JPS63304650A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS63304650A JPS63304650A JP14023687A JP14023687A JPS63304650A JP S63304650 A JPS63304650 A JP S63304650A JP 14023687 A JP14023687 A JP 14023687A JP 14023687 A JP14023687 A JP 14023687A JP S63304650 A JPS63304650 A JP S63304650A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- solder
- heat sink
- power transistor
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はパワートランジスターチップ等i+田でヒート
シンクに取)付けた半導体装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor device such as a power transistor chip attached to a heat sink using an i+ field.
従来、この種のヒートシンクは銅、アルミ、鉄などの表
面にニッケル(N、)メッキをほどこしてい友。このN
iメッキ上にパワートランジスタテップを半田付けして
いた。Conventionally, this type of heat sink was made by applying nickel (N) plating to the surface of copper, aluminum, iron, etc. This N
A power transistor tip was soldered onto the i-plating.
上述した従来のヒートシンクはNiメッキが表面全体が
一様である為、以下の様な問題点があった0
1)半田のNiメッキへの濡れ性をよくしようとした時
はNiメッキの粒子の大きさを大きくすればよいが半田
量が多い時、必要な部分以外に半田が広がり、ケース等
の貼シ付は部分等に半田がついた時はケース等の密着不
良を起した。The conventional heat sink mentioned above has the following problems because the Ni plating is uniform over the entire surface. 1) When trying to improve the wettability of solder to the Ni plating, the Ni plating particles It is possible to increase the size, but when the amount of solder is large, the solder spreads to areas other than the necessary areas, and when attaching a case, etc., if solder adheres to a part, etc., it causes poor adhesion of the case, etc.
2)前記l)とは逆に半田の広がりを抑えようとN1メ
ッキの粒子金車さくすると半田の濡れ性が悪るくなシ、
バサートランジスターチップ等の接続不良を起した。2) Contrary to 1) above, if you try to reduce the spread of the solder by using a particle wheel of N1 plating, the wettability of the solder will be poor.
A connection failure occurred in the bass transistor chip, etc.
父上記問題点を解決する為に従来は部分的に札Ag等を
メッキする事が行なわれているが、これはヒートシンク
が高価となる欠点があった。In order to solve the above-mentioned problems, it has conventionally been done to partially plate the tag with Ag, etc., but this has the disadvantage that the heat sink becomes expensive.
本発明によればヒートシンク上にN□メッキが施され、
このNiメッキの粒子は所定部で他部よカも大きくされ
ておシ、この所定部にトランジスターチップが半田付は
烙れた半導体装置を得る。According to the present invention, N□ plating is applied on the heat sink,
The particles of the Ni plating are made larger in a predetermined part than in other parts, and a transistor chip is soldered to this predetermined part to obtain a semiconductor device.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は不発明の一実施例に用いるヒートシンクを示す
図である。ヒートシンクlの表面には粒子の小さいNi
メッキ4が設けられておル、更にこのNiミッキ4上の
パワートランジスター等の取付部2には粒子の大きなN
iメッキ5が施されている。FIG. 1 is a diagram showing a heat sink used in an embodiment of the invention. The surface of the heat sink l is covered with small particles of Ni.
The plating 4 is provided with Ni plating 4, and the mounting part 2 of the power transistor etc. on the Ni plating 4 is coated with large particles of N.
I-plating 5 is applied.
第2図は第1図のA−A’部での断面図である。FIG. 2 is a sectional view taken along line A-A' in FIG.
ヒートシンク1の母材全体に粒子の小さいNiメッキ4
がされており、パワートランジスター等取付部分2のみ
粒子の大きいNiメッキ5がさ詐ている。このヒートシ
ンクlを作成する工程はまずヒートシンク母材3にNi
メッキ4を全面に施こし、次にパワートランジスタ等取
付部分2以外をホトレジスト等でマスクを施こしてた後
、Niメッキ5を行い、最後にホトレジストヲ剥離する
。Ni plating with small particles 4 on the entire base material of heat sink 1
The Ni plating 5 with large particles is hidden only on the mounting part 2 of the power transistor etc. The process of creating this heat sink 1 is to first apply Ni to the heat sink base material 3.
Plating 4 is applied to the entire surface, and then the areas other than the parts 2 where power transistors and the like are attached are masked with photoresist, etc., Ni plating 5 is applied, and finally the photoresist is peeled off.
〔発明の効果〕
以上説明したように、本発明はヒートシンクのパワート
ランジスタ等取付部のNiメッキは粒子が大きく他の部
分のNiメッキは粒子が小さい事によりパワートランジ
スターチップ等を半田で取付ける時半田の濡れ性はよく
かつ半田の広が9が不必要な部分に及ぶことが少なくな
る。[Effects of the Invention] As explained above, the present invention is effective for attaching power transistor chips, etc. with solder because the Ni plating on the mounting part of the heat sink for power transistors, etc. has large particles, and the Ni plating on other parts has small particles. The wettability of the solder is good and the spread of solder 9 is less likely to reach unnecessary areas.
又Au、Ag等の部分メッキに比較して割安となる。Also, it is cheaper than partial plating of Au, Ag, etc.
第1図は本発明の一実施例に用いるヒートシンクの平面
図であり、第2図はそのA−A’での断面図である。
1・・・・・ヒートシンク、2・・・・・・パワートラ
ンジスター等取付部、3・・・・・・ヒートシンク母材
、4・・・・・・N・メッキ、5・・・・・・Niメッ
キ。
代理人 弁理士 内 原 晋、、、、)= 、、
、、7ゝ・1く′・・ ′FIG. 1 is a plan view of a heat sink used in an embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line AA'. 1...Heat sink, 2...Mounting part for power transistors, etc., 3...Heat sink base material, 4...N-plating, 5... Ni plated. Agent: Susumu Uchihara, patent attorney...
,,7ゝ・1ku'...'
Claims (1)
粒子は所定部分で他の部分より大きくなされており、該
所定部分にトランジスタチップが取り付けられている事
を特徴とする半導体装置。1. A semiconductor device characterized in that a heat sink surface is metal plated, particles of the metal plating are larger in a predetermined part than in other parts, and a transistor chip is attached to the predetermined part.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14023687A JPS63304650A (en) | 1987-06-03 | 1987-06-03 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14023687A JPS63304650A (en) | 1987-06-03 | 1987-06-03 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63304650A true JPS63304650A (en) | 1988-12-12 |
Family
ID=15264076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14023687A Pending JPS63304650A (en) | 1987-06-03 | 1987-06-03 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63304650A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5057903A (en) * | 1989-07-17 | 1991-10-15 | Microelectronics And Computer Technology Corporation | Thermal heat sink encapsulated integrated circuit |
-
1987
- 1987-06-03 JP JP14023687A patent/JPS63304650A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5057903A (en) * | 1989-07-17 | 1991-10-15 | Microelectronics And Computer Technology Corporation | Thermal heat sink encapsulated integrated circuit |
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