KR0146188B1 - Lithography and alignment system of plate edge - Google Patents

Abstract

In the process of loading or unloading a plate coated with a photosensitive material for engraving a pattern from a cassette, a plurality of plates are mounted in a portion loading or unloading a plate from the cassette, so that the plate alignment position while being loaded or unloaded from the cassette. Plate peripheral portion exposure and alignment means for detecting and outputting an electrical signal corresponding thereto and exposing the periphery of the plate; Operation control means for determining an alignment position of the plate according to the signal output from the plate peripheral portion exposure and alignment means, and outputting a corresponding robot driving command accordingly; The plate periphery exposure and alignment system made up of the robot drive means for varying the operation state according to the robot drive command output from the motion control means to change the alignment position of the plate, double exposure during loading and unloading of the plate. By doing so, the cause of dust generation can be eliminated by exposing the periphery of the plate more efficiently. In addition, it takes no time for exposing the periphery of the plate other than the pattern exposure time of the LCD fixing, thereby preventing the decrease in productivity. In addition, by exposing the periphery of the plate using the main light source used for fixing the LCD without using a separate light source, it is possible to reduce the burden of the separate operating and maintenance costs.

Description

Plate Peripheral Exposure and Alignment System

1 is a simplified block diagram of a plate perimeter exposure and alignment system according to an embodiment of the invention,

2 is an overall configuration diagram of an exposure and alignment system of a plate periphery according to an embodiment of the present invention,

3 is a block diagram of a plate peripheral portion exposure optical portion according to an embodiment of the present invention,

4 is a configuration diagram of the plate periphery alignment sensor unit according to an embodiment of the present invention,

5 is a plan view of a plate peripheral exposure and alignment device according to an embodiment of the present invention,

6 is a cross-sectional view of a plate peripheral exposure and alignment device according to an embodiment of the present invention,

7 is a configuration of the main light source according to an embodiment of the present invention,

8 is an alignment position detection state diagram when the plate according to the embodiment of the present invention is correctly positioned,

9 is an alignment position detection state diagram when the plate is incorrectly positioned according to the embodiment of the present invention,

10 is a configuration diagram of a sensor interface unit according to an embodiment of the present invention,

11 is a state diagram showing an exposure area of a plate according to an embodiment of the present invention,

12 is a block diagram of a plate peripheral exposure and alignment system according to another embodiment of the present invention,

13 is a block diagram of a plate periphery exposure and alignment system according to another embodiment of the present invention.

* Explanation of symbols for main parts of the drawings

1: signal processing device 12: differential amplifier

13: A / D conversion part 2: Motion control device

3: Robot drive device 31: Robot control unit

32: robot 33: plate loading / unloading unit

4: Plate Peripheral Exposure and Alignment Device 41: Exposure Optics

411: optical fiber 412: condenser lens

413: reflection mirror 42: first alignment sensor

421: Receiver 422,425: Condenser lens

424: first reflection mirror 425: second reflection mirror

426: light emitting unit 44: sensor interface unit

441: current / voltage section 442: voltage amplification section

443: signal inversion unit 43: second alignment sensor unit

51: first cassette 52: second cassette

6: Plate stage 7: Plate

71: Plate peripheral part 8: Daylight source

The present invention relates to a plate periphery exposure and alignment system. More specifically, the exposure and alignment apparatus for exposing the periphery of the plate is configured as a module and mounted on a plate loader and an unloader. And a plate periphery exposure and alignment system for double exposing the plate periphery during loading and unloading of the plate.

In order to manufacture a liquid crystal display device (hereinafter referred to as LCD), an electric circuit formed on a plate (reticle hereinafter) on a flat glass (plate) is engraved using light. The exposure process is the most important process.

At this time, the plate is coated with a material (PR: Photo Resist) that is exposed to light of a specific wavelength, the electrical circuit engraved on the reticle by the exposure light source is imaged on the plate and already applied on the plate by the reticle pattern The photosensitive material is exposed to light.

The exposure apparatus for LCD includes a reticle stage for mounting a reticle having an electric circuit pattern engraved thereon and a plate stage for fixing a plate having an electric circuit pattern engraved therebetween, and a lens system for condensing an exposure light source is positioned between the two stages.

A blinder is mounted on the reticle stage to limit the exposure light source to the circuit pattern on the reticle so as to illuminate only the portion of the electrical circuit pattern on the reticle on the plate.

