JPS60136145A - Charged particle analyzer - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION (a) Industrial Application The present invention relates to charged particle analyzers such as AES, SIMS, and EPMA, and relates to an optical system for two-dimensionally scanning a stone-shaped particle beam in the intestine.

(B) Prior Art Generally, this type of charged particle analyzer includes an electromagnetic deflection type and an electrostatic deflection type for two-dimensional scanning of stone-shaped particle beams such as ions and electrons.

Scanning is performed by applying a deflection signal to each of the X- and Y-direction deflectors arranged orthogonally to each other. By the way, in the prior art, only a sawtooth wave function pattern is used as the deflection signal given to the deflector, and therefore only a rectangular pattern scan is performed on the sample. For this reason, it is difficult to analyze only a certain part of the sample, resulting in problems such as long analysis time and contamination.

(c) Purpose It is an object of the present invention to solve the above-mentioned problems and to enable a charged particle beam to scan shapes other than rectangles as desired.

In order to achieve such an object, the present invention includes a deflector that deflects a charged particle beam, and a deflection signal generator that provides a deflection signal to the deflector. A function generator in which a function pattern is set is connected, and this function generator functions-controls the cod direction signal of the deflection signal generator so that the charged particle beam can be scanned in an arbitrary shape.

(E) Example Hereinafter, the present invention will be explained in detail based on an example shown in the drawings. In this embodiment, a case where the present invention is applied to a charged particle analyzer equipped with an external electric deflection type ion gun will be explained.

FIG. 1 is a configuration diagram of a capacitive ion gun of a charged particle analyzer. In the figure, numeral 1 is an ion gun of a charged particle analyzer, and 2 is a B consisting of a grid 4 and a filament 6.
An ayard Alpert type ion source, 8 an ion extraction electrode, 10, 12, and 14 convergent lenses, and 16 a deflector for deflecting the ion beam. This deflector 16 includes a pair of electrodes 18a and 18 that are parallel to each other and face each other.
b, 20a, and '20b are arranged orthogonally in the X direction (vertical direction in Figure 1) and the Y direction (perpendicular to the paper plane in the figure) 9' Figure 2 shows a deflector of a charged particle analyzer. FIG. 2 is a configuration diagram of a scanning control section that drives and controls this deflector.

A pair of electrodes 18a and 18b in the X direction of the deflector 16 are provided with a first □ deflection signal generator 22 that applies a deflection voltage for scanning in the X direction to the electrodes 18a and 18b, and a pair of electrodes 20a and 20a in the Y direction are provided. For 2θb, these electrodes 20a, 20b
! 'c A second deflection signal generator 24 for providing a deflection voltage for scanning in the Y direction is connected to each of the second deflection signal generators 24. Furthermore, the above first
and a second respective deflection signal generator 22. , 24 are commonly connected to a function generator 26 in which a predetermined function pattern is set.

In the above configuration, ions generated in the ion source 2 are extracted and accelerated by the ion extraction electrode 8, focused by each converging lens 10, 12.14, and finally electrostatically deflected by the deflector 1G. . At this time, in order to perform two-dimensional scanning with the ion beam, first a function pattern corresponding to a desired shape such as a triangle, trapezoid, or circle to be scanned is set using the function generator 26. The function generator 26 generates the set function pattern by
The X-direction control signal based on the X component is sent to the first deflection signal generator 22, and the Y-direction control signal based on the Y component is sent to the first deflection signal generator 22.
Each second deflection signal generator 244 outputs a direction control signal. The first deflection signal generator 22 changes the deflection gauntlet in response to the X-direction control signal given from the function generator 2G. The second deflection signal generator 24 is also the function generator 2.
The deflection voltage is changed in response to the Y direction control signal given from 6. Therefore, for example, when performing trapezoidal scanning, one electrode 18a in the X direction is
A deflection voltage waveform as shown in Fig. 1 is given. A deflection voltage waveform of opposite polarity is applied to the other electrode 1"8b facing this. Also, a deflection voltage waveform as shown in FIG. A deflection voltage waveform of the opposite polarity is applied to the other electrode 20b facing the ion beam.As a result, the ion beam is deflected by the deflector 16 and is squared into a trapezoidal shape as shown in FIG. In this way, the function generator 26 functions-controls the deflection voltages of the deflection signal generators 22 and 24, and the ion beam is scanned in an arbitrary shape.

Although this embodiment describes a charged particle beam ml equipped with an electrostatic deflection type ion gun, it is not limited to this, and an electromagnetic deflection type may also be used. Of course, the present invention can also be applied to electron guns.

(f) Effects As described above, according to the present invention, charged particles can be scanned in any shape. Therefore, it is possible to analyze only a specific area, and it is possible to shorten the curve during force analysis and prevent contamination.

[Brief explanation of the drawing]

The first page shows an embodiment of the present invention; Figure 1 is a configuration diagram of an electrostatic deflection type ion gun of a charged particle analyzer, and Figure 2 is a diagram of a deflector of a charged particle analyzer and the drive of this deflector. 3(a) and 3(b) are voltage waveform diagrams applied to the deflector, and FIG. 3(C) is a pattern diagram showing the scanning shape of the charged particle beam. 16... Deflector, 22... First deflection signal generator, 24... Second deflection signal generator, 26
...Function generator. Applicant Shimadzu Corporation Representative Patent Attorney Kazuhide Okada

Claims (1)

[Claims] (1) A deflector that deflects a charged particle beam, and a deflection signal generator that provides a deflection signal to the deflector, and the deflection signal generator includes a function generator in which a predetermined numerical pattern is set. A charged particle analyzer characterized in that the deflection signal of the deflection signal generator is controlled by the function generator to generate a wide beam of charged fact particles in an arbitrary shape.