JPS6363153A - Production of optical recording medium - Google Patents
Production of optical recording mediumInfo
- Publication number
- JPS6363153A JPS6363153A JP61208196A JP20819686A JPS6363153A JP S6363153 A JPS6363153 A JP S6363153A JP 61208196 A JP61208196 A JP 61208196A JP 20819686 A JP20819686 A JP 20819686A JP S6363153 A JPS6363153 A JP S6363153A
- Authority
- JP
- Japan
- Prior art keywords
- selenium
- nitrogen
- tellurium
- recording
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000007789 gas Substances 0.000 claims abstract description 20
- 239000011669 selenium Substances 0.000 claims abstract description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 13
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 13
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 12
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 12
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims abstract description 10
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000004544 sputter deposition Methods 0.000 claims abstract description 8
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims abstract description 6
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229960001730 nitrous oxide Drugs 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 6
- 230000035945 sensitivity Effects 0.000 abstract description 4
- 229910001370 Se alloy Inorganic materials 0.000 description 5
- 239000000203 mixture Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000011116 polymethylpentene Substances 0.000 description 2
- 229920000306 polymethylpentene Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- LEQRFHXXXRSFLO-UHFFFAOYSA-N [N].[Se] Chemical compound [N].[Se] LEQRFHXXXRSFLO-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はレーザ光によって情報を記録再生することので
きる光記録媒体の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of manufacturing an optical recording medium on which information can be recorded and reproduced using laser light.
[従来の技術]
レーザ光によって情報を媒体に記録しかつ再生する光デ
イスクメモリは、記録密度が高いことから大容量記録装
置として優れた特徴を有している。[Prior Art] Optical disk memories, which record and reproduce information on a medium using laser light, have excellent characteristics as large-capacity recording devices because of their high recording density.
この光記録媒体材料としては、最初にタンタルと鉛が使
用された(サイエンス(Science)154.15
50゜19E)6) )。それ以来種々の材料が使用さ
れているが、テルル(Te)等のカルコゲン元素または
これらの化合物はよく使用されており(特公昭47−2
13897号公報)、とくにテルル−セレン系合金はよ
く使用されている(特公昭54−41902号公報、特
公昭57−7919号公報、特公昭57−56058号
公報)。Tantalum and lead were first used as optical recording medium materials (Science 154.15
50°19E)6)). Since then, various materials have been used, but chalcogen elements such as tellurium (Te) or their compounds are often used (Japanese Patent Publication No. 47-2
13897), and tellurium-selenium based alloys are particularly commonly used (Japanese Patent Publication No. 54-41902, Japanese Patent Publication No. 57-7919, Japanese Patent Publication No. 57-56058).
近年、記録装置を小型化するため、レーザ光源としては
半導体レーザが使用されてきている。半導体レーザは発
振波長がaooo八前後へおるが、テルル−セレン系合
金はこの波長帯にも比較的よく適合し、適度な反射率と
適度な吸収率が得られる(フィジカ・スティタス・ソリ
ダイ(phys、 5tat。In recent years, in order to downsize recording devices, semiconductor lasers have been used as laser light sources. Semiconductor lasers have an oscillation wavelength of around 800 nm, and tellurium-selenium alloys are relatively well suited to this wavelength range, and can provide moderate reflectance and moderate absorption (physica status solidi). , 5tat.
sol、 7.189.1964) )。sol, 7.189.1964)).