Due to their interaction, the circuit image of the reticle is exposed on the plate surface.In the assembly stage, the final stage of LCD manufacturing, the LCD peripheral IC must be mounted on the plate periphery. Inscribed in the center.

Therefore, no pattern is engraved on the photosensitive material at the plate periphery, so that the photosensitive material applied to the plate periphery remains unsensitized during the process.

These residual photosensitive materials remain unremoved even in an etching process or the like performed after the exposure process, causing dust generation, which is a very fatal factor in LCD fabrication requiring high cleanliness.

Therefore, an unexposed photosensitive material in the periphery of these plates must be subjected to a separate exposure process for exposing and removing.

In addition, a separate alignment device for this purpose must be used to accurately expose the residual photosensitive material in the peripheral portion without damaging the electrical circuit pattern in the center of the plate.

As described above, a separate exposure apparatus for removing the photosensitive material around the plate is divided into two types as follows.

Firstly, during pattern exposure fixing in which the plate is fixed to the plate stage and the pattern of the reticle is exposed on the plate, exposure to the plate periphery is performed.

Therefore, by using a separate alignment sensor mounted for accurate periphery exposure, the exact position of the plate fixed to the stage is measured, and the exposure of the periphery of the plate is performed using the main exposure light source of the exposure equipment while driving the stage accordingly. Done.

Secondly, by attaching an exposure device for exposing a plate peripheral portion having its own exposure light source separately from the main exposure apparatus, the plate peripheral portion is exclusively exposed separately from the pattern exposure process.

This method has the same configuration as operating two separate exposure apparatuses for exposing a single plate.

However, in the first plate peripheral exposure method described above, since the plate peripheral exposure is generated on the stage, the alignment time and the peripheral exposure time necessary for accurate plate peripheral exposure must be included in the total pattern exposure time.

Therefore, there is a disadvantage in that the total exposure process time is a cause of a long and productivity decrease occurs.

In addition, since the second plate peripheral exposure method is performed by a separate dedicated exposure apparatus instead of the main exposure apparatus, the plate alignment time and the exposure time required for the plate peripheral exposure are not included in the overall pattern exposure time, thereby reducing productivity. On the other hand, it has the advantage that does not occur, but because it requires the use of a separate dedicated exposure apparatus, there is a disadvantage in that the cost and additional space required to purchase and operate additional devices.

Therefore, an object of the present invention is to solve the above-mentioned drawbacks, comprising an exposure and alignment device for exposing the periphery of the plate as a module and mounted on the plate loader and unloader to load the plate and By performing the double exposure at the time of unloading, it does not take time to expose the separate plate periphery, thereby preventing productivity decrease and providing a plate periphery exposure and alignment system for realizing higher cleanness according to the double exposure. have.

In order to achieve the above object, in the process of loading or unloading a plate coated with a photosensitive material for engraving a pattern from a cassette, a plurality of plates are mounted on a portion that loads or unloads a plate from a cassette. Plate peripheral exposure and alignment means for detecting a plate alignment position while being loaded or unloaded from the cassette, outputting an electrical signal corresponding thereto, and exposing a peripheral portion of the plate; Operation control means for determining an alignment position of the plate according to the signal output from the plate peripheral portion exposure and alignment means, and outputting a corresponding robot driving command accordingly; The operation state is changed according to the robot driving command output from the operation control means, and the robot driving means is configured to change the alignment position of the plate.

According to another aspect of the present invention for achieving the above object, in the process of loading or unloading a plate coated with a photosensitive material for engraving a pattern from a cassette, a plurality of plates are mounted on a portion that loads or unloads from a cassette. Plate peripheral exposure and alignment means for detecting a plate alignment position while being loaded or unloaded from the cassette, outputting an electrical signal corresponding thereto, and exposing a periphery of the plate; Operation control means for determining an alignment position of the plate according to the signal output from the plate peripheral portion exposure and alignment means, and outputting a corresponding robot driving command accordingly; Robot driving means for varying an operation state according to a robot driving command outputted from the operation control means to change an alignment position of the plate; And a position adjusting means for sensing the size of the plate and varying the mounting position of the plate periphery exposure and alignment means mounted on the portion where the plate is loaded or unloaded according to the detected size of the plate.

By the above configuration, the most preferred embodiment that can be easily carried out by those skilled in the art with reference to the present invention will be described in detail with reference to the accompanying drawings.

