KR100200359B1 - Method for repairing pixel defect of lcd device - Google Patents

Abstract

The present invention relates to a repair method of a liquid crystal display device, and more particularly, to a method for repairing a pixel defect of a liquid crystal display device. In the present invention, when a pixel defect occurs, the pixel defect is repaired by connecting a pixel electrode of the pixel region where the pixel defect occurs with a gate line or a data line to always apply a scan signal or an image signal. In this case, the pixel electrode is connected to the gate line or the data line by using an auxiliary gate line formed to overlap the pixel electrode.

Description

How to repair pixel defects in liquid crystal displays

1 is a plan view showing a conventional liquid crystal display device centering on a wiring;

2 is an equivalent circuit diagram showing a pixel portion of a conventional liquid crystal display device,

3 is a layout view of a thin film transistor substrate for a conventional liquid crystal display device,

4 is a cross-sectional view taken along the line A-A of FIG.

5 is a layout view of a thin film transistor substrate for a liquid crystal display according to a first embodiment of the present invention,

6 to 8 are layout views showing a repair method of a thin film transistor substrate for a liquid crystal display according to a first embodiment of the present invention.

9 is a layout view of a thin film transistor substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.

FIG. 10 is a layout view illustrating a repairing method of a thin film transistor substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.

FIG. 11 is a layout view of a thin film transistor substrate for a liquid crystal display according to a third exemplary embodiment of the present invention.

12 and 13 are layout views illustrating a method of repairing a thin film transistor substrate for a liquid crystal display according to a third exemplary embodiment of the present invention.

14 is a layout view of a thin film transistor substrate for a liquid crystal display according to a fourth exemplary embodiment of the present invention.

FIG. 15 is a layout view illustrating a repairing method of a thin film transistor substrate for a liquid crystal display according to a fourth exemplary embodiment of the present invention.

* Explanation of symbols for main parts of the drawings

1, 1a, 1b: auxiliary gate line 2: gate electrode

3: gate oxide film 4: gate insulating layer

5 semiconductor layer 6 contact layer

7 source electrode 8 drain electrode

9: protective film 10: pixel electrode

51, 52, 53, 54: connection

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pixel defect repair method of a matrix type display device. More particularly, a defect occurs in a pixel of a liquid crystal display device which is a type of matrix display device. If it is how to repair it.

As a display device for human and computer media, liquid crystal display (LCD), plasma display panel (PDP), instead of the conventional cathode ray tube (CRT), There are various flat panel displays (FPD) such as EL (electroluminescence) and FED (field emission display). Such flat panel displays employ a matrix wiring structure that is formed to be orthogonal to each other horizontally and vertically. This will be described in detail with reference to the drawings.

1 is a plan view showing the structure of a matrix display device.

As shown in FIG. 1, in a general matrix type display device, a plurality of scan signal lines G ₁ , G ₂ ,..., G _m are formed in parallel to each other and intersect with the insulating layer. A plurality of display signal lines D ₁ , D ₂ , D ₃ , D ₄ ,..., D _2n-1 , D _2n are formed vertically.

At one end of each display signal line (D ₁ , D ₂ , D ₃ , D ₄ , ……, D _2n-1 , D _2n ) and scan signal lines (G ₁ , G ₂ , ……, G _m ) Input pads DP ₁ , DP ₂ , DP ₃ , DP ₄ ,..., DP _2n-1 , DP _2n ; GP ₁ , GP ₂ ,..., GP _m . D ₁ , D ₂ , D ₃ , D ₄ ,..., D _2n-1 , D _2n ) have an input pad formed on the top (D ₁ , D ₃ , ……, D _2n-1 ,) There are (D ₂ , D ₄ ,..., D _2n ) formed at the bottom.

On the other hand, in the space where the scan signal lines G ₁ , G ₂ ,..., G _m and the display signal lines D ₁ , D ₂ , D ₃ , D ₄ ,..., D _2n-1 , D _2n meet each other, a pixel is formed. (PX) is formed and arranged in the form of a matrix, the structure of this pixel may vary depending on the type of display device.