このテルル−セレン系合金を光記録層として用いた光記
録媒体は第1図に示すような構成になっている。すなわ
ち基板1に隣接してテルル−セレン系合金よりなる記録
層21が設けられている。記録用レーザ光は基板1を通
して記録層21に集光照射され、ピット22が形成され
る。基板1としてはポリカーボネート、ポリオレフィン
、ポリメチルペンテン、アクリル、エポキシ樹脂等の合
成樹脂やガラスが使用され、基板1にはピットが同心円
状あるいはスパイラル状に一定間隔で精度よく記録され
るように通常案内溝が設けられている。An optical recording medium using this tellurium-selenium alloy as an optical recording layer has a structure as shown in FIG. That is, a recording layer 21 made of a tellurium-selenium alloy is provided adjacent to the substrate 1. The recording laser beam is focused and irradiated onto the recording layer 21 through the substrate 1, and pits 22 are formed. The substrate 1 is made of synthetic resin such as polycarbonate, polyolefin, polymethylpentene, acrylic, or epoxy resin, or glass, and is usually guided so that pits are recorded concentrically or spirally at regular intervals with high accuracy. A groove is provided.
レーザビーム径程度の幅の溝に光が入射すると光は回折
され、ビーム中心が溝からずれるにつれて回折光強度の
空間分布が変化するので、これを検出してレーザビーム
を溝の中心に入射させるようにサーボ系が構成されてい
る。溝の幅は通常0.3〜1゜3層mであり、溝の深さ
は使用するレーザ波長の1712から174の範囲に設
定される。集光に関しても同様にサーボ系が構成されて
いる。情報の読み出しは、記録のときよりも弱いパワー
のレーザ光をピット上を通過するように照射することに
より、ピットの有無に起因する反射率の変化を検出して
行う。When light enters a groove with a width similar to the diameter of the laser beam, the light is diffracted, and as the beam center shifts from the groove, the spatial distribution of the intensity of the diffracted light changes.This is detected and the laser beam is directed to the center of the groove. The servo system is configured as follows. The width of the groove is usually 0.3 to 1.3 layer m, and the depth of the groove is set within the range of 1712 to 174 of the laser wavelength used. A servo system is similarly configured for condensing light. Information is read by irradiating a laser beam with a weaker power than during recording so as to pass over the pits, and detecting changes in reflectance caused by the presence or absence of pits.
[発明が解決1ようとする問題点コ
しかしながら、テルル−セレン合金層を記録層として用
いた光記録媒体では耐候性と感度と信号品質のすべてを
満足するものではなかった。 4本発明は以上のような
問題点を解決するためになされたもので、耐候性がよく
、かつ高感度で信号品質が良好で安定な光記録媒体の製
造方法を提供することを目的とする。[Problems to be Solved by the Invention 1] However, optical recording media using a tellurium-selenium alloy layer as a recording layer do not satisfy all of weather resistance, sensitivity, and signal quality. 4 The present invention was made to solve the above problems, and its purpose is to provide a method for manufacturing an optical recording medium that has good weather resistance, high sensitivity, good signal quality, and stability. .
[問題点を解決するための手段]
本発明は基板上に、レーザ光によって一部が選択的に除
去されて情報を記録する記録層を形成することよりなる
光記録媒体の!!!造方決方法いて、前記記録層中に、
テルルとセレンを含む物質をターゲットとし、一酸化窒
素ガス、二酸化窒素ガスまたは二酸化窒素ガスを含むガ
ス中でスパッタリングすることによってテルルとセレン
と窒素とを主成分とする層を少なくとも設けることを特
徴とする光記録媒体の製造方法である。[Means for Solving the Problems] The present invention provides an optical recording medium in which a recording layer for recording information is formed on a substrate, a portion of which is selectively removed by laser light. ! ! The manufacturing method is such that in the recording layer,
A material containing tellurium and selenium is targeted, and at least a layer containing tellurium, selenium, and nitrogen as main components is provided by sputtering in nitrogen monoxide gas, nitrogen dioxide gas, or a gas containing nitrogen dioxide gas. This is a method of manufacturing an optical recording medium.
