JPS6355857B2 - - Google Patents
Info
- Publication number
- JPS6355857B2 JPS6355857B2 JP526383A JP526383A JPS6355857B2 JP S6355857 B2 JPS6355857 B2 JP S6355857B2 JP 526383 A JP526383 A JP 526383A JP 526383 A JP526383 A JP 526383A JP S6355857 B2 JPS6355857 B2 JP S6355857B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- bulb
- halogen
- air
- cooling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052736 halogen Inorganic materials 0.000 claims description 27
- 150000002367 halogens Chemical class 0.000 claims description 27
- 238000001816 cooling Methods 0.000 claims description 24
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000011144 upstream manufacturing Methods 0.000 description 10
- 229910052721 tungsten Inorganic materials 0.000 description 7
- 239000010937 tungsten Substances 0.000 description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004781 supercooling Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- -1 tungsten halide Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Furnace Details (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP526383A JPS59132118A (ja) | 1983-01-18 | 1983-01-18 | 光照射装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP526383A JPS59132118A (ja) | 1983-01-18 | 1983-01-18 | 光照射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59132118A JPS59132118A (ja) | 1984-07-30 |
| JPS6355857B2 true JPS6355857B2 (ru) | 1988-11-04 |
Family
ID=11606338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP526383A Granted JPS59132118A (ja) | 1983-01-18 | 1983-01-18 | 光照射装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59132118A (ru) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0462048U (ru) * | 1990-10-02 | 1992-05-27 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001082348A1 (en) * | 2000-04-20 | 2001-11-01 | Tokyo Electron Limited | Thermal processing system |
| US20070167029A1 (en) * | 2005-11-11 | 2007-07-19 | Kowalski Jeffrey M | Thermal processing system, components, and methods |
| JP6094605B2 (ja) * | 2015-01-20 | 2017-03-15 | トヨタ自動車株式会社 | 単結晶製造装置 |
-
1983
- 1983-01-18 JP JP526383A patent/JPS59132118A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0462048U (ru) * | 1990-10-02 | 1992-05-27 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59132118A (ja) | 1984-07-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI613936B (zh) | 用於控制一光維持電漿中之對流之方法及系統 | |
| US4550245A (en) | Light-radiant furnace for heating semiconductor wafers | |
| JP2002203804A (ja) | 加熱装置、当該加熱装置を有する熱処理装置、及び、熱処理制御方法 | |
| JPS59928A (ja) | 光加熱装置 | |
| JPS63502548A (ja) | シリコンウエフア−の如き薄い部品の熱処理の為の装置 | |
| US1895887A (en) | Incandescent electric lamp | |
| JP2019145518A (ja) | 光維持プラズマを形成するための開放プラズマランプ | |
| KR19980041866A (ko) | 반도체 웨이퍼용 열 처리기 | |
| KR100970013B1 (ko) | 열처리 장치 | |
| US4883424A (en) | Apparatus for heat treating substrates | |
| JPS6355857B2 (ru) | ||
| US3817710A (en) | Apparatus for producing crystal | |
| JP2006524885A (ja) | 赤外線放射器および照明装置 | |
| SU953975A3 (ru) | Устройство дл стерилизации жидкостей | |
| KR100906711B1 (ko) | 급속열처리 장치 | |
| JP4329629B2 (ja) | エキシマランプ | |
| NO115469B (ru) | ||
| JPH09210577A (ja) | 流体の温度制御装置 | |
| JPH05136074A (ja) | 半導体製造装置等における加熱装置 | |
| JPS6111401B2 (ru) | ||
| JPS634345Y2 (ru) | ||
| SU760490A1 (ru) | Установка инфракрасного нагрева 1 | |
| JPH02282689A (ja) | 赤外線加熱炉 | |
| JPH09199509A (ja) | 半導体成膜装置 | |
| JPH097550A (ja) | 紫外線ランプ |