JPS6033350A - Vacuum film forming apparatus - Google Patents
Vacuum film forming apparatusInfo
- Publication number
- JPS6033350A JPS6033350A JP58142143A JP14214383A JPS6033350A JP S6033350 A JPS6033350 A JP S6033350A JP 58142143 A JP58142143 A JP 58142143A JP 14214383 A JP14214383 A JP 14214383A JP S6033350 A JPS6033350 A JP S6033350A
- Authority
- JP
- Japan
- Prior art keywords
- chain
- workpiece
- evaporation source
- rollers
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
技術分野
この発明は、真空容器内に蒸発源と被加工物とを間隔を
置いて配設し、蒸発源からの蒸発物質を被加工物に付着
させて薄膜を形成する、蒸着、スパッタ、 −(オンブ
レーティング等の真空薄膜形成装置に関し、特にその被
加工物を支持する治具の改良に関する。Detailed Description of the Invention Technical Field This invention provides a method for forming a thin film by arranging an evaporation source and a workpiece in a vacuum container with a distance between them, and causing evaporated substances from the evaporation source to adhere to the workpiece. The present invention relates to vacuum thin film forming apparatuses for vapor deposition, sputtering, -(onblating, etc.), and particularly to improvements in jigs that support the workpiece.
従来弦且
イオンブレーティング装置等の真空薄膜形成装置は、一
般に真空容器の容量が大きくなる程コストが高くなり、
排気に要する時間も長くなるので、低コストで効率よく
薄膜を形成するには、限られた容量の真空容器内に一度
になるべく多くの被加二[二物をチャージできることが
望ましい。Conventional vacuum thin film forming devices such as string and ion brating devices generally cost more as the capacity of the vacuum container increases;
Since the time required for evacuation is also long, in order to form a thin film efficiently at low cost, it is desirable to be able to charge as much material as possible in a vacuum container of limited capacity at one time.
また、例えば時計の外装部品のような凹凸のある被加工
物の全面に均一に被膜を形成するには、被加工物を回転
させながら薄膜形成を行なう必要がある。Furthermore, in order to uniformly form a film over the entire surface of a workpiece having irregularities, such as the exterior parts of a watch, it is necessary to form a thin film while rotating the workpiece.
そのため、従来は、例えば第1図に示すように一端に回
転伝達用ギア2を固着した回転軸1に、複数の被加工物
4を取付ける被加工物取付具3を間隔を置いて固設し、
これを第2図又は第6図に示すように真空容器内に配設
していた。Therefore, conventionally, as shown in FIG. 1, for example, workpiece mounts 3 for attaching a plurality of workpieces 4 are fixed at intervals to a rotating shaft 1 having a rotation transmission gear 2 fixed to one end. ,
This was placed in a vacuum container as shown in FIG. 2 or 6.
この第2図及び第3図において、5は真空容器であるベ
ルジャ、6は蒸発源セあり、図示しない電源から給電さ
れて電子ビーム加熱や抵抗加熱等によって蒸発物質7(
例えばTiN、Tic等)を蒸発させる。In FIGS. 2 and 3, 5 is a bell jar which is a vacuum container, and 6 is an evaporation source, which is supplied with power from a power source (not shown) and uses electron beam heating, resistance heating, etc. to evaporate the material 7 (
For example, TiN, Tic, etc.) are evaporated.
そして、第2図の例では、蒸発源6の上方に5本の回転
軸1を軸方向を水平にして間隔を置いて平面的に配置し
、各回転軸に固着した回転伝達用ギア2を夫々アイドル
ギア8を介して噛み合わせ、いずれかの回転軸1を回転
させることによって、全てのギア2及びその回転軸1を
矢示のように同じ方向に回転させるようにしたものであ
る。In the example shown in FIG. 2, five rotary shafts 1 are arranged in a plane above the evaporation source 6 at intervals with their axial directions horizontal, and rotation transmission gears 2 fixed to each rotary shaft are arranged. By meshing each gear through an idle gear 8 and rotating one of the rotating shafts 1, all the gears 2 and their rotating shafts 1 are rotated in the same direction as shown by the arrow.
