JPS6422089A - Optically bistable semiconductor laser and its manufacture - Google Patents
Optically bistable semiconductor laser and its manufactureInfo
- Publication number
- JPS6422089A JPS6422089A JP17958887A JP17958887A JPS6422089A JP S6422089 A JPS6422089 A JP S6422089A JP 17958887 A JP17958887 A JP 17958887A JP 17958887 A JP17958887 A JP 17958887A JP S6422089 A JPS6422089 A JP S6422089A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- inp
- mask
- isolation trench
- sio2 film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F3/00—Optical logic elements; Optical bistable devices
- G02F3/02—Optical bistable devices
- G02F3/026—Optical bistable devices based on laser effects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To increase isolation resistance, and enable the decrease of an oscillation threshold value, by making a structure wherein an isolation trench is formed in an active layer to a depth reaching at least an upper clad layer, and a semi-insulative semiconductor layer is buried in the isolation trench. CONSTITUTION:By liquid growth method, a double hetero junction structure is formed on an N-InP substrate 1. A stripe-type SiO2 film mask 31 is formed. By applying this to a protective film, etching is performed up to an N-InP clad layer 2, and a stripe-type laser layer 6 containing an active layer 3 is formed. An iron-doped SI-InP layer 11 is grown and buried until the surface becomes flat. Then the SiO2 film mask 31 is eliminated, and a new SiO2 film mask 32 is formed in the perpendicular direction. By applying this to a protective mask, etching performed up to a P-InP clad layer 4, and a stripe-type isolation trench 13 is formed. The SiO2 film mask 32 is left as it is. By applying this to a mask, an ion-doped SI-InP layer 21 is grown and buried in the isolation trench 13 part by vapor growth method, until the surface becomes flat.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17958887A JPH0824210B2 (en) | 1987-07-17 | 1987-07-17 | Optical bistable semiconductor laser and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17958887A JPH0824210B2 (en) | 1987-07-17 | 1987-07-17 | Optical bistable semiconductor laser and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6422089A true JPS6422089A (en) | 1989-01-25 |
JPH0824210B2 JPH0824210B2 (en) | 1996-03-06 |
Family
ID=16068355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17958887A Expired - Fee Related JPH0824210B2 (en) | 1987-07-17 | 1987-07-17 | Optical bistable semiconductor laser and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0824210B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03286586A (en) * | 1990-04-03 | 1991-12-17 | Nec Corp | Integration type light modulator and manufacture thereof |
CN111504523A (en) * | 2020-04-15 | 2020-08-07 | 深圳第三代半导体研究院 | Self-luminous type calendaring electric device and preparation method thereof |
-
1987
- 1987-07-17 JP JP17958887A patent/JPH0824210B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03286586A (en) * | 1990-04-03 | 1991-12-17 | Nec Corp | Integration type light modulator and manufacture thereof |
CN111504523A (en) * | 2020-04-15 | 2020-08-07 | 深圳第三代半导体研究院 | Self-luminous type calendaring electric device and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0824210B2 (en) | 1996-03-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |