JPS63313457A - Electron-optical applied device - Google Patents
Electron-optical applied deviceInfo
- Publication number
- JPS63313457A JPS63313457A JP62149597A JP14959787A JPS63313457A JP S63313457 A JPS63313457 A JP S63313457A JP 62149597 A JP62149597 A JP 62149597A JP 14959787 A JP14959787 A JP 14959787A JP S63313457 A JPS63313457 A JP S63313457A
- Authority
- JP
- Japan
- Prior art keywords
- coil
- electron
- lens system
- coils
- current value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 claims abstract description 16
- 239000004020 conductor Substances 0.000 claims description 4
- 238000001816 cooling Methods 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000004804 winding Methods 0.000 abstract description 2
- 239000003973 paint Substances 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000012212 insulator Substances 0.000 description 6
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 2
- 229910001006 Constantan Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 201000009310 astigmatism Diseases 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001198 high resolution scanning electron microscopy Methods 0.000 description 1
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
この発明は、電子顕微鏡およびイオン・マイクロ・アナ
ライザー等の各種電子光学応用装置に係り、特に、その
電子レンズ系の各部を構成するコイルの耐熱温度向上を
図った電子光学応用装置に関する。Detailed Description of the Invention "Field of Industrial Application" This invention relates to various electron optical applied devices such as electron microscopes and ion microanalyzers, and in particular, to heat resistance of coils constituting each part of the electron lens system. This invention relates to an electro-optical application device that aims to improve temperature.
「従来の技術」
例えば、TEM(透過型電子顕微鏡)、SEM(走査型
電子顕微鏡)、およびFIB(フォーカスト・イオン・
ビーム)装置等の電子レンズ系の各部には、励磁用のコ
イルを有する電子レンズ(コンデンサ・レンズ、対物レ
ンズ等)や、偏向コイル(軸合わせ用コイル、非点補正
コイル、走査コイル等)が設けられている。従来、この
種の電子レンズ系の各部のコイルは、導線を樹脂系絶縁
物で被覆した絶縁電線によって構成するのが一般的であ
った。"Conventional technology" For example, TEM (transmission electron microscope), SEM (scanning electron microscope), and FIB (focused ion microscope)
Each part of an electronic lens system such as a beam) device has an electronic lens (condenser lens, objective lens, etc.) with an excitation coil, and a deflection coil (alignment coil, astigmatism correction coil, scanning coil, etc.). It is provided. Conventionally, the coils of each part of this type of electronic lens system have generally been constructed of insulated wires in which conductive wires are coated with a resin-based insulator.
「発明が解決しようとする問題点」
ところで、樹脂系絶縁物の耐熱温度は、通常150℃前
後であり、この耐熱温度以上の高温度においては、その
絶縁特性を維持することができず、したがって、従来の
電子光学応用装置においては、以下に示すような問題が
あった。"Problems to be Solved by the Invention" By the way, the heat-resistant temperature of resin-based insulators is usually around 150°C, and at temperatures higher than this heat-resistant temperature, they cannot maintain their insulating properties. However, conventional electro-optical application devices have the following problems.
■コイルに流す電流によって、コイル自体が発熱するた
め、特に、大きな電流を必要とするコンデンサ・レンズ
や対物レンズ等においては、水冷パイプ等の冷却装置を
設け、コイルを樹脂系絶縁物の耐熱温度以下となるよう
に冷却しなければならず、装置の複雑化が避けられない
。■Since the coil itself generates heat due to the current flowing through it, especially for condenser lenses and objective lenses that require large currents, a cooling device such as a water cooling pipe is installed, and the coil is heated to the temperature limit of resin-based insulators. It must be cooled to meet the following requirements, which inevitably complicates the equipment.
■上記■の理由により、コイルに流せる許容最大電流値
が制限され、これによりコイルのターン数を大としなけ
ればならず、装置が大形化してしまう。(2) Due to the reason (2) above, the maximum permissible current value that can be passed through the coil is limited, which necessitates increasing the number of turns in the coil, resulting in an increase in the size of the device.
