KR0136746B1 - Optical exposure method - Google Patents

Optical exposure method

Info

Publication number: KR0136746B1
Authority: KR; South Korea
Prior art keywords: exposure method; optical exposure; optical; exposure
Prior art date: 1992-06-02

Application number

KR93009856A

Other languages

Korean (ko)

Other versions

KR940005965A (en

Inventor

Tamae Hruki

Kenji Nagagawa

Masao Taguchi

Hiroyuki Tanaka

Satoru Asai

Isamu Hanyu

Original Assignee

Fujitsu Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1992-06-02

Filing date

1993-06-02

Publication date

1998-04-24

1992-06-02 Priority claimed from JP4141548A external-priority patent/JP2848425B2/en

1992-06-18 Priority claimed from JP18291392A external-priority patent/JP3230014B2/en

1993-06-02 Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd

1994-03-22 Publication of KR940005965A publication Critical patent/KR940005965A/en

1997-08-27 Priority to KR97041359A priority Critical patent/KR0136800B1/en

1998-04-24 Application granted granted Critical

1998-04-24 Publication of KR0136746B1 publication Critical patent/KR0136746B1/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

KR93009856A 1992-06-02 1993-06-02 Optical exposure method KR0136746B1 (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
KR97041359A KR0136800B1 (en)	1992-06-02	1997-08-27	An optimization method for a light source profile

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP92-141548		1992-06-02
JP4141548A JP2848425B2 (en)	1992-06-02	1992-06-02	Light exposure method
JP18291392A JP3230014B2 (en)	1992-06-18	1992-06-18	Projection exposure method and method of manufacturing semiconductor device using the exposure method

Publications (2)

Publication Number	Publication Date
KR940005965A KR940005965A (en)	1994-03-22
KR0136746B1 true KR0136746B1 (en)	1998-04-24

Family

ID=26473774

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR93009856A KR0136746B1 (en)	1992-06-02	1993-06-02	Optical exposure method

Country Status (1)

Country	Link
KR (1)	KR0136746B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2001116917A (en)	1999-10-18	2001-04-27	Hitachi Ltd	Member to improve image quality and image display device using the same
DE19963588C2 (en) *	1999-12-29	2002-01-10	Zeiss Carl	Optical arrangement
KR100614651B1 (en) *	2004-10-11	2006-08-22	삼성전자주식회사	Apparatus and method for exposing a circuit pattern, photomask used and design method thereof, lighting system and implementation method thereof

1993
- 1993-06-02 KR KR93009856A patent/KR0136746B1/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
KR940005965A (en)	1994-03-22

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Legal Events

Date	Code	Title	Description
1993-06-02	A201	Request for examination
1997-03-27	E902	Notification of reason for refusal
1997-11-05	E701	Decision to grant or registration of patent right
1998-01-26	GRNT	Written decision to grant
2009-01-23	FPAY	Annual fee payment	Payment date: 20090123 Year of fee payment: 12
2010-01-27	LAPS	Lapse due to unpaid annual fee