The liquid crystal display is one of the most popular flat panel displays in recent years, and is a display device using an electro-optical effect of a liquid crystal material, and its driving method is largely a simple matrix type and an active matrix. It is divided into active matrix types.

In an active matrix liquid crystal display, an operation of each pixel is controlled by adding a switching element having a nonlinear characteristic to each pixel arranged in a matrix form. That is, a three-terminal thin film transistor (TFT) is generally used as the switching element, and a thin film diode (TFD) such as a two-terminal metal insulator metal (MIM) is also used.

In particular, a liquid crystal display device using a thin film transistor as a switching element includes a scan signal line or a gate line and a display signal or an image signal for supplying a scan signal or a switching signal to the thin film transistor and the pixel electrode. A thin film transistor substrate on which display signal lines or data lines to be supplied are formed, an opposing substrate on which a common electrode is formed, and a liquid crystal material enclosed therebetween.

Next, the structure of the pixel of the thin film transistor liquid crystal display will be described with reference to FIG. 2.

2 is a diagram illustrating a structure and an equivalent circuit of a pixel of a liquid crystal display, wherein each pixel PX includes a thin film transistor TFT formed on a lower substrate (a thin film transistor substrate) and a pixel electrode of a lower substrate. And a liquid crystal capacitor C _lc composed of a common electrode CE of the upper substrate, which is the opposite substrate, and a liquid crystal material therebetween, and a storage capacitor C _st formed on the lower substrate. Doing. Here, the storage capacitor C _st serves to hold the signal applied to the pixel PX for a predetermined time. On the other hand, the pixel PX is connected to the data line and the gate line through the thin film transistor TFT. For example, one terminal of the thin film transistor TFT is connected to the data line, the other terminal is connected to the gate line, and the last one is connected to the pixel electrode 10. However, in FIG. 2, the thin film transistor for switching the corresponding pixel PX has a structure existing outside the pixel. That is, one terminal of the thin film transistor TFT shown in FIG. 2 is a neighboring pixel. It is connected to the pixel electrode of the driving the adjacent pixels. However, there are many cases where a thin film transistor for driving a pixel is formed in the pixel.

In the liquid crystal display, when a pixel is driven and a display operation is performed, a predetermined voltage or a periodic voltage is applied to the common electrode CE, and a voltage is applied to the pixel electrode 10 through the thin film transistor TFT. The display operation is performed by the electro-optic effect of the liquid crystal material of the capacitor C _ls .

Next, in the liquid crystal display having the structures illustrated in FIGS. 1 and 2, the planar layout and the vertical structure of the thin film transistor substrate corresponding to the lower substrate will be described with reference to FIGS. 3 and 4.

FIG. 3 is a plan view illustrating a layout of the thin film transistor substrate corresponding to the lower substrate in FIG. 2, and the gate line structure is a closed curve surrounding the pixel electrode. FIG. 4 is along the AA line of FIG. 3. It is a cut section. Here, PXi (i = 1, 2, 3, 4), which represents a rectangular region, corresponds to a lower portion of one pixel, but is referred to as a “pixel” or “pixel region” for convenience unless there is a risk of confusion. The set of pixels formed on the horizontal line is referred to as the "pixel row", and the set of pixels formed on the vertical line is called the "pixel row".

As shown in FIGS. 3 and 4, upper and lower gate lines G _up and G _down are formed on both sides of the pixel row on the transparent insulating substrate 100. The lower gate line (G _down) may beoteo soon properly horizontally, directed down from the upper gate line (G _up) has a first horizontal portion (G _h1), the first lateral portion (G _h1), which account for most of the length The second vertical portion G _v1 rising upward from the first vertical portion G _v1 , the second horizontal portion G _h1 , and the second horizontal portion G _h2 , which progress horizontally again from the first vertical portion G _v1 . ) As one repeating unit. The double gate line structure is generally referred to as a double gate line structure.