テルルとセレンと窒素とを主成分とする層(以下、テル
ル−セレン−窒素層と略す)の厚さは100人から10
00人の範囲が記録再生特性の観点から望ましく、セレ
ンの含有量は原子数パーセントで2パーセントから50
パーセントの範囲が記録再生特性、耐候性の観点から望
ましく、窒素の含有量は原子数パーセントで2パ一セン
ト以上20パーセント未満が記録再生特性、耐候性の観
点から望ましい。また、テルル−セレン−窒素層中の元
素の組成比は、ターゲットの組成比や一酸化窒素(No
)ガス酸化二窒素(N20)ガスあるいは二酸化窒素(
NO2)ガスの分圧に依存するのは勿論であるが、スパ
ッタ装置の大きざ(スパッタ室の表面積等)やスパッタ
時間等にも依存するので、所望の記録膜組成を得るため
には各スパッタ装置ごとにN0分圧等を適宜設定するこ
とが望ましい。The thickness of the layer whose main components are tellurium, selenium, and nitrogen (hereinafter abbreviated as tellurium-selenium-nitrogen layer) is 100 to 10.
A range of 0.00 is desirable from the viewpoint of recording/reproduction characteristics, and the selenium content ranges from 2% to 50% in terms of atomic percent.
The nitrogen content is preferably in the range of 2% or more and less than 20% in terms of atomic percent from the viewpoint of recording/reproducing characteristics and weather resistance. In addition, the composition ratio of elements in the tellurium-selenium-nitrogen layer is determined by the composition ratio of the target and nitrogen monoxide (No.
) gas dinitrogen oxide (N20) gas or nitrogen dioxide (
Of course, it depends on the partial pressure of NO2) gas, but also on the size of the sputtering equipment (surface area of the sputtering chamber, etc.), sputtering time, etc. Therefore, in order to obtain the desired recording film composition, it is necessary to It is desirable to set the N0 partial pressure etc. appropriately for each device.
テルルとセレンと窒素とを主成分とする層には、鉛、ア
ンチモン、ヒ素、イオウ、スズ、ゲルマニウム、タリウ
ム、リン、カドミウム、インジウム、ガリウム、亜鉛、
くスマス、アルミニウム、銅、銀、マグネシウム、タン
タル、金、パラジウム、コバルトの群から選ばれた少な
くとも1種の元素が添加されていてもよいもこの場合、
ピットの形状を良好に整える場合がある。ただし、添加
量は原子数パーセントで20パ一セント未満が望ましい
。The layer mainly composed of tellurium, selenium, and nitrogen contains lead, antimony, arsenic, sulfur, tin, germanium, thallium, phosphorus, cadmium, indium, gallium, zinc,
In this case, at least one element selected from the group consisting of aluminum, copper, silver, magnesium, tantalum, gold, palladium, and cobalt may be added.
In some cases, the shape of the pit can be improved. However, the amount added is preferably less than 20 percent in terms of atomic percent.
スパッタガスはNoガス、N20ガスおよびNO2ガス
のうち1種のみでもよいが、放電や成膜の安定性の観点
からは不活性ガスとの混合ガスが望ましい。また、さら
にその他のガスを混合してもよい。The sputtering gas may be only one of No gas, N20 gas, and NO2 gas, but from the viewpoint of stability of discharge and film formation, a mixed gas with an inert gas is preferable. Furthermore, other gases may be mixed.
テルル−セレン−窒素層と基板との間に、酸化物、窒化
物、フッ化物、炭化物、硫化物またはホウ化物で形成さ
れた層を少なくとも1層設けてもよい。この場合記録パ
ワー変動に対する余裕度が大きくなり、トラッキングや
フォーカスのサーボが安定になることがある。At least one layer formed of an oxide, nitride, fluoride, carbide, sulfide or boride may be provided between the tellurium-selenium-nitrogen layer and the substrate. In this case, there is a greater margin for recording power fluctuations, and tracking and focusing servo may become more stable.