1 is a simplified block diagram of a plate perimeter exposure and alignment system according to an embodiment of the invention,

2 is an overall configuration diagram of an exposure and alignment system of a plate periphery according to an embodiment of the present invention,

3 is a block diagram of a plate peripheral portion exposure optical portion according to an embodiment of the present invention,

4 is a configuration diagram of the plate periphery alignment sensor unit according to an embodiment of the present invention,

5 is a plan view of a plate peripheral exposure and alignment device according to an embodiment of the present invention,

6 is a cross-sectional view of a plate peripheral exposure and alignment device according to an embodiment of the present invention,

7 is a configuration of the main light source according to an embodiment of the present invention,

8 is an alignment position detection state diagram when the plate according to the embodiment of the present invention is correctly positioned,

9 is an alignment position detection state diagram when the plate is incorrectly positioned according to the embodiment of the present invention,

10 is a configuration diagram of a sensor interface unit according to an embodiment of the present invention,

11 is a state diagram showing an exposure area of a plate according to an embodiment of the present invention,

12 is a block diagram of a plate peripheral exposure and alignment system according to another embodiment of the present invention,

13 is a block diagram of a plate periphery exposure and alignment system according to another embodiment of the present invention.

As shown in FIG. 1 or FIG. 2, the configuration of the plate periphery exposure and alignment system according to the embodiment of the present invention includes a signal corresponding to the plate 7 and the alignment position of the plate 7. Outputs and processes the signal output connected to the plate peripheral exposure and alignment device 4 for exposing the periphery 71 of the plate 7 and the output end of the plate peripheral exposure and alignment device 4, The motion control device 2 determines the alignment position of the plate 7 according to the processed signal and outputs the corresponding robot drive command, and the robot is operated according to the robot drive command output from the motion control device 2. It consists of a robot drive device 3 which drives to vary the alignment position of the plate 7.

As shown in FIG. 2, the motion control apparatus 2 is connected to an output terminal of the plate exposure and alignment device 4 to differentially amplify the amplified signal and the inverted amplified signal applied to output a corresponding signal. A signal processor comprising a differential amplifier 151 and an A / D (Analog / Digital) converter 152 for converting a signal applied to the output terminal of the differential amplifier 151 into a digital signal and outputting the digital signal. 15) and an operation controller 13 which determines an alignment state of the plate 7 according to the signal output from the signal processor 15 and outputs a robot driving command corresponding thereto.

As shown in FIG. 2, the robot drive device 3 includes a robot control unit 31 for outputting a drive signal corresponding to the robot drive command output from the operation control device 2, and the robot control unit. The operation state is changed according to the drive signal output from the 31, and the plate 7 is pulled out from the first cassette 51 or the second cassette 52 on which the plate 7 is loaded. A robot that performs a loading operation for positioning on the plate stage or performs an unloading operation for placing the plate 7 located on the plate stage 6 back to the first cassette 51 or the second cassette 52. 32).

As shown in FIGS. 2 to 6, the plate periphery exposure and alignment device according to an embodiment of the present invention is an exposure for condensing and outputting light output from the main light source 8 used in the LCD manufacturing process. An optical unit 41 and a first alignment sensor unit 42 positioned at the front end of the exposure optical unit 41 to sense an alignment position of the plate 7 and outputting a corresponding first alignment signal; A second alignment sensor unit 43 positioned at a rear end of the optical unit 41 and sensing an alignment position of the plate 7 to output a corresponding second alignment signal; The sensor interface unit 44 is connected to the output terminals of the first alignment sensor unit 42 and the second alignment sensor unit 43.

The exposure optical unit 41 is connected to the main light source 8, the optical fiber 411 for transmitting the light, and the condensing lens unit 412 for condensing and outputting the light transmitted through the optical fiber 411 And a reflection mirror 413 reflecting the light collected through the condenser lens 412 and outputting the reflected light to the peripheral portion 71 of the plate 7.

The first alignment sensor unit 41 and the second alignment sensor unit 43 have the same structure, and include a light emitting unit 426 for outputting a predetermined amount of light according to a driving signal applied thereto, and the light emitting unit 426. The first reflection mirror 424 reflecting the light output from the lower side and the light emitting unit 426 and the first reflection mirror 424 and the plate 7 at a predetermined interval to pass through, The second reflecting mirror 423 reflecting the light output from the first reflecting mirror 424 again in a straight line, and the light emitting part 426, the first reflecting mirror 424, and the plate 7 pass through. A second reflection mirror 423 positioned at a lower side with a predetermined distance therebetween to reflect the light output from the first reflection mirror 424 back in a straight line; and the light emitting unit 426 and the first reflection mirror. 424 and the plate 7 is positioned at a lower side at a predetermined interval through which the second reflective mirror 423 is output. The light receiver 421 receives light and outputs a corresponding electrical signal (a first alignment signal or a second alignment signal).

Condensing lenses 422 and 425 for condensing and outputting light may be further installed between the light emitting unit 426 and the first reflection mirror 424 or between the second reflection mirror 423 and the light receiving unit 421. Can be.

The sensor interface unit 44 may include a current / voltage unit 441 and a current / voltage unit 441 for varying and outputting an input current signal into a corresponding voltage signal, as shown in FIG. 10. A voltage amplifying unit 442 for amplifying and outputting the output voltage signal, and a signal inverting unit 443 for inverting and outputting the amplified signal output from the voltage amplifying unit 442, wherein the first alignment sensor unit ( 42 and the signal output from the second alignment sensor unit 43 are respectively processed to output corresponding amplified signals and inverted amplified signals.

As described above, the plate periphery exposure and alignment device 4 according to the embodiment of the present invention is composed of an integrated module, and each of the alignment sensor units 42 at the front and rear ends with respect to one exposure optical unit 41. , 43) is mounted.

The first alignment sensor unit 42 mounted at the front end senses the alignment position of the plate 7 when the plate 7 is taken out of the cassettes 51 and 52, and the second alignment sensor unit mounted at the rear end. Reference numeral 43 is for detecting the alignment position of the plate 7 when the exposed plate 7 is put into the cassettes 51 and 52.

The plate periphery exposure and alignment device 4 made as described above is installed and operated at all six points of the plate loading / unloading part 33, as shown in FIG. Since each alignment sensor unit is included in each of the six, the six exposure optical units and the twelve alignment sensor units are mounted on the loading / unloading unit 33 to align the peripheral portions of the plate 7 and expose them.

As shown in FIG. 2, a portion in which the plate 7 is loaded or unloaded in the first cassette 51, a portion in which the plate 7 is loaded or unloaded in the plate stage 6, and a second cassette. In the portion 52 where the plate 7 is loaded or unloaded, the plate periphery exposure and alignment devices 4A to AF, respectively, at the corresponding left and right positions to allow exposure of the plate periphery 71 during loading and unloading. Is installed.

In addition, the optical fiber 411 of the exposure optical unit 41 transmits light in the unused area A of the main light source 8 that is generally used in the LCD manufacturing process, as shown in FIG. It is connected to the part corresponding to the unused area | region A of the main light source 8. As shown in FIG.

In other words, the light emitted from the main light source 8, which is the exposure light source, is limited to the area B which is opened / blocked by a shutter (not shown) due to the structure of the rectangular plate, and the actual pattern exposure of the area A indicated by hatching is limited. The unused area becomes unused.

In order to use the unused area A of the main light source 8 as a light source for exposing the periphery of the plate, optical fibers of six exposure optics mounted on the plate loading / unloading part 33 are installed in the unused area A. Thus, the plate peripheral portion is exposed using the light emitted from the main light source 8 without using a separate light source for the peripheral portion exposure.

Referring to the operation of the plate periphery exposure and alignment system according to an embodiment of the present invention by the above configuration is as follows.

The LCD exposure apparatus has a plate loader / unloader section like other exposure apparatuses. The plate loader / unloader part consists of a plate cassette on which a plate is loaded, and a loading / unloading robot for removing the plate to be exposed from the cassette and loading the plate on the plate stage, or loading and unloading the exposed plate from the plate stage onto the cassette. It is.

In the embodiment of the present invention, the plate periphery exposure and alignment are performed so that the exposure and alignment of the plate periphery performed to maintain the cleanliness in the exposure process of the plate, which is the core of the LCD panel manufacturing process, do not affect the overall pattern exposure time. An alignment device is mounted to the loader / unloader portion of the plate to expose the periphery of the plate.

When power is applied to drive the plate periphery exposure and alignment system, the motion control device 2 uses the robot drive device 3 to load the plates 7 loaded on the first and second cassettes 51, 52. Outputs the robot drive command.

