR100701143B1 KR100701143B1 KR1020057005834A KR20057005834A KR100701143B1 KR 100701143 B1 KR100701143 B1 KR 100701143B1 KR 1020057005834 A KR1020057005834 A KR 1020057005834A KR 20057005834 A KR20057005834 A KR 20057005834A KR 100701143 B1 KR100701143 B1 KR 100701143B1
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- light emitting
- organic
- emitting layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- -1 pyrene compound Chemical class 0.000 claims abstract description 111
- BBEAQIROQSPTKN-UHFFFAOYSA-N antipyrene Natural products C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 claims abstract description 90
- 239000000463 material Substances 0.000 claims abstract description 79
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 claims abstract description 69
- 239000010410 layer Substances 0.000 claims description 268
- 125000001424 substituent group Chemical group 0.000 claims description 47
- 125000003118 aryl group Chemical group 0.000 claims description 43
- 239000000126 substance Substances 0.000 claims description 18
- 239000001257 hydrogen Substances 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 16
- 239000002356 single layer Substances 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 abstract description 8
- 150000003220 pyrenes Chemical class 0.000 abstract description 8
- 230000007774 longterm Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 83
- 238000002347 injection Methods 0.000 description 26
- 239000007924 injection Substances 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 20
- 230000005525 hole transport Effects 0.000 description 18
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 239000010408 film Substances 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 15
- 239000000758 substrate Substances 0.000 description 12
- 238000007740 vapor deposition Methods 0.000 description 12
- UUDHDTDCHXHIOS-UHFFFAOYSA-N 1,3,6,8-tetrakis(4-phenoxyphenyl)pyrene Chemical compound C=1C=C(C=2C3=CC=C4C(C=5C=CC(OC=6C=CC=CC=6)=CC=5)=CC(=C5C=CC(C3=C54)=C(C=3C=CC(OC=4C=CC=CC=4)=CC=3)C=2)C=2C=CC(OC=3C=CC=CC=3)=CC=2)C=CC=1OC1=CC=CC=C1 UUDHDTDCHXHIOS-UHFFFAOYSA-N 0.000 description 11
- 229910001148 Al-Li alloy Inorganic materials 0.000 description 11
- UJOBWOGCFQCDNV-UHFFFAOYSA-N Carbazole Natural products C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- UFVXQDWNSAGPHN-UHFFFAOYSA-K bis[(2-methylquinolin-8-yl)oxy]-(4-phenylphenoxy)alumane Chemical compound [Al+3].C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC=C([O-])C2=NC(C)=CC=C21.C1=CC([O-])=CC=C1C1=CC=CC=C1 UFVXQDWNSAGPHN-UHFFFAOYSA-K 0.000 description 10
- 238000007733 ion plating Methods 0.000 description 10
- VFUDMQLBKNMONU-UHFFFAOYSA-N 9-[4-(4-carbazol-9-ylphenyl)phenyl]carbazole Chemical group C12=CC=CC=C2C2=CC=CC=C2N1C1=CC=C(C=2C=CC(=CC=2)N2C3=CC=CC=C3C3=CC=CC=C32)C=C1 VFUDMQLBKNMONU-UHFFFAOYSA-N 0.000 description 9
- 230000000903 blocking effect Effects 0.000 description 9
- 150000002739 metals Chemical class 0.000 description 9
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 8
- 238000000151 deposition Methods 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 230000005284 excitation Effects 0.000 description 7
- 238000004020 luminiscence type Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 238000005546 reactive sputtering Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000012043 crude product Substances 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 4
- 229940078552 o-xylene Drugs 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- ZKBKRTZIYOKNRG-UHFFFAOYSA-N 1,3,6,8-tetrabromopyrene Chemical compound C1=C2C(Br)=CC(Br)=C(C=C3)C2=C2C3=C(Br)C=C(Br)C2=C1 ZKBKRTZIYOKNRG-UHFFFAOYSA-N 0.000 description 3
- HXWWMGJBPGRWRS-CMDGGOBGSA-N 4- -2-tert-butyl-6- -4h-pyran Chemical compound O1C(C(C)(C)C)=CC(=C(C#N)C#N)C=C1\C=C\C1=CC(C(CCN2CCC3(C)C)(C)C)=C2C3=C1 HXWWMGJBPGRWRS-CMDGGOBGSA-N 0.000 description 3