また、基板としてはポリカーボネート、ポリオレフィン
、ポリメチルペンテン、アクリル、エポキシ樹脂等の合
成樹脂やガラスなど通常使用されているものが用いられ
る。Further, as the substrate, commonly used materials such as synthetic resins such as polycarbonate, polyolefin, polymethylpentene, acrylic and epoxy resins, and glass are used.
[実施例] 以下本発明の実施例について説明する。[Example] Examples of the present invention will be described below.
100℃で2時間アニール処理した内径15繭、外径1
30#、厚さ1.2mの案内溝付きポリカーボネート樹
脂ディスク基板上に、テルル−セレン合金ターゲットを
アルゴン(Ar>とNOとの混合ガスでマグネトロンス
パッタして、テルル(Te)とセレン(Se)と窒素(
N>の比が原子数パーセントで85対8対7のテルル−
セレン−窒素層を約240人厚形成し、しかる後、温度
85℃、相対湿度90%の環境に12時間保存して光記
録媒体を作製した。この光ディスクの波長8300人に
おける基板入射の反射率を測定したところ、約24%で
あった。Cocoon inner diameter 15, outer diameter 1 annealed at 100℃ for 2 hours
Tellurium (Te) and selenium (Se) were deposited on a 30#, 1.2 m thick polycarbonate resin disk substrate with a guide groove by magnetron sputtering a tellurium-selenium alloy target with a mixed gas of argon (Ar> and NO). and nitrogen (
Tellurium with a ratio of N> of 85:8:7 in atomic percent
A selenium-nitrogen layer was formed to a thickness of about 240 layers, and then stored in an environment at a temperature of 85° C. and a relative humidity of 90% for 12 hours to produce an optical recording medium. When the reflectance of this optical disc at a wavelength of 8,300 people was measured, it was approximately 24%.
波長8300人の半導体レーザ光を基板を通して入射し
て記録層上で1.6庫φ程度に絞り、媒体線速度5、6
5m/SeC,記録周波数3.778H2,記録パルス
幅70nSeC、記録パワー6.0mWの条件で記録し
、0.7mWで再生した。バンド幅30kH2のキャリ
アーとノイズとの比(C/N)は48d8と良好でおっ
た。この光ディスクを70℃、80%の高温高湿度の環
境に60時間保存した後、上記特性を調ぺたが変化はな
く、耐候性に優れた光記録媒体であることが確認された
。Semiconductor laser light with a wavelength of 8,300 is incident through the substrate and focused on the recording layer to a diameter of about 1.6, and the linear velocity of the medium is 5 and 6.
Recording was performed under the conditions of 5 m/SeC, recording frequency of 3.778H2, recording pulse width of 70 nSeC, and recording power of 6.0 mW, and reproduction was performed at 0.7 mW. The carrier-to-noise ratio (C/N) with a bandwidth of 30 kHz was good at 48d8. After this optical disc was stored in a high temperature and high humidity environment of 70° C. and 80% for 60 hours, the above characteristics were examined, and no change was observed, confirming that the optical recording medium had excellent weather resistance.
[発明の効果]
以上説明したように、本発明の方法によれば耐候性がよ
く、かつ高感度で信号品質が良好で安定な光記録媒体を
製造することができる。[Effects of the Invention] As explained above, according to the method of the present invention, it is possible to manufacture a stable optical recording medium with good weather resistance, high sensitivity, and good signal quality.
