[go: up one dir, main page]

JPS6448463A - Method of driving amorphous silicon thin film transistor - Google Patents

Method of driving amorphous silicon thin film transistor

Info

Publication number
JPS6448463A
JPS6448463A JP62205707A JP20570787A JPS6448463A JP S6448463 A JPS6448463 A JP S6448463A JP 62205707 A JP62205707 A JP 62205707A JP 20570787 A JP20570787 A JP 20570787A JP S6448463 A JPS6448463 A JP S6448463A
Authority
JP
Japan
Prior art keywords
state
voltage
amorphous silicon
drain
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62205707A
Other languages
Japanese (ja)
Inventor
Shinichiro Ishihara
Seiichi Nagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62205707A priority Critical patent/JPS6448463A/en
Publication of JPS6448463A publication Critical patent/JPS6448463A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]

Landscapes

  • Thin Film Transistor (AREA)

Abstract

PURPOSE:To prevent degradation of characteristics of a transistor due to irradiation with light, by applying a large voltage across a source and a drain compared with the voltage which causes the area therebetween to be in an insulating state. CONSTITUTION:In a thin film transistor TFT, a n type amorphous silicon hydride (a -Si :H) 4 is so formed under both a source 1 and a drain 2 as to be in ohmic contact with a TFT active layer 6. And, a gate 3 is biased in the reverse direction with respect to ON state so that the transistor is turned into OFF state. Now, the reverse biase is so setted that the voltage thereof is large compared with the voltage which generally causes the area between the source and the drain to be in an OFF state. As a result, an Si-Si bond which was strained in ON state can be restored to the original state thereof. Even if the bond is broken, when the reverse biase is applied, the bonds which were broken can be again close nearly each other, thereby the probability of their being bonded is increased. Accordingly, the photodegradation of an amorphous silicon can be prevented effectively, and the TFT with large mobility of carrier can be still kept operated even under the condition of strong irradiation with light.
JP62205707A 1987-08-19 1987-08-19 Method of driving amorphous silicon thin film transistor Pending JPS6448463A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62205707A JPS6448463A (en) 1987-08-19 1987-08-19 Method of driving amorphous silicon thin film transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62205707A JPS6448463A (en) 1987-08-19 1987-08-19 Method of driving amorphous silicon thin film transistor

Publications (1)

Publication Number Publication Date
JPS6448463A true JPS6448463A (en) 1989-02-22

Family

ID=16511368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62205707A Pending JPS6448463A (en) 1987-08-19 1987-08-19 Method of driving amorphous silicon thin film transistor

Country Status (1)

Country Link
JP (1) JPS6448463A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02285995A (en) * 1989-04-25 1990-11-26 Zexel Corp Brushless motor controller
US5055899A (en) * 1987-09-09 1991-10-08 Casio Computer Co., Ltd. Thin film transistor
US5166085A (en) * 1987-09-09 1992-11-24 Casio Computer Co., Ltd. Method of manufacturing a thin film transistor
US5229644A (en) * 1987-09-09 1993-07-20 Casio Computer Co., Ltd. Thin film transistor having a transparent electrode and substrate
US5327001A (en) * 1987-09-09 1994-07-05 Casio Computer Co., Ltd. Thin film transistor array having single light shield layer over transistors and gate and drain lines
CN102270636A (en) * 2010-06-04 2011-12-07 元太科技工业股份有限公司 Thin film transistor array substrate and manufacturing method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5055899A (en) * 1987-09-09 1991-10-08 Casio Computer Co., Ltd. Thin film transistor
US5166085A (en) * 1987-09-09 1992-11-24 Casio Computer Co., Ltd. Method of manufacturing a thin film transistor
US5229644A (en) * 1987-09-09 1993-07-20 Casio Computer Co., Ltd. Thin film transistor having a transparent electrode and substrate
US5327001A (en) * 1987-09-09 1994-07-05 Casio Computer Co., Ltd. Thin film transistor array having single light shield layer over transistors and gate and drain lines
JPH02285995A (en) * 1989-04-25 1990-11-26 Zexel Corp Brushless motor controller
CN102270636A (en) * 2010-06-04 2011-12-07 元太科技工业股份有限公司 Thin film transistor array substrate and manufacturing method thereof

Similar Documents

Publication Publication Date Title
DE69418283D1 (en) TFT with low parasitic capacitance
EP0997950A3 (en) Method of improving the crystallization of semiconductor films particularly for thin film transistors
MY130168A (en) Semiconductor device and manufacturing method thereof
EP0915503A3 (en) Semiconductor device for use in a light valve device, and process for manufacturing the same
US4885616A (en) Thin film display device with thin amorphous channel
WO1999030369A3 (en) Thin film transistors and electronic devices comprising such
KR970076030A (en) Liquid crystal display device with integrated driving circuit and manufacturing method
KR960012583B1 (en) Tft (thin film transistor )and the method of manufacturing the same
JPS6453574A (en) Semiconductor device
JPS6448463A (en) Method of driving amorphous silicon thin film transistor
KR970063785A (en) Method for manufacturing thin film transistor of liquid crystal display
EP0410799A3 (en) High voltage thin film transistor with second control electrode
JPS6390859A (en) Thin film transistor and its manufacturing method
JPS6452128A (en) Active device
JPH09260671A (en) Thin film transistor and liquid crystal display device formed using that
US4979006A (en) Reverse staggered type silicon thin film transistor
KR100225100B1 (en) Thin film transistor
JPS5565455A (en) Manufacture of semiconductor device
JPH025572A (en) Semiconductor device
JPS6427272A (en) Semiconductor device
KR960008734B1 (en) Thin film transistor and manufacturing method thereof
JPS63181473A (en) Thin-film transistor
JPS57210657A (en) Array substrate for display device
JPS6490560A (en) Thin-film transistor
JPS6422066A (en) Thin film transistor