JPS6094162A - Electrostatic purification device for pure water - Google Patents
Electrostatic purification device for pure waterInfo
- Publication number
- JPS6094162A JPS6094162A JP20310783A JP20310783A JPS6094162A JP S6094162 A JPS6094162 A JP S6094162A JP 20310783 A JP20310783 A JP 20310783A JP 20310783 A JP20310783 A JP 20310783A JP S6094162 A JPS6094162 A JP S6094162A
- Authority
- JP
- Japan
- Prior art keywords
- pure water
- purification device
- electrostatic purification
- ultrapure water
- electrode plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 16
- 238000000746 purification Methods 0.000 title claims description 10
- 239000002245 particle Substances 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 claims description 6
- 229910001220 stainless steel Inorganic materials 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 19
- 239000012498 ultrapure water Substances 0.000 description 19
- 239000010419 fine particle Substances 0.000 description 8
- 239000012528 membrane Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Electrostatic Separation (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は純水中の微粒子を静電的に除去する装置に関し
、より具体的には超純水の処理に最適な純水の静電浄化
装置に関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to an apparatus for electrostatically removing particulates from pure water, and more specifically to an electrostatic purification device for pure water that is optimal for the treatment of ultrapure water. Regarding equipment.
現在、半導体生産工程で洗浄に使用されている超純水は
、コースポイント(超純水の実際の使用箇所を云う)で
、比抵抗が18MΩ以上、微粒子数が50個/−以下で
あることが条件として要求されている。超純水製造装置
内の微粒子除去装置としては、一般的に限外ろ過膜、精
密ろ過膜等が、使用されており、これ等の膜は装置出口
において?1純水中の微粒子数を50個/ me以下に
低下させる。然しこの超純水が装置出口から数6乃至数
千mの配管中を通過してユースポイントに至る間に、該
水中には配管の各1%で汚染物等が取り込まれ、従って
ユースポイントにおいては、超純水中の微粒子数は上記
条件値よりも尚(なってしまう。そこで現在は、ユース
ポイントに別途限外ろ過膜、精密ろ過膜等を設置し、超
純水中の微粒子の除去を行うようにし又いる。然しこれ
等の膜では、配管圧を常にある一定値以上、例えば3に
?/Cd以上に維持しなければ充分な流量を得ることが
出来ないという欠点があった。Currently, the ultrapure water used for cleaning in the semiconductor production process has a specific resistance of 18 MΩ or more and a particle count of 50/- or less at the course point (the actual location where ultrapure water is used). is required as a condition. Ultrafiltration membranes, microfiltration membranes, etc. are generally used as particulate removal devices in ultrapure water production equipment, and are these membranes used at the equipment outlet? 1. Reduce the number of fine particles in pure water to 50 particles/me or less. However, while this ultrapure water passes through several six to several thousand meters of piping from the equipment outlet to the point of use, contaminants are introduced into the water in each 1% of the piping, and therefore, at the point of use, contaminants are introduced into the water. In this case, the number of particles in ultrapure water is even lower than the above condition value.Therefore, we are currently installing separate ultrafiltration membranes, microfiltration membranes, etc. at the point of use to remove particles in ultrapure water. However, these membranes have the disadvantage that a sufficient flow rate cannot be obtained unless the piping pressure is always maintained above a certain value, for example, above 3?/Cd.
上記問題を解決する方法として、上記ろ過膜に代えて静
電浄化装置を用いる方法が考えられる。As a method of solving the above problem, a method of using an electrostatic purifier in place of the above filtration membrane can be considered.
然し、絶縁性液体例えば油等の中のS!核粒子静電的に
浄化する従来の装置は、繊維賀或いは多孔性物質を充填
した電極間に液体を通過させ微粒子を除去するよプな構
造をなしく実開Br557−187658号公報参照ン
、このような構造の装置乞超純水中の微粒子除去に適用
すると、充填物自体がうgl、粒子が流出し、また充填
物及び電極板からの溶解物の溶出によって超純水の比抵
抗値が低下するという問題が生ずる。However, S! in insulating liquids such as oil! Conventional devices for electrostatically purifying nuclear particles do not have a structure in which fine particles are removed by passing a liquid between electrodes filled with fibers or porous materials; When a device with this type of structure is applied to remove fine particles from ultrapure water, the filling itself will shrink, the particles will flow out, and the specific resistance value of the ultrapure water will decrease due to the elution of dissolved substances from the filling and electrode plates. A problem arises in that the value decreases.
