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KR100194166B1 - 액체로부터 용존 가스를 제거하는 용존 가스 제거방법 - Google Patents

액체로부터 용존 가스를 제거하는 용존 가스 제거방법 Download PDF

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Publication number
KR100194166B1
KR100194166B1 KR1019980012516A KR19980012516A KR100194166B1 KR 100194166 B1 KR100194166 B1 KR 100194166B1 KR 1019980012516 A KR1019980012516 A KR 1019980012516A KR 19980012516 A KR19980012516 A KR 19980012516A KR 100194166 B1 KR100194166 B1 KR 100194166B1
Authority
KR
South Korea
Prior art keywords
dissolved gas
liquid
removal method
remove
gas removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019980012516A
Other languages
English (en)
Inventor
제이. 밴 슈라벤디크 바트
더블유. 버크하트 크리스토퍼
에이치. 산티아고 티토
이. 포머로이 챨스
더블유. 린드 제프리
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of KR100194166B1 publication Critical patent/KR100194166B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D99/00—Subject matter not provided for in other groups of this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
KR1019980012516A 1992-11-16 1998-04-09 액체로부터 용존 가스를 제거하는 용존 가스 제거방법 Expired - Lifetime KR100194166B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US97821692A 1992-11-16 1992-11-16

Publications (1)

Publication Number Publication Date
KR100194166B1 true KR100194166B1 (ko) 1999-06-15

Family

ID=25525865

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1019930024026A Ceased KR940011344A (ko) 1992-11-16 1993-11-12 액체로 부터 용해된 가스를 제거하기 위한 장치 및 그 제거방법
KR1019980012516A Expired - Lifetime KR100194166B1 (ko) 1992-11-16 1998-04-09 액체로부터 용존 가스를 제거하는 용존 가스 제거방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1019930024026A Ceased KR940011344A (ko) 1992-11-16 1993-11-12 액체로 부터 용해된 가스를 제거하기 위한 장치 및 그 제거방법

Country Status (4)

Country Link
US (3) US5425803A (ko)
EP (1) EP0598424A3 (ko)
JP (1) JPH06220640A (ko)
KR (2) KR940011344A (ko)

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JP3947398B2 (ja) * 2001-12-28 2007-07-18 株式会社コガネイ 薬液供給装置および薬液供給方法
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US7311761B2 (en) * 2003-12-11 2007-12-25 Seiko Epson Corporation Gas absorption device, method of manufacturing the same, and liquid container
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JP4526335B2 (ja) * 2004-09-07 2010-08-18 セイコーエプソン株式会社 液滴吐出装置
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Also Published As

Publication number Publication date
EP0598424A2 (en) 1994-05-25
JPH06220640A (ja) 1994-08-09
EP0598424A3 (en) 1996-05-15
US5772736A (en) 1998-06-30
US5645625A (en) 1997-07-08
KR940011344A (ko) 1994-06-21
US5425803A (en) 1995-06-20

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