The robot control unit 31 of the robot drive device 3 drives the robot 32 in accordance with an applied robot drive command to load the plates 7 loaded on the first and second cassettes 51 and 52.

As shown in the accompanying FIG. 2, for example, as the plate 7 loaded on the first cassette 51 is loaded, it passes through the plate peripheral exposure and alignment device 4A. 4B.

At this time, the two periphery sensor portions (hereinafter, six periphery exposure and alignment apparatuses installed in the loading / unloading portion) mounted at the front end of the plate periphery exposure and alignment apparatuses 4A and 4B all have the same configuration, so that each exposure The operation of the optical unit and the alignment sensor unit is explained based on the reference numerals shown in FIGS. 5 and 6. In 42 and 43, a plate coated with a photosensitive material as the plate 7 passes through Light output from the light emitting unit 411 is blocked by the surface, and a signal corresponding thereto is input to the sensor interface unit 44.

In other words, when the plate 7 passes the plate periphery exposure and alignment device 4 to the set alignment position, as shown in FIG. 6, the light emitting portion 426 and the light receiving portion of the alignment sensor portion 42 are shown. By passing through the 421, the light output from the light emitting portion 426 of the alignment sensor portion 41 mounted in front of the exposure optical portion 41 is reflected by the first reflection mirror 424. Blocked by the plate (7), the light is not transmitted to the light receiving unit 421 located on the upper side.

However, when the plate 7 passes through the plate periphery exposure and alignment device 4 outside the set alignment position, the light emitting portion 426 of the first alignment sensor portion 42 mounted at the front end of the exposure optical portion 41. Since the light output from the light reflected by the first reflecting mirror 424 is reflected by the second reflecting mirror 423 located on the upper side again in a straight line to enter the light receiving unit 421, the light receiving unit 421 is The current signal corresponding to the incident light is output.

As described above, the electrical signal output from the light receiving unit 421, that is, the alignment signal, is input to the sensor interface unit 44 as shown in FIG. 10.

First, the alignment signal input to the sensor interface unit 44 is converted into a corresponding voltage signal through the current / voltage unit 441 and then output, and then amplified to a predetermined level through the voltage amplifying unit 442 to be operated. Is output as (2).

In addition, the amplified signal output from the voltage amplifying unit 442 is inverted and amplified through the signal inverting unit 443 so as to remove noise on the transmission and output to the operation control device 2.

The alignment signal processing operation as described above is performed in two alignment sensor units that inspect two surfaces of the peripheral portion 71 of the plate 7.

As the plate 7 is loaded from the first cassette 51 as described above, the two alignment sensor units mounted in front of the plate peripheral exposure and alignment devices 4A and 4B respectively transmit corresponding signals. ), The operation control device 2 determines the alignment position of the plate 7 according to the input signal.

The amplified signal and the inverted amplified signal output from the plate peripheral portion exposure and alignment devices 4A and 4B are input to the signal processing unit 15 of the operation control device 2 and processed by the operation control unit 13 as a signal that can be judged. .

The differential amplifier 151 of the signal processor 15 differentially amplifies the input amplified signal and the inverted amplified signal to remove noise and then outputs the output signal. The differential amplified signal is output through the A / D converter 152. Is converted into a digital signal and output to the operation control unit 13.

The operation control unit 13 outputs from the two plate periphery exposure and alignment devices 4A and 4B and according to the two alignment signals processed as above, the plate 7 loaded from the first cassette 51. Determine the alignment position.

When the signals output from the plate peripheral portion exposure and alignment devices 4A and 4B mounted on the left and right sides of the plate peripheral portion 71 are the same, as shown in the attached FIG. It is judged that the alignment position of the plate 7 loaded from the cassette 51 is correct, and outputs the corresponding robot drive command to the robot drive device 3 so as to continue loading the plate 7 at the current position.

When the two alignment signals output from the plate peripheral exposure and alignment devices 4A and 4B are different from each other, the light output from the alignment sensor unit 4B mounted on the left side, as shown in FIG. The light blocked by the plate 7 and output from the other alignment sensor unit 4A is determined to pass, and the alignment position of the plate 7 loaded from the first cassette 51 is not correct. To judge.

In addition to determining the alignment position of the plate 7 according to the presence or absence of signal output from the alignment sensor unit as described above, the alignment position of the plate 7 is determined by a signal output according to the difference in the amount of light detected by the alignment sensor unit. You can judge.

If the alignment position of the plate 7 loaded as described above is not correct, the position error is calculated according to the alignment signals output from the two plate peripheral exposure and alignment devices 4A and 4B, and the calculated position error is calculated. Accordingly, a corresponding robot drive command is output to position the plate 7 at the correct position.

The robot controller 31 of the robot drive device 3 drives the robot 32 to load the plate 7 in the correct alignment position according to the robot drive command output from the motion control device 2.

As described above, the peripheral portion 71 of the plate 7 to which the photosensitive material is applied is loaded with the plate peripheral exposure and alignment devices 4A and 4B while loading the plate 7 in the first cassette 51 with the correct alignment position. ) Is exposed.

In other words, as the plate 7 is loaded in the first cassette 51, light emitted from the main light source 8 is transmitted through the optical fiber 411 and output to the reflective mirror 413 through the condenser lens 412. do.

The reflective mirror 413 reflects the light output through the condenser lens 412 downward, and is applied to the left and right regions a and b of the plate peripheral portion 71 to be loaded as shown in FIG. The photosensitive material is exposed.

Such a plate peripheral exposure operation is performed while the plate 7 is loaded in the first cassette 51 and while the plate 7 loaded in the first cassette 51 is positioned to the plate stage 6. The exposure operation is performed again by the shear alignment sensor portion of the plate peripheral portion exposure and alignment device 4C, 4D.

In addition, while loading the plate 7 exposed on the plate stage 6, the exposure operation is again performed by the rear end sensor unit of the plate peripheral exposure and alignment apparatus 4C, 4D, and at the plate stage 6 While the loaded plate 7 is again unloaded into the first cassette 51, the exposure operation is performed by the rear end sensor part of the plate peripheral exposure and alignment devices 4A and 4B.

The exposure operation by the rear end alignment sensor unit is performed in the same manner as the exposure operation by the front end alignment sensor unit, and the plate 7 loaded from the second cassette 53 is exposed on the plate stage 6. It is again unloaded into the second cassette 52. The exposure operation during unloading is performed in the same manner as above.

Twelve alignment sensor signals installed at the front or rear of the six plate peripheral exposure and alignment devices 4A to 4F mounted on the plate loading / unloading unit 33 as described above to check the alignment of the two plate surfaces are provided. Is processed.

Since the above-described plate peripheral portion exposure and alignment devices 4A to 4F are fixed according to the plate size at the corresponding positions of the plate loading / unloading portion 33, the plate peripheral portion exposure and alignment device The position can also be configured to be manually fixed.

In addition, as shown in the attached FIG. 12, instead of using two plate cassettes as described above, one plate cassette is used, and a plate peripheral exposure and alignment device is used at four points of the plate loading / unloading portion. Plate periphery can be exposed efficiently.

13 is a block diagram of a plate periphery exposure and alignment system according to another embodiment of the present invention.

As shown in FIG. 13, the plate periphery exposure and alignment system according to the embodiment of the present invention includes an operation control device 1, a robot drive device 3, and the same operation as the above-described embodiment. , Position adjusting device 9 for installing the plate periphery exposure and alignment device 4, the plate 7, and the plate exposure and alignment device 4 at any position of the plate loading / unloading part 33. )

The operation control device 1, the robot drive device 3, the plate peripheral portion exposure and alignment device 4, and the plate 7 perform the same operation in the same configuration as the above-described embodiment, thereby performing the plate peripheral portion. It exposes.

As described above, according to the embodiment of the present invention, an exposure and alignment device for exposing the periphery of the plate is configured as a module and mounted on the plate loader part and the unloader part, thereby double exposure during loading and unloading of the plate. By performing the above, the cause of dust generation can be eliminated by exposing the periphery of the plate more efficiently.

In addition, since the time required for exposing a separate plate periphery other than the pattern exposure time of LCD fixing is not required, productivity decrease can be prevented.

In addition, by exposing the periphery of the plate using the main light source used for LCD fixing without using a separate light source, it is possible to reduce the burden of the separate operation and maintenance costs.

In addition, by varying the mounting position of the plate periphery exposure and alignment device according to the size of the plate, it is possible to provide a plate periphery exposure and alignment system having an effect that can be efficiently used corresponding to various types of plates.

Claims (19)

In the process of loading or unloading a plate coated with a photosensitive material for forming a pattern from a cassette, a plurality of plates are mounted in a portion which loads or unloads a plate from the cassette to align the plate while being loaded or unloaded from the cassette. Plate peripheral exposure and alignment means for sensing a position and outputting an electrical signal corresponding thereto and exposing a peripheral portion of the plate; Operation control means for determining an alignment position of the plate according to the signal output from the plate peripheral portion exposure and alignment means, and outputting a corresponding robot driving command accordingly; An operation state is changed according to the robot driving command outputted from the operation control means, so as to load / unload a plate from a cassette, and include robot driving means for varying the alignment position of the plate. system. According to claim 1, wherein the plate peripheral portion exposure and alignment means, the exposure optical unit for collecting and outputting the light output from the main light source used in the LCD manufacturing process, and positioned in front of the exposure optical unit and the alignment position of the plate A first alignment sensor unit for sensing and outputting a corresponding first alignment signal, and a second alignment sensor unit positioned at a rear end of the exposure optical unit and sensing an alignment position of the plate and outputting a corresponding second alignment signal; And a sensor interface unit connected to each of the output terminals of the first alignment sensor unit and the second alignment sensor unit to process an input alignment signal and output a corresponding amplified signal and an inverted amplified signal. And sorting system. The plate peripheral exposure and alignment system of claim 2, wherein the exposure optical unit, the first alignment sensor unit, the second alignment sensor unit, and the sensor interface unit are integrated modules. The optical system of claim 2, wherein the exposure optical unit comprises: an optical fiber which transmits light output by being connected to a main light source used in an LCD manufacturing process; And a plurality of condensing lenses for condensing and outputting light transmitted through the optical fiber, and a reflecting mirror for reflecting light condensed through the condensing lenses and outputting them to the periphery of the plate. system. The optical fiber of claim 4, wherein the optical fiber is connected to an unused area that is not used in response to the shutter opening of light emitted from the main light source used in the LCD manufacturing process to transmit light of the unused area that is not used in the pattern exposure process. Plate peripheral exposure and alignment system. The light emitting device of claim 2, wherein the first alignment sensor unit and the second alignment sensor unit have the same structure, and include a light emitting unit configured to output a predetermined amount of light according to a driving signal applied thereto; A first reflection mirror that reflects light emitted from the light emitting part downward, and is positioned at a lower side at a predetermined interval through which the light emitting part, the first reflection mirror and a plate can pass, and outputs light from the first reflection mirror A second mirror for reflecting the light straight back; And a light receiving unit positioned below the light emitting unit, the first reflecting mirror and the plate at a predetermined interval to pass therethrough, and receiving light output from the second reflecting mirror and outputting a corresponding electric signal. Plate Peripheral Exposure and Alignment System. The method of claim 6, wherein the first alignment sensor unit detects the alignment position of the plate loaded from the cassette, and the second alignment sensor unit detects the alignment position of the plate unloaded into the cassette. Sorting system. The plate periphery of claim 6, wherein a condenser lens is further mounted between the light emitting unit and the first reflecting mirror or between the second reflecting mirror and the light receiving unit 421. Exposure and alignment system. The display apparatus of claim 2, wherein the sensor interface unit comprises: a current / voltage unit configured to convert an electrical signal output from the light receiving unit into a corresponding voltage signal and output the converted voltage signal; A voltage amplifier for amplifying the voltage signal output from the current / voltage unit and outputting a corresponding amplified signal to an operation control means; And a signal inverting unit inverting the amplified signal output from the voltage amplifying unit and outputting a corresponding inverted amplifying signal to the operation control means. The plate periphery exposure and alignment system according to claim 1, wherein said plate periphery exposure and alignment means are mounted respectively on the left and right sides of the plate such that the periphery of the plate is exposed during loading or unloading from the cassette. 2. The apparatus of claim 1, wherein the operation control means comprises: a differential amplifier for differentially amplifying the amplified signal and the inverted amplified signal output to the plate exposure and alignment means, and outputting a corresponding signal; A signal processing unit comprising an A / D converter for converting the connected and applied signal into a digital signal and outputting the signal, and an operation control unit for determining a plate alignment state according to the signal output from the signal processing unit and outputting a corresponding robot driving command. Plate peripheral exposure and alignment system, characterized in that consisting of. 12. The apparatus of claim 11, wherein the operation controller determines that the alignment positions of the plates currently loaded or unloaded from the cassette are correct when the signals output from the plurality of plate peripheral exposure and alignment means are the same. If the signals