JPS6451125A - Exhaust treatment device - Google Patents
Exhaust treatment deviceInfo
- Publication number
- JPS6451125A JPS6451125A JP62209849A JP20984987A JPS6451125A JP S6451125 A JPS6451125 A JP S6451125A JP 62209849 A JP62209849 A JP 62209849A JP 20984987 A JP20984987 A JP 20984987A JP S6451125 A JPS6451125 A JP S6451125A
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- oven
- arsine
- gas
- unreacted starting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Treating Waste Gases (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE:To collect unreacted starting gas efficiently by collecting solid by means of the first and the second collecting means after treatment of gas generated from a semiconductor gas phase growth device in a reaction oven, and then treating the same with a chemical or physical adsorbent. CONSTITUTION:Unreacted starting gas such as arsine generated from a reaction oven 1 to grow crystals on a semiconductor base is decomposed into, for example, As and H2 from an exhaust outlet 5 by a thermal decomposition oven 17. Then, the exhaust comes into a cyclone 19, and after a part of As is removed, comparatively large diameter As is removed by a membrane filter 2 and solidified As is removed by a display filter 23 respectively. Arsine is adsorbed and removed by a chemical trap 25. Thus, the durability of the chemical trap 25 is enhanced.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62209849A JPS6451125A (en) | 1987-08-24 | 1987-08-24 | Exhaust treatment device |
| US07/222,905 US4940213A (en) | 1987-08-24 | 1988-07-22 | Exhaust processing apparatus |
| GB8818093A GB2209005B (en) | 1987-08-24 | 1988-07-29 | Exhaust processing apparatus |
| GB9110393A GB2243311B (en) | 1987-08-24 | 1991-05-14 | Exhaust processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62209849A JPS6451125A (en) | 1987-08-24 | 1987-08-24 | Exhaust treatment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6451125A true JPS6451125A (en) | 1989-02-27 |
Family
ID=16579640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62209849A Pending JPS6451125A (en) | 1987-08-24 | 1987-08-24 | Exhaust treatment device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6451125A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07222908A (en) * | 1994-02-15 | 1995-08-22 | Sadayoshi Taketsuna | Exhaust gas filtering treatment method of semiconductor manufacturing process |
| GB2323312B (en) * | 1997-03-21 | 2001-08-08 | Korea M A T Co Ltd | Gas scrubber and methods of disposing a gas using the same |
| JP2010510165A (en) * | 2006-11-22 | 2010-04-02 | エス．オー．アイ．テック シリコン オン インシュレータ テクノロジーズ | Reducing reactive gases from gallium nitride deposition |
-
1987
- 1987-08-24 JP JP62209849A patent/JPS6451125A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07222908A (en) * | 1994-02-15 | 1995-08-22 | Sadayoshi Taketsuna | Exhaust gas filtering treatment method of semiconductor manufacturing process |
| GB2323312B (en) * | 1997-03-21 | 2001-08-08 | Korea M A T Co Ltd | Gas scrubber and methods of disposing a gas using the same |
| JP2010510165A (en) * | 2006-11-22 | 2010-04-02 | エス．オー．アイ．テック シリコン オン インシュレータ テクノロジーズ | Reducing reactive gases from gallium nitride deposition |
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