第1図は光記録媒体の1例を示す部分断面図である。 1・・・基板 21・・・記録層 22・・・ピット FIG. 1 is a partial sectional view showing an example of an optical recording medium. 1... Board 21...Recording layer 22...Pit
Claims (1)
されて情報を記録する記録層を形成することよりなる光
記録媒体の製造方法において、前記記録層中に、テルル
とセレンを含む物質をターゲットとし、一酸化窒素ガス
、酸化二窒素ガスまたは二酸化窒素ガスを含むガス中で
スパッタリングすることによってテルルとセレンと窒素
とを主成分とする層を少なくとも設けることを特徴とす
る光記録媒体の製造方法。(1) A method for manufacturing an optical recording medium comprising forming a recording layer on a substrate, a portion of which is selectively removed by a laser beam to record information, wherein the recording layer contains tellurium and selenium. An optical recording medium characterized in that at least a layer containing tellurium, selenium, and nitrogen as main components is provided by sputtering a substance as a target in a gas containing nitrogen monoxide gas, dinitrogen oxide gas, or nitrogen dioxide gas. manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61208196A JPS6363153A (en) | 1986-09-03 | 1986-09-03 | Production of optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61208196A JPS6363153A (en) | 1986-09-03 | 1986-09-03 | Production of optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6363153A true JPS6363153A (en) | 1988-03-19 |
Family
ID=16552249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61208196A Pending JPS6363153A (en) | 1986-09-03 | 1986-09-03 | Production of optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6363153A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63171446A (en) * | 1987-01-09 | 1988-07-15 | Mitsubishi Kasei Corp | Manufacture of optical recording medium |
US6153063A (en) * | 1996-03-11 | 2000-11-28 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
US6268034B1 (en) | 1998-08-05 | 2001-07-31 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and method for producing the same, method for recording and reproducing information thereon and recording/reproducing apparatus |
US6343062B1 (en) | 1997-09-26 | 2002-01-29 | Matsushita Electric Industrial Co., Ltd | Optical disk device and optical disk for recording and reproducing high-density signals |
US6388984B2 (en) | 1997-08-28 | 2002-05-14 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and its recording and reproducing method |
WO2003101750A1 (en) * | 2002-06-03 | 2003-12-11 | Pioneer Corporation | Information recording medium and process for producing the same |
US6821707B2 (en) | 1996-03-11 | 2004-11-23 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6034897A (en) * | 1983-08-08 | 1985-02-22 | Nippon Telegr & Teleph Corp <Ntt> | Rewritable optical recording medium |
JPS6134741A (en) * | 1984-07-09 | 1986-02-19 | アメリカン テレフォン アンド テレグラフ カムパニー | Medium for storage of information |
JPS6211685A (en) * | 1985-07-10 | 1987-01-20 | Mitsubishi Chem Ind Ltd | Optical recording medium |
-
1986
- 1986-09-03 JP JP61208196A patent/JPS6363153A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6034897A (en) * | 1983-08-08 | 1985-02-22 | Nippon Telegr & Teleph Corp <Ntt> | Rewritable optical recording medium |
JPS6134741A (en) * | 1984-07-09 | 1986-02-19 | アメリカン テレフォン アンド テレグラフ カムパニー | Medium for storage of information |
JPS6211685A (en) * | 1985-07-10 | 1987-01-20 | Mitsubishi Chem Ind Ltd | Optical recording medium |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63171446A (en) * | 1987-01-09 | 1988-07-15 | Mitsubishi Kasei Corp | Manufacture of optical recording medium |
US6153063A (en) * | 1996-03-11 | 2000-11-28 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
US6821707B2 (en) | 1996-03-11 | 2004-11-23 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
US7037413B1 (en) | 1996-03-11 | 2006-05-02 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
US6388984B2 (en) | 1997-08-28 | 2002-05-14 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and its recording and reproducing method |
US6343062B1 (en) | 1997-09-26 | 2002-01-29 | Matsushita Electric Industrial Co., Ltd | Optical disk device and optical disk for recording and reproducing high-density signals |
US6268034B1 (en) | 1998-08-05 | 2001-07-31 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and method for producing the same, method for recording and reproducing information thereon and recording/reproducing apparatus |
WO2003101750A1 (en) * | 2002-06-03 | 2003-12-11 | Pioneer Corporation | Information recording medium and process for producing the same |
US7524612B2 (en) | 2002-06-03 | 2009-04-28 | Pioneer Corporation | Information recording medium and process for producing the same |
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