- 0 CC*C1=CCCc2ccccc12 Chemical compound CC*C1=CCCc2ccccc12 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 238000005658 halogenation reaction Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000004076 pyridyl group Chemical group 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- SDEAGACSNFSZCU-UHFFFAOYSA-N (3-chlorophenyl)boronic acid Chemical compound OB(O)C1=CC=CC(Cl)=C1 SDEAGACSNFSZCU-UHFFFAOYSA-N 0.000 description 2
- SIJHJHYRYHIWFW-UHFFFAOYSA-N 1,3,6,8-tetraphenylpyrene Chemical class C1=CC=CC=C1C(C1=CC=C23)=CC(C=4C=CC=CC=4)=C(C=C4)C1=C2C4=C(C=1C=CC=CC=1)C=C3C1=CC=CC=C1 SIJHJHYRYHIWFW-UHFFFAOYSA-N 0.000 description 2
- YODNYGZNTJWZLP-UHFFFAOYSA-N 1-n,1-n,3-n,3-n,6-n,6-n,8-n,8-n-octakis-phenylpyrene-1,3,6,8-tetramine Chemical compound C1=CC=CC=C1N(C=1C2=CC=C3C(N(C=4C=CC=CC=4)C=4C=CC=CC=4)=CC(=C4C=CC(C2=C43)=C(N(C=2C=CC=CC=2)C=2C=CC=CC=2)C=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 YODNYGZNTJWZLP-UHFFFAOYSA-N 0.000 description 2
- TWPMMLHBHPYSMT-UHFFFAOYSA-N 3-methyl-n-phenylaniline Chemical compound CC1=CC=CC(NC=2C=CC=CC=2)=C1 TWPMMLHBHPYSMT-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- JFBZPFYRPYOZCQ-UHFFFAOYSA-N [Li].[Al] Chemical compound [Li].[Al] JFBZPFYRPYOZCQ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000005576 amination reaction Methods 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 125000003636 chemical group Chemical group 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 2
- GRWIABMEEKERFV-UHFFFAOYSA-N methanol;oxolane Chemical compound OC.C1CCOC1 GRWIABMEEKERFV-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 150000002941 palladium compounds Chemical class 0.000 description 2
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical class OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000123 polythiophene Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- LISFMEBWQUVKPJ-UHFFFAOYSA-N quinolin-2-ol Chemical class C1=CC=C2NC(=O)C=CC2=C1 LISFMEBWQUVKPJ-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 238000002061 vacuum sublimation Methods 0.000 description 2
- DKYRKAIKWFHQHM-UHFFFAOYSA-N (3,5-dichlorophenyl)boronic acid Chemical compound OB(O)C1=CC(Cl)=CC(Cl)=C1 DKYRKAIKWFHQHM-UHFFFAOYSA-N 0.000 description 1
- KFXUHRXGLWUOJT-UHFFFAOYSA-N (4-phenoxyphenyl)boronic acid Chemical compound C1=CC(B(O)O)=CC=C1OC1=CC=CC=C1 KFXUHRXGLWUOJT-UHFFFAOYSA-N 0.000 description 1
- UWRZIZXBOLBCON-VOTSOKGWSA-N (e)-2-phenylethenamine Chemical compound N\C=C\C1=CC=CC=C1 UWRZIZXBOLBCON-VOTSOKGWSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- VJLDAEGCDJWMSO-UHFFFAOYSA-N 1,3,4,6-tetraphenylpyrene Chemical compound C1=CC=CC=C1C(C1=CC(=C23)C=4C=CC=CC=4)=CC=C(C=C4)C1=C2C4=C(C=1C=CC=CC=1)C=C3C1=CC=CC=C1 VJLDAEGCDJWMSO-UHFFFAOYSA-N 0.000 description 1
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical compound C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 1
- XGFSQCNMLKVNGX-UHFFFAOYSA-N 1-(3-chlorophenyl)pyrene Chemical compound ClC=1C=C(C=CC=1)C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C34 XGFSQCNMLKVNGX-UHFFFAOYSA-N 0.000 description 1
- GBPJYRVTCXCMLT-UHFFFAOYSA-N 1-(4-phenoxyphenyl)pyrene Chemical compound C=1C=C(C=2C3=CC=C4C=CC=C5C=CC(C3=C54)=CC=2)C=CC=1OC1=CC=CC=C1 GBPJYRVTCXCMLT-UHFFFAOYSA-N 0.000 description 1
- VERMWGQSKPXSPZ-BUHFOSPRSA-N 1-[(e)-2-phenylethenyl]anthracene Chemical compound C=1C=CC2=CC3=CC=CC=C3C=C2C=1\C=C\C1=CC=CC=C1 VERMWGQSKPXSPZ-BUHFOSPRSA-N 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- KTSGGWMVDAECFK-UHFFFAOYSA-N 2,4,7,9-tetraphenyl-1,10-phenanthroline Chemical compound C1=CC=CC=C1C1=CC(C=2C=CC=CC=2)=C(C=CC=2C3=NC(=CC=2C=2C=CC=CC=2)C=2C=CC=CC=2)C3=N1 KTSGGWMVDAECFK-UHFFFAOYSA-N 0.000 description 1
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
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- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
또한, 상기에 개시한 내용으로부터 아래와 같은 부기에 나타낸 발명을 이끌어 낼 수 있다.
