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KR0136800B1 - An optimization method for a light source profile - Google Patents

An optimization method for a light source profile

Info

Publication number
KR0136800B1
KR0136800B1 KR97041359A KR19970041359A KR0136800B1 KR 0136800 B1 KR0136800 B1 KR 0136800B1 KR 97041359 A KR97041359 A KR 97041359A KR 19970041359 A KR19970041359 A KR 19970041359A KR 0136800 B1 KR0136800 B1 KR 0136800B1
Authority
KR
South Korea
Prior art keywords
light source
optimization method
source profile
profile
optimization
Prior art date
Application number
KR97041359A
Other languages
Korean (ko)
Inventor
Tanae Naruki
Kenji Nakagawa
Masao Taguchi
Miroyuki Tanaka
Satoru Asai
Isamu Hanyu
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4141548A external-priority patent/JP2848425B2/en
Priority claimed from JP4141755A external-priority patent/JPH05335214A/en
Priority claimed from JP18291392A external-priority patent/JP3230014B2/en
Priority claimed from JP26741592A external-priority patent/JP3330648B2/en
Priority claimed from JP6059393A external-priority patent/JPH06275493A/en
Priority claimed from KR93009856A external-priority patent/KR0136746B1/en
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of KR0136800B1 publication Critical patent/KR0136800B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
KR97041359A 1992-06-02 1997-08-27 An optimization method for a light source profile KR0136800B1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP4141548A JP2848425B2 (en) 1992-06-02 1992-06-02 Light exposure method
JP4141755A JPH05335214A (en) 1992-06-02 1992-06-02 Light projection exposure method
JP18291392A JP3230014B2 (en) 1992-06-18 1992-06-18 Projection exposure method and method of manufacturing semiconductor device using the exposure method
JP26741592A JP3330648B2 (en) 1992-10-06 1992-10-06 Light source shape optimization method
JP6059393A JPH06275493A (en) 1993-03-19 1993-03-19 Projection exposure
KR93009856A KR0136746B1 (en) 1992-06-02 1993-06-02 Optical exposure method

Publications (1)

Publication Number Publication Date
KR0136800B1 true KR0136800B1 (en) 1998-04-24

Family

ID=27550797

Family Applications (1)

Application Number Title Priority Date Filing Date
KR97041359A KR0136800B1 (en) 1992-06-02 1997-08-27 An optimization method for a light source profile

Country Status (1)

Country Link
KR (1) KR0136800B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100733546B1 (en) * 2000-05-23 2007-06-28 에이에스엠엘 유에스, 인크. Method and apparatus for selective linewidth optimization during lithography process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100733546B1 (en) * 2000-05-23 2007-06-28 에이에스엠엘 유에스, 인크. Method and apparatus for selective linewidth optimization during lithography process

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Legal Events

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Year of fee payment: 12

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