KR100592445B1 - 비스페놀 a의 제조 방법 - Google Patents
비스페놀 a의 제조 방법 Download PDFInfo
- Publication number
- KR100592445B1 KR100592445B1 KR1020017008098A KR20017008098A KR100592445B1 KR 100592445 B1 KR100592445 B1 KR 100592445B1 KR 1020017008098 A KR1020017008098 A KR 1020017008098A KR 20017008098 A KR20017008098 A KR 20017008098A KR 100592445 B1 KR100592445 B1 KR 100592445B1
- Authority
- KR
- South Korea
- Prior art keywords
- phenol
- melt
- bisphenol
- nitrogen
- mbar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
- C07C37/68—Purification; separation; Use of additives, e.g. for stabilisation
- C07C37/70—Purification; separation; Use of additives, e.g. for stabilisation by physical treatment
- C07C37/74—Purification; separation; Use of additives, e.g. for stabilisation by physical treatment by distillation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (2)
- 비스페놀 A와 페놀의 부가물을 100 ℃ 내지 120 ℃의 온도에서 용융시킨 다음, 이 용융물을 질소에 의해 불활성으로 되게하여 제1 증류 장치의 탑정에 연속적으로 공급하고, 여기서 120 ℃ 내지 160 ℃ 미만의 온도 및 80 mbar 초과 내지 200 mbar의 압력 하에 용융물의 페놀 함량을 10 내지 25 중량%으로 감소시키며, 이와 동시에 도입된 용융물의 부피를 기준으로 0.5 내지 50 부피%의 질소를 증류 장치의 탑저를 경유하여 통과시키고, 이어서 산소를 제거한 농축 용융물로부터 180 ℃ 내지 220 ℃의 온도 및 1 내지 1.5 bar의 질소 분압 하에 잔류 페놀을 제거하는 것을 포함하는, 비스페놀 A의 제조 방법.
- 60 중량%의 비스페놀 A와 40 중량%의 페놀을 함유하는 혼합 결정을 100 ℃ 내지 120 ℃의 온도에서 용융시킨 다음, 이 용융물을 질소에 의해 불활성으로 되게하여 증류 장치의 탑정에 연속적으로 공급하고, 여기서 120 ℃ 내지 160 ℃ 미만의 온도 및 80 mbar 초과 내지 200 mbar의 압력 하에 용융물의 페놀 함량을 10 내지 25 중량%로 감소시키며, 이와 동시에 도입된 용융물의 부피를 기준으로 0.5 내지 50 부피%의 질소를 증류 장치의 탑저를 경유하여 통과시키는 것을 포함하는, 75 내지 90 중량%의 비스페놀 A와 10 내지 25 중량%의 페놀을 함유하고 산소 함량이 1 ppm 미만인 용융물의 제조 방법.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19860144A DE19860144C1 (de) | 1998-12-24 | 1998-12-24 | Verfahren zur Herstellung von Bisphenol A |
DE19860144.1 | 1998-12-24 | ||
PCT/EP1999/009917 WO2000039060A1 (de) | 1998-12-24 | 1999-12-14 | Verfahren zur herstellung von bisphenol a |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010099940A KR20010099940A (ko) | 2001-11-09 |
KR100592445B1 true KR100592445B1 (ko) | 2006-06-22 |
Family
ID=7892718
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020017008098A Expired - Fee Related KR100592445B1 (ko) | 1998-12-24 | 1999-12-14 | 비스페놀 a의 제조 방법 |
Country Status (13)
Country | Link |
---|---|
US (1) | US6414198B1 (ko) |
EP (1) | EP1140755B1 (ko) |
JP (1) | JP2002533424A (ko) |
KR (1) | KR100592445B1 (ko) |
CN (1) | CN1156423C (ko) |
AU (1) | AU1658800A (ko) |
BR (1) | BR9916578A (ko) |
DE (2) | DE19860144C1 (ko) |
ES (1) | ES2216601T3 (ko) |
HK (1) | HK1042888A1 (ko) |
RU (1) | RU2219158C2 (ko) |
TW (1) | TW533193B (ko) |
WO (1) | WO2000039060A1 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19961566A1 (de) * | 1999-12-20 | 2001-06-21 | Bayer Ag | Bis(4-hydroxyaryl)alkane |
TW553977B (en) * | 2000-03-10 | 2003-09-21 | Idemitsu Petrochemical Co | Processes for producing raw polycarbonate resin material and producing polycarbonate resin |
US6703530B2 (en) | 2002-02-28 | 2004-03-09 | General Electric Company | Chemical reactor system and process |
WO2004037894A1 (de) * | 2002-10-21 | 2004-05-06 | Bayer Materialscience Ag | Herstellung von besonders wenig durch sauerstoff geschädigtem polycarbonat |