■例えば、電界放射型のカソードを用いたSEMのよう
に、電子レンズ系内の真空度を高レベルに維持する必要
のあるSEMにおいては、加熱装置によって電子レンズ
系全体を加熱(ベーキング)し、系内に存在する汚染物
質の排出、いわゆるガス出しを行う必要があるが、コイ
ル設置部分については、その温度を樹脂系絶縁物の耐熱
温度以上とすることができず、部分的なベーキングしか
実施できない。For example, in a SEM that uses a field emission type cathode, where it is necessary to maintain a high degree of vacuum within the electron lens system, the entire electron lens system is heated (baked) using a heating device. It is necessary to discharge contaminants existing in the system, so-called gas venting, but the temperature of the coil installation area cannot be raised above the heat resistance temperature of the resin-based insulator, so only partial baking can be performed. Can not.
この発明は上述した事情に鑑みてなされたもので、電子
レンズ系の各部を構成するコイルの耐熱温度向上を図り
、これにより、コイルの許容最大電流値の向上、装置の
簡素化、および高真空度に対する要求を充分に達成し得
る電子光学応用装置を提供することを目的としている。This invention was made in view of the above-mentioned circumstances, and aims to improve the heat resistance temperature of the coils constituting each part of the electronic lens system, thereby improving the maximum allowable current value of the coils, simplifying the device, and achieving high vacuum The object of the present invention is to provide an electro-optical application device that can satisfactorily meet the requirements for optical performance.
「問題点を解決するための手段」
この発明は、電子レンズ系の各部のコイルを、セラミッ
クによって導線を被覆してなるセラミック絶縁電線によ
って構成したことを特徴としている。"Means for Solving the Problems" The present invention is characterized in that the coils of each part of the electron lens system are constructed of ceramic insulated wires in which conductive wires are coated with ceramic.
「作用」
電子レンズ系の各部を構成するコイルの耐熱温度が向上
し、これにより、コイルを冷却する冷却装置が一切不要
となり、装置が簡素化され、また、各コイルの許容最大
電流値が向上するため、コイルのターン数を減らして電
流値を増加させることができ、各コイルの小形化が可能
となり、さらに、電子レンズ系全体を均一に、かつ高温
度でベーキングすることが可能となり、電子レンズ系の
真空度を高いレベルに維持することができる。"Effect" The heat resistance temperature of the coils that make up each part of the electronic lens system is improved, which eliminates the need for any cooling device to cool the coils, simplifying the equipment, and increasing the maximum allowable current value of each coil. Therefore, it is possible to reduce the number of turns in the coil and increase the current value, making it possible to downsize each coil.Furthermore, it is possible to bake the entire electron lens system uniformly and at high temperature, making it possible to increase the current value by reducing the number of turns in the coil. The degree of vacuum in the lens system can be maintained at a high level.
「実施例」
以下、図面を参照し、この発明の実施例について説明す
る。"Embodiments" Hereinafter, embodiments of the present invention will be described with reference to the drawings.
図はこの発明の一実施例が適用されるSEMの概略構成
を示す図である。The figure is a diagram showing a schematic configuration of a SEM to which an embodiment of the present invention is applied.
この図において、1はフィラメント1aと、ウェーネル
トibと、アノードlcからなる電子銃であり、この電
子銃lで発生した電子線は、コンデンサ・レンズ2と、
対物レンズ3によって集束され、また偏向コイル4によ
って偏向されて、試料5上を走査するようになっている
。そして、試料5の各点から放出される2次電子は、2
次電子検出器6によって検出され、増幅器7によって増
幅された後、映像信号としてCRT(陰極線管)8に供
給される。この際、偏向コイル4とCRT8の偏向コイ
ルは同一の走査電源9によって同期して駆動され、これ
により、CRTB上に試料5の拡大像が表示される。In this figure, 1 is an electron gun consisting of a filament 1a, Wehnelt ib, and an anode lc, and the electron beam generated by this electron gun 1 is transmitted to a condenser lens 2,
It is focused by an objective lens 3 and deflected by a deflection coil 4 to scan over a sample 5. The secondary electrons emitted from each point on the sample 5 are 2
After being detected by an electron detector 6 and amplified by an amplifier 7, it is supplied to a CRT (cathode ray tube) 8 as a video signal. At this time, the deflection coil 4 and the deflection coil of the CRT 8 are driven synchronously by the same scanning power source 9, thereby displaying an enlarged image of the sample 5 on the CRTB.
