JPS6489355A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6489355A JPS6489355A JP24718487A JP24718487A JPS6489355A JP S6489355 A JPS6489355 A JP S6489355A JP 24718487 A JP24718487 A JP 24718487A JP 24718487 A JP24718487 A JP 24718487A JP S6489355 A JPS6489355 A JP S6489355A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cracking
- insulator
- metal layer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 6
- 238000005336 cracking Methods 0.000 abstract 2
- 239000012212 insulator Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 230000017525 heat dissipation Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
- Bipolar Transistors (AREA)
- Die Bonding (AREA)
Abstract
PURPOSE:To improve thermal characteristic and to prevent a semiconductor device from cracking by isolating heat generating sections of adjacent semiconductor elements, and forming a metal layer on a substrate. CONSTITUTION:After an emitter 2, a base 3 and a collector 4 are formed on a substrate 6, an insulating tape 5 is adhered on a semiconductor element 1. Then, the substrate 6 is reduced in thickness by chemical and mechanical treatment method from the side of the substrate 6. Then, the heat generating section 7 of the element 1 is isolated from that of its adjacent element 1. Thereafter, an insulator 8 is buried in a recess generated in the isolating step, thereby flattening the surface of the substrate. Subsequently, after a metal layer 9 is formed on the whole substrate, the tape 5 is separated, and the insulator 8 is then removed. Thus, the thermal balance with heat dissipation is improved, thereby improving thermal characteristic. Even if the size of a semiconductor element is increased, it can prevent the element from cracking.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24718487A JPS6489355A (en) | 1987-09-29 | 1987-09-29 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24718487A JPS6489355A (en) | 1987-09-29 | 1987-09-29 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489355A true JPS6489355A (en) | 1989-04-03 |
Family
ID=17159689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24718487A Pending JPS6489355A (en) | 1987-09-29 | 1987-09-29 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489355A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05234972A (en) * | 1992-02-24 | 1993-09-10 | Nec Corp | Manufacture of semiconductor device |
-
1987
- 1987-09-29 JP JP24718487A patent/JPS6489355A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05234972A (en) * | 1992-02-24 | 1993-09-10 | Nec Corp | Manufacture of semiconductor device |
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