JPS6477964A - Fine-grain transistor - Google Patents
Fine-grain transistorInfo
- Publication number
- JPS6477964A JPS6477964A JP62235353A JP23535387A JPS6477964A JP S6477964 A JPS6477964 A JP S6477964A JP 62235353 A JP62235353 A JP 62235353A JP 23535387 A JP23535387 A JP 23535387A JP S6477964 A JPS6477964 A JP S6477964A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gaas
- fine grains
- drain electrode
- source electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
- H10D62/824—Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
Landscapes
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To enlarge length of a tunnel while enabling heterojunction of semiconductor layers to be formed with good controllability, by a method wherein the second semiconductor layer joins fine grains consisting of an electrically conductive substance and the semiconductor layer, a source electrode and a drain electrode for tunneling a low barrier. CONSTITUTION:Fine grains consist of an undoped GaAs layer 18, an n<+>-GaAs layer (the first semiconductor layer) 19 and gold 11. And a source consists of an undoped GaAs layer 18, the n<+>-GaAs layer 19' and a source electrode 12, a drain consists of the undoped GaAs layer 18', the n<+>-GaAs layer 19' and a drain electrode, while an AlxGa1-xAs layer 17 joins the fine grains with the source electrode and the fine grains with the drain electrode, as the second semiconductor layer. Then, x value of the layer 17 is made 0.05 to be a crystal extremely near a GaAs crystal for being heterojoined to form a low barrier. Further, the n<+>-GaAs layers 19 and 19', which are ohmic-contacted with the particles, the source electrode and the drain electrode, contain many impurities being reduced and retreated so that a conductive zone EC occupys a lower energy level than the Fermilevel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62235353A JP2533134B2 (en) | 1987-09-18 | 1987-09-18 | Particulate transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62235353A JP2533134B2 (en) | 1987-09-18 | 1987-09-18 | Particulate transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6477964A true JPS6477964A (en) | 1989-03-23 |
JP2533134B2 JP2533134B2 (en) | 1996-09-11 |
Family
ID=16984831
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62235353A Expired - Fee Related JP2533134B2 (en) | 1987-09-18 | 1987-09-18 | Particulate transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2533134B2 (en) |
-
1987
- 1987-09-18 JP JP62235353A patent/JP2533134B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2533134B2 (en) | 1996-09-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |