KR0132184B1 - 반도체 레이저 장치 및 그 제조방법 - Google Patents
반도체 레이저 장치 및 그 제조방법Info
- Publication number
- KR0132184B1 KR0132184B1 KR1019940022971A KR19940022971A KR0132184B1 KR 0132184 B1 KR0132184 B1 KR 0132184B1 KR 1019940022971 A KR1019940022971 A KR 1019940022971A KR 19940022971 A KR19940022971 A KR 19940022971A KR 0132184 B1 KR0132184 B1 KR 0132184B1
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor substrate
- light
- laser
- semiconductor
- laser device
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 78
- 238000000034 method Methods 0.000 title description 6
- 239000000758 substrate Substances 0.000 claims abstract description 44
- 238000001514 detection method Methods 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 238000000347 anisotropic wet etching Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 17
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 201000009310 astigmatism Diseases 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010005 wet pre-treatment Methods 0.000 description 1
Landscapes
- Semiconductor Lasers (AREA)
- Optical Head (AREA)
Abstract
Description
Claims (2)
- 반도체 레이저 장치에 있어서, 반도체 기판의 일측에 단차를 갖도록 형성된 측벽과, 상기 반도체 기판의 표면에 형성된 신호 검출용 광 검출소자와, 상기 측벽에 수직한 면에 이 측벽과 인접되어 형성된 광 검출소자와, 상기 반도체 기판의 수평면과 인접하도록 본딩된 레이저 칩으로 구성된 반도체 레이저 장치.
- 반도체 레이저 장치의 제조방법에 있어서, 반도체 기판의 일측면을 이방성 습식 에칭에 의해 단차를 갖는 측벽을 형성하는 단계와, 상기 반도체 기판의 수평면에 신호 검출용 광 검출소자를 형성하는 단계와, 상기 에칭된 반도체 기판의 수평면에 측벽과 인접하도록 광 검출소자를 형성하는 단계와, 상기 측벽에 반도체 기판의 수평면과 일치하도록 메탈본딩에 의해 레이저 칩을 어태치하는 단계로 이루어진 반도체 레이저 장치의 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940022971A KR0132184B1 (ko) | 1994-09-13 | 1994-09-13 | 반도체 레이저 장치 및 그 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940022971A KR0132184B1 (ko) | 1994-09-13 | 1994-09-13 | 반도체 레이저 장치 및 그 제조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR0132184B1 true KR0132184B1 (ko) | 1998-04-11 |
Family
ID=19392573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940022971A KR0132184B1 (ko) | 1994-09-13 | 1994-09-13 | 반도체 레이저 장치 및 그 제조방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0132184B1 (ko) |
-
1994
- 1994-09-13 KR KR1019940022971A patent/KR0132184B1/ko not_active IP Right Cessation
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