[go: up one dir, main page]

JPS6036349A - Glass composition - Google Patents

Glass composition

Info

Publication number
JPS6036349A
JPS6036349A JP14406483A JP14406483A JPS6036349A JP S6036349 A JPS6036349 A JP S6036349A JP 14406483 A JP14406483 A JP 14406483A JP 14406483 A JP14406483 A JP 14406483A JP S6036349 A JPS6036349 A JP S6036349A
Authority
JP
Japan
Prior art keywords
less
glass
softening point
steel plate
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14406483A
Other languages
Japanese (ja)
Inventor
Masahiko Okuyama
奥山 雅彦
Kazuo Kondo
和夫 近藤
Yoshimasa Shibata
柴田 良昌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Tokushu Togyo KK
Niterra Co Ltd
Original Assignee
NGK Spark Plug Co Ltd
Nippon Tokushu Togyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Spark Plug Co Ltd, Nippon Tokushu Togyo KK filed Critical NGK Spark Plug Co Ltd
Priority to JP14406483A priority Critical patent/JPS6036349A/en
Publication of JPS6036349A publication Critical patent/JPS6036349A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

PURPOSE:The titled composition that is obtained by admixing appropriately the following essential components: SiO2, B2O3, Al2O3 and Cu2O, thus being suitably used as an insulating coat under the load of large tensile stress. CONSTITUTION:The objective glass composition is composed of, as essential components, 30-65mol% of SiO2, 11-45mol% of B2O3, 5-15mol% of Al2O3, and 10-20mol% of Cu2O and, as optional components, less than 5mol% of P2O5, less than 2mol% of V2O5, less than 2mol% of Na2O, less than 5mol% of PbO, less than 3mol% of SnO2 and less than 10mol% of ZnO. The total amounts of the essential components are required to exceed 85mol%. The resultant composition has a softening point of about up to 660 deg.C and a thermal expansion coefficient of less than 40X10<-17>/ deg.C. The composition is suitably used as an insulating coat formed on silicon steel plates.

Description

【発明の詳細な説明】 本発明は低軟化点を有する低熱膨張性ガラス組成物に関
するものであり、特にトランス鉄心用の珪素鋼板の表面
に形成する絶縁被膜として好適なガラス組成物に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a low thermal expansion glass composition having a low softening point, and particularly to a glass composition suitable as an insulating coating formed on the surface of a silicon steel plate for a transformer core. .

従来、トランスのエネルギー効率を向上する方法の一つ
として、トランスの鉄心に引張り応力を付加することが
有効と確認されており、その方策として鉄心の珪素鋼板
を脱炭処理したのち、その表面にMgO粉末を焼付けて
反応させ、厚さ5μm程度の膜を発生させて引張り応力
を付加させたり、更にそれを5i02−H3POif溶
液に浸漬して乾燥後、焼成して厚さ3μm程度の膜を生
成させて、引張り応力を付加する方法が採知されている
Conventionally, it has been confirmed that adding tensile stress to the core of the transformer is an effective way to improve the energy efficiency of transformers. MgO powder is baked and reacted to generate a film with a thickness of about 5 μm and tensile stress is added, and then it is immersed in a 5i02-H3POif solution, dried, and fired to create a film with a thickness of about 3 μm. A method has been adopted in which tensile stress is applied by applying a tensile stress.

これらの被膜形成珪素鋼板に発生している引張り応力は
前者品で0.3kg/*:であり、後者品でO9b〜0
.7 kg / 1111程度であり、それぞれにトラ
ンスのエネルギー効率を向上させているが、満足すべき
ものでなかった。
The tensile stress generated in these film-formed silicon steel sheets is 0.3 kg/*: for the former product, and O9b ~ 0 for the latter product.
.. It was about 7 kg/1111, and although the energy efficiency of the transformer was improved in each case, it was not satisfactory.

故に、より向上したトランスのエネルギー効率とするた
めに、従来より大きな引張り応力を付加することが要望
されていた。
Therefore, in order to further improve the energy efficiency of the transformer, it has been desired to apply a larger tensile stress than before.

発明者等は、係る要請に対して鋭意検討の結果、熱膨張
係数が20 x 10−77”c以下のガラスで被膜を
形成することによって従来より大きな引張り応力を付加
することができることを見い出し、特願昭57−231
309号発明において鋼板面に7 熱膨張係数20xlO/”c以下のCu1O−B、03
−AI、03−3in2系を主成分とする低熱膨張ガラ
スを、平均粒径2μm以下のガラスフリットとして塗布
し、温度1200℃以下の中性雰囲気中で焼付け、厚さ
5μm以下のガラス質の被膜を形成することにより鋼板
に0.8〜1.0kg / 璽!の引張り応力を付加す
る方法を提案した。
As a result of intensive studies in response to such requests, the inventors have discovered that by forming a coating with glass having a coefficient of thermal expansion of 20 x 10-77"c or less, it is possible to apply a larger tensile stress than before. Patent application 1986-231
In the invention No. 309, Cu1O-B with a thermal expansion coefficient of 20xlO/"c or less, 03 on the steel plate surface
-A low thermal expansion glass mainly composed of AI, 03-3in2 system is applied as a glass frit with an average particle size of 2 μm or less, and baked in a neutral atmosphere at a temperature of 1200°C or less to form a glassy coating with a thickness of 5 μm or less. 0.8~1.0kg/seal on the steel plate by forming! We proposed a method to add tensile stress.

上記発明において、焼付は温度の上限を1200℃とし
たのは、鋼板の耐熱性を考慮したためであるに過ぎない
。従って、上記発明の明細書中に例示したガラスの焼付
は温度はいずれも1050℃以上の高温であった。しか
しながら、一般に鋼板は1100℃以上になると結晶相
の変化が起こり、特に特殊な結晶相を持つトランス鉄心
用方向性珪素鋼板の場合、結晶配列が変化すると共に鉄
損が小さいこと等の優れた緒特性が劣化する傾向にある
ので、これを防止するためには鋼板へのガラス焼付けは
1100℃以下望ましくはI 000 ’C以下の温度
で短時間で行わなければならない。このような焼付は条
件で容易に焼付けるためには軟化点が低く望ましくは7
00°C以下更に望ましくは660℃以下で且つ軟化点
以上の温度において粘度の低いガラスを使用しなければ
ならない。発明者等ばCu20−B203−A I、O
,−3i O2系で適当な組成を有するガラスであれば
、温度1000℃以下、保持時間数分の条件で珪素鋼板
面に焼付けることができ、加えて鋼板にl kg / 
mn2以上の引張り応力を付加することもできることを
見い出した。
In the above invention, the upper limit of the baking temperature is set at 1200° C. simply because the heat resistance of the steel plate is taken into consideration. Therefore, the temperatures for baking the glasses exemplified in the above specification of the invention were all at a high temperature of 1050° C. or higher. However, in general, the crystalline phase of steel sheets changes when the temperature exceeds 1100℃, and in the case of grain-oriented silicon steel sheets for transformer cores, which have a special crystalline phase, the crystal orientation changes and the iron loss is small. Since the properties tend to deteriorate, in order to prevent this, glass baking on a steel plate must be carried out in a short time at a temperature of 1100° C. or lower, preferably I 000'C or lower. In order to easily bake under such conditions, the softening point should be low, preferably 7.
It is necessary to use a glass that has a low viscosity at temperatures below 00°C, more preferably below 660°C, and above its softening point. Inventors Cu20-B203-A I, O
, -3i If the O2-based glass has an appropriate composition, it can be baked onto the surface of a silicon steel plate at a temperature of 1000°C or less for a holding time of several minutes.
It has been found that it is also possible to apply a tensile stress of mn2 or more.

本発明は上記の知見に基づいてなされたもので、その要
旨とするところは、S iOz 30〜65mo1%、
B O11〜45mo1%、A1.LO35〜λ 3 15 mo1%及びCu、 010〜20 mo1%か
らなることを特徴とするガラス組成物に存する。
The present invention was made based on the above findings, and its gist is that SiOz 30 to 65 mo1%,
B O11-45 mo1%, A1. A glass composition characterized by comprising LO35~λ315 mo1% and Cu, 010~20 mo1%.

以下各成分の含有量を上記のように限定した理由を説明
する。
The reason why the content of each component was limited as mentioned above will be explained below.

SiO□は、後述のCu2Oと共にガラスの熱膨張係数
を下げるために欠くことのできないものであるが、65
mo1%を超えると軟化点が700℃以上となり、10
00℃以下の温度での焼付けは困難となる。他方、30
mo1%に満たないと熱膨張係数が大きくなり、所望の
引張り応力を得ることができず、また耐水性に悪影響を
及ぼすので、その含有量を30〜65mo1%とした。
SiO□ is indispensable for lowering the thermal expansion coefficient of glass together with Cu2O, which will be described later, but 65
If mo exceeds 1%, the softening point will be 700°C or higher, and 10%
Baking at temperatures below 00°C becomes difficult. On the other hand, 30
If the mo amount is less than 1%, the coefficient of thermal expansion becomes large, making it impossible to obtain the desired tensile stress, and also having an adverse effect on water resistance, so the content is set to 30 to 65 mo1%.

B2O3はガラスの熱特性と密接な関係があり、含有量
が増すと共に軟化点が下がり、ひいては低温での焼付け
を容易にするが、45mo1%を超えると失透傾向が増
大するうえ耐水性も悪くなり、他方11mo1%に満た
ないと軟化点が700℃以下となりにくいのでその含有
量を11〜45mo1%とした。就中、B工o3が軟化
点等熱特性を下げる効果の著しいのは25mo1%まで
であり、耐水性、耐失透性、熱膨張係数等を考慮すると
最も好ましい含有量は15〜25111o1%である。
B2O3 has a close relationship with the thermal properties of glass, and as the content increases, the softening point decreases, which in turn makes it easier to bake at low temperatures, but if it exceeds 45 mo1%, the tendency to devitrify increases and water resistance deteriorates. On the other hand, if the content is less than 11 mo1%, the softening point will not easily reach 700°C or less, so the content is set to 11 to 45 mo1%. In particular, the effect of lowering the thermal properties such as the softening point of B process O3 is remarkable up to 25mol1%, and considering water resistance, devitrification resistance, thermal expansion coefficient, etc., the most preferable content is 15 to 25111ol1%. be.

Al2O3は耐失透性、耐水性及び電気絶縁性を向上さ
せるが5 mo1%未満ではその効果′に乏しく、15
 mo1%を超えると軟化点が高くなるのでその含有量
を5〜l 5 mo1%とした。
Al2O3 improves devitrification resistance, water resistance, and electrical insulation, but if it is less than 5 mo1%, its effects are poor;
If it exceeds 1% by mo, the softening point becomes high, so the content was set to 5 to 1% by mo.

Cu、Oは前述の通り、S i02同様熱膨張係数を下
げる効果を生じるが、10 mo1%未満ではその効果
に乏しく、20mo1%を超えると失透傾向が増大する
のでその含有量を10〜20mo1%とじた。
As mentioned above, Cu and O have the effect of lowering the thermal expansion coefficient like Si02, but if it is less than 10 mo1%, the effect is poor, and if it exceeds 20 mo1%, the tendency to devitrify increases, so the content should be reduced to 10 to 20 mo1. % closed.

本発明ガラス組成物は上記必須成分のみから成る場合で
も、本発明の効果を奏するが、必要に応じて他の成分を
選択的に添加しても良い。但し必須成分の含量が85m
o1%に満たないと低膨張、低軟化点、易濡れ性、低粘
性等の被膜材料としての本発明の効果を十分に奏するこ
とができないので、必須成分の含量を85 no1%以
上とし、残部を選択成分の含量としなければならない。
Although the glass composition of the present invention exhibits the effects of the present invention even when it consists only of the above-mentioned essential components, other components may be selectively added as necessary. However, the content of essential components is 85m
If the content is less than 1%, the effects of the present invention as a coating material such as low expansion, low softening point, easy wettability, and low viscosity cannot be fully exhibited, so the content of essential components is set to 85 no.1% or more, and the remaining shall be the content of the selected ingredient.

