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JPS6449227A - Stepper - Google Patents

Stepper

Info

Publication number
JPS6449227A
JPS6449227A JP62206005A JP20600587A JPS6449227A JP S6449227 A JPS6449227 A JP S6449227A JP 62206005 A JP62206005 A JP 62206005A JP 20600587 A JP20600587 A JP 20600587A JP S6449227 A JPS6449227 A JP S6449227A
Authority
JP
Japan
Prior art keywords
reticle
reference pattern
constitution
environmental conditions
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62206005A
Other languages
English (en)
Other versions
JPH0548931B2 (ja
Inventor
Norio Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62206005A priority Critical patent/JPS6449227A/ja
Publication of JPS6449227A publication Critical patent/JPS6449227A/ja
Publication of JPH0548931B2 publication Critical patent/JPH0548931B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62206005A 1987-08-19 1987-08-19 Stepper Granted JPS6449227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62206005A JPS6449227A (en) 1987-08-19 1987-08-19 Stepper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62206005A JPS6449227A (en) 1987-08-19 1987-08-19 Stepper

Publications (2)

Publication Number Publication Date
JPS6449227A true JPS6449227A (en) 1989-02-23
JPH0548931B2 JPH0548931B2 (ja) 1993-07-22

Family

ID=16516329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62206005A Granted JPS6449227A (en) 1987-08-19 1987-08-19 Stepper

Country Status (1)

Country Link
JP (1) JPS6449227A (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116735A (ja) * 1981-12-29 1983-07-12 Canon Inc 投影焼付方法
JPS6021051A (ja) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> レンズ投影露光方法及び装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116735A (ja) * 1981-12-29 1983-07-12 Canon Inc 投影焼付方法
JPS6021051A (ja) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> レンズ投影露光方法及び装置

Also Published As

Publication number Publication date
JPH0548931B2 (ja) 1993-07-22

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees