JPS5743487A - Semiconductor laser - Google Patents
Semiconductor laserInfo
- Publication number
- JPS5743487A JPS5743487A JP11863480A JP11863480A JPS5743487A JP S5743487 A JPS5743487 A JP S5743487A JP 11863480 A JP11863480 A JP 11863480A JP 11863480 A JP11863480 A JP 11863480A JP S5743487 A JPS5743487 A JP S5743487A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- layers
- striped
- clad layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To improve the operating characteristics of a laser by filling a clad layer between an active layer and a guide layer, thereby forming a striped guide layer with good reproducibility and confining the carrier preferably. CONSTITUTION:An n type clad layer 12, an n type active layer 13, a p type active layer 13, a p type clad layer 14, a p type guide layer 15 and a p type clad layer 16 are continuously grown by a liquid epitaxial growth method sequentially on an n type semiconductor substrate 11. At this time the layers 12, 14 have smaller refractive indexes than the layer 15 and larger forbidden band width than that. An SiO2 film is adhered in the striped shaped of 4-6mum in width by a CVD method on the layer 16, and the layers 16, 15 are etched and removed except the striped part. An n type InP layer 17 is so epitaxially grown as to surround the layers 15, 16 thus retained, electrodes 18, 19 are formed, and a reflecting surface is then formed by cleavage.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11863480A JPS5743487A (en) | 1980-08-28 | 1980-08-28 | Semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11863480A JPS5743487A (en) | 1980-08-28 | 1980-08-28 | Semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5743487A true JPS5743487A (en) | 1982-03-11 |
Family
ID=14741379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11863480A Pending JPS5743487A (en) | 1980-08-28 | 1980-08-28 | Semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5743487A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6064488A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6064491A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6064490A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6064492A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6174382A (en) * | 1984-09-20 | 1986-04-16 | Matsushita Electric Ind Co Ltd | Semiconductor laser device and manufacture thereof |
JPS61285781A (en) * | 1985-06-12 | 1986-12-16 | Sanyo Electric Co Ltd | Semiconductor laser |
JPS62147792A (en) * | 1985-12-23 | 1987-07-01 | Hitachi Ltd | Manufacture of semiconductor laser |
JPS6317586A (en) * | 1986-07-10 | 1988-01-25 | Nec Corp | Semiconductor laser |
JPS6360404A (en) * | 1986-03-28 | 1988-03-16 | トムソン‐セーエスエフ | Solid-state optical guide, laser applying said optical guide and manufacture of said optical guide and laser |
JPS63164290A (en) * | 1986-12-25 | 1988-07-07 | Mitsubishi Electric Corp | Semiconductor laser device |
JP2001057461A (en) * | 1999-06-10 | 2001-02-27 | Nichia Chem Ind Ltd | Nitride semiconductor laser element |
JP2003086899A (en) * | 2001-09-12 | 2003-03-20 | Furukawa Electric Co Ltd:The | Semiconductor laser element and its manufacturing method |
-
1980
- 1980-08-28 JP JP11863480A patent/JPS5743487A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6064488A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6064491A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6064490A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6064492A (en) * | 1983-09-19 | 1985-04-13 | Rohm Co Ltd | Semiconductor laser and manufacture thereof |
JPS6174382A (en) * | 1984-09-20 | 1986-04-16 | Matsushita Electric Ind Co Ltd | Semiconductor laser device and manufacture thereof |
JPS61285781A (en) * | 1985-06-12 | 1986-12-16 | Sanyo Electric Co Ltd | Semiconductor laser |
JPS62147792A (en) * | 1985-12-23 | 1987-07-01 | Hitachi Ltd | Manufacture of semiconductor laser |
JPS6360404A (en) * | 1986-03-28 | 1988-03-16 | トムソン‐セーエスエフ | Solid-state optical guide, laser applying said optical guide and manufacture of said optical guide and laser |
JPS6317586A (en) * | 1986-07-10 | 1988-01-25 | Nec Corp | Semiconductor laser |
JPS63164290A (en) * | 1986-12-25 | 1988-07-07 | Mitsubishi Electric Corp | Semiconductor laser device |
JP2001057461A (en) * | 1999-06-10 | 2001-02-27 | Nichia Chem Ind Ltd | Nitride semiconductor laser element |
JP2003086899A (en) * | 2001-09-12 | 2003-03-20 | Furukawa Electric Co Ltd:The | Semiconductor laser element and its manufacturing method |
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