選択成分とし好ましいのはPl 05− 、V、’0r
XNa、0PbO,SnO2及びZnOである。P2O
5は軟化点を下げるが、5 mo1%を超えると失透傾
向が増す。V、、 O,は軟化点を下げ、軟化点以上の
温度での粘度の低下を促進するが、2 mo1%を超え
るとガラスの電気絶縁性を著しく低下させる。
Preferred selective components are Pl 05- , V, '0r
They are XNa, 0PbO, SnO2 and ZnO. P2O
5 lowers the softening point, but when 5 mo1% is exceeded, the tendency to devitrify increases. V,,O, lowers the softening point and promotes a decrease in viscosity at temperatures above the softening point, but when it exceeds 2 mol%, it significantly reduces the electrical insulation properties of the glass.

Na> Oも軟化点を下げるが、熱膨張係数を急激に増
加させるため2 mo1%を超えると熱膨張係数を40
xlO/”c以下に抑制し難く、本発明の目的に適さな
い。pboは軟化点を下げる効果を生じるが、5 mo
1%を超えると失透傾向が著しい。
Na>O also lowers the softening point, but rapidly increases the coefficient of thermal expansion, so if it exceeds 2 mo1%, the coefficient of thermal expansion decreases to 40
It is difficult to suppress the softening point to less than
If it exceeds 1%, there is a marked tendency for devitrification.

S n Ozは軟化点以上の温度における粘度を下げる
働きをするが、3 mo1%を超えると失透傾向が著し
い。ZnOはCuρと置換させることによって軟化点を
下げるが、Cu2Oとの含量が15mo1%に満たない
とその効果に乏しく、含量が25mo1%を超えるか又
はZnOのみで10mo1%を超える場合は熱膨張係数
が増大する。
S n Oz functions to lower the viscosity at temperatures above the softening point, but when it exceeds 3 mo1%, there is a marked tendency to devitrify. ZnO lowers the softening point by substituting Cuρ, but if the content with Cu2O is less than 15 mo1%, the effect is poor, and if the content exceeds 25 mo1% or ZnO alone exceeds 10 mo1%, the coefficient of thermal expansion decreases. increases.

本発明ガラス組成物を珪素鋼板面に被着するには先ず本
発明ガラス組成物を溶融し、急冷後粉砕のガラスフリッ
トとし、沈降法、スプレー法、ディッピング法等常法に
従って鋼板面に塗布する。
To apply the glass composition of the present invention to the surface of a silicon steel plate, first, the glass composition of the present invention is melted, rapidly cooled, and then ground into a glass frit, which is then applied to the steel plate surface using a conventional method such as a sedimentation method, a spray method, or a dipping method. .

ここで沈降法とは例えば適当な有機溶剤中にガラスフリ
ットを分散させ、その中に鋼板を浸漬して、鋼板表面に
ガラスを沈降させ、溶剤が蒸発した後鋼板を取り出す方
法である。スプレー法とはガラスフリットを分散させた
溶液をスプレーにより鋼板上へ噴霧し、その後滓渣を蒸
発させることにより塗布する方法である。ディッピング
法とはガラ次にガラスが塗布された鋼板を、温度800
〜1000℃で鋼板が酸化されない中性雰囲気中に数分
間保持した後、放冷することによって鋼板にガラス被膜
を焼付ける。このようにして表面に本発明ガラス組成物
を被着させた鋼板は1 kg / 璽:以上の引張り応
力が付加されている。
Here, the sedimentation method is, for example, a method in which glass frit is dispersed in a suitable organic solvent, a steel plate is immersed in it, the glass is precipitated on the surface of the steel plate, and the steel plate is taken out after the solvent has evaporated. The spray method is a method in which a solution in which glass frit is dispersed is sprayed onto a steel plate, and the residue is then evaporated to apply the solution. In the dipping method, a steel plate coated with glass is heated to a temperature of 800 ml.
After holding the steel plate in a neutral atmosphere where it is not oxidized at ~1000°C for several minutes, the glass coating is baked onto the steel plate by allowing it to cool. The steel plate having the glass composition of the present invention applied to its surface in this manner is subjected to a tensile stress of 1 kg/kg or more.

また本発明ガラス組成物は珪素鋼表面の5in2−P、
O,被膜との濡れ性及び反応性が良いことから珪素鋼と
の接着強度が高く剥離の可能性が小さい。更にまた本発
明ガラス組成物はトランス鉄心用の珪素鋼板の表面に形
成する絶縁被膜としての実用上満足できる電気絶縁性を
有している。
Furthermore, the glass composition of the present invention has a 5in2-P surface on the silicon steel surface,
Since O has good wettability and reactivity with the coating, the adhesive strength with silicon steel is high and the possibility of peeling is small. Furthermore, the glass composition of the present invention has electrical insulation properties that are practically satisfactory for use as an insulating coating formed on the surface of a silicon steel plate for a transformer core.

以下実施例を示すが、本発明はその要旨を超えない限り
これに限定されるものではない。
Examples will be shown below, but the present invention is not limited thereto unless it exceeds the gist thereof.

実施例 酸化物に換算して、第1表又は第2表に示すガラス組成
となるようニS + OZ 、H3B O3、A I 
(OH) 、CII z O、H3P O/IL 、V
:b 0゜3・ Na2Co3、PbO,SnO2及びZnOを秤量し、
雷潰機にて均一混合した後、アルミナ坩堝に入れ、大気
中温度1500℃で3時間溶融し、融液を水中に落下し
ガラス塊を得、これをアルミナ製ボールミルで平均粒径
1μmまで粉砕することによってガラスフリントを製作
した。ガラスフリットの室温〜400℃の温度範囲にお
ける熱膨張係数と軟化点を第1表及び第2表に示す。
S + OZ, H3B O3, A
(OH) , CII z O, H3P O/IL , V
:b 0゜3・Weigh Na2Co3, PbO, SnO2 and ZnO,
After uniformly mixing in a lightning crusher, it was placed in an alumina crucible and melted at a temperature of 1500°C in the atmosphere for 3 hours. The melt was dropped into water to obtain a glass lump, which was ground in an alumina ball mill to an average particle size of 1 μm. Glass flint was produced by doing this. The thermal expansion coefficient and softening point of the glass frit in the temperature range from room temperature to 400°C are shown in Tables 1 and 2.

別途、脱炭処理が施され、表面にSiO−λ P2O5被膜を持つ珪素鋼とイソプロピルアルコール9
0重量%、酢酸エチル10重量%に調製された混合溶液
とを用意しておき、混合溶液中にガラスフリットを分散
させ、その溶液中に鋼板を浸漬して鋼板表面にガラスフ
リットを沈降させ、溶液が蒸発した後鋼板を取り出し乾
燥した。鋼板表面に堆積したガラスフリットの厚さは約
5μmであった。次いで鋼板をN2雰囲気中昇温速度3
00”C/hrテ900 ”c、 950″C又は10
00’cまで昇温し、同温度で1分間保持することによ
って鋼、板にガラスを焼き付けることを試みた。第1表
及び第2表の焼付は状態において○印及びX印はそれぞ
れガラスが被覆したこと及び被着しながった比を表わす
Separately, silicon steel that has been decarburized and has a SiO-λ P2O5 coating on its surface and isopropyl alcohol 9
A mixed solution prepared at 0% by weight and 10% by weight in ethyl acetate is prepared, glass frit is dispersed in the mixed solution, and a steel plate is immersed in the solution to precipitate the glass frit on the surface of the steel plate. After the solution evaporated, the steel plate was taken out and dried. The thickness of the glass frit deposited on the surface of the steel plate was approximately 5 μm. Next, the steel plate was heated at a heating rate of 3 in an N2 atmosphere.
00”C/hrte900”C, 950”C or 10
An attempt was made to bake glass onto steel and plates by raising the temperature to 00'C and holding it at the same temperature for 1 minute. Regarding the baking conditions in Tables 1 and 2, the marks ◯ and X represent the ratio of glass coverage and non-adhesion, respectively.

第 2 表 注*1)フリット隘・11h14. Na15及び阻1
6のフリットはそれぞれ特公昭49−32646号「ガ
ラス組成物」の例2、特開昭56−6924.0号造方
法」の実施例1に開示された組成のものである。
2nd Table Note *1) Frit 11h14. Na15 and Na1
Frit No. 6 has the composition disclosed in Example 2 of ``Glass Composition'' in Japanese Patent Publication No. 49-32646 and Example 1 of ``Production Method'' in JP-A No. 56-6924.0, respectively.