しかしながら、このように被加工物取付具を備えた複数
の回転軸を蒸発源6の上方に平面的に配置したのでは、
蒸発源6からの距離が中央部と両端部とではかなり違っ
てしまうため、被加工物に形成される薄膜の膜質及び膜
厚に差ができてしまう。However, if a plurality of rotating shafts equipped with workpiece fixtures are arranged in a plane above the evaporation source 6,
Since the distance from the evaporation source 6 is considerably different between the center and both ends, there is a difference in the quality and thickness of the thin film formed on the workpiece.
濠だ、ベルジャ内のスペースの利用にも無駄かあり、1
バッチ当りの被加工物チャージ数を充分多くすることが
できず、しかも図にαで示す角度範囲外に蒸発する蒸発
物質は無駄になり、ロスが多い等の問題がある。It's a moat, it's a waste of space in Bellja, 1
There are problems in that the number of charges of workpieces per batch cannot be sufficiently increased, and the evaporated material that evaporates outside the angle range shown by α in the figure is wasted, resulting in a large amount of loss.
そこで第3図に示すように、蒸発源6を取囲むように多
数の回転軸1をリングフレーム日によって間隔を置いて
それぞれ回転自在に支持し、その外側に固設した内歯リ
ングギア10に各回転軸1の回転伝達用ギア2を噛み合
せ、リングフレーム9を例えば矢示A方向に回転させる
ことにより、各ギア2及びそれと一体の回転軸1が同方
向に公転しながら夫々矢示B方向に自転するようにした
ものである。Therefore, as shown in FIG. 3, a large number of rotary shafts 1 are rotatably supported at intervals depending on the ring frame so as to surround the evaporation source 6, and internally toothed ring gears 10 are fixedly installed on the outside of the rotary shafts 1. By meshing the rotation transmission gears 2 of each rotating shaft 1 and rotating the ring frame 9 in, for example, the direction of arrow A, each gear 2 and the rotating shaft 1 integrated therewith are rotated in the same direction while respectively moving in the direction of arrow B. It is designed to rotate on its own axis.
このようにすれば、第2図の例における問題点は一応解
決でき、蒸発源からの距離が均一になり、ベルジャ内の
利用効率もよく、蒸発物質のロスも少なくなる。In this way, the problems in the example shown in FIG. 2 can be solved to a certain extent, the distance from the evaporation source becomes uniform, the efficiency of utilization inside the bell jar is improved, and the loss of evaporated substances is reduced.
しかし、蒸発源6の周囲に被加工物を環状に配置するた
め、蒸発源と被加工物との距離の選択範囲が大幅に制約
され、しかも蒸発源6には図示しない支持部材や給電線
、冷却水配管等があるため、その取付けが極めて困難に
なると共に、この薄膜形成装置をインラインに配置して
、被加工物の搬入、搬出を連続工程内で行なうようにす
ることも極めて困難になる。However, since the workpiece is arranged in a ring around the evaporation source 6, the selection range of the distance between the evaporation source and the workpiece is greatly restricted. Since there are cooling water pipes, etc., it is extremely difficult to install them, and it is also extremely difficult to place this thin film forming device in-line so that workpieces can be brought in and taken out in a continuous process. .
さらに、上方の被加工物から剥離した薄膜片等のごみが
下方の被加工物に付着する(特に、TiN。Furthermore, dust such as thin film pieces peeled off from the upper workpiece adheres to the lower workpiece (especially TiN).
TiC等の硬質膜は剥離片がでやすい)ため、膜質が劣
化する恐れがある等の問題が生じる。Hard films such as TiC are prone to peeling off pieces), which causes problems such as the possibility of deterioration of the film quality.