The first horizontal portion G _h1 of the upper gate line G _up and the lower gate line G _down are connected to the left auxiliary gate line 1a, and the second vertical portion G of the upper gate line G _up ( G _v2 ) extends downward to form a right auxiliary gate line 1b that meets the lower gate line G _down .

The data line D is vertically formed between the pixel columns, and the first horizontal portion G _h1 and the lower gate line of the upper gate line G _up are formed through the gate insulating layer (4 in FIG. 4). Intersect with (G _down ).

The upper and lower gate lines G _up and G _down and the pair of auxiliary gate lines 1a and 1b formed to the left and to the right form a closed curve to serve as a black matrix, which is defined as the closed curve. In the closed region, the gate lines G _up and G _down and the auxiliary gate lines 1a and 1b are interposed between the gate insulating layer (described in FIG. 4) and the passivation layer (reference numeral 9 in FIG. 4) to be described later. The pixel electrode 10 is formed so as to overlap with, and the overlapped portion serves as a storage capacitor (C _st in FIG. 2). This holding capacitor is also called a “ring capacitor” because it consists of a closed curve. The upper and lower gate lines (G _up , G _down ) and the pair of auxiliary gate lines (1a, 1b) that make up the ring capacitor It is also called a ring capacitor because it is weak. Here, the ring capacitor is used in the latter sense.

As described above, when the gate lines G _up and G _down and the auxiliary gate lines 1a and 1b have the structure enclosing the pixel electrode 10 in the form of a closed curve, the gate lines G _up and G _down and the auxiliary gate lines are taken. It is advantageous to adopt such a structure because no signal is cut off if any part of (1a, 1b) is disconnected.

Meanwhile, a thin film transistor is formed in the second vertical portion G _v2 of the upper gate line G _up , which will be described in more detail with reference to FIGS. 3 and 4.

First, part of the second vertical portion G _v2 becomes a gate electrode 2 in the thin film transistor. When the material forming the gate lines G _up and G _down is an anodizable material such as aluminum, except for a gate pad (not shown) that electrically connects the gate lines G _up and G _down to the outside. The remainder is usually anodized. Thus, the anodized gate oxide film 3 also exists on the yarn gate electrode 2.

A gate insulating layer 4 is formed on the entire surface of the gate oxide film 3 except for the gate pad.

The semiconductor layer 5 is formed to cover the gate electrode 2 with the gate insulating layer 4 interposed therebetween. A semiconductor layer 5, in addition to covering the gate electrodes 2 are formed also on the gate lines (G _up, G _down) and serves to prevent short-circuiting of the gate line (G _up, G _down) and the data line (D). The material constituting the semiconductor layer 5 is generally amorphous silicon or polycrystalline silicon.

A contact layer 6 is formed on the semiconductor layer 5 for good ohmic contact between the semiconductor and the metal, which is mainly made of highly doped n ⁺ amorphous silicon. consist of. In FIG. 3, the pattern of the contact layer 6 becomes a portion where the semiconductor layer 5 and the source electrode 7 and the drain electrode 8 overlap each other.

On the contact layer 6, the source electrode 7 which is the branch of the data line D, and the drain electrode 8 separated from this are formed. Since the source electrode 7 is located near the intersection of the upper gate line G _up and the data line D, the source electrode 7 overlaps the first horizontal portion G _v2 of the upper gate line G _up as shown in FIG. 3. There may be. One end of the drain electrode 8 faces the source electrode 7 with the gate electrode 2 interposed therebetween, and the other end is connected to the pixel electrode 10 of the upper pixel of the same pixel column and has a lower gate line. Overlaid with (G _down ). For example, in FIG. 3, the drain electrode 8 of the pixel PX2 is connected to the pixel electrode 10 of the pixel PX1, which is the upper pixel of the same pixel column, and the pixel electrode 10 of the pixel PX1. It overlaps with the lower gate line G _down positioned below.

A passivation layer 9 is covered on the entire surface of the drain electrode 8 and the contact electrode 10 except for a contact portion and a pad (not shown), and a transparent conductive material such as indium tin oxide (ITO) on the passivation layer 9. The pixel electrode 10 is formed.

As described above, a thin film transistor substrate for a flat panel display device, particularly a liquid crystal display device, has wirings such as gate lines and data lines for supplying signals to the pixels. However, it is easy to break or short-circuit in the manufacturing process such as the subsequent heat treatment process and etching process. If the wiring is broken, a signal necessary for the pixel cannot be applied properly, and thus, the display device cannot function properly.

On the other hand, the third help of disconnection of the gate line _{(G up, G down, 1a} , 1b) for the liquid crystal display device having a structure, a gate line _{(G up, G down, 1a} , 1b) is, but can be easily cured, In the case where the data line D is disconnected, the image signal cannot be transmitted to the pixels below the disconnected point, and when a defect occurs in the pixel such as the image signal cannot be transmitted to the pixel electrode due to a defect in the thin film transistor, etc. There is a problem that is impossible.

SUMMARY OF THE INVENTION The present invention has been made to solve this problem, and the problem is to repair pixel defects without increasing the number of processes or reducing the aperture ratio.

In order to solve this problem, the present invention is to heal pixel defects using an auxiliary signal line or the like in the state in which the structure of FIG. 3 is modified based on the prior art of FIG.

The pixel defect repair method of the liquid crystal display according to the present invention is as follows.

First, the structure of the liquid crystal display device to be repaired is as follows. The upper and lower gate lines to which the scan signal is supplied form upper and lower boundaries of each pixel area, and the auxiliary gate lines form a left and right boundary of each pixel area, and a data line to which an image signal is supplied is upper between each pixel area. And insulate and cross the lower gate line. A pixel electrode made of a transparent conductive material is formed in the pixel area, and a transistor having a gate connected to the upper gate line and a source connected to the data line and a drain connected to the pixel electrode is formed. When a pixel defect occurs in the liquid crystal display, the pixel electrode of the pixel region where the pixel defect occurs is connected to a gate line or a data line through an auxiliary gate line so that a scan signal or an image signal is always supplied to the pixel electrode.

The auxiliary gate line may be connected to the gate line and may overlap the pixel electrode through an insulating material. In this case, the pixel electrode and the gate line may be connected by shorting an overlapping point between the auxiliary gate line and the pixel electrode. .

Alternatively, the auxiliary gate line may overlap the pixel electrode and the data line with an insulating material, respectively. In this case, the pixel electrode and the gate line may be shorted by overlapping the overlapping point of the auxiliary gate line and the pixel electrode and the overlapping point of the auxiliary gate line and the data line. Connect. The liquid crystal display may further include a connector formed between the auxiliary gate line and the pixel electrode at the overlapping point between the auxiliary gate line and the pixel electrode, and formed of the same material as the data line through an insulator. The connection of the electrodes is made through the connecting body. In this case, the auxiliary gate line may be connected to the gate line, and in this case, the auxiliary gate line should be separated from the gate line.

In addition, the liquid crystal display device further includes connecting means each overlapping the auxiliary gate line and the pixel electrode through an insulator and made of the same material as the data line, and the auxiliary gate line overlaps the data line and the insulating material. In this case, the overlapping point of the auxiliary gate line and the connecting means, the overlapping point of the connecting means and the pixel electrode, and the overlapping point of the auxiliary gate line and the data line are shorted to connect the pixel electrode and the gate line. In this case, the auxiliary gate line may be connected to the gate line, and in this case, the auxiliary gate line is separated from the gate line.

In various cases, the auxiliary gate line may be made of aluminum, and the pixel electrode may be made of ITO.

As such, when a pixel defect occurs, a signal is always applied to the pixel electrode by connecting the pixel electrode of the pixel region in which the pixel defect occurs to the gate line or the data line, thereby preventing the defective pixel from appearing bright.

Hereinafter, embodiments of the liquid crystal display according to the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention.

First, the wiring structure of the liquid crystal display device applied to the first embodiment of the present invention will be described.