注*2)軟化点・軟化点は示差熱分析針を用いて測定し
た。
Note *2) Softening point and softening point were measured using a differential thermal analysis needle.

第1表及び第2表に示すように本発明範囲内の組成を有
するガラスはいずれも1000℃以下の温度で鋼板面に
焼付けることができた。尚、本発明ガラス組成物は若干
の失透傾向を有しているが、本発明の主用途である珪素
鋼板への焼付けに対しては影響を及ぼすことなく均質に
被着することができた。
As shown in Tables 1 and 2, all glasses having compositions within the range of the present invention were able to be baked onto the surface of a steel plate at a temperature of 1000° C. or lower. Although the glass composition of the present invention has a slight tendency to devitrify, it was able to be uniformly adhered to silicon steel plates, which is the main application of the present invention, without affecting baking. .

以上のように本発明ガラス組成物は軟化点及び熱膨張係
数が共に低く、電気絶縁性にも優れているので、珪素鋼
板の表面に形成する絶縁被膜としては勿論、低熱膨張材
料の接合材としであるいは各種金属ペーストに含有させ
る焼付は用ガラスとして使用できる。
As described above, the glass composition of the present invention has a low softening point and a low coefficient of thermal expansion, and has excellent electrical insulation properties, so it can be used not only as an insulating coating formed on the surface of a silicon steel plate, but also as a bonding material for low thermal expansion materials. It can be used as glass for glass by baking or by incorporating it into various metal pastes.

Claims (3)

【特許請求の範囲】[Claims] (1) S + 0230〜65mo1%、B20,1
1〜45mo1%、A I 2035〜15 mo1%
及びCu 2010〜20mo1%からなることを特徴
とするガラス組成物。
(1) S+0230-65mo1%, B20.1
1-45 mo1%, AI 2035-15 mo1%
and Cu 2010 to 20 mo1%.
(2) S i O230〜65 mo1%、B20ヨ
 11〜45mo1%、A l 2−035〜15 m
o1%及びCu 2010〜20mo1%を必須成分と
し、P2O3−5mo1%以下、V2O5−2mo1%
以下、N a 202 mo1%以下、Pb05mo1
%以下、5n023mo1%以下及びZnolomol
%以下を選択成分とし、該必須成分の含量85mo1%
以上と残部該選択成分のうちから選ばれる一種以上とか
らなることを特徴とするガラス組成物。
(2) S i O2 30-65 mo1%, B20 Yo 11-45 mo1%, Al 2-035-15 m
O1% and Cu 2010~20mo1% are essential components, P2O3-5mo1% or less, V2O5-2mo1%
Below, Na 202 mo1% or less, Pb05 mo1
% or less, 5n023mol or less and Znolomol
% or less is the selected component, and the content of the essential component is 85 mo1%.
A glass composition comprising the above and the remainder one or more selected from the selected components.
(3)軟化点が660℃以下で、室温〜400℃の温度
範囲における熱膨張係数が40xlO/”cより小さい
ことを特徴とする特許請求の範囲第1項又は第2項記載
のガラス組成物。
(3) The glass composition according to claim 1 or 2, which has a softening point of 660°C or less and a thermal expansion coefficient of less than 40xlO/''c in the temperature range from room temperature to 400°C. .
JP14406483A 1983-08-05 1983-08-05 Glass composition Pending JPS6036349A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14406483A JPS6036349A (en) 1983-08-05 1983-08-05 Glass composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14406483A JPS6036349A (en) 1983-08-05 1983-08-05 Glass composition

Publications (1)

Publication Number Publication Date
JPS6036349A true JPS6036349A (en) 1985-02-25

Family

ID=15353459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14406483A Pending JPS6036349A (en) 1983-08-05 1983-08-05 Glass composition

Country Status (1)

