JPS60244013A - Manufacture of magnetic material - Google Patents
Manufacture of magnetic materialInfo
- Publication number
- JPS60244013A JPS60244013A JP9927084A JP9927084A JPS60244013A JP S60244013 A JPS60244013 A JP S60244013A JP 9927084 A JP9927084 A JP 9927084A JP 9927084 A JP9927084 A JP 9927084A JP S60244013 A JPS60244013 A JP S60244013A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- metal
- magnetic material
- molten metal
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 31
- 239000002184 metal Substances 0.000 claims abstract description 31
- 239000007769 metal material Substances 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract 2
- 239000011810 insulating material Substances 0.000 claims description 5
- 238000001816 cooling Methods 0.000 abstract description 5
- 238000005266 casting Methods 0.000 abstract description 3
- 238000010276 construction Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 4
- 230000009970 fire resistant effect Effects 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000011449 brick Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 description 1
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 229910021344 molybdenum silicide Inorganic materials 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910001258 titanium gold Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明ば離性金属薄膜形成用のスパッタリングターゲッ
トを作成する磁性材料の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for producing a magnetic material for producing a sputtering target for forming a releasable metal thin film.
背景技術とその問題点
従来、磁性金属i1X膜を形成するスパッタリングター
ゲットを製造するには金属製鋳型あるいは耐火性レンガ
鋳型に溶融し°ζいる磁性金属を注湯してブロック状に
鋳造しており、またずの発生し易い材料では押湯を設け
て鋳造を行なっていた。BACKGROUND TECHNOLOGY AND PROBLEMS Conventionally, sputtering targets for forming magnetic metal i1X films have been manufactured by pouring molten magnetic metal into a metal mold or refractory brick mold and casting it into a block shape. For materials that are prone to splintering, a riser was installed for casting.
しかし、この製造方法では直径が150−以上の磁性材
ターゲットブロックを鋳造することはできず、またセン
ダスト合金のように硬くて脆く、しかも結晶粒が粗大化
し易く凝固時の収縮の大きい材料は単に押湯を設けるだ
けではずなしの大型のブロックを割れのない状態で鋳造
することば困難であった。However, with this manufacturing method, it is not possible to cast a magnetic material target block with a diameter of 150 mm or more, and materials such as sendust alloy, which are hard and brittle, tend to have coarse grains, and have large shrinkage during solidification, are simply It was difficult to cast a large block without cracking just by providing a riser.
発明の目的
本発明はかかる点に鑑み、ず及び割れのない大型の磁性
材料ターゲットが得られる磁性材料の製造方法を提供す
るものである。OBJECTS OF THE INVENTION In view of the above, it is an object of the present invention to provide a method for producing a magnetic material that allows a large-sized magnetic material target without cracks or cracks to be obtained.
発明の概要
本発明は上記目的を達成するために、内鋳型に耐火性保
温材、外鋳型に金属材を用いた二層構造の鋳型と金属材
よりなる鋳型台に磁性材料の溶湯を注湯し、この溶湯を
」二連の金属材よりなる鋳型台より一方向に凝固させて
磁性材料を製造することによりす及び割れのない大型の
磁性材料ターゲットを得ることができるようにしたもの
である。Summary of the Invention In order to achieve the above-mentioned object, the present invention has a two-layered mold with a fire-resistant heat insulating material for the inner mold and a metal material for the outer mold, and a mold base made of the metal material, in which molten metal of a magnetic material is poured. By solidifying this molten metal in one direction through a mold stand made of two metal materials to produce a magnetic material, it is possible to obtain a large magnetic material target without cracks or cracks. .
実施例
以下本発明の一実施例を図面を参照して説明す先ず図面
に不ずように銅及びtl=1合金、すIi鉛及び亜鉛合
金等から形成される大型の金属製鋳型台(1)の1−に
焼結アルミナ、黒鉛等の耐火物材により所定の寸法に設
計し人−Ilit火保lXI性で押i’Jji (2a
)を有する内鋳型(:つ)を載置する。そしてこの内鋳
型(2)の外部に軟鋼、鋳鉄等の鉄鋼材料から形成され
る金属型外鋳型(3)を嵌合して丁−1皆構造の鋳型を
構成する。なお金属製り目か型(3)によって溶湯の漏
出を防止才る。EXAMPLE An example of the present invention will be described below with reference to the drawings. First, as shown in the drawings, a large metal mold stand (1 ) is designed to the specified dimensions using a refractory material such as sintered alumina or graphite, and then pressed with a fire-retaining property (2a
) is placed on the inner mold. Then, a metal outer mold (3) made of a steel material such as mild steel or cast iron is fitted to the outside of this inner mold (2) to form a mold with a one-piece structure. In addition, the leakage of molten metal is prevented by the metal perforated mold (3).