5 is a layout view illustrating a pixel structure of a substrate for a matrix type liquid crystal display device according to a first exemplary embodiment of the present invention.

As shown in FIG. 5, in the matrix liquid crystal display substrate according to the first embodiment of the present invention, the left auxiliary gate line 1a is separated from the upper gate line G _up , and the upper end thereof is The connection part 51 bent to the left is formed to overlap the data line D of the left pixel, and the lower end thereof is bent to the left to be connected to the lower gate line G _down to overlap the data line D. have. The pixel electrode 10 overlaps with the left auxiliary gate line 1a but slightly enters inward from the lower end portion thereof and does not overlap. Here, the data line D and the connection portion 51 sandwich the gate oxide film 3 and the gate insulating layer 4 of FIG. The other parts are similar to the structures of FIGS. 3 and 4.

Next, a method of repairing pixel defects in the liquid crystal display of the present embodiment will be described.

6 to 8 are diagrams showing a repair method when a pixel defect occurs in the liquid crystal display substrate according to the present embodiment.

6 is a diagram showing a so-called off-type repair method as the simplest repair method. In this method, the pixel electrode 10 of the pixel PX3 in which the pixel defect occurs and the left auxiliary gate line 1a overlapping the same are short-circuited with a laser so that a scan signal is applied to the pixel electrode 10. will be.

In this case, while the repair method is simple, aluminum and ITO tend to cause chemical reactions because the pixel electrode 10 made of ITO and the left auxiliary gate line 1a made of aluminum come into contact with each other. In addition, since a high voltage gate voltage is applied to the pixel electrode, there is a problem that the liquid crystal molecules deteriorate and the pixel defect is likely to recur after repair.

FIG. 7 is a diagram showing a so-called D-type repairing method, wherein the drain electrode 8, the gate electrode 2, the gate electrode 2, and the source electrode 7 of the thin film transistor connected to the pixel PX1 having a pixel defect occur. ) Are shorted (a, b), respectively, and the upper gate line G _up connecting the gate electrode 2 to both sides is cut (c, d). The image signal from the data line D is then transferred directly to the pixel electrode 10.

In this method, since the image signal is applied to the pixel electrode, the liquid crystal molecules are less likely to deteriorate than the off type. However, since the gate lines around the thin film transistors need to be cut off, the wiring fragments generated during cutting are adjacent to the pixel electrode. This may cause a pixel electrode to bounce off. In addition, repair of the thin film transistor itself is impossible.

FIG. 8 is a view showing another repairing method according to the present embodiment, wherein the connecting portion 51 of the left auxiliary gate line 1a and the data line D and the left auxiliary gate of the pixel PX3 in which the pixel defect has occurred are shown in FIG. Shorting the lines 1a and the pixel electrode 10, respectively, and then shorting the lower gate line G _down to the left and right of the connection point between the left auxiliary gate line 1a and the lower gate line G _down , respectively. The left auxiliary gate line 1a is separated from the lower gate line G _down by cutting d and e. If necessary, the left auxiliary gate line 1a and the data line D may be shorted (c). Then, an image signal is applied to the pixel electrode 10 through the left auxiliary gate line 1a.

In this case, since an image signal is applied to the pixel electrode 10, pixel defects do not recur and repair is easy.

Next, a wiring structure applied to the second embodiment of the present invention will be described.

9 is a layout view illustrating a pixel structure of a substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.

As shown in FIG. 9, in the matrix type liquid crystal dental substrate according to the second embodiment of the present invention, the right auxiliary gate line 1b is separated from the upper gate line G _up , and the upper end is right. The connection part 51 bent toward the side is formed so as to overlap the data line D. FIG. Here, the data line D and the connection portion 51 sandwich the gate oxide film 3 and the gate insulating layer 4 of FIG. The other parts are similar to the structures of FIGS. 3 and 4.

