KR100395754B1 - 반도체패키지의 단수화 방법 - Google Patents
반도체패키지의 단수화 방법 Download PDFInfo
- Publication number
- KR100395754B1 KR100395754B1 KR10-2001-0009201A KR20010009201A KR100395754B1 KR 100395754 B1 KR100395754 B1 KR 100395754B1 KR 20010009201 A KR20010009201 A KR 20010009201A KR 100395754 B1 KR100395754 B1 KR 100395754B1
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor package
- cutting
- laser beam
- station
- singularization
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 82
- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000005520 cutting process Methods 0.000 claims abstract description 46
- 238000001035 drying Methods 0.000 claims abstract description 15
- 238000005406 washing Methods 0.000 claims abstract description 14
- 239000010802 sludge Substances 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000004904 shortening Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
- H01L21/4842—Mechanical treatment, e.g. punching, cutting, deforming, cold welding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
Description
Claims (2)
- 반도체패키지의 단수화방법에 있어서, 상기 방법은 반도체패키기(12)를 배큠 스테이션(10)상에 안착시키는 반도체패키지 안착단계(100)와; 배큠 스테이션(10)상에 안착된 반도체패키지(12)를 다이싱 휠(14)을 사용하여 상면에서 소정두께 만큼 절단하는 예비절단단계(110)와; 예비절단시 발생되는 절단슬러지를 제거하기 위하여 예비절단된 반도체패키지(12)를 세척하고, 건조하는 세척 및 건조단계(120)와; 세척건조된 반도체패키지(12)의 절단되지 않은 잔여두께를 레이저빔(15)을 사용하여 절단하는 레이저빔 절단단계(130)로 구성되는 것을 특징으로 하는 반도체패키지의 단수화방법.
- 제 1항에 있어서, 상기 예비절단단계(110)는 반도체패키지(12)를 이송이 가능한 잔여두께를 남기고 다이싱 휠(14)로 절단하며; 상기 레이저빔 절단단계(130)는 상기 예비절단단계(110)에서 남겨진 잔여두께를 레이저빔으로 절단하는 것을 특징으로 하는 반도체패키지의 단수화방법.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0009201A KR100395754B1 (ko) | 2001-02-23 | 2001-02-23 | 반도체패키지의 단수화 방법 |
TW091117868A TW554435B (en) | 2001-02-23 | 2002-08-08 | Method for singulation of semiconductor package |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0009201A KR100395754B1 (ko) | 2001-02-23 | 2001-02-23 | 반도체패키지의 단수화 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020068848A KR20020068848A (ko) | 2002-08-28 |
KR100395754B1 true KR100395754B1 (ko) | 2003-08-27 |
Family
ID=27695309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-0009201A KR100395754B1 (ko) | 2001-02-23 | 2001-02-23 | 반도체패키지의 단수화 방법 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR100395754B1 (ko) |
TW (1) | TW554435B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2942807A1 (en) | 2014-05-07 | 2015-11-11 | Sensirion AG | Semiconductor package |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100686810B1 (ko) * | 2001-04-27 | 2007-02-23 | 앰코 테크놀로지 코리아 주식회사 | 웨이퍼 소잉 방법 |
KR100780965B1 (ko) * | 2006-11-21 | 2007-12-03 | 삼성전자주식회사 | 반도체 장치의 플라즈마 세정장치 및 방법 |
CN109920752A (zh) * | 2019-02-28 | 2019-06-21 | 厦门信达光电物联科技研究院有限公司 | 一种切割工艺 |
-
2001
- 2001-02-23 KR KR10-2001-0009201A patent/KR100395754B1/ko not_active IP Right Cessation
-
2002
- 2002-08-08 TW TW091117868A patent/TW554435B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2942807A1 (en) | 2014-05-07 | 2015-11-11 | Sensirion AG | Semiconductor package |
Also Published As
Publication number | Publication date |
---|---|
KR20020068848A (ko) | 2002-08-28 |
TW554435B (en) | 2003-09-21 |
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