−目一盈
この発明は、これらの問題を解決して、真空容器内のス
ペースを効率よく利用でき、蒸発源と被加工物との距離
も比較的自由に設定でき、各被加工物に形成される薄膜
の膜質及び膜厚にむらができたり膜質が劣化したりする
こともなく、しがもインラインでの使用も容易な被加工
物支持用治具を備えた真空薄膜形成装置を提供すること
を目的とする。- This invention solves these problems, makes it possible to use the space inside the vacuum container efficiently, allows the distance between the evaporation source and the workpiece to be set relatively freely, and allows the formation of To provide a vacuum thin film forming device equipped with a jig for supporting a workpiece, which does not cause unevenness or deterioration in the film quality and thickness of a thin film to be produced, and is also easy to use in-line. The purpose is to
地」
そのため、この発明による真空:II膜形成装置は、被
加工物を支持する治具を、少なくとも一対のスブロケツ
1へに無端状に張装したチェーンの複数の連結ピンに夫
々ローラを回転自在に軸支させ、その各ローラにそれぞ
れ被加工物取イ」具を固設した支持軸を一体的に回転す
るように装着すると共に、真空容器内の所定の領域に亘
って、上記各ローラを転接させるようにガイドレールを
固設して構成し、スプロケットによってチェーンを回転
させることにより、各ローラが支持軸と共にチェーンに
よって移動され、ローラがガイドレールに転接すること
によって自転するようにしたものである。Therefore, in the vacuum II film forming apparatus according to the present invention, a jig for supporting a workpiece is attached to a plurality of connecting pins of a chain endlessly stretched around at least one pair of sub-buttons 1, so that the rollers can be freely rotated. A support shaft with a workpiece pick-up tool fixed to each roller is mounted so as to rotate integrally, and each of the rollers is A guide rail is fixedly installed so that the rollers are in rolling contact, and the chain is rotated by a sprocket, so that each roller is moved by the chain together with the support shaft, and the rollers are rotated by rolling in contact with the guide rail. It is.
ズL矧1
以下、図面の第4図以降を参照してこの発明の詳細な説
明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in detail with reference to FIG. 4 and subsequent drawings.
第4図は、この発明の実施例における被加工物を支持す
る治具の要部斜視図であり、図示しない一対のスプロケ
ットに無端状に張装したチェーン11の連結ピン12に
ローラ20を回転自在に軸支させ、このローラ20のチ
ェーン11と反対側に形成したボス部20aに設けた切
欠き溝20bに板バネによるクリップ21を固着してい
る。FIG. 4 is a perspective view of a main part of a jig for supporting a workpiece in an embodiment of the present invention, in which a roller 20 is rotated by a connecting pin 12 of a chain 11 that is endlessly stretched around a pair of sprockets (not shown). The roller 20 is freely pivoted, and a clip 21 made of a plate spring is fixed to a notch groove 20b provided in a boss portion 20a formed on the side opposite to the chain 11 of the roller 20.
このローラ20の軸方向に沿ってクリップ21に支持軸
22を挿着して、ローラ20と一体的に回転するように
し、この支持軸22に、第1図の例と同様に複数個の被
加工物取付具3を間隔を置いて固設する。A support shaft 22 is inserted into the clip 21 along the axial direction of the roller 20 so that it rotates integrally with the roller 20, and a plurality of covers are attached to the support shaft 22 as in the example shown in FIG. Workpiece fixtures 3 are fixed at intervals.
なお、支持軸22のクリップ21に挾持される端部は、
第5図に示すように両側22aを平面状に面取りしてあ
り、ローラ22との間で相対回転しないようにしている
。Note that the end of the support shaft 22 that is held by the clip 21 is
As shown in FIG. 5, both sides 22a are chamfered to form a flat surface to prevent relative rotation with the roller 22.
被加工物取付具3は、支持軸22に嵌挿される円筒状の
基部31と、この基部の外周面から放射状に延びる3本
のロッド32と、その各ロンドの先端に固着された略三
角形状の板バネからなる係止片33からなり、この係止
片33によって被加工物4を点接触で支持する。The workpiece fixture 3 includes a cylindrical base 31 fitted into the support shaft 22, three rods 32 extending radially from the outer peripheral surface of the base, and a substantially triangular rod 32 fixed to the tip of each rod. The workpiece 4 is supported by point contact with the locking piece 33 made of a plate spring.
チェーン11は、それぞれまゆ形をなす外側鎖片13,
13と内側鎖片14.14が、第6図にも示すように中
空状の連結ピン12によって回動自在に連結されてなり
(例えば椿本チェーン製のホロービンチェーン)、この
連結ピン12のうちの所要の複数のものの中空孔12a
に、一端部がローラ20にボールベアリング23を介し
て挿着された軸24の他端部を挿入し、ストッパリング
25とナツト26によって固定している。The chain 11 includes outer chain pieces 13 each shaped like a cocoon,
13 and inner chain pieces 14 and 14 are rotatably connected by a hollow connecting pin 12 (for example, a hollow chain made by Tsubakimoto Chain), as shown in FIG. A plurality of hollow holes 12a as required for
One end of the shaft 24 is inserted into the roller 20 via a ball bearing 23, and the other end of the shaft 24 is inserted and fixed by a stopper ring 25 and a nut 26.
このようにして、複数のローラ20がチェーン11の複
数の連結ピン12にそれぞれ回転自在に間隔を置いて軸
支される。In this way, the plurality of rollers 20 are rotatably supported by the plurality of connecting pins 12 of the chain 11 at intervals.
第7図は、この発明によるイオンブレーティング装置に
おける冶具の配置例を模式的に示し、被加工物取付具ろ
及び被加工物4は図示を省略している。FIG. 7 schematically shows an example of the arrangement of jigs in the ion blating apparatus according to the present invention, and the workpiece mounting tool and the workpiece 4 are not shown.
この例では、ベルジャ5内の蒸発源6の上方に、蒸発源
6からの蒸発物質7の蒸発量に差が生じ易い方向に間隔
を置いて、−・対のスプロケット27゜28をそれぞれ
軸27a、28aによって回転可能に配設し、このスプ
ロケツ1〜27.28にチェーン11を無端状に張装し
、このチェーン11に前述のようにして11個のローラ
2oをそれぞれ回転自在に軸支している。In this example, above the evaporation source 6 in the bell jar 5, a pair of sprockets 27 and 28 are mounted on the shaft 27a, spaced apart in a direction that tends to cause a difference in the amount of evaporation material 7 from the evaporation source 6. , 28a, a chain 11 is endlessly stretched around the sprockets 1 to 27, and 11 rollers 2o are rotatably supported on the chain 11 as described above. ing.
そして、このチェーン11の上方走行部及び下方走行部
の下側に、それぞれローラ2oを転接させるように所定
領域に亘ってガイドレール41゜42を固設している。Guide rails 41 and 42 are fixedly installed below the upper and lower running parts of the chain 11 over predetermined areas so as to roll the rollers 2o into contact with each other.
したがって、スプロケット27.28を矢示A方向に回
転させると、チェーン11の上方走行部は矢示B方向に
、下側走行部は矢示C方向に走行し、各ローラ20はそ
れぞれチェーン11と同方向に移動すると共に、ガイド
レール41,42に転接すると矢示のように回転する。Therefore, when the sprockets 27 and 28 are rotated in the direction of arrow A, the upper running part of the chain 11 runs in the direction of arrow B, and the lower running part runs in the direction of arrow C, and each roller 20 is connected to the chain 11, respectively. While moving in the same direction, when it comes into contact with the guide rails 41 and 42, it rotates as shown by the arrow.
それによって、各支持軸22及び第4図に示した被加工
物取付具3もローラ2oに同動して移動しながら回転す
る。As a result, each support shaft 22 and the workpiece fixture 3 shown in FIG. 4 also rotate while moving in unison with the roller 2o.