FIG. 10 is a view showing a repairing method of the liquid crystal display device according to the present embodiment, wherein the connection part 51 of the right auxiliary gate line 1b of the pixel PX1 having the pixel defect, the data line D, and the right auxiliary support are shown in FIG. After the gate line 1b and the pixel electrode 10 are shorted (a, b), respectively, the lower gate line G _down to the left and right of the connection point between the right auxiliary gate line 1b and the lower gate line G _{down is} connected. The right auxiliary gate line 1b is separated from the lower gate line G _down by cutting d and e, respectively. Then, an image signal is applied to the pixel electrode 10 through the right auxiliary gate line 1b.

In this case, since an image signal is applied to the pixel electrode 10, pixel defects do not recur and repair is easy.

Next, a wiring structure to which the present invention is applied to the third embodiment will be described.

FIG. 11 is a layout view illustrating a pixel structure of a substrate for a liquid crystal display according to a third exemplary embodiment of the present invention.

As shown in FIG. 11, the matrix liquid crystal display substrate according to the third embodiment of the present invention is similar to the structure of the substrate in the first embodiment shown in FIG. The difference between the first connection portion 52 or 53 for shorting is formed between the first electrode and the pixel electrode 10 by the same material as that of the data line D. FIG. In cross section, there is a gate insulating layer (reference numeral 4 in FIG. 4) between the left auxiliary gate line 1a and the second connection portion 52, and between the second connection portion 52 and the pixel electrode 10. A protective film (9 in FIG. 4) is interposed therebetween. In this case, the position of the second connector 52 or 53 may be changed. In the case of reference numeral 52, the left auxiliary gate line 1a, the second connector 52, and the pixel electrode 10 are vertically formed. The overlapping points of the elements coincide with each other, and in the case of reference numeral 53, the overlapping point of the left auxiliary gate line 1a and the second connector 53 is different from the overlapping point of the second connector 53 and the pixel electrode 10. If it is.

In the liquid crystal display device as in the present embodiment, the pixel defect repair method is essentially the same as that in FIG. It should be noted, however, that when the left auxiliary gate line 1a of the defective pixel PX3 and the pixel electrode are short-circuited, they are short-circuited at the point where the second connection portion 52 is formed.

That is, as shown in FIG. 12, when the left auxiliary gate line 1a, the second connection portion 52, and the overlapping point b of the pixel electrode 10 coincide with each other, the left auxiliary gate is provided through one laser irradiation. The gate line 1a and the pixel electrode 10 are short-circuited b via the second connection portion 52. On the other hand, as shown in FIG. 13, the overlapping point f of the left auxiliary gate line 1a and the second connector 53 is different from the overlapping point g of the second connector 53 and the pixel electrode 10. In this case, each of the overlapping points f and g is irradiated with a laser to short-circuit the left auxiliary gate line 1a and the second connection part 53, and the second connection part 53 and the pixel electrode 10, respectively. , g).

In this case, since the left auxiliary gate line 1a and the pixel electrode 10 are not in direct contact with each other but through the second connection portion 52 in the middle, no chemical reaction occurs due to the contact between aluminum and ITO. Compared to the case of FIG. 10, there is an advantage that the repair is complete.

Finally, the wiring structure applied to the fourth embodiment of the present invention will be described.

FIG. 14 is a layout view illustrating a pixel structure of a substrate for a liquid crystal display according to a fourth exemplary embodiment of the present invention.

As shown in FIG. 14, the matrix liquid crystal display substrate according to the fourth embodiment of the present invention is similar to the structure of the substrate in the first embodiment shown in FIG. One end of the left auxiliary gate line 1a separated from the lower gate line G _down as well as the upper gate line G _up of (1a) is separated from the lower gate line G _down . The difference is that it has a second connecting portion 53 which overlaps with D). The rest of the structure is the same as shown in FIG.

Next, a method of repairing pixel defects in the liquid crystal display of the present embodiment will be described.

FIG. 15 is a diagram illustrating a repair method when a pixel defect occurs in the liquid crystal display substrate according to the present embodiment.