また従来のコットレル式の静電ろ過装置は、油中の微水
滴を合体させ大きな水滴にする為、llk間距離を3.
5乃至20cfnとし、且つ3乃至30KVの高電圧を
II健に印加しているにも拘らず、微粒子の除去をする
ことは出来ない。In addition, in the conventional Cottrell type electrostatic filtration device, the distance between llk is set at 3.0 mm in order to coalesce small water droplets in oil into large water droplets.
Despite applying a high voltage of 5 to 20 cfn and a high voltage of 3 to 30 KV, fine particles cannot be removed.
本発明は斯かる状況を鑑みてなされたものであり、既設
の超純水のユースポイントに設置出来、而も確実に微粒
子を除去することが可能な純水の静電浄化装置を提供す
ることを目的とする。The present invention has been made in view of such circumstances, and an object of the present invention is to provide an electrostatic purification device for pure water that can be installed at existing ultrapure water use points and that can reliably remove particulates. With the goal.
上記目的を達成する為本発明においては、静電浄化装置
の電極板として、導電性セラミックスまたはイオン化順
向の低い材料で表面コーティング処理を行ったステンレ
ス鋼の何れかを用いた。In order to achieve the above object, in the present invention, either conductive ceramics or stainless steel whose surface has been coated with a material having a low ionization tendency is used as the electrode plate of the electrostatic purification device.
この構成により、既設の超純水のユースポイントに容易
に設置出来、また電極板からの微粒子或・は溶解物のO
IL出を未然に防ぐことにより確実な微粒子床去を行う
ことか「1」舵となる。With this configuration, it can be easily installed at existing ultrapure water use points, and O
The first step is to ensure the removal of particulates by preventing the emission of IL.
〔う6すJの実施6・リ 」
第1図は、面留時間を1秒にし、電極板間距離に比vl
lシて1L界強度を鎖めた場合の、超純水中の微粒子の
除去年の夏化乞芙験した軸朱ケ示ず図である。同図に示
すように、電極板間距離を太き(すると、乱流の影響に
より微粒子の除去率が低下することが判る。[Implementation 6 of U6S J] Figure 1 shows the surface dwell time of 1 second and the distance vl compared to the distance between the electrode plates.
It is a diagram (not shown in red) that shows the removal of fine particles in ultrapure water during the summer of 2015 when the field strength of 1L was limited. As shown in the figure, it can be seen that when the distance between the electrode plates is increased, the removal rate of particulates decreases due to the influence of turbulence.
また第1衣は、電極板の携賀と超純水の比抵抗の低下と
の関係を検討した結果を示す表である。The first table is a table showing the results of examining the relationship between the resistance of the electrode plate and the decrease in the specific resistance of ultrapure water.
同表に示すように、長時間の使用後においては、炭素鋼
やステンレス鋼の場合には、鉄の溶出や腐食等の影響に
より比抵抗が低下する傾向が見られるが、導電性セラミ
ックス(酸化ビスマス、タングステンカーバイドが好ま
しい)或いはイオン化++S向の低い材料で表面コーテ
ィング処理を行ったステンレス鋼の場合には、比抵抗の
低下は殆んど見られない。As shown in the same table, after long-term use, in the case of carbon steel and stainless steel, there is a tendency for the resistivity to decrease due to the effects of iron elution and corrosion, whereas conductive ceramics (oxidized In the case of stainless steel whose surface is coated with bismuth or tungsten carbide (preferably bismuth or tungsten carbide) or a material with low ionization ++S direction, there is hardly any decrease in specific resistance.
尚電極板に付着した粒子は、電極板に逆電荷を1印加し
たり、超音波照射等、剥R機能を促進する装置を用いる
と除去出来る。Particles attached to the electrode plate can be removed by applying a reverse charge to the electrode plate or using a device that promotes the peeling R function, such as ultrasonic irradiation.