蒸発源6としてこの例では電子ビーム蒸発源(EBガン
)を示しており、蒸発源電源46によって加熱したヒー
タがら電子ビームを放出させ、それをマグネットによっ
て偏向して接地したるっぼ上の蒸発物質7を照射させ、
加熱して蒸発させるようになっている。This example shows an electron beam evaporation source (EB gun) as the evaporation source 6, in which an electron beam is emitted from a heater heated by an evaporation source power source 46, and is deflected by a magnet to evaporate on a grounded surface. Irradiate the substance 7,
It is heated and evaporated.
この場合、電子ビームを放出する側の図でα1で示す角
度範囲より、反対側のα2で示す角度範囲の方が約30
%程度蒸発物質7の蒸発量が多い。In this case, the angle range shown by α2 on the opposite side is approximately 30
The amount of evaporated substance 7 is large by about %.
したがって、第7図に示すようにこの蒸発量に差が生じ
る全角度範囲に亘って被加工物を移動させ得るように、
チェーン11を張装することが望ましい。Therefore, as shown in FIG. 7, the workpiece can be moved over the entire angle range in which the amount of evaporation varies.
It is desirable to tension the chain 11.
一方、高圧直流電源44から、全て金属製のスブロケツ
1〜27.チェーン11.ローラ20.支持軸22.及
び被加工物取付具3を介して、被加工物4(第4図)に
蒸発物質粒子のイオン化極性と逆極性の電圧を印加する
。On the other hand, from the high-voltage DC power supply 44, all metal subblocks 1 to 27. Chain 11. Roller 20. Support shaft 22. A voltage having a polarity opposite to the ionization polarity of the evaporated material particles is applied to the workpiece 4 (FIG. 4) via the workpiece fixture 3.
なお、図示していないが、必要に応じて蒸発源Sとチェ
ーン11との間にイオン化電極を設けて蒸発物質粒子の
イオン化を促進することができる。Although not shown, an ionization electrode may be provided between the evaporation source S and the chain 11 if necessary to promote ionization of the evaporation material particles.
この実施例によれば、第1図に示した従来例に比して、
ベルジャS内に上下2段に多数の被加工物をチャージす
ることができ、しかも各被加工物がチェーン11の回動
に伴なって、蒸発源6に対して左右、上下の異なる条件
の位置を入れ換わりながら回転するので、全ての被加工
物の全面に略均−な膜質及び膜厚の薄膜を形成すること
ができる。According to this embodiment, compared to the conventional example shown in FIG.
A large number of workpieces can be charged in the belljar S in two stages, upper and lower, and as the chain 11 rotates, each workpiece can be placed in different positions horizontally and vertically with respect to the evaporation source 6. Since it rotates while exchanging the parts, it is possible to form a thin film of substantially uniform quality and thickness on the entire surface of all the workpieces.
第8図は、この発明によるイオンブレーティング装置に
おける治具の他の配置例を模式的に示す図であり、第7
図と対応する部分には同一の符号を付しである。FIG. 8 is a diagram schematically showing another example of the arrangement of jigs in the ion blating apparatus according to the present invention, and FIG.
Parts corresponding to those in the figure are given the same reference numerals.
この実施例では、一対のスプロケット27゜28をベル
ジャ5内の蒸発源6と同しベ、ルの下部における蒸発源
6の両側に配設し、チェーン11を略ベルジャ5の内壁
に沿って逆U字状に張装するように、上部に蒸発源7の
蒸発中心を中心とする円弧状のガイドレール41’ 、
42’ を2段に固設して、上部の外側及び内側のチェ
ーン11に装着されたローラ20を転接させると同時に
支持している。In this embodiment, a pair of sprockets 27 and 28 are disposed on both sides of the evaporation source 6 at the bottom of the belljar 5 at the same level as the evaporation source 6 inside the belljar 5, and the chain 11 is inverted approximately along the inner wall of the belljar 5. An arc-shaped guide rail 41' centered on the evaporation center of the evaporation source 7 is provided on the upper part so as to be stretched in a U-shape.
42' are fixedly installed in two stages to rotate and simultaneously support the rollers 20 attached to the upper outer and inner chains 11.
