KR100574329B1 - 소수성 처리 조성물, 코팅을 형성하는 방법 및 상기 코팅을 구비한 제품 - Google Patents
소수성 처리 조성물, 코팅을 형성하는 방법 및 상기 코팅을 구비한 제품 Download PDFInfo
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- KR100574329B1 KR100574329B1 KR1020017000972A KR20017000972A KR100574329B1 KR 100574329 B1 KR100574329 B1 KR 100574329B1 KR 1020017000972 A KR1020017000972 A KR 1020017000972A KR 20017000972 A KR20017000972 A KR 20017000972A KR 100574329 B1 KR100574329 B1 KR 100574329B1
- Authority
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- South Korea
- Prior art keywords
- hydrophobic
- oleophilic
- substrate
- coating
- composition
- Prior art date
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- 230000002209 hydrophobic effect Effects 0.000 title claims abstract description 41
- 238000000576 coating method Methods 0.000 title claims abstract description 28
- 239000000203 mixture Substances 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 125000000524 functional group Chemical group 0.000 claims abstract description 21
- 239000000243 solution Substances 0.000 claims abstract description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000002241 glass-ceramic Substances 0.000 claims abstract description 6
- 239000007864 aqueous solution Substances 0.000 claims abstract description 5
- 230000037452 priming Effects 0.000 claims description 23
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 230000003678 scratch resistant effect Effects 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 150000002367 halogens Chemical group 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 claims description 2
- 239000011707 mineral Substances 0.000 claims description 2
- 230000001568 sexual effect Effects 0.000 claims 1
- 241001074085 Scophthalmus aquosus Species 0.000 abstract 1
- 239000008199 coating composition Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 28
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 238000012360 testing method Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000011356 non-aqueous organic solvent Substances 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- -1 polysiloxanes Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920000131 polyvinylidene Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 241000238631 Hexapoda Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000004941 influx Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000037072 sun protection Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/88—Coatings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
X-(SiX2O)nSiX3 (III)
SiRX3 (IV)
SiR2X2 (V)
Claims (16)
- 소수성/소유성 코팅(hydrophobic/oleophobic coating)을 위한 조성물(composition)로서,상기 조성물은 아래 구조식의 프라이밍제(priming agent)를 포함하는 소수성/소유성제의 수용액으로 이루어지고,이 구조식에서- R3는 탄소 사슬을 나타내고,- R1과 R2는 각각 알킬기 또는 수소 원자를 나타내며,- X1과 X2는 할로겐 또는 알콕시와 같이 서로 동일하거나 또는 서로 다른 가수분해 가능한 작용기이고,- q와 q'는 0, 1 또는 2이며,상기 소수성/소유성제는 다음 구조식의 퍼플루오르알킬알킬실란(perfluoroalkylalkylsilane)이고,이 식에서,- m은 0 내지 15이고,- n은 1 내지 5이며,- p는 0, 1 또는 2이고,- R은 알킬기 또는 수소원자이며,- X는 할로겐 또는 알콕시와 같은 가수분해 가능한 작용기인 것을 특징으로 하는, 소수성/소유성 코팅을 위한 조성물.
- 제 1항에 있어서, 상기 구조식(I)에서, X1과 X2는 알콕시 작용기이고 q와 q'는 0 또는 3인 것을 특징으로 하는, 소수성/소유성 코팅을 위한 조성물.
- 삭제
- 제 1항 또는 제 2항에 있어서, 상기 수용액은 0.2 내지 10 중량%의 소수성/소유성제와, 0.05 내지 10 중량%의 프라이밍제를 포함하는 것을 특징으로 하는, 소수성/소유성 코팅을 위한 조성물.
- 제 1항 또는 제 2항에 기재된 조성물을 이용하여 기판에 소수성/소유성 코팅을 형성하는 방법으로서,상기 방법은, 소수성/소유성제가 전혀 없는 상태에서, 상기 기판을 상기 조성물과 접촉시키기 전, 상기 기판을 용액 상태의 프라이밍제와 접촉시키는 단계를포함하는 것을 특징으로 하는, 기판에 소수성/소유성 코팅을 형성하는 방법.
- 제 6항에 있어서, 상기 구조식 (I), (II), (III), (IV) 및 (V)에서, X1, X2 및 X는 알콕시 작용기인 것을 특징으로 하는, 기판에 소수성/소유성 코팅을 형성하는 방법.
- 외부 표면이, 제 1항 또는 제 2항에 기재된 조성물로부터 형성된 소수성/소유성 코팅을 구비하는, 제품.
- 제 8항에 있어서, 코팅을 구비한 상기 외부 표면은, 유리 물질, 세라믹, 유리 세라믹, 천연 광물질 또는 플라스틱으로 이루어지는 것을 특징으로 하는, 제품.
