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JPS63214941A - Optical recording medium manufacturing method and manufacturing device - Google Patents

Optical recording medium manufacturing method and manufacturing device

Info

Publication number
JPS63214941A
JPS63214941A JP4826687A JP4826687A JPS63214941A JP S63214941 A JPS63214941 A JP S63214941A JP 4826687 A JP4826687 A JP 4826687A JP 4826687 A JP4826687 A JP 4826687A JP S63214941 A JPS63214941 A JP S63214941A
Authority
JP
Japan
Prior art keywords
substrate
manufacturing
recording medium
optical recording
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4826687A
Other languages
Japanese (ja)
Other versions
JP2569535B2 (en
Inventor
Nobuko Gomi
五味 信子
Akira Aoyama
明 青山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP62048266A priority Critical patent/JP2569535B2/en
Publication of JPS63214941A publication Critical patent/JPS63214941A/en
Application granted granted Critical
Publication of JP2569535B2 publication Critical patent/JP2569535B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光記録媒体の製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing an optical recording medium.

〔発明の概要〕[Summary of the invention]

本発明は、記録・再生あるいは消去が可能な光記録媒体
の製造方法において、透明樹脂基板の少なくとも記録面
の反対側には製造用治呉を存在させないことにより、成
膜中に透明樹脂基板の温度上昇とガス放出を大幅に減少
できるようにしたものである。
The present invention provides a method for manufacturing an optical recording medium capable of recording, reproducing, or erasing, by not providing a manufacturing adhesive at least on the opposite side of the recording surface of the transparent resin substrate, so that the transparent resin substrate can be removed during film formation. This makes it possible to significantly reduce temperature rise and gas emissions.

〔従来の技術〕[Conventional technology]

従来の光記録媒体の製造方法は、第2図に示すようにス
テンレス製の基板ホルダー4、と基板オサエ5、により
プラスチック基板6を固定しスパッタリングする方法で
ある。
A conventional method for manufacturing an optical recording medium is to fix a plastic substrate 6 using a stainless steel substrate holder 4 and a substrate support 5 and perform sputtering, as shown in FIG.

ところが、基板を支えている泊呉4が金属であるためス
パッタリングによるターゲットからの熱線放q者の際に
、治具が熱を吸収してしまう、つまり、基板がその影響
によりガス(0,、Il、o>を放出してしまうという
問題があった。そこで従来の手段として成膜中の基板温
度上昇が50°C以下になる成膜速度で作成していた。
However, since the base plate 4 supporting the substrate is made of metal, the jig absorbs heat when the heat rays are emitted from the sputtering target. There was a problem that Il,o> was released.Therefore, as a conventional means, the film was formed at a film forming rate such that the substrate temperature rise during film forming was 50°C or less.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、前述の主流となっている基板ホルダー面への置
き合わせは非常に温度を上げ易いため、スパッタリング
する際にはターゲットへの投入電力を上げるごとに基板
温度が上昇してしまう。このことによりターゲットへの
投入電力を上げるはどプラスチック基板のガス放出量が
多くなり、成膜した痕の劣化を極端に速めてしよう。又
、温度上昇を押さえるためターゲットへの投入電力を少
なくすると成膜速度が遅くなり、量産を考えると時間が
かかりすぎるという重大な問題点を有していた。
However, since the above-mentioned mainstream placement on the substrate holder surface is very likely to raise the temperature, the substrate temperature increases each time the power input to the target is increased during sputtering. As a result, even if the power input to the target is increased, the amount of gas released from the plastic substrate will increase, and the deterioration of the deposited film will be extremely accelerated. Furthermore, if the power input to the target is reduced in order to suppress the temperature rise, the film formation rate becomes slow, which poses a serious problem in that it takes too much time when mass production is considered.

そこで本発明はこのような問題点を解決するもので、そ
の目的とするところは、成り速度を上げても基板温度上
昇を少なくでき、ガス放出量を極力減少させるところに
ある。その上スパッタ81 mlが短時間で済む、つま
りターゲットへの投入電力を多くしてスパッタしても光
記録媒体としての良好な特性を11侍し、大量生産でき
る光記録媒体の製造方法を提供するところにある。
The present invention is intended to solve these problems, and its purpose is to reduce the rise in substrate temperature even if the growth rate is increased, and to reduce the amount of gas released as much as possible. In addition, the present invention provides a method for producing an optical recording medium that can be sputtered in a short time by sputtering 81 ml, that is, has good characteristics as an optical recording medium even when sputtering is performed by increasing the power input to the target, and that can be mass-produced. It's there.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の光記録媒体の製造方法は、光!Li録媒体の製
造用治具において、透明樹脂lA仮の少なくとも記録面
の反対側には、製造用治具が存在しないことを特徴とす
る。
The method for manufacturing an optical recording medium of the present invention is based on Hikari! The Li recording medium manufacturing jig is characterized in that no manufacturing jig exists at least on the opposite side of the temporary transparent resin lA recording surface.

〔実施例〕〔Example〕

第1図は、本発明の実施例における基板セット川治具の
断面図であって、lはステンレス製基板;1チルダーで
あり、記録面に当たる部分は(り抜いである。2は基板
オサエで、いずれ6基板固定のためのものである。
FIG. 1 is a cross-sectional view of a substrate setting jig in an embodiment of the present invention, where 1 is a stainless steel substrate; 1 is a tilde; the portion corresponding to the recording surface is a hollow; 2 is a substrate surface; This is for fixing 6 boards.

まず、第1図の上うに予めI)C(ポリカーボネート)
基板3を固定したものをスパッタHn内にセットする。
First, in advance, the upper sea urchin in Figure 1 is made of I) C (polycarbonate).
The fixed substrate 3 is set in the sputter Hn.

そしてその槽内をlXl0−@Torrまで排気した後
スパッタリングを開始する。まず1層)lk:Al5j
N膜4電体c t o o 。
After evacuating the tank to lXl0-@Torr, sputtering is started. First layer) lk: Al5j
N film 4-electrode c t o o .

人、さらに2層目に光磁気記録層としてNdDyF c
 Co T i B 400人そして3層1」にΔl5
iN膜1000人を順に成膜する。
Furthermore, the second layer is NdDyF c as a magneto-optical recording layer.
Co T i B 400 people and Δl5 to 3 layers 1
1000 iN films were deposited one by one.

ここでI) CIA仮の温度上昇が問題となるのは、1
層口のAl5jN膜を成膜する際である。つまり、2A
91目のN d D y F c Co T i I!
2を成膜する際に基板からのガス放出は極力押さえる必
要があるため、1層目の成膜中の基板温度上昇は極力お
さえなければならない 第3図は1層目のAl5iN誘電体膜の1000人成膜
時の基板温度」−昇とターゲットへの役人電力の関係を
グラフにしたものである。成膜をする際にかける電力を
0.5.1.2.3人wと4つの場合について実験し、
その時プラスチック基板にサーモラベル(温度測定紙)
を取り付け、違いの様子を見る。7は従来の温la′変
化で、8は本発明の温度変化である。この変化図から、
成膜速度を速めるため投入電力を]−げても、本発明の
製造用治具においては基板温度の」1昇を防止できるこ
とがわかる。
Here I) The problem with the CIA temporary temperature rise is 1.
This is when forming the Al5jN film at the layer opening. In other words, 2A
91st N d D y F c Co T i I!
Since gas release from the substrate must be suppressed as much as possible when forming the second layer, the temperature rise of the substrate during the first layer formation must be suppressed as much as possible. This is a graph showing the relationship between the substrate temperature increase during film deposition by 1000 people and the power applied to the target. Experiments were conducted on four cases in which the power applied during film formation was 0.5, 1, 2, and 3 people w.
At that time, a thermo label (temperature measurement paper) is placed on the plastic substrate.
Install it and see the difference. 7 is the conventional temperature la' change, and 8 is the temperature change of the present invention. From this change diagram,
It can be seen that even if the input power is increased to increase the film formation rate, the production jig of the present invention can prevent the substrate temperature from increasing by 1.

第4図は、横軸にノみ板温度をとり縦軸にガス放出量を
とったグラフである。このグラフから、基板温度が上昇
するのに伴いガス放出量を増えていくことがわかる。よ
って、基板温度をできるだけ低い温度に保ち成膜するこ
とが望まれる。
FIG. 4 is a graph in which the horizontal axis represents the knife plate temperature and the vertical axis represents the amount of gas released. This graph shows that the amount of gas released increases as the substrate temperature rises. Therefore, it is desirable to form a film while keeping the substrate temperature as low as possible.

本発明の治具である、PC基板の紀Ω面とは反対側のス
テンレス製の基板ホルダ一部分をくり抜くことにより、
成膜時に真空槽内で放射される熱線がI) Ci&仮を
通過することができる。つまり、スパッタリングする時
の投入電力を上げても温度上昇はないため、光磁気記録
媒体の本来の特性が確保できることになる。
By hollowing out a part of the stainless steel board holder, which is the jig of the present invention, on the side opposite to the surface of the PC board,
The heat rays radiated in the vacuum chamber during film formation can pass through I) Ci&temporary. In other words, even if the input power is increased during sputtering, the temperature does not rise, so the original characteristics of the magneto-optical recording medium can be maintained.