この場合、ガイドレール41’ 、42’の横断面形状
を第9図に示すようにチャンネル状にして、ローラ20
の軸方向の移動を規制する必要がある。In this case, the cross-sectional shape of the guide rails 41' and 42' is made into a channel shape as shown in FIG.
It is necessary to restrict the axial movement of the
また、この実施例では、高圧直流電源44からガイドレ
ール41’ 、42’ に給電して、ローラ20及び被
加工物取付具3を介して被加工物4(第4図)に電圧を
印加している。Further, in this embodiment, power is supplied from the high voltage DC power supply 44 to the guide rails 41' and 42', and a voltage is applied to the workpiece 4 (FIG. 4) via the roller 20 and workpiece fixture 3. ing.
このようにすれば、給電経路を短かくして抵抗損失を少
なくでき、チェーン11とローラ20との間に絶縁体を
介在させるかチェーン11を絶縁材製にすれば、ローラ
20がガイドレール41′又は42′に転接して回転し
ている時にのみ被加工物に電圧が印加されて、イオンブ
レーティングが行なわれるようにすることもできる。In this way, the power supply path can be shortened to reduce resistance loss, and if an insulator is interposed between the chain 11 and the rollers 20 or the chain 11 is made of an insulating material, the rollers 20 can be connected to the guide rail 41' or It is also possible to apply a voltage to the workpiece only when it is rotating in rolling contact with 42', so that ion blating can be performed.
この実施例によれば、第7図に示した実施例よりさらに
多数の被加工物を一度にチャージすることができ、且つ
形成される薄膜の膜質及び膜厚を均一に保つことができ
る。According to this embodiment, a larger number of workpieces can be charged at one time than in the embodiment shown in FIG. 7, and the quality and thickness of the formed thin film can be kept uniform.
また、蒸発源6の下側には被加工物がないので、第6図
に示した従来例のように、上方から落下する剥離片等の
ごみによって膜質が劣化することがなく、蒸発源の取付
や、インラインでの治具の搬入、搬出も容易であり、蒸
発源の高さも比較的自由に調整できる。In addition, since there is no workpiece below the evaporation source 6, the film quality is not deteriorated by debris such as flakes falling from above, as in the conventional example shown in FIG. Installation and in-line jig loading and unloading are easy, and the height of the evaporation source can be adjusted relatively freely.
なお、ベルジャ内の治具の配置は、上記実施例に限られ
るものではなく、チェーンの張装の仕方及びガイドレー
ルの形−状及び位置によって種々変更できる。その場合
、チェーンの張装形状によっては中間スプロケットを必
要数使用することができる。Note that the arrangement of the jigs in the bell jar is not limited to the above embodiment, and can be changed in various ways depending on the method of tensioning the chain and the shape and position of the guide rail. In that case, depending on the tensioning shape of the chain, the required number of intermediate sprockets can be used.
さらに、蒸発源として電子ビーム蒸発源を使用したイオ
ンブレーティング装置の実施例を説明したが、蒸発源と
して抵抗加熱や高周波加熱によるもの等種々のものを使
用することができるし、イオンブレーティング装置だけ
でなく、蒸着やスパッタ等の他の真空薄膜形成装置にこ
の発明を適用しても、充分効果がある。Furthermore, although an example of an ion blating apparatus using an electron beam evaporation source as an evaporation source has been described, various types of evaporation sources such as those using resistance heating or high frequency heating can be used. In addition, the present invention can be applied to other vacuum thin film forming apparatuses such as evaporation and sputtering with sufficient effect.
ところで、第4図に示したように支持軸22をローラ2
0にワンタッチで着脱できるようにしておけば、ベルジ
ャ開放時の薄膜を形成した被加工物と未形成の被加工物
の交換を短時間で行なうことができるので、ベルジャ開
放時間も短縮され、湿気等の吸着が少なくなるので次の
排気工程も短かくなり、作業能率が大幅に向上する。By the way, as shown in FIG.