- 제 8항에 있어서, 단일층(monolithic), 적층(laminated) 또는 다층 창유리(multiple glazing)으로 이루어진, 제품.
- 제 10항에 있어서, 제품은, 전체 표면 또는 표면 일부에, 내긁힘성 층(scratch-resistant layer), 장식층(decorative layer), 차폐 층(masking layer), 광학 선택층(optically selective layers), 반사 방지층 스택(a stack of antireflection layer), 전기 전도성 회로(electrically conducting layers), 정전기방지 전도층(antistatic conducting layers)을 포함하는 그룹으로부터 선택된 층을 포함하는 것을 특징으로 하는, 제품.
- 제 8항에 기재된 제품을 운송 수단 또는 건물용 창유리로 사용하는 방법.
- 제 8항에 기재된 제품을 유리 세라믹 홉(glass ceramic hop) 또는 오븐의 문으로 사용하는 방법.
- 제 8항에 기재된 제품을 한 가지 품목의 도시 시설물(urban furniture)의 구성요소로 사용하는 방법.
- 제 8항에 기재된 제품을 한 점의 가구의 구성요소로 사용하는 방법.
- 제 8항에 기재된 제품을 스크린으로 사용하는 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR98/09476 | 1998-07-24 | ||
FR9809476A FR2781495B3 (fr) | 1998-07-24 | 1998-07-24 | Composition de traitement hydrophobe, procede de formation d'un revetement a partir de cette composition et produits munis de ce revetement |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010074744A KR20010074744A (ko) | 2001-08-09 |
KR100574329B1 true KR100574329B1 (ko) | 2006-04-26 |
Family
ID=9528978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020017000972A KR100574329B1 (ko) | 1998-07-24 | 1999-07-22 | 소수성 처리 조성물, 코팅을 형성하는 방법 및 상기 코팅을 구비한 제품 |
Country Status (11)
Country | Link |
---|---|
US (1) | US6451432B1 (ko) |
EP (1) | EP1102825B1 (ko) |
JP (1) | JP4546645B2 (ko) |
KR (1) | KR100574329B1 (ko) |
AT (1) | ATE250114T1 (ko) |
BR (1) | BR9912384B1 (ko) |
DE (1) | DE69911431T2 (ko) |
ES (1) | ES2207251T3 (ko) |
FR (1) | FR2781495B3 (ko) |
PT (1) | PT1102825E (ko) |
WO (1) | WO2000005321A1 (ko) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7220470B2 (en) * | 2001-02-20 | 2007-05-22 | Certainteed Corporation | Moisture repellent air duct products |
US6593392B2 (en) * | 2001-06-22 | 2003-07-15 | Corning Incorporated | Curable halogenated compositions |
US7815967B2 (en) * | 2001-09-06 | 2010-10-19 | Alain Yang | Continuous process for duct liner production with air laid process and on-line coating |
GB0206930D0 (en) | 2002-03-23 | 2002-05-08 | Univ Durham | Method and apparatus for the formation of hydrophobic surfaces |
US20030211262A1 (en) * | 2002-05-08 | 2003-11-13 | Certainteed Corporation | Duct board having two facings |
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- 1999-07-22 BR BRPI9912384-3A patent/BR9912384B1/pt not_active IP Right Cessation
- 1999-07-22 EP EP99932944A patent/EP1102825B1/fr not_active Expired - Lifetime
- 1999-07-22 WO PCT/FR1999/001799 patent/WO2000005321A1/fr active IP Right Grant
- 1999-07-22 US US09/764,999 patent/US6451432B1/en not_active Expired - Lifetime
- 1999-07-22 DE DE69911431T patent/DE69911431T2/de not_active Expired - Lifetime
- 1999-07-22 PT PT99932944T patent/PT1102825E/pt unknown
- 1999-07-22 AT AT99932944T patent/ATE250114T1/de active
- 1999-07-22 KR KR1020017000972A patent/KR100574329B1/ko not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
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ATE250114T1 (de) | 2003-10-15 |
PT1102825E (pt) | 2004-02-27 |
FR2781495A1 (fr) | 2000-01-28 |
BR9912384A (pt) | 2001-04-24 |
ES2207251T3 (es) | 2004-05-16 |
JP4546645B2 (ja) | 2010-09-15 |
JP2002521522A (ja) | 2002-07-16 |
KR20010074744A (ko) | 2001-08-09 |
DE69911431T2 (de) | 2004-07-01 |
FR2781495B3 (fr) | 2000-09-01 |
EP1102825B1 (fr) | 2003-09-17 |
EP1102825A1 (fr) | 2001-05-30 |
US6451432B1 (en) | 2002-09-17 |
DE69911431D1 (de) | 2003-10-23 |
WO2000005321A1 (fr) | 2000-02-03 |
BR9912384B1 (pt) | 2010-07-13 |
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