Country Link
JP (1) JPS6036349A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0311274A2 (en) * 1987-10-07 1989-04-12 Corning Glass Works Thermal writing on glass or glass-ceramic substrates and copper-exuding glasses
US5157234A (en) * 1991-01-24 1992-10-20 Obara Corporation C-type welding gun robot holding apparatus
JP2016155759A (en) * 2010-05-27 2016-09-01 コーニング インコーポレイテッド Glass having low softening temperature and high toughness
US9527767B2 (en) 2013-05-09 2016-12-27 Corning Incorporated Alkali-free phosphoborosilicate glass
US9622483B2 (en) 2014-02-19 2017-04-18 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11039620B2 (en) 2014-02-19 2021-06-22 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11039621B2 (en) 2014-02-19 2021-06-22 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11168018B2 (en) 2013-08-15 2021-11-09 Corning Incorporated Aluminoborosilicate glass substantially free of alkali oxides
USRE49307E1 (en) 2013-08-15 2022-11-22 Corning Incorporated Alkali-doped and alkali-free boroaluminosilicate glass

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0311274A2 (en) * 1987-10-07 1989-04-12 Corning Glass Works Thermal writing on glass or glass-ceramic substrates and copper-exuding glasses
US5157234A (en) * 1991-01-24 1992-10-20 Obara Corporation C-type welding gun robot holding apparatus
JP2016155759A (en) * 2010-05-27 2016-09-01 コーニング インコーポレイテッド Glass having low softening temperature and high toughness
US9527767B2 (en) 2013-05-09 2016-12-27 Corning Incorporated Alkali-free phosphoborosilicate glass
US11168018B2 (en) 2013-08-15 2021-11-09 Corning Incorporated Aluminoborosilicate glass substantially free of alkali oxides
US12134580B2 (en) 2013-08-15 2024-11-05 Corning Incorporated Aluminoborosilicate glass substantially free of alkali oxides
USRE49307E1 (en) 2013-08-15 2022-11-22 Corning Incorporated Alkali-doped and alkali-free boroaluminosilicate glass
US11039621B2 (en) 2014-02-19 2021-06-22 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11039619B2 (en) 2014-02-19 2021-06-22 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11464232B2 (en) 2014-02-19 2022-10-11 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11470847B2 (en) 2014-02-19 2022-10-18 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11039620B2 (en) 2014-02-19 2021-06-22 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11751570B2 (en) 2014-02-19 2023-09-12 Corning Incorporated Aluminosilicate glass with phosphorus and potassium
US12121030B2 (en) 2014-02-19 2024-10-22 Corning Incorporated Aluminosilicate glass with phosphorus and potassium
US9622483B2 (en) 2014-02-19 2017-04-18 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same

Similar Documents

Publication Publication Date Title
CN108623158A (en) A kind of acidproof enamel enamel and preparation method thereof
JPH11180728A (en) Substrate glass composition for display device
JPS6036349A (en) Glass composition
JPS58151345A (en) Glass composition with low dielectric constant
CN102352143B (en) Glass coating and film technology for reducing platinum rhodium alloy bushing plate loss
CN104529164A (en) Devitrification type high-expansion sealing glass powder as well as preparation method and application thereof
CN114212995A (en) Preparation method suitable for OLED sealing solder
JP3741526B2 (en) Substrate glass for display devices
JPWO2001090012A1 (en) Glass composition and glass-forming material containing the composition
JPS59205479A (en) Method for applying tensile stress to steel plate
JPS6110963B2 (en)
CN112851126B (en) Lead-free composite glass powder for side insulation of ZnO resistor sheet, preparation method and glass glaze
CN100352782C (en) Glass ceramic containing phosphorus lithium aluminium silicon and its preparation method
JPS6136137A (en) Low-melting point glass composition
JPH0218562B2 (en)
JPS6031104B2 (en) Glass for silicon semiconductor device packaging
JPH03170346A (en) Glass composition and insulator using the same
JPS5988340A (en) Enamel frit
JPH0148210B2 (en)
JP7650245B2 (en) Low thermal expansion glass for sealing and coating
JPS63123837A (en) Enamel for enameled aluminum ware
JPH0375238A (en) Enamel frit
JPS59131542A (en) Sealing composition
JPS63239138A (en) Frit for thermally spraying glass
CN113480334A (en) Preparation method of conductive material and coating for induction heating of ceramic substrate