output from the plate periphery exposure and alignment means are not the same, it is determined that the alignment position of the plate currently loaded or unloaded from the cassette is inaccurate, and the position error of the plate is calculated accordingly. A plate periphery exposure and alignment system, characterized by outputting a robot drive command to position the plate in the correct alignment position. According to claim 1, wherein the robot drive means, the robot control unit for outputting a corresponding drive signal in accordance with the robot drive command output from the operation control means, and the operation state is variable according to the drive signal output from the robot control unit And a robot for loading or unloading the plate. A plate stage; A first cassette on which a plate is loaded; A second cassette on which a plate is loaded; The left and right peripheral portions of the plate are exposed to the portion where the plate is loaded or unloaded from the first cassette, the portion where the plate is loaded or unloaded to the plate stage, and the portion where the plate is loaded or unloaded from the second cassette. Plate periphery exposure and alignment means respectively installed at the periphery, for sensing a plate alignment position at which loading and operation is performed, outputting an electrical signal corresponding thereto, and exposing a periphery of the plate; Operation control means for determining an alignment position of the plate according to the signal output from the plate peripheral portion exposure and alignment means, and outputting a corresponding robot driving command accordingly; And a robot driving means for varying an operation state according to a robot driving command output from the operation control means to load / unload a plate from a cassette and to change an alignment position of the plate. Sorting system. 15. The method of claim 14, wherein in the case of placing the plate from the first cassette onto the plate stage, the two plate peripheral exposure and alignment means mounted to each of the above loading / unloading portions is provided with a plate from the first cassette. Perform primary exposure of the plate periphery while loading, perform secondary exposure while the plate loaded from the first cassette is placed in the plate stage, and perform tertiary exposure while unloading the exposed plate on the plate stage. And perform a fourth order exposure while unloading the plate into the first cassette. 15. The method of claim 14, wherein in the case of placing the plate from the second cassette onto the plate stage, the two plate peripheral exposure and alignment means mounted to each of the above loading / unloading portions is provided with a plate from the second cassette. Perform primary exposure of the plate periphery while loading, perform secondary exposure while the plate loaded from the second cassette is placed in the plate stage, and perform tertiary exposure while unloading the exposed plate on the plate stage. And perform a fourth order exposure while unloading the plate into the second cassette. The signal output from the two plate peripheral exposure and alignment means respectively mounted on the left and right sides so that the peripheral portion of the plate is exposed to each loading / unloading portion is the same. In this case, it is judged that the alignment position of the currently loaded or unloaded plate is correct, and the signals output from the two plate peripheral exposure and alignment means respectively mounted on the left and right so as to expose the periphery of the plate to each loading / unloading portion. If is not the same, it is determined that the alignment position of the currently loaded or unloaded plate is incorrect, calculates the position error of the plate accordingly, and then sends a robot drive command to position the plate to the correct alignment position accordingly. And peripheral plate exposure and alignment system. A plate stage; A cassette on which a plate is loaded; In the portion where the plate is loaded or unloaded from the cassette and the portion where the plate is loaded or unloaded by the plate stage, the left and right peripheral portions of the plate are respectively exposed on the left and right sides to detect the plate alignment position where loading and operation are performed. Plate peripheral exposure and alignment means for outputting a corresponding electrical signal and exposing a peripheral portion of the plate; Operation control means for determining an alignment position of the plate according to the signal output from the plate peripheral portion exposure and alignment means, and outputting a corresponding robot driving command accordingly; And a robot driving means for varying an operation state according to a robot driving command output from the operation control means to load / unload a plate from a cassette and to change an alignment position of the plate. Sorting system. In the process of loading or unloading a plate coated with a photosensitive material for engraving a pattern from a cassette, a plurality of plates are mounted in a portion loading or unloading a plate from the cassette, so that the plate alignment position while being loaded or unloaded from the cassette. Plate peripheral portion exposure and alignment means for detecting and outputting an electrical signal corresponding thereto and exposing the periphery of the plate; Operation control means for determining an alignment position of the plate according to the signal output from the plate peripheral portion exposure and alignment means, and outputting a corresponding robot driving command accordingly; Robot driving means for varying an operation state according to a robot driving command outputted from the operation control means to change an alignment position of the plate; Plate periphery exposure, characterized in that for detecting the size of the plate, the plate peripheral portion mounted on the portion where the plate is loaded or unloaded according to the detected plate size and the position adjusting means for varying the mounting position of the alignment means And sorting system.