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JPS6411349A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS6411349A
JPS6411349A JP62167334A JP16733487A JPS6411349A JP S6411349 A JPS6411349 A JP S6411349A JP 62167334 A JP62167334 A JP 62167334A JP 16733487 A JP16733487 A JP 16733487A JP S6411349 A JPS6411349 A JP S6411349A
Authority
JP
Japan
Prior art keywords
interconnection
axis
connection
junction
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62167334A
Other languages
Japanese (ja)
Inventor
Tatsuro Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62167334A priority Critical patent/JPS6411349A/en
Publication of JPS6411349A publication Critical patent/JPS6411349A/en
Pending legal-status Critical Current

Links

Landscapes

  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To make connection between a substrate and a conductive layer have low contact resistance as well as high critical current density by forming the above connection which is formed through intervening an insulating layer so that its connection is performed at a conductive part of its connection by a surface wherein a substrate layer or a semiconductor layer is formed and also by a junction surface which is not parallel to the above surface at least. CONSTITUTION:The first and second interconnection films 3 and 6 are formed by using superconductive conductors composed of, for example, La-Sr-Cu-O system materials and a part of the second interconnection film 6 is embedded in a contact hole 5 to form an electrode 7 and junction is made between the electrode 7 and the first interconnection film 3. In a normal conductive state, electric resistance to the direction of an axis c is higher than that of each direction in the axes a and b. The first and second interconnection films 3 and 6 or either of the above films shall be a single crystal interconnection composed of the superconductive conductors having electrical, magnetic anisotropy and perform a crystal growth so that an X direction falls to the axis a. As a junction part connecting with the upper surface of the interconnection film 3 is perpendicular to the axis c, electric resistance in this direction is high but the junction part connecting with the side of the interconnection film 3 allows a current to flow in the direction along the axis a. Then contact resistance can be decreased.
JP62167334A 1987-07-03 1987-07-03 Semiconductor device Pending JPS6411349A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62167334A JPS6411349A (en) 1987-07-03 1987-07-03 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62167334A JPS6411349A (en) 1987-07-03 1987-07-03 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS6411349A true JPS6411349A (en) 1989-01-13

Family

ID=15847807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62167334A Pending JPS6411349A (en) 1987-07-03 1987-07-03 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS6411349A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6437052A (en) * 1987-07-31 1989-02-07 Matsushita Electric Ind Co Ltd Semiconductor device
US5856275A (en) * 1990-11-01 1999-01-05 Sumitomo Electric Industries, Ltd. Superconducting wiring lines and process for fabricating the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6437052A (en) * 1987-07-31 1989-02-07 Matsushita Electric Ind Co Ltd Semiconductor device
US5856275A (en) * 1990-11-01 1999-01-05 Sumitomo Electric Industries, Ltd. Superconducting wiring lines and process for fabricating the same

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