ごのよ・)に構成した鋳型に例えばセンダスト合金等の
磁性材料の溶湯mを内鋳型(2)内1.こその湯口から
注湯する。このようにして内鋳型(2)内に注湯された
磁性材ネ1の溶湯mは横周囲からの冷却ははとんど無視
され、底面側の金属製鋳型台(11側からのみ冷却が進
み凝固されるごとになる。A molten metal m of a magnetic material such as sendust alloy is poured into an inner mold (1. Pour hot water from the sprue. The molten metal m of the magnetic material 1 poured into the inner mold (2) in this way is cooled only from the metal mold base (11 side) on the bottom side, with almost no cooling from the lateral surroundings. As it progresses, it solidifies.
そのため金属製鋳型台(1)の月質と体積は溶湯mの用
によって設計する必ツiがある。Therefore, the quality and volume of the metal mold stand (1) must be designed depending on the use of the molten metal.
例えば鋳型台+11をtJilにより形成し、1500
℃のセンダスI・合金の溶湯mを鋳込んだ時の温度が5
00ら500℃に冷却する際、放出する熱量は約2.7
×10’ cal/kgであり、また銅が20℃から5
00°Cへ温度上昇する際の吸収熱は約470ca l
/ cIdである。For example, mold stand +11 is formed by tJil, 1500
The temperature when pouring the molten metal M of Sendas I and alloy at ℃ is 5
When cooling from 00 to 500℃, the amount of heat released is approximately 2.7
×10' cal/kg, and copper is
The absorbed heat when the temperature rises to 00°C is approximately 470 cal
/cld.
従って10kgの溶湯mを鋳込むとするならば鋳型台f
ilを形成する銅の体積は
2.7X 10’ X 10÷470ζ5745c+d
に設計ずればよいごとになる。Therefore, if 10 kg of molten metal m is to be cast, the mold table f
The volume of copper forming il is 2.7X 10' X 10÷470ζ5745c+d
It would be a good idea to change the design accordingly.
また、鋳込まれたインゴットの割れを防止するためにこ
のインゴットを真空中或いは溶解雰囲気にて長時間放置
することが望ましく、約10時間の放置が好ましい。Further, in order to prevent the cast ingot from cracking, it is desirable to leave the cast ingot in a vacuum or in a melting atmosphere for a long time, preferably about 10 hours.
この、磁す!l−材乳1の鋳込みにおい゛ζ内鋳型(2
)及び外鋳型(3)の形状を円形、長方形、止方形等に
形成することにより種々の形状の磁性材料インゴットす
わなちターゲットが得られる。This is magnetic! l - When pouring the milk material 1, the inside mold (2
) and the outer mold (3) into a circular, rectangular, or square shape, magnetic material ingots of various shapes, that is, targets can be obtained.
また、鋳型の各部分の形成材質としては−I−述した材
質の他、鋳型台(1)はアルミニウム及びアルミニウム
合金、チタン及びチタン合金あるいは金等を、内鋳型(
2)はサファイヤ、焼結ジルコニア、焼結マグネシャ、
焼結ケイ化モリブデン、窒化モリブデン、窒化ホウ素或
いは炭化ケイ素等を、また外鋳型(3)はステンレス鋼
、窒化鋼或いは高硬鋼等の鉄鋼月料を用いて形成しζも
よい。In addition to the materials mentioned above, the mold base (1) is made of aluminum and aluminum alloys, titanium and titanium alloys, or gold, etc. for the inner mold (
2) is sapphire, sintered zirconia, sintered magnesia,
Sintered molybdenum silicide, molybdenum nitride, boron nitride, silicon carbide, etc. may be used, and the outer mold (3) may be formed using a steel material such as stainless steel, nitrided steel, or high-hardness steel.
なお、鋳型台(1)に耐火レンガを敷設したり、内鋳型
(2)を耐火性温材以り(の材料により形成するとイン
ゴットにずが発生したり、湯漏れが生じるおそれがある
。Note that if the mold base (1) is laid with fire-resistant bricks or the inner mold (2) is made of a fire-resistant hot material, there is a risk of ingot splintering or leakage.
以上のように本例は鋳型の底面側を磁性材料溶湯の凝固
熱及び冷却時の放出熱を充分吸収可能な金属材により、
また側面及び上面を熱伝導の極めて小さい飼犬性保温材
により形成すると共に耐火性保温材により形成される側
面から上面にかけて金属材により被覆したことにより鋳
型内に鋳込まれる磁性材料の溶湯は外部に漏出すること
なく、底面側から一方向に凝固され、ずのない大型イン
ゴットの鋳造を可能とし、これによって直径が150−
璽を越える磁性材料スパッタリング用のクーゲットを製
造できる。As described above, in this example, the bottom side of the mold is made of a metal material that can sufficiently absorb the solidification heat of the molten magnetic material and the heat released during cooling.
