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JP2569535B2 - Method and apparatus for manufacturing optical recording medium - Google Patents

Method and apparatus for manufacturing optical recording medium

Info

Publication number
JP2569535B2
JP2569535B2 JP62048266A JP4826687A JP2569535B2 JP 2569535 B2 JP2569535 B2 JP 2569535B2 JP 62048266 A JP62048266 A JP 62048266A JP 4826687 A JP4826687 A JP 4826687A JP 2569535 B2 JP2569535 B2 JP 2569535B2
Authority
JP
Japan
Prior art keywords
substrate
transparent resin
optical recording
recording medium
resin substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62048266A
Other languages
Japanese (ja)
Other versions
JPS63214941A (en
Inventor
信子 五味
明 青山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP62048266A priority Critical patent/JP2569535B2/en
Publication of JPS63214941A publication Critical patent/JPS63214941A/en
Application granted granted Critical
Publication of JP2569535B2 publication Critical patent/JP2569535B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光記録媒体の製造方法および製造装置に関す
る。
The present invention relates to a method and an apparatus for manufacturing an optical recording medium.

〔発明の概要〕[Summary of the Invention]

本発明は、記録・再生あるいは消去が可能な光記録媒
体の製造方法において、透明樹脂基板の記録面となる側
に成膜するときに放射される熱線を透明樹脂基板の記録
面と反対側に透過させ、成膜中の透明樹脂基板の温度上
昇とガス放出を大幅に減少できるようにしたものであ
る。
The present invention relates to a method for manufacturing an optical recording medium capable of recording / reproducing or erasing, wherein a heat ray radiated when forming a film on a side to be a recording surface of a transparent resin substrate is directed to a side opposite to a recording surface of the transparent resin substrate. By allowing the light to pass therethrough, the temperature rise and outgassing of the transparent resin substrate during film formation can be significantly reduced.

〔従来の技術〕[Conventional technology]

従来の光記録媒体の製造方法は、第2図に示すように
ステンレス製の基板ホルダー4、と基板オサエ5、によ
りプラスチック基板6を固定しスパッタリングする方法
である。
The conventional method of manufacturing an optical recording medium is a method of fixing a plastic substrate 6 by a stainless steel substrate holder 4 and a substrate holder 5 as shown in FIG.

ところが、基板を支えている治具4が金属であるため
スパッタリングによるターゲットからの熱線放射の際
に、治具が熱を吸収してしまう。つまり、基板がその影
響によりガス(O2、H2O)を放出してしまうという問
題があった。そこで従来の手段として成膜中の基板温度
上昇が50℃以下になる成膜速度で作成していた。
However, since the jig 4 supporting the substrate is made of metal, the jig absorbs heat when radiating heat rays from the target by sputtering. That is, there is a problem that the substrate releases gas (O 2 , H 2 O) due to the influence. Therefore, as a conventional means, the film is formed at a film formation rate at which the temperature rise of the substrate during the film formation becomes 50 ° C. or less.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

しかし、前述の主流となっている基板ホルダー面への
置き合わせは非常に温度を上げ易いため、スパッタリン
グする際にはターゲットへの投入電力を上げるごとに基
板温度が上昇してしまう。このことによりターゲットへ
の投入電力を上げるほどプラスチック基板のガス放出量
が多くなり、成膜した膜の劣化を極端に速めてしまう。
又、温度上昇を押さえるためターゲットへの投入電力を
少なくすると成膜速度が遅くなり、量産を考えると時間
がかかりすぎるという重大な問題点を有していた。
However, since the temperature of the above-described main placement on the substrate holder surface is very easy to increase, the substrate temperature increases each time the power supplied to the target is increased during sputtering. As a result, as the power applied to the target is increased, the amount of gas released from the plastic substrate increases, and the deterioration of the formed film is extremely accelerated.
In addition, when the power supplied to the target is reduced to suppress the temperature rise, the film forming speed becomes slow, and there is a serious problem that it takes too much time in consideration of mass production.

そこで本発明はこのような問題点を解決するもので、
その目的とするところは、成膜速度を上げても基板温度
上昇を少なくでき、ガス放出量を極力減少させるところ
にある。その上スパッタ時間が短時間で済む、つまりタ
ーゲットへの投入電力を多くしてスパッタしても光記録
媒体としての良好な特性を維持し、大量生産できる光記
録媒体の製造方法、およびその製造方法に使用される製
造装置を提供するところにある。
Therefore, the present invention solves such a problem,
The purpose is to increase the substrate temperature even if the film forming speed is increased, and to reduce the amount of gas release as much as possible. In addition, a method for manufacturing an optical recording medium which requires a short sputtering time, that is, maintains good characteristics as an optical recording medium even when sputtered by increasing the power applied to a target and can be mass-produced, and a method for manufacturing the same The present invention provides a manufacturing apparatus used for:

〔問題点を解決するための手段〕[Means for solving the problem]

本発明は、スパッタリングまたは蒸着により放射され
る熱線が、透明樹脂基板を透過できるように、前記透明
樹脂基板を、その両面が露出するような基板セット用治
具に固定して、スパッタリングまたは蒸着により前記透
明樹脂基板に薄膜を成膜することを特徴とする。
The present invention is such that the transparent resin substrate is fixed to a substrate setting jig such that both surfaces thereof are exposed, so that heat rays radiated by sputtering or vapor deposition can be transmitted through the transparent resin substrate, and sputtering or vapor deposition is performed. A thin film is formed on the transparent resin substrate.

また、透明樹脂基板を固定する基板ホルダーを有し、
前記透明樹脂基板の記録面となる側に薄膜を成膜して光
記録媒体を製造する光記録媒体の製造装置において、前
記基板ホルダーは、前記透明樹脂基板の前記記録面と反
対側の少なくとも前記記録面に当たる部分がくり抜かれ
ていることを特徴とする。
In addition, it has a substrate holder for fixing the transparent resin substrate,
In an optical recording medium manufacturing apparatus for manufacturing an optical recording medium by forming a thin film on a side to be a recording surface of the transparent resin substrate, the substrate holder is at least the opposite side of the transparent resin substrate on the side opposite to the recording surface. It is characterized in that the portion corresponding to the recording surface is hollowed out.

〔実施例〕〔Example〕

第1図は、本発明の実施例における基板セット用治具
の断面図であって、1はステンレス製基板ホルダーであ
り、記録面に当たる部分はくり抜いてある。2は基板オ
サエで、いずれも基板固定のためのものである。
FIG. 1 is a cross-sectional view of a substrate setting jig according to an embodiment of the present invention. Reference numeral 1 denotes a stainless steel substrate holder, and a portion corresponding to a recording surface is hollowed out. Reference numeral 2 denotes a substrate holder for fixing the substrate.

まず、第1図のように予めPC(ポリカーボネート)基
板3を固定したものをスパッタ装置内にセットする。そ
してその槽内を1×10-6Torrまで排気した後スパッタリ
ングを開始する。まず1層目にAlSiN誘電体膜1000Å、
さらに2層目に光磁気記録層としてNdDyFeCoTi膜400Å
そして3層目にAlSiN膜1000Åを順に成膜する。
First, a PC (polycarbonate) substrate 3 previously fixed as shown in FIG. 1 is set in a sputtering apparatus. Then, the chamber is evacuated to 1 × 10 −6 Torr and then sputtering is started. The first layer is an AlSiN dielectric film of 1000Å,
Further, an NdDyFeCoTi film 400Å is used as a magneto-optical recording layer as a second layer.
Then, an AlSiN film 1000Å is sequentially formed as a third layer.

ここでPC基板の温度上昇が問題となるのは、1層目の
AlSiN膜を成膜する際である。つまり、2層目のNdDyFeC
oTi膜を成膜する際に基板からのガス放出は極力押さえ
る必要があるため、1層目の成膜中の基板温度上昇は極
力おさえなければならない 第3図は1層目のAlSiN誘電体膜の1000Å成膜時の基
板温度上昇とターゲットへの投入電力の関係をグラフに
したものである。成膜をする際にかける電力を0,5、
1、2、3kwと4つの場合について実験し、その時プラ
スチック基板にサーモラベル(温度測定紙)を取り付
け、違いの様子を見る。7は従来の温度変化で、8は本
発明の温度変化である。この変化図から、成膜速度を速
めるため投入電力を上げても、本発明の製造用治具にお
いては基板温度の上昇を防止できることがわかる。
Here, the temperature rise of the PC board poses a problem.
This is when the AlSiN film is formed. In other words, the second layer of NdDyFeC
Since the outgassing from the substrate must be suppressed as much as possible when forming the oTi film, the temperature rise of the substrate during the formation of the first layer must be suppressed as much as possible. FIG. 3 shows the first AlSiN dielectric film. Is a graph showing the relationship between the substrate temperature rise and the power input to the target during the film deposition at 1000 °. The power to be applied during film formation is 0,5,
Experiment with 1, 2, 3 kw and 4 cases. At that time, attach a thermo label (temperature measurement paper) to the plastic substrate and see the difference. 7 is the conventional temperature change, and 8 is the temperature change of the present invention. From this change diagram, it can be seen that even if the input power is increased to increase the film forming speed, the manufacturing jig of the present invention can prevent the substrate temperature from increasing.