The repair method according to the present embodiment is also fundamentally similar to the repair method in FIG. That is, as shown in FIG. 15, the left auxiliary gate 1a and the pixel electrode 10 which are short-circuited by the first connection part 51 and the data line D and are connected to the first connection part 51 again. Short circuit. However, unlike in FIG. 8, since the left auxiliary gate line 1a is separated from the upper and lower gate lines G _up and G _down , it does not need to be separately cut.

Here, as shown in FIG. 11, the pattern may be left between the left auxiliary gate line 1a and the pixel electrode 10 with the same material as the data line d. This avoids contact between aluminum and ITO, resulting in a more complete repair.

As described above, in the present embodiment, the pixel defects can be repaired efficiently and the recurrence of the pixel defects can be prevented without increasing the number of steps or decreasing the aperture ratio.

Claims (12)

Upper and lower gate lines forming upper and lower boundaries of each pixel region and receiving scan signals, auxiliary gate lines forming a left and right boundary of each pixel region, and formed between the pixel regions and insulated from the upper and lower gate lines. A data line intersecting and supplied with an image signal, a pixel electrode formed in the pixel area and made of a transparent conductive material, a gate connected to the upper gate line, a source connected to the data line, and a pixel electrode connected to the pixel electrode. A method for repairing a pixel defect of a liquid crystal display including a transistor having a drain, the method comprising: connecting the pixel electrode of a pixel region in which a pixel defect occurs with the gate line through the auxiliary gate line so that the scan signal is always supplied to the pixel electrode Pixel texture of liquid crystal display How to repair. 2. The pixel electrode and the gate line of claim 1, wherein the auxiliary gate line is connected to the gate line and overlaps the pixel electrode through an insulating material to short-circuit an overlapping point between the auxiliary gate line and the pixel electrode. How to connect pixel fault repair. Upper and lower gate lines forming upper and lower boundaries of each pixel area, respectively, and auxiliary gate lines forming a left and right boundary of each pixel area, and are insulated from and intersected with the upper and lower gate lines. And a data line to which an image signal is supplied, a pixel electrode formed in the pixel area, and made of a transparent conductive material, a gate connected to the upper gate line, a source connected to the data line, and a drain connected to the pixel electrode. A method for repairing a pixel defect of a liquid crystal display including a transistor comprising: a liquid crystal for connecting the pixel electrode of a pixel region where a pixel defect occurs to the data line through the auxiliary gate line so that the image signal is always supplied to the pixel electrode Pixel texture of the display device How to repair. 4. The display device of claim 3, wherein the auxiliary gate line overlaps the pixel electrode and the data line through an insulating material, respectively, and the overlapping point of the auxiliary gate line and the pixel electrode and the overlapping point of the auxiliary gate line and the data line are shorted to each other. A pixel defect repair method for connecting a pixel electrode and the gate line. The method of claim 4, wherein the auxiliary gate line is connected to the gate line, and the auxiliary gate line is separated from the gate line. The method of claim 4 or 5, wherein the auxiliary gate line is made of aluminum. The method of claim 6, wherein the pixel electrode is made of ITO. 8. The liquid crystal display of claim 7, wherein the liquid crystal display further comprises a connection body formed of the same material as the data line via an insulator between the auxiliary gate line and the pixel electrode at an overlapping point between the auxiliary gate line and the pixel electrode. And the auxiliary gate line is connected to the pixel electrode through the connector. 4. The liquid crystal display of claim 3, wherein the liquid crystal display further comprises connecting means overlapping the auxiliary gate line through an insulator, overlapping the pixel electrode via an insulator, and made of the same material as the data line. A line overlaps the data line and the insulating material, and the pixel is formed by shorting an overlapping point of the auxiliary gate line and the connecting means, an overlapping point of the connecting means and the pixel electrode, and an overlapping point of the auxiliary gate line and the data line. A pixel defect repair method for connecting an electrode and the gate line. The pixel defect repair method of claim 9, wherein the auxiliary gate line is connected to the gate line, and the auxiliary gate line is separated from the gate line. The method of claim 9 or 10, wherein the auxiliary gate line is made of aluminum. The method of claim 11, wherein the pixel electrode is made of ITO.