In addition, the side and top surfaces are made of a heat insulating material with extremely low heat conductivity, and the top surface is coated with a metal material from the sides made of a fire-resistant heat insulating material, so that the molten metal of the magnetic material poured into the mold is exposed to the outside. It solidifies in one direction from the bottom side without leaking, making it possible to cast large, clean ingots with a diameter of 150 mm.
It is possible to manufacture a cougette for sputtering magnetic materials that exceeds the size of a seal.
発明の効果
以上のように本発明によれば内鋳型に耐火性保温材、外
鋳型に金属材を用いた二層構造の鋳型と金属材よりなる
鋳型台に磁性材料の溶湯を注湯してこの溶湯を金属材よ
りなる鋳型台より一方向に凝固させるので、ずのない大
型インゴットの鋳造が可能となり磁性材料例えばセンダ
ストスパッタリング用のターゲットを確実に形成できる
と共にその製造歩留が向上し、また大型のターゲットを
確実に形成できることによりスパッタ作業能率の向上を
図ることができる等の効果を有する。Effects of the Invention As described above, according to the present invention, molten metal of a magnetic material is poured into a mold having a two-layer structure using a refractory heat insulating material for the inner mold and a metal material for the outer mold, and a mold base made of a metal material. Since this molten metal is solidified in one direction from a mold stand made of a metal material, it is possible to cast large ingots without any defects, and it is possible to reliably form targets for magnetic materials such as sendust sputtering, and the manufacturing yield is improved. This has the effect of improving sputtering efficiency by reliably forming a large target.
図は本発明に適用する鋳型の一例の断面図である。
図中(1)は鋳型台、(2)は内鋳型、(2a)は押湯
、(3)は外鋳型である。The figure is a sectional view of an example of a mold applied to the present invention. In the figure, (1) is a mold stand, (2) is an inner mold, (2a) is a riser, and (3) is an outer mold.
Claims (1)
造の鋳型と金属材よりなる鋳型台に磁性材料の溶湯を注
湯し、前記磁性材料の溶湯を前記金属材よりなる鋳型台
より一方向に凝固させることを特徴とする磁性材料の製
造方法。A molten metal of a magnetic material is poured into a mold with a two-layer structure in which an inner mold is made of a refractory heat insulating material and an outer mold is made of a metal material, and a mold stand made of a metal material is used, and the molten metal of the magnetic material is poured into a mold made of the metal material. A method for manufacturing a magnetic material, characterized by solidifying it in one direction from a stand.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9927084A JPS60244013A (en) | 1984-05-17 | 1984-05-17 | Manufacture of magnetic material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9927084A JPS60244013A (en) | 1984-05-17 | 1984-05-17 | Manufacture of magnetic material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60244013A true JPS60244013A (en) | 1985-12-03 |
Family
ID=14242990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9927084A Pending JPS60244013A (en) | 1984-05-17 | 1984-05-17 | Manufacture of magnetic material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60244013A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63238268A (en) * | 1987-03-27 | 1988-10-04 | Hitachi Ltd | Method for manufacturing sputtering targets |
JPS63241167A (en) * | 1987-03-30 | 1988-10-06 | Seiko Epson Corp | Target for sputtering |
JPS6411060A (en) * | 1987-07-06 | 1989-01-13 | Seiko Epson Corp | Mold for casting |
JP2001271161A (en) * | 2000-01-20 | 2001-10-02 | Mitsui Mining & Smelting Co Ltd | Method for manufacturing sputtering target |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4970826A (en) * | 1972-11-08 | 1974-07-09 | ||
JPS54102233A (en) * | 1978-01-30 | 1979-08-11 | Sumitomo Spec Metals | Production of directional pillar like crystalline magnet |
-
1984
- 1984-05-17 JP JP9927084A patent/JPS60244013A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4970826A (en) * | 1972-11-08 | 1974-07-09 | ||
JPS54102233A (en) * | 1978-01-30 | 1979-08-11 | Sumitomo Spec Metals | Production of directional pillar like crystalline magnet |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63238268A (en) * | 1987-03-27 | 1988-10-04 | Hitachi Ltd | Method for manufacturing sputtering targets |
JPS63241167A (en) * | 1987-03-30 | 1988-10-06 | Seiko Epson Corp | Target for sputtering |
JPS6411060A (en) * | 1987-07-06 | 1989-01-13 | Seiko Epson Corp | Mold for casting |
JP2001271161A (en) * | 2000-01-20 | 2001-10-02 | Mitsui Mining & Smelting Co Ltd | Method for manufacturing sputtering target |
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