第2図及び第3図は、上記検討結果に基づいて構成した
本発す」に係る純水のn型浄化装置の一実施例を示す図
である。装置全体は絶縁体10によって囲まれた管状を
なし、その一方の側に超純水の流入口12が、また他方
の側に流出ロエ4が形成されている。図示実施例におい
ては、流入口12及び流出口14の径が夫々25m、ま
た中央の膨径部16の径が50鰭となっている。上記膨
径部16即ち装置内部には、円筒状で長さ力;500m
の4亀性セラミツクス製の正電極板18と負電極板20
とが、管の軸方向に沿って4mi間噛で交互に配列され
る。各電極板18.20は中空の絶縁性支持棒22によ
って両端を支持さノt、該支持俸22内部に配置された
端子から夫々正負の電荷を父げるー
上記装置において、支持棒22内部の端子を電源に接続
すると、両電極板18.20間に電場力l生じ、この間
を超純水を通過させると該水中の微P子は負のイ片屯体
となり、正電極へ移動して付層−する。この様にして超
純水中の微粒子は連ヤかに除去される。FIGS. 2 and 3 are diagrams showing an embodiment of the pure water n-type purification apparatus according to the present invention, which was constructed based on the above study results. The entire device has a tubular shape surrounded by an insulator 10, with an ultrapure water inlet 12 formed on one side and an outflow 4 on the other side. In the illustrated embodiment, the diameters of the inlet 12 and the outlet 14 are each 25 m, and the diameter of the central enlarged diameter portion 16 is 50 m. The expanded diameter portion 16, that is, the inside of the device has a cylindrical shape with a length of 500 m.
A positive electrode plate 18 and a negative electrode plate 20 made of ceramic ceramics
are arranged alternately along the axial direction of the tube with a spacing of 4 mm. Each electrode plate 18, 20 is supported at both ends by a hollow insulating support rod 22, and receives positive and negative charges from terminals disposed inside the support rod 22. When the terminal is connected to a power source, an electric field force l is generated between the two electrode plates 18 and 20, and when ultrapure water is passed between them, the minute P particles in the water become negative particles and move to the positive electrode. Add a layer. In this way, fine particles in ultrapure water are continuously removed.
第4図は、上記装置を超純水ノくイロットプラントの末
端に取付け、1001d間連杭Hソに微粒子除去を行っ
た結果を示す凶である。条件は、亀佐間の電圧が450
■、電界強度か170 V/、:rn、 81回超音波
照射による電極板の微粒子除去を行ったものである。同
図から判るように、長時間の使用に亘ってユースポイン
トで超純水中の微粒子数50個/d以下を維持すること
が出来る。FIG. 4 shows the result of removing particulates from the 1001d continuous pile H by installing the above device at the end of the ultrapure water plant. The conditions are that the voltage between Kamesama is 450
(2) The electric field strength was 170 V/rn, and the electrode plate was subjected to ultrasonic irradiation 81 times to remove fine particles. As can be seen from the figure, the number of fine particles in ultrapure water can be maintained at 50 particles/d or less at the point of use over a long period of use.
向上記実施例においては、電極板として導電性セラミッ
クスを用いたか、この代りに前記の表面コーティング処
理を行ったステンレス鋼を用いても、前述の検討結果か
らして同様な効果が得られることは明らかである。また
電極板の形状及び配列については独々の設計変更が可能
であり、例えば、平板′電極を多層に配列したり、線状
の被電極と平板電極とを平行に置くような形としてもよ
い〔発明の効果〕
成上の如く本発明に係る純水の静電浄化装置によれは、
構造が単純である為既設の超純水のユースポイントに容
易に設置出来、また電極板からの微粒子等の流出を未然
に防ぐ為確実な微粒子除去を行うことが可能となる。In the above-mentioned embodiment, it is possible to obtain the same effect by using conductive ceramics as the electrode plate, or by using stainless steel with the above-mentioned surface coating treatment instead. it is obvious. In addition, the shape and arrangement of the electrode plates can be individually modified; for example, flat plate electrodes may be arranged in multiple layers, or linear electrodes and flat plate electrodes may be placed in parallel. [Effects of the Invention] As described above, the pure water electrostatic purification device according to the present invention has the following effects:
Since the structure is simple, it can be easily installed at existing ultrapure water use points, and it is possible to reliably remove particulates to prevent them from flowing out from the electrode plate.