If the belljar can be attached and detached with one touch, the workpiece with a thin film formed and the unformed workpiece can be exchanged in a short time when the belljar is opened, which shortens the belljar opening time and prevents moisture. Since the amount of adsorption of substances such as the like is reduced, the next exhaust process is also shortened, greatly improving work efficiency.
魂−末
以上説明してきたように、この発明によれば、従来の真
空薄膜形成装置における被加工物支持」二の問題を全て
解決して、真空容器内の利用効率を高めて1バッチ当り
の被加工物チャージ数を多くし、しかも形成される薄膜
の膜質や膜厚にむらができたり、ごみによる劣化を生ず
る恐れもなく、蒸発源の取付けやインラインで使用する
場合の治具の搬入、搬出も容易にすることができる。End of the Soul As explained above, according to the present invention, it is possible to solve all the two problems of "workpiece support" in conventional vacuum thin film forming apparatuses, increase the efficiency of use of the inside of the vacuum container, and reduce the amount of work per batch. The number of charges to the workpiece can be increased, and there is no risk of unevenness in the quality or thickness of the formed thin film or deterioration due to dust, and it is possible to install evaporation sources and carry in jigs for in-line use. It can also be carried out easily.
また、イオンブレーティングの場合には、チェーンやガ
イドレールを給電路として使用できる。Furthermore, in the case of ion brating, a chain or guide rail can be used as a power supply path.
第1図は、従来の真空薄膜形成装置における真空容器内
で被加工物を支持する治具の例を示す斜視図、
第2図及び第6図は、従来の真空薄膜形成装置における
第1図に示した治具のそれぞれ異なる配置例を示す模式
図、
第4図は、この発明の実施例における治具の要部を示す
斜視図、
第5図は、同じくその支持軸のローラへの挿着端部を示
す斜視図、
第6図は、同じくチェーンとローラとの連結状態を示す
軸方向に沿う断面図、
第7図及び第8図は、この発明のそれぞれ異なる実施例
の治具の配置を示す模式図、
第9図は、同じくそのガイドレールの横断面形状の例を
示す断面図である。
3・・・被加工物取付具 4・・・被加工物5・・・ベ
ルジャ(真空容器) 6・・・蒸発源7・・・蒸発物質
11・・・チェーン12・・・連結ピン 20・・・
ローラ21・・・クリップ 22・・・支持軸27.2
8・・・スプロケット
41.42.41’ 、42’ ・・・ガイドレール第
1図
第2図
第3図FIG. 1 is a perspective view showing an example of a jig for supporting a workpiece in a vacuum container in a conventional vacuum thin film forming apparatus. FIGS. 2 and 6 are a first diagram in a conventional vacuum thin film forming apparatus. FIG. 4 is a schematic diagram showing different arrangement examples of the jigs shown in FIG. FIG. 6 is a sectional view along the axial direction showing the connected state of the chain and the rollers. FIGS. 7 and 8 are views of jigs according to different embodiments of the present invention. FIG. 9, which is a schematic diagram showing the arrangement, is a sectional view showing an example of the cross-sectional shape of the guide rail. 3...Workpiece attachment fixture 4...Workpiece 5...Belljar (vacuum container) 6...Evaporation source 7...Evaporation substance 11...Chain 12...Connection pin 20.・・・
Roller 21...Clip 22...Support shaft 27.2
8...Sprocket 41.42.41', 42'...Guide rail Figure 1 Figure 2 Figure 3
Claims (1)
設し、前記蒸発源からの蒸発物質を前記被加工物に付着
させて薄膜を形成する真空薄膜形成装置において、 前記被加工物を支持する治具を、少なくとも一対のスプ
ロケットに無端状に張装したチェーンと、該チェーンの
複数の連結ピンにそJLぞれ回転自在に間隔を置いて軸
支させた複数のり−ラと、その各ローラに装着されて一
体的に回転する支持軸と、該支持軸に固設された被加工
物取付具と、前記各ローラを転接させるように前記真空
容器内の所定の領域に亘って固設したガイドレールとに
よって構成したことを特徴とする真空薄膜形成装置。 2 前記ローうに前記支持軸が着脱自在に装着されてい