本発明のs2遣方法は、低温度!1侍のまま成膜できる
ことから光磁気記録膜が酸化しに(くなり、従来より優
れた光磁気記録媒体が得られ、そればかりでな(投入電
力を上げられることがら成膜時間が短mでき、コストダ
ウンできる。
The s2 sending method of the present invention is low temperature! Since the film can be formed with just one layer, the magneto-optical recording film is less susceptible to oxidation, resulting in a magneto-optical recording medium that is superior to conventional ones. It is possible to reduce costs.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明によれば、プラスチック基板の
少なくとも記録面とは反対側の基板ボルダ−をくり抜く
ことにより、成膜時の没入電力を上げてもプラスチック
基板の温度を低く保ちガス放出量を押さえることができ
、スパッタリング時間の短縮化による製造枚数能力の向
1−1それに伴う装置償却コストの大幅なダウ/という
効果を有する。
As described above, according to the present invention, by hollowing out at least the substrate boulder on the side opposite to the recording surface of the plastic substrate, the temperature of the plastic substrate can be kept low even when the immersion power is increased during film formation, and the amount of gas released is This has the effect of increasing the production capacity by shortening the sputtering time and greatly reducing the equipment amortization cost.

尚、本実施例では透明樹脂基板にポリカーボネートを用
いたが、これら以外にI) M M A 、エポキシ樹
脂、塩化ビニル樹脂、ポリメチルペンテン等、さらには
ガラス基板においても本発明は有効であり、成膜時に放
出される熱線が透過可能な物質であれば有効である。ま
た、rL空成膜法にスパッタ法を用いたが、蒸a法等の
全ての真空成膜法に本発明が(r効なのは言うまでもな
いことである。
In this example, polycarbonate was used for the transparent resin substrate, but the present invention is also effective for other materials such as I) MMA, epoxy resin, vinyl chloride resin, polymethylpentene, and even glass substrates. Any material that can be penetrated by heat rays emitted during film formation is effective. Further, although the sputtering method was used for the rL dry film formation method, it goes without saying that the present invention is effective for all vacuum film formation methods such as the vapor deposition method.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例における基板セット用治具の断
面図。 第2図は従来の光記録媒体の製造方法における基板セッ
ト川治具の断面図。 第3図は、1層目のAl5iN誘電体膜の1000人成
較時の基板温度上昇とターゲットの役人電力の関係図。 第4図は、横軸に基板温度をとり縦軸にガス放出足をと
った変化図。 1・・・基板ホルダー 2・・・基板オサエ 3・・・I)C(ポリカーボネート)IA仮4・・・基
板ホルダー 5・・・基板オザエ 6・・・I)C(ポリカーボネート)基板7・・・従来
の温度変化 8・・・本発明の温度変化 以  上 出14人 セイコーエプソン株式会社 代理人 弁理士 最 上  務 他1名1、X市にノド
lしダニ(ステンレスへ染う2、歴イ及1才す二 3、Pcc汀ゆツカー蒋−トに 第1図 第2図 7信fx=&彰賄6
FIG. 1 is a sectional view of a board setting jig in an embodiment of the present invention. FIG. 2 is a sectional view of a substrate setting jig in a conventional optical recording medium manufacturing method. FIG. 3 is a diagram showing the relationship between the substrate temperature rise of the first layer Al5iN dielectric film and the target official power when compared to 1000 people. FIG. 4 is a change diagram in which the horizontal axis represents the substrate temperature and the vertical axis represents the gas release rate. 1...Substrate holder 2...Substrate support 3...I) C (polycarbonate) IA provisional 4...Substrate holder 5...Substrate support 6...I)C (polycarbonate) board 7...・Conventional temperature change 8...Temperature change of the present invention 14 people Representative of Seiko Epson Co., Ltd. Patent attorney Tsutomu Mogami and 1 other person I and 1 year old, 23 years old, Pcc 1 year old, 23 years old, Pcc

Claims (1)

【特許請求の範囲】[Claims] 透明樹脂基板を用い光を照射し、記録・再生あるいは消
去をおこなう光記録媒体の製造用治具において、前記透
明樹脂基板の少なくとも記録面の反対側には、前記製造
用治具が存在しないことを特徴とする光記録媒体の製造
方法。
In a manufacturing jig for an optical recording medium that uses a transparent resin substrate and performs recording, reproduction, or erasing by irradiating light, the manufacturing jig does not exist at least on the opposite side of the recording surface of the transparent resin substrate. A method for manufacturing an optical recording medium characterized by:
JP62048266A 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium Expired - Lifetime JP2569535B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62048266A JP2569535B2 (en) 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62048266A JP2569535B2 (en) 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium

Publications (2)

Publication Number Publication Date
JPS63214941A true JPS63214941A (en) 1988-09-07
JP2569535B2 JP2569535B2 (en) 1997-01-08

Family

ID=12798634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62048266A Expired - Lifetime JP2569535B2 (en) 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium

Country Status (1)

Country Link
JP (1) JP2569535B2 (en)

Also Published As

Publication number Publication date
JP2569535B2 (en) 1997-01-08

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