第1図は微粒子除去に及ぼす′電極板間の距離の影響を
示す図、第2図は本発明に係る純水の静電浄化装置の一
実施例を示す断面図、第3図は第2図のA−A線に沿っ
た断面図、第4図は同装置の連続運転結果を示す図であ
る。
lO・・・絶縁体、12・・・流入口、14・・・流出
口、16・・・膨径部、18・・・正電極板、20・・
・負電極板、22・・・支持棒。
出1如人 11立ブラ、1)I一般14+J、’v会社
第1図
第3図
第4図
イ史弔哨藺 (ロ)Fig. 1 is a diagram showing the influence of the distance between the electrode plates on particulate removal, Fig. 2 is a sectional view showing an embodiment of the electrostatic purification device for pure water according to the present invention, and Fig. 3 is a diagram showing the effect of the distance between the electrode plates on particulate removal. FIG. 4 is a sectional view taken along the line A-A in the figure, and is a diagram showing the results of continuous operation of the same device. lO... Insulator, 12... Inlet, 14... Outlet, 16... Expanded diameter part, 18... Positive electrode plate, 20...
- Negative electrode plate, 22... support rod. Out 1 Jojin 11 Standing Bra, 1) I General 14 + J, 'v Company Figure 1 Figure 3 Figure 4 I History Condolences (B)
Claims (2)
中の浮遊微粒子を静電的に除去する装置において、 上記電極板として、導電性セラミックスまたはイオノ化
傾向の低い材料で表面コーティング処理を行ったステン
レス鋼の何れかを用いたことを特許とする純水の静電浄
化装置。(1) In a device that passes a liquid between electrode plates to which a voltage is applied and electrostatically removes floating particles in the liquid, the electrode plate is surface coated with conductive ceramics or a material with a low ionization tendency. A patented electrostatic purification device for pure water that uses one of the stainless steels.
求の範囲第(IJ項に記載の純水の静電浄化装置。 (3J 前記ステンレス鋼の表面コーティング処理材料
が、白金、金、銀、高分子化合物の何れかである特許請
求の範囲第(1)項に記載の純水の静電浄化装置。(2) The electrostatic purification device for pure water according to Claim IJ, wherein the distance between the electrode plates is 1 crn or less. (3J) The stainless steel surface coating material is platinum, gold, silver, etc. The electrostatic purification device for pure water according to claim (1), which is any one of .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20310783A JPS6094162A (en) | 1983-10-28 | 1983-10-28 | Electrostatic purification device for pure water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20310783A JPS6094162A (en) | 1983-10-28 | 1983-10-28 | Electrostatic purification device for pure water |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6094162A true JPS6094162A (en) | 1985-05-27 |
Family
ID=16468504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20310783A Pending JPS6094162A (en) | 1983-10-28 | 1983-10-28 | Electrostatic purification device for pure water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6094162A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6325111U (en) * | 1986-07-29 | 1988-02-19 | ||
JPS63296885A (en) * | 1987-05-28 | 1988-12-02 | Nec Corp | Removal of fine particles in aqueous solution |
JP2016027616A (en) * | 2014-06-25 | 2016-02-18 | 東京エレクトロン株式会社 | Treatment solution supply method, treatment solution supply apparatus, and computer-readable recording medium |
-
1983
- 1983-10-28 JP JP20310783A patent/JPS6094162A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6325111U (en) * | 1986-07-29 | 1988-02-19 | ||
JPS63296885A (en) * | 1987-05-28 | 1988-12-02 | Nec Corp | Removal of fine particles in aqueous solution |
JP2016027616A (en) * | 2014-06-25 | 2016-02-18 | 東京エレクトロン株式会社 | Treatment solution supply method, treatment solution supply apparatus, and computer-readable recording medium |
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