ここで、コンデンサ・レンズ2と対物レンズ3は、磁性
体のコイルカバー2a、3a内にコイル2b。Here, the condenser lens 2 and the objective lens 3 have a coil 2b inside a magnetic coil cover 2a, 3a.
3bを収納し、その起磁力を中央間隙に集中させ、中心
を通過する電子線に対して、レンズ作用を与える構造と
なっている。3b, its magnetomotive force is concentrated in the center gap, and a lens effect is applied to the electron beam passing through the center.
次に、本実施例の要部について説明すれば、上記コンデ
ンサ・レンズ2および対物レンズ3の各コイル2bおよ
び3bと、偏向コイル4は、全て成型加工の容易な特殊
なセラミック絶縁電線(例えば、藤倉電線株式会社製フ
ジサーモ)によって構成されている。このセラミック絶
縁電線の製造方法に関しては、特開昭55−43746
号に開示されているので、その詳細については説明を省
略するが、要は、導線を被覆する絶縁塗膜層が未だセラ
ミック化されていない未焼成の半製品の段階で、コイル
巻き加工等の成型加工を行い、その後、高温で焼成して
塗膜層をセラミック化するものである。このような特殊
なセラミック絶縁電線は、焼成前には、エナメル線と同
等の可撓性を有し、焼成後には絶縁体がセラミック化し
、セラミックと同等の絶縁性と耐熱性を発揮する。セラ
ミック電線は、耐熱温度が350〜800℃(耐熱温度
は導線の材質に依存し、例えば、導線がアルミニウム、
コンスタンタンの場合350℃、ニッケルメッキ銅の場
合400℃、銀の場合500’C1金。Next, to explain the main parts of this embodiment, the coils 2b and 3b of the condenser lens 2 and objective lens 3, and the deflection coil 4 are all made of special ceramic insulated wires that are easy to mold (for example, It is composed of Fujithermo (manufactured by Fujikura Electric Cable Co., Ltd.). Regarding the manufacturing method of this ceramic insulated wire, please refer to Japanese Patent Application Laid-Open No. 55-43746.
The detailed explanation will be omitted, but the point is that the insulating coating layer that covers the conductor is still in the unfired, semi-finished stage, and the coil winding process etc. The coating layer is molded and then fired at a high temperature to form a ceramic layer. Before firing, such a special ceramic insulated wire has flexibility equivalent to that of an enameled wire, and after firing, the insulator becomes ceramic and exhibits insulation and heat resistance equivalent to ceramic. Ceramic wires have a heat resistance temperature of 350 to 800°C (heat resistance temperature depends on the material of the conductor, for example, if the conductor is aluminum,
350°C for constantan, 400°C for nickel-plated copper, and 500'C1 gold for silver.
白金、白金ロジウムの場合800℃)であり、樹脂系の
絶縁物の耐熱温度150℃より、はるかに高い。このた
め、従来、必要であった水冷パイプ等の冷却装置が一切
不要となり、装置の構成が簡素化され、また安価に構成
できる。一方、通常、水冷を行わない偏向コイル4に関
しても、耐熱性が向上するため、その部分の温度上昇を
気にすることなく、200〜300℃のベーキングを行
う事ができる。これにより、従来では部分的なベーキン
グしか実施できなかった電子レンズ系全体を均一な温度
でベーキングすることが可能となり、電子レンズ系の真
空度を高いレベルに維持することができる。このように
真空度を高レベルに維持できることは、近年開発が鋭意
進められている電界放射型カソードを用いた超高分解能
SEMおよびTEMに適用して効果的であるばかりか、
電子ビームやイオンビームを用いた分析装置、例えばA
ES(オージェ・エレクトロン・スペクトロスコピー)
やI M A (イオン・マイクロ・アナライザー)等
に対しても、その検出限界レベルを下げ、感度を上げる
意味から、極めて有効であると言える。In the case of platinum and platinum-rhodium, the heat resistance temperature is 800°C), which is much higher than the heat resistance temperature of resin-based insulators, which is 150°C. Therefore, a conventionally necessary cooling device such as a water cooling pipe is not required at all, and the configuration of the device is simplified and can be constructed at low cost. On the other hand, since the deflection coil 4, which is not normally water-cooled, has improved heat resistance, it can be baked at 200 to 300°C without worrying about the temperature rise in that part. As a result, it becomes possible to bake the entire electron lens system at a uniform temperature, whereas in the past, only a portion of the electron lens system could be baked, and the degree of vacuum in the electron lens system can be maintained at a high level. Being able to maintain a high degree of vacuum in this way is not only effective when applied to ultra-high resolution SEM and TEM using field emission cathodes, which have been actively developed in recent years.