(부기 1)
하기 화학식 1로 표시되는 1,3,6,8-4 치환 피렌 화합물.
<화학식 1>
식 중, R은 서로 독립적으로 하기 화학식 2의 구조를 갖는다.
<화학식 2>
{식 중, R1 내지 R5는 서로 독립적으로 수소 또는 치환기를 나타내되, 단 R1 내지 R5 중 하나 이상은 하기 화학식 3 내지 6으로 표시되는 기 중 어느 하나임}
<화학식 3>
<화학식 4>
<화학식 5>
<화학식 6>
{식 중, R6 내지 R12는 서로 독립적으로 수소 또는 치환기를 나타냄}
(부기 2)
부기 1에 있어서, 상기 화학식 3의 R6 및 R7이 모두 서로 독립적으로 치환기를 가질 수도 있는 방향족기인 1,3,6,8-4 치환 피렌 화합물.
(부기 3)
부기 1에 있어서, 상기 화학식 6의 R12가 치환기를 가질 수도 있는 방향족기인 1,3,6,8-4 치환 피렌 화합물.
(부기 4)
부기 1에 있어서, 유기 전계 발광 소자에서의 유기 발광층 형성 재료로서 사용되는 1,3,6,8-4 치환 피렌 화합물.
(부기 5)
부기 1에 있어서, 유기 전계 발광 소자에서의 호스트 또는 게스트로서의 유기 발광층 형성 재료로서 사용되는 1,3,6,8-4 치환 피렌 화합물.
(부기 6)
정극과 부극 사이에 유기 발광층을 가지며, 해당 유기 발광층이 하기 화학식 1로 표시되는 1,3,6,8-4 치환 피렌 화합물을 유기 발광층 형성 재료로서 함유하는 유기 전계 발광 소자.
<화학식 1>
식 중, R은 서로 독립적으로 하기 화학식 2의 구조를 갖는다.
<화학식 2>
{식 중, R1 내지 R5는 서로 독립적으로 수소 또는 치환기를 나타내되, 단 R1 내지 R5 중 하나 이상은 하기 화학식 3 내지 6으로 표시되는 기 중 어느 하나임}
<화학식 3>
<화학식 4>
<화학식 5>
<화학식 6>
{식 중, R6 내지 R12는 서로 독립적으로 수소 또는 치환기를 나타냄}
(부기 7)
부기 6에 있어서, 상기 화학식 1로 표시되는 1,3,6,8-4 치환 피렌 화합물이 호스트 또는 게스트로서의 유기 발광층 형성 재료인 유기 전계 발광 소자.
(부기 8)
부기 6에 있어서, 상기 유기 발광층이 상기 화학식 1로 표시되는 1,3,6,8-4 치환 피렌 화합물의 단독층을 포함하는 유기 전계 발광 소자.
(부기 9)
부기 6에 있어서, 상기 화학식 3의 R6 및 R7이 모두 서로 독립적으로 치환기를 가질 수도 있는 방향족기인 유기 전계 발광 소자.
(부기 10)
부기 6에 있어서, 상기 화학식 6의 R12가 치환기를 가질 수도 있는 방향족기인 유기 전계 발광 소자.
(부기 11)
부기 6에 있어서, 상기 유기 발광층이 하기 화학식 7로 표시되는 방향족 아민 화합물을 하나 이상 함유하여 이루어지는 유기 전계 발광 소자.
<화학식 7>
식 중, Ar1은 치환기를 가질 수도 있는 2, 3 또는 4가 방향족기를 나타내고, R17 및 R18은 각각 독립적으로 치환기를 가질 수도 있는 1가 방향족기를 나타내며, n은 2 내지 4의 정수를 나타낸다.
(부기 12)
부기 11에 있어서, 화학식 7로 표시되는 방향족 아민 화합물이 하기 화학식 8로 표시되는 N,N'-디나프틸-N,N'-디페닐-[1,1'-비페닐]-4,4'-디아민인 유기 전계 발광 소자.
<화학식 8>
(부기 13)
부기 6에 있어서, 상기 유기 발광층이 하기 화학식 9로 표시되는 카르바졸 화합물을 하나 이상 함유하여 이루어지는 유기 전계 발광 소자.
