JPS6451647A - Manufacture of trench type capacitor - Google Patents
Manufacture of trench type capacitorInfo
- Publication number
- JPS6451647A JPS6451647A JP62208412A JP20841287A JPS6451647A JP S6451647 A JPS6451647 A JP S6451647A JP 62208412 A JP62208412 A JP 62208412A JP 20841287 A JP20841287 A JP 20841287A JP S6451647 A JPS6451647 A JP S6451647A
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- silicon oxide
- trench
- silicon substrate
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To make the thickness of an oxide film in the opening edge section of a trench thicker than that of other sections, and to inhibit a horn phenomenon by forming an opening section to an silicon oxide film on an silicon substrate, diffusing an impurity from the opening section and shaping the trench to the silicon substrate, using the silicon oxide film as a mask. CONSTITUTION:As<+> ions are implanted into an opening through an ion implantation method, employing an silicon oxide film 2 formed onto an silicon substrate 1 as a mask. An N-type diffusion layer 3 in high concentration is shaped through a diffusion for twenty min at 1000 deg.C in an N2 atmosphere. The silicon substrate exposed in the opening section is dry-etched, using the silicon oxide film 2 as a mask, thus forming a trench 4. The silicon oxide film 2 is removed, the surface of the silicon substrate 1 and the inwall of the trench 4 are oxidized, and an silicon oxide film 5 is grown. Since the N-type diffusion layer in high concentration is shaped in the upper edge section of the trench at that time, the silicon oxide film 5 is grown thickly, thus inhibiting a horn phenomenon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62208412A JPS6451647A (en) | 1987-08-22 | 1987-08-22 | Manufacture of trench type capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62208412A JPS6451647A (en) | 1987-08-22 | 1987-08-22 | Manufacture of trench type capacitor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6451647A true JPS6451647A (en) | 1989-02-27 |
Family
ID=16555811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62208412A Pending JPS6451647A (en) | 1987-08-22 | 1987-08-22 | Manufacture of trench type capacitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6451647A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6439215B1 (en) | 2000-08-10 | 2002-08-27 | Honda Giken Kogyo Kabushiki Kaisha | Breather structure in four-cycle engine for work machines |
| JP2011211204A (en) * | 2010-03-30 | 2011-10-20 | Ibiden Co Ltd | Electronic component and printed wiring board |
-
1987
- 1987-08-22 JP JP62208412A patent/JPS6451647A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6439215B1 (en) | 2000-08-10 | 2002-08-27 | Honda Giken Kogyo Kabushiki Kaisha | Breather structure in four-cycle engine for work machines |
| JP2011211204A (en) * | 2010-03-30 | 2011-10-20 | Ibiden Co Ltd | Electronic component and printed wiring board |
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