る特許請求の範囲第1項記載の真空薄膜形成装置。[Scope of Claims] 1. A vacuum thin film in which an evaporation source and a workpiece are arranged at a distance in a vacuum container, and evaporated substances from the evaporation source are attached to the workpiece to form a thin film. In the forming apparatus, the jig for supporting the workpiece is rotatably supported by a chain stretched endlessly around at least one pair of sprockets and a plurality of connecting pins of the chain, each of which is rotatably spaced apart. a plurality of rollers, a support shaft attached to each of the rollers and rotated together, a workpiece fixture fixed to the support shaft, and the vacuum so as to bring the rollers into contact with each other. 1. A vacuum thin film forming apparatus comprising a guide rail fixedly installed over a predetermined area within a container. 2. The vacuum thin film forming apparatus according to claim 1, wherein the support shaft is detachably attached to the row.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58142143A JPS6033350A (en) | 1983-08-03 | 1983-08-03 | Vacuum film forming apparatus |
KR1019840004043A KR890004617B1 (en) | 1983-08-03 | 1984-07-11 | Apparatus for forming thin film in a vacuum |
GB08419870A GB2144453B (en) | 1983-08-03 | 1984-08-03 | Apparatus for forming thin films in vacuum |
HK815/87A HK81587A (en) | 1983-08-03 | 1987-11-05 | Apparatus for forming thin film in a vacuum |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58142143A JPS6033350A (en) | 1983-08-03 | 1983-08-03 | Vacuum film forming apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6033350A true JPS6033350A (en) | 1985-02-20 |
Family
ID=15308361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58142143A Pending JPS6033350A (en) | 1983-08-03 | 1983-08-03 | Vacuum film forming apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS6033350A (en) |
KR (1) | KR890004617B1 (en) |
GB (1) | GB2144453B (en) |
HK (1) | HK81587A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6210272A (en) * | 1985-07-05 | 1987-01-19 | Seiko Electronic Components Ltd | Rotary type vapor deposition device |
JP2010095745A (en) * | 2008-10-15 | 2010-04-30 | Sumitomo Electric Ind Ltd | Film-forming method and film-forming apparatus |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101909810B1 (en) | 2017-03-02 | 2018-12-18 | 박현철 | Injection mold for molding products with thread |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55146927A (en) * | 1979-05-07 | 1980-11-15 | Citizen Watch Co Ltd | Film forming device |
JPS5743983A (en) * | 1980-08-30 | 1982-03-12 | Shimadzu Corp | Film preparing apparatus |
-
1983
- 1983-08-03 JP JP58142143A patent/JPS6033350A/en active Pending
-
1984
- 1984-07-11 KR KR1019840004043A patent/KR890004617B1/en not_active IP Right Cessation
- 1984-08-03 GB GB08419870A patent/GB2144453B/en not_active Expired
-
1987
- 1987-11-05 HK HK815/87A patent/HK81587A/en not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55146927A (en) * | 1979-05-07 | 1980-11-15 | Citizen Watch Co Ltd | Film forming device |
JPS5743983A (en) * | 1980-08-30 | 1982-03-12 | Shimadzu Corp | Film preparing apparatus |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6210272A (en) * | 1985-07-05 | 1987-01-19 | Seiko Electronic Components Ltd | Rotary type vapor deposition device |
JP2010095745A (en) * | 2008-10-15 | 2010-04-30 | Sumitomo Electric Ind Ltd | Film-forming method and film-forming apparatus |
Also Published As
Publication number | Publication date |
---|---|
GB2144453A (en) | 1985-03-06 |
GB2144453B (en) | 1986-06-11 |
KR850002110A (en) | 1985-05-06 |
HK81587A (en) | 1987-11-13 |
KR890004617B1 (en) | 1989-11-20 |
GB8419870D0 (en) | 1984-09-05 |
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