第4図は、横軸に基板温度をとり縦軸にガス放出量を
とったグラフである。このグラフから、基板温度が上昇
するのに伴いガス放出量が増えていくことがわかる。よ
って、基板温度をできるだけ低い温度に保ち成膜するこ
とが望まれる。
FIG. 4 is a graph in which the horizontal axis represents the substrate temperature and the vertical axis represents the gas release amount. From this graph, it can be seen that the gas release amount increases as the substrate temperature increases. Therefore, it is desired to form a film while keeping the substrate temperature as low as possible.

本発明の治具である、PC基板の記録面とは反対側のス
テンレス製の基板ホルダー部分をくり抜くことにより、
成膜時に真空槽内で放射される熱線がPC基板を通過する
ことができる。つまり、スパッタリングする時の投入電
力を上げても温度上昇はないため、光磁気記録媒体の本
来の特性が確保できることになる。
The jig of the present invention, by hollowing out the stainless steel substrate holder part on the opposite side to the recording surface of the PC substrate,
Heat rays radiated in the vacuum chamber during film formation can pass through the PC substrate. That is, since the temperature does not increase even if the input power at the time of sputtering is increased, the original characteristics of the magneto-optical recording medium can be secured.

本発明の製造方法は、低温度維持のまま成膜できるこ
とから光磁気記録膜が酸化しにくくなり、従来より優れ
た光磁気記録媒体が得られ、そればかりでなく投入電力
を上げられることから成膜時間が短縮でき、コストダウ
ンできる。
The manufacturing method of the present invention is capable of forming a film while maintaining a low temperature, making it difficult for the magneto-optical recording film to be oxidized, obtaining a magneto-optical recording medium superior to the conventional one, and increasing the input power. The film time can be shortened and the cost can be reduced.

〔発明の効果〕〔The invention's effect〕

以上述べたように本発明によれば、プラスチック基板
などの透明樹脂基板を、この透明樹脂基板の記録面と反
対側の少なくとも記録面に当たる部分がくり抜かれてい
る基板ホルダーに装着して成膜することにより、成膜の
ときに放射される熱線が透明樹脂基板を透過し、スパッ
タリング法あるいは蒸着法などの成膜速度を上げても成
膜中の透明樹脂基板の温度上昇を防止できる。このた
め、成膜中のガス放出量を抑え、成膜した膜の劣化を防
止できる。従って、優れた品質の光記録媒体を短時間で
安価に提供できる。また、本発明により成膜時の投入電
力を上げてもプラスチック基板の温度を低く保ちガス放
出量を抑えることができるので、成膜時間の短縮化によ
る製造枚数能力の向上、それに伴う装置償却コストの大
幅なダウンという効果を有する。
As described above, according to the present invention, a film is formed by mounting a transparent resin substrate such as a plastic substrate on a substrate holder in which at least a portion corresponding to a recording surface opposite to a recording surface of the transparent resin substrate is hollowed out. Thereby, the heat rays radiated at the time of film formation pass through the transparent resin substrate, and even if the film formation speed is increased by a sputtering method or a vapor deposition method, the temperature rise of the transparent resin substrate during the film formation can be prevented. Therefore, the amount of gas released during film formation can be suppressed, and deterioration of the formed film can be prevented. Therefore, an optical recording medium of excellent quality can be provided in a short time and at low cost. Further, according to the present invention, since the temperature of the plastic substrate can be kept low and the amount of outgassing can be suppressed even if the input power at the time of film formation is increased, the capacity of the number of sheets to be produced can be improved by shortening the film formation time, and the depreciation cost of the apparatus accompanying it. Has the effect of a significant down.

