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KR100391345B1 - 노광방법및스테퍼 - Google Patents

노광방법및스테퍼 Download PDF

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Publication number
KR100391345B1
KR100391345B1 KR1019950029744A KR19950029744A KR100391345B1 KR 100391345 B1 KR100391345 B1 KR 100391345B1 KR 1019950029744 A KR1019950029744 A KR 1019950029744A KR 19950029744 A KR19950029744 A KR 19950029744A KR 100391345 B1 KR100391345 B1 KR 100391345B1
Authority
KR
South Korea
Prior art keywords
mark
substrate
optical system
projection optical
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019950029744A
Other languages
English (en)
Korean (ko)
Other versions
KR960012294A (ko
Inventor
오꾸부라마사히꼬
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR960012294A publication Critical patent/KR960012294A/ko
Application granted granted Critical
Publication of KR100391345B1 publication Critical patent/KR100391345B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019950029744A 1994-09-14 1995-09-13 노광방법및스테퍼 Expired - Fee Related KR100391345B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1994-219884 1994-09-14
JP21988494A JP3531227B2 (ja) 1994-09-14 1994-09-14 露光方法および露光装置

Publications (2)

Publication Number Publication Date
KR960012294A KR960012294A (ko) 1996-04-20
KR100391345B1 true KR100391345B1 (ko) 2003-10-17

Family

ID=16742568

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950029744A Expired - Fee Related KR100391345B1 (ko) 1994-09-14 1995-09-13 노광방법및스테퍼

Country Status (2)

Country Link
JP (1) JP3531227B2 (ja)
KR (1) KR100391345B1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100499188B1 (ko) * 1996-09-19 2005-11-11 가부시키가이샤 니콘 투영노광방법및투영노광장치
KR101306431B1 (ko) * 2008-07-04 2013-09-09 캐논 가부시끼가이샤 결상광학계, 노광장치, 및 디바이스의 제조방법

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
KR100535781B1 (ko) * 1996-11-14 2006-02-28 가부시키가이샤 니콘 투영노광장치및투영노광방법
NL2005092A (en) * 2009-07-16 2011-01-18 Asml Netherlands Bv Object alignment measurement method and apparatus.
JP6226525B2 (ja) * 2013-01-15 2017-11-08 キヤノン株式会社 露光装置、露光方法、それらを用いたデバイスの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191420A (ja) * 1988-01-27 1989-08-01 Canon Inc 半導体焼付装置
JPH0547625A (ja) * 1991-08-09 1993-02-26 Nikon Corp 投影露光装置
JPH0627252A (ja) * 1992-07-07 1994-02-04 Tokyo Electron Yamanashi Kk 被処理体の位置合わせ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191420A (ja) * 1988-01-27 1989-08-01 Canon Inc 半導体焼付装置
JPH0547625A (ja) * 1991-08-09 1993-02-26 Nikon Corp 投影露光装置
JPH0627252A (ja) * 1992-07-07 1994-02-04 Tokyo Electron Yamanashi Kk 被処理体の位置合わせ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100499188B1 (ko) * 1996-09-19 2005-11-11 가부시키가이샤 니콘 투영노광방법및투영노광장치
KR101306431B1 (ko) * 2008-07-04 2013-09-09 캐논 가부시끼가이샤 결상광학계, 노광장치, 및 디바이스의 제조방법

Also Published As

Publication number Publication date
JPH0883758A (ja) 1996-03-26
JP3531227B2 (ja) 2004-05-24
KR960012294A (ko) 1996-04-20

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