Analyzers using electron beams or ion beams, such as A
ES (Auger Electron Spectroscopy)
It can be said that it is extremely effective for lowering the detection limit level and increasing sensitivity for IMA (ion micro analyzer) and the like.
「発明の効果」
以上説明したように、この発明によれば、電子レンズ系
の各部のコイルを、耐熱性の高いセラミック絶縁電線に
よって構成したので、次に示すような効果が得られる。"Effects of the Invention" As explained above, according to the present invention, the coils of each part of the electron lens system are constructed of ceramic insulated wires with high heat resistance, so that the following effects can be obtained.
■電子レンズ系の各部のコイルを冷却する水冷パイプ等
の冷却装置が一切不要となり、これにより装置の簡素化
が図られ、製造コストの低減が図れる。■A cooling device such as a water cooling pipe for cooling the coils of each part of the electronic lens system is completely unnecessary, which simplifies the device and reduces manufacturing costs.
■電子レンズ系全体の耐熱温度が上がり、これにより、
従来と比較して、電子レンズ系全体を均一に、かつ高温
度でベーキングしてガス出しを実施することが可能とな
り、電子レンズ系の真空度を高レベルに維持することが
できる。■The heat resistance temperature of the entire electronic lens system has increased, and as a result,
Compared to the conventional method, the entire electron lens system can be baked uniformly and at a high temperature to release gas, and the degree of vacuum in the electron lens system can be maintained at a high level.
■電子レンズ系の各コイルの耐熱温度が上がり、各コイ
ルの許容最大電流値が向上するため、各コイルのターン
数を減らして電流値を増加させることができ、これによ
り、各コイルの小形化が実現できる。■As the heat resistance temperature of each coil in the electronic lens system increases and the maximum allowable current value of each coil increases, it is possible to reduce the number of turns in each coil and increase the current value, which makes each coil smaller. can be realized.
図はこの発明が適用される走査型電子顕微鏡の概略構成
図である。
2・・・・・・コンデンサ・レンズ、2b・・・・・・
コイル、3・・・・・・対物レンズ、3b・・・・・・
コイル、4・・・・・・偏向コイル。The figure is a schematic configuration diagram of a scanning electron microscope to which the present invention is applied. 2...Condenser lens, 2b...
Coil, 3...Objective lens, 3b...
Coil, 4...Deflection coil.
Claims (1)
線を被覆してなるセラミック絶縁電線によって構成した
ことを特徴とする電子光学応用装置。An electro-optical application device characterized in that the coils of each part of an electron lens system are constructed of ceramic insulated wires made by covering conductor wires with ceramic.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62149597A JPS63313457A (en) | 1987-06-16 | 1987-06-16 | Electron-optical applied device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62149597A JPS63313457A (en) | 1987-06-16 | 1987-06-16 | Electron-optical applied device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63313457A true JPS63313457A (en) | 1988-12-21 |
Family
ID=15478686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62149597A Pending JPS63313457A (en) | 1987-06-16 | 1987-06-16 | Electron-optical applied device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63313457A (en) |
-
1987
- 1987-06-16 JP JP62149597A patent/JPS63313457A/en active Pending
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