DE102004005723A1 (de) * | 2004-02-05 | 2005-08-25 | Bayer Materialscience Ag | Herstellung von Bisphenol A mit verringertem Schwefelgehalt |
US7371902B2 (en) * | 2004-09-29 | 2008-05-13 | General Electric Company | Methods for purifying p,p-bisphenol-A |
DE102005025788A1 (de) | 2005-06-04 | 2006-12-07 | Bayer Materialscience Ag | Verfahren zur Herstellung von hochreinem Bisphenol A |
CN113662985B (zh) | 2021-09-07 | 2022-06-24 | 北京中医药大学 | 具有促进干细胞定向分化为心肌细胞作用的中药组合物、中药有效组分组合物及其应用 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2775620A (en) * | 1954-07-12 | 1956-12-25 | Shell Dev | Production of bis (hydroxyaryl) substituted compounds |
US4859803A (en) * | 1988-05-16 | 1989-08-22 | Shell Oil Company | Preparation of bisphenols |
DE4105428A1 (de) * | 1991-02-21 | 1992-08-27 | Bayer Ag | Verfahren zur reinigung von bisphenolen |
EP0523931B1 (en) * | 1991-07-16 | 1996-10-30 | Chiyoda Corporation | Process for the production of bisphenol A |
CN1050828C (zh) | 1993-02-16 | 2000-03-29 | 中国石油化工总公司 | 制备高品位聚碳酸脂级双酚a的脱酚新方法 |
RU2054411C1 (ru) * | 1993-06-29 | 1996-02-20 | Котюкова Анна Лукинична | Способ получения бисфенолов |
JP3917201B2 (ja) * | 1995-05-29 | 2007-05-23 | 三菱化学株式会社 | ビスフェノールaの製造方法 |
DE19529855A1 (de) * | 1995-08-14 | 1997-02-20 | Bayer Ag | Verfahren zur Reinigung von Bisphenol |
US5783733A (en) * | 1996-06-13 | 1998-07-21 | General Electric Company | Process for manufacture of bisphenol |
-
1998
- 1998-12-24 DE DE19860144A patent/DE19860144C1/de not_active Expired - Fee Related
-
1999
- 1999-12-14 BR BR9916578-3A patent/BR9916578A/pt not_active IP Right Cessation
- 1999-12-14 AU AU16588/00A patent/AU1658800A/en not_active Abandoned
- 1999-12-14 US US09/868,806 patent/US6414198B1/en not_active Expired - Fee Related
- 1999-12-14 RU RU2001120698/04A patent/RU2219158C2/ru not_active IP Right Cessation
- 1999-12-14 ES ES99959411T patent/ES2216601T3/es not_active Expired - Lifetime
- 1999-12-14 DE DE59909358T patent/DE59909358D1/de not_active Expired - Lifetime
- 1999-12-14 HK HK02104364.8A patent/HK1042888A1/zh unknown
- 1999-12-14 CN CNB998150835A patent/CN1156423C/zh not_active Expired - Fee Related
- 1999-12-14 JP JP2000590973A patent/JP2002533424A/ja active Pending
- 1999-12-14 WO PCT/EP1999/009917 patent/WO2000039060A1/de active IP Right Grant
- 1999-12-14 EP EP99959411A patent/EP1140755B1/de not_active Expired - Lifetime
- 1999-12-14 KR KR1020017008098A patent/KR100592445B1/ko not_active Expired - Fee Related
- 1999-12-16 TW TW088122064A patent/TW533193B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1332710A (zh) | 2002-01-23 |
JP2002533424A (ja) | 2002-10-08 |
BR9916578A (pt) | 2001-10-02 |
EP1140755A1 (de) | 2001-10-10 |
TW533193B (en) | 2003-05-21 |
US6414198B1 (en) | 2002-07-02 |
RU2219158C2 (ru) | 2003-12-20 |
CN1156423C (zh) | 2004-07-07 |
DE19860144C1 (de) | 2000-09-14 |
KR20010099940A (ko) | 2001-11-09 |
ES2216601T3 (es) | 2004-10-16 |
WO2000039060A1 (de) | 2000-07-06 |
AU1658800A (en) | 2000-07-31 |
HK1042888A1 (zh) | 2002-08-30 |
DE59909358D1 (de) | 2004-06-03 |
EP1140755B1 (de) | 2004-04-28 |
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Patent event date: 20010623 Patent event code: PA01051R01D Comment text: International Patent Application |
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