<화학식 9>
식 중, Ar2는 치환기를 가질 수도 있는 2, 3 또는 4가 방향족기를 나타내고, R13 및 R13'는 각각 독립적으로 수소 원자, 할로겐 원자, 또는 치환될 수도 있는 알킬기, 아랄킬기, 알케닐기, 방향족기, 시아노기, 아미노기, 아실기, 알콕시카르보닐기, 카르복시기, 알콕시기, 알킬술포닐기, 수산기, 아미드기 또는 방향족 옥시기를 나타내며, n은 2 내지 4의 정수를 나타낸다.
(부기 14)
부기 13에 있어서, 화학식 9로 표시되는 카르바졸 화합물이 하기 화학식 10으로 표시되는 4,4'-비스(9-카르바졸릴)-비페닐인 유기 전계 발광 소자.
<화학식 10>
CBP
(부기 15)
부기 6에 있어서, 상기 유기 발광층이 하기 화학식 11로 표시되는 히드록시퀴놀린-옥시아릴 착체를 하나 이상 함유하여 이루어지는 유기 전계 발광 소자.
<화학식 11>
식 중, R14는 수소 또는 치환기를 가질 수도 있는 알킬기이고, R15는 치환기를 가질 수도 있는 방향족기를 나타내며, M은 3가의 금속을 나타내고, n은 1 또는 2를 나타낸다.
(부기 16)
부기 15에 있어서, 화학식 11로 표시되는 히드록시퀴놀린-옥시아릴 착체가 하기 화학식 12로 표시되는 알루미늄 히드록시퀴놀린-옥시비페닐 착체인 유기 전계 발광 소자.
<화학식 12>
(부기 17)
부기 6에 기재된 유기 전계 발광 소자를 이용한 유기 전계 발광 디스플레이.
(부기 18)
부기 7에 기재된 유기 전계 발광 소자를 이용한 유기 전계 발광 디스플레이.
(부기 19)
부기 9에 기재된 유기 전계 발광 소자를 이용한 유기 전계 발광 디스플레이.
(부기 20)
부기 10에 기재된 유기 전계 발광 소자를 이용한 유기 전계 발광 디스플레이.
Claims (20)
- 제1항에 있어서, 상기 화학식 3의 R6 및 R7이 모두 서로 독립적으로 치환기를 가질 수도 있는 방향족기인 1,3,6,8-4 치환 피렌 화합물.
- 제1항에 있어서, 상기 화학식 6의 R12가 치환기를 가질 수도 있는 방향족기인 1,3,6,8-4 치환 피렌 화합물.
- 제1항에 있어서, 유기 전계 발광 소자에서의 유기 발광층 형성 재료로서 사용되는 1,3,6,8-4 치환 피렌 화합물.
- 제1항에 있어서, 유기 전계 발광 소자에서의 호스트 또는 게스트로서의 유기 발광층 형성 재료로서 사용되는 1,3,6,8-4 치환 피렌 화합물.
- 정극과 부극 사이에 유기 발광층을 가지며, 해당 유기 발광층이 하기 화학식 1로 표시되는 1,3,6,8-4 치환 피렌 화합물을 유기 발광층 형성 재료로서 함유하는 유기 전계 발광 소자.<화학식 1>식 중, R은 서로 독립적으로 하기 화학식 2의 구조를 갖는다.<화학식 2>{식 중, R1 내지 R5는 서로 독립적으로 수소 또는 치환기를 나타내되, 단 R1 내지 R5 중 하나 이상은 하기 화학식 3 내지 6으로 표시되는 기 중 어느 하나임}<화학식 3><화학식 4><화학식 5><화학식 6>{식 중, R6 내지 R12는 서로 독립적으로 수소 또는 치환기를 나타냄}
- 제6항에 있어서, 상기 화학식 1로 표시되는 1,3,6,8-4 치환 피렌 화합물이 호스트 또는 게스트로서의 유기 발광층 형성 재료인 유기 전계 발광 소자.
- 제6항에 있어서, 상기 유기 발광층이 상기 화학식 1로 표시되는 1,3,6,8-4 치환 피렌 화합물의 단독층을 포함하는 유기 전계 발광 소자.
- 제6항에 있어서, 상기 화학식 3의 R6 및 R7이 모두 서로 독립적으로 치환기를 가질 수도 있는 방향족기인 유기 전계 발광 소자.
- 제6항에 있어서, 상기 화학식 6의 R12가 치환기를 가질 수도 있는 방향족기인 유기 전계 발광 소자.
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