尚、本実施例では透明樹脂基板にポリカーボネートを
用いたが、これら以外にPMMA、エポキシ樹脂、塩化ビニ
ル樹脂、ポリメチルペンテン等、さらにはガラス基板に
おいても本発明は有効であり、成膜時に放出される熱線
が透過可能な物質であれば有効である。また、真空成膜
法にスパッタ法を用いたが、蒸着法等の全ての真空成膜
法に本発明が有効なのは言うまでもないことである。
In this example, polycarbonate was used for the transparent resin substrate, but in addition to these, PMMA, epoxy resin, vinyl chloride resin, polymethylpentene, etc., and even the glass substrate, the present invention is effective. Any substance that can transmit the heat rays to be applied is effective. Although the sputtering method is used for the vacuum film forming method, it goes without saying that the present invention is effective for all vacuum film forming methods such as the vapor deposition method.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の実施例における基板セット用治具の断
面図。 第2図は従来の光記録媒体の製造方法における基板セッ
ト用治具の断面図。 第3図は、1層目のAlSiN誘電体膜の1000Å成膜時の基
板温度上昇とターゲットへの投入電力の関係図。 第4図は、横軸に基板温度をとり縦軸にガス放出量をと
った変化図。 1……基板ホルダー 2……基板オサエ 3……PC(ポリカーボネート)基板 4……基板ホルダー 5……基板オサエ 6……PC(ポリカーボネート)基板 7……従来の温度変化 8……本発明の温度変化
FIG. 1 is a sectional view of a jig for setting a substrate according to an embodiment of the present invention. FIG. 2 is a sectional view of a jig for setting a substrate in a conventional method for manufacturing an optical recording medium. FIG. 3 is a diagram showing the relationship between the substrate temperature rise and the power input to the target when the first AlSiN dielectric film is formed at 1000 °. FIG. 4 is a change diagram in which the horizontal axis represents the substrate temperature and the vertical axis represents the gas release amount. DESCRIPTION OF SYMBOLS 1 ... Substrate holder 2 ... Substrate cover 3 ... PC (polycarbonate) substrate 4 ... Substrate holder 5 ... Substrate cover 6 ... PC (polycarbonate) substrate 7 ... Conventional temperature change 8 ... Temperature of the present invention change

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】スパッタリングまたは蒸着により放射され
る熱線が、透明樹脂基板を透過できるように、前記透明
樹脂基板を、その両面が露出するような基板セット用治
具に固定して、スパッタリングまたは蒸着により前記透
明樹脂基板に薄膜を成膜することを特徴とする光磁気媒
体の製造方法。
The transparent resin substrate is fixed to a jig for exposing both sides of the transparent resin substrate so that heat rays radiated by sputtering or vapor deposition can pass through the transparent resin substrate. Forming a thin film on the transparent resin substrate by the method described above.
【請求項2】透明樹脂基板を固定する基板ホルダーを有
し、前記透明樹脂基板の記録面となる側に薄膜を成膜し
て光記録媒体を製造する光記録媒体の製造装置におい
て、前記基板ホルダーは、前記透明樹脂基板の前記記録
面と反対側の少なくとも前記記録面に当たる部分がくり
抜かれていることを特徴とする光記録媒体の製造装置。
2. An optical recording medium manufacturing apparatus, comprising: a substrate holder for fixing a transparent resin substrate; and forming an optical recording medium by forming a thin film on a recording surface side of the transparent resin substrate. The apparatus for manufacturing an optical recording medium, wherein the holder has at least a portion corresponding to the recording surface on the side opposite to the recording surface of the transparent resin substrate, which is hollowed out.
JP62048266A 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium Expired - Lifetime JP2569535B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62048266A JP2569535B2 (en) 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62048266A JP2569535B2 (en) 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium

Publications (2)

Publication Number Publication Date
JPS63214941A JPS63214941A (en) 1988-09-07
JP2569535B2 true JP2569535B2 (en) 1997-01-08

Family

ID=12798634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62048266A Expired - Lifetime JP2569535B2 (en) 1987-03-03 1987-03-03 Method and apparatus for manufacturing optical recording medium

Country Status (1)

Country Link
JP (1) JP2569535B2 (en)

Also Published As

Publication number Publication date
JPS63214941A (en) 1988-09-07

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