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JPS60131868A - Manufacture of silicic acid powder sphere - Google Patents

Manufacture of silicic acid powder sphere

Info

Publication number
JPS60131868A
JPS60131868A JP58236421A JP23642183A JPS60131868A JP S60131868 A JPS60131868 A JP S60131868A JP 58236421 A JP58236421 A JP 58236421A JP 23642183 A JP23642183 A JP 23642183A JP S60131868 A JPS60131868 A JP S60131868A
Authority
JP
Japan
Prior art keywords
less
uranium
product
particle size
silicic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58236421A
Other languages
Japanese (ja)
Inventor
井手 亮一
晃 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP58236421A priority Critical patent/JPS60131868A/en
Publication of JPS60131868A publication Critical patent/JPS60131868A/en
Pending legal-status Critical Current

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  • Compositions Of Oxide Ceramics (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は珪酸買初末席状体の製造方法、更に詳しくは、
トランジスターやICおよびLSIなどの側止材料とし
て用いられる便脂充填用のウラン含何社が少な(、流動
性が良好な溶liI!ll珪戚質初末球状体の製造方法
に関する。
[Detailed Description of the Invention] The present invention relates to a method for producing a silicic acid substrate, more specifically,
There are few companies that contain uranium for filling fecal fat, which is used as a side-filling material for transistors, ICs, LSIs, etc. (This article relates to a method for producing siliceous primary spheres with good fluidity.

従来トランジスターやICおよびLSIなどの藺脂耐止
材料に用いる充填材としては結昂實石英、溶融注酸等珪
ば質の初末が知られており、特に溶融石英初氷はエポキ
シ、シリジーン、ポリエステル*、jfll 脂などの
モールド材に配合した場合、艮好な熱特性、゛電気特注
作業性を付与するため注目されている。
Conventionally, siliceous materials such as fused quartz and fused acid are known as fillers used in grease-resistant materials such as transistors, ICs, and LSIs.In particular, fused quartz is filled with epoxy, siligene, and polyester. *, jflll When blended with molding materials such as fats, it is attracting attention because it imparts excellent thermal properties and electrical customization workability.

しかし最近技術の進少と共に半4体が尚果績度化を指向
するようになり、そのパッケージ材料の高性能化か要求
され、前記充填材に芭まれるウランはその崩壊時にα粒
子が発生するので、半導体製品のソフトエラーの原因と
なることからi■及的にそのウラン含有基の少ない充填
材か要望されている。
However, recently, with the advancement of technology, half-four bodies have become more efficient, and the packaging materials are required to have higher performance, and the uranium used as the filler produces alpha particles when it disintegrates. Therefore, fillers with fewer uranium-containing groups are desired since they can cause soft errors in semiconductor products.

このウラン言有産の少ない充填材としては天然に成用す
るシリカ原石を4II製し浴融、粉砕し祷られるものと
ハロゲン化シリコン化合物を出発原料とする合成品があ
る。(特開昭57−187956号、特開昭58−15
1318号)、シかし、天然品はその生産量に限界かあ
り破近の十碑体工菓の、@賊な需、装の増加に対応でき
ずまた品負の而においても安定して良品質のものを祷る
には不安がある。 ・ 一方合成品は非常に赦細な粒子径をもつため賀脂への充
填性に乏しくかつ作業性が悪いということから微細な合
成品を1900 ’C以上に加熱、醇1独しこれを急冷
することによりガラス化した品を・丹び200μ以下程
度に粉砕し光填材を得る方法が提案されている。(特開
昭57〜195151)しかしながらこの方法によると
ウラン含有層の少ない珪酸質籾米が得られるが、粉砕工
程を経るため粉砕された品は粒子形状が不定形となり、
樹脂へ亦加虚を増加させるとその流動性が低下し刺止操
作に支障を生ずる他硬化時に歪が残留し十害体の素子特
性を低下させるという問題があった。
Fillers with low uranium content include those made from naturally occurring silica ore, bath-fused and pulverized, and synthetic fillers using halogenated silicon compounds as starting materials. (Unexamined Japanese Patent Application No. 57-187956, Unexamined Japanese Patent Application No. 58-15
(No. 1318), the production of natural products is at a limit, and Juhitai Koka, which is on the verge of collapse, cannot meet the increasing demand and supplies, and the quality is also stable. I'm worried about hoping for something of good quality.・ On the other hand, synthetic products have a very small particle size, which makes it difficult to fill the resin and have poor workability, so fine synthetic products are heated to over 1900'C and then rapidly cooled. A method has been proposed in which a vitrified product is crushed into pieces of about 200 μm or less to obtain an optical filler. (Japanese Patent Application Laid-Open No. 57-195151) However, although this method yields siliceous rice with a small uranium-containing layer, the pulverized product has an amorphous particle shape due to the pulverization process.
Increasing the loading of the resin reduces its fluidity, which impedes the pricking operation, and also leaves distortions during curing, which deteriorates the properties of the ten-damaged element.

また光項材の粒度分布を調整することによりこの歪を改
善する提案もあるが樹脂充填用として十分、4足するも
のではンよい。
There is also a proposal to improve this distortion by adjusting the particle size distribution of the optical material, but it is sufficient for resin filling, and four plus one is sufficient.

科とする珪ば買粉末涼科を造粒し、これを火焔用で直接
#1融して球状化することにより、ウラン含有ばか少な
く、シかも樹脂との配合時の元塙注および流動性にすぐ
れ、かつ成形時に応力の低い樹脂組成9勿が得られるウ
ラン含W姓の少1工い珪酸質粉末球状体の製造方法を提
供しようとするものである。すなわら、本発明はウラン
言N磁が10ppb以下の合成珪素質iI!ll!扮末
を粒径5L10μ以下に造粒した後、これを口r燃注気
犀とI!11!素と共にバーナーから噴射し17ooc
以上の温度で熱処理し冷却することを′4!j徴とする
By granulating the powdered Ryoshina, which is used in the field of fire, and melting it directly into #1 spherules for flame use, it contains less uranium and improves the stability and fluidity when blended with Shikamo resin. The object of the present invention is to provide a method for manufacturing a silicate powder spherical body containing uranium and W in a small process, which allows a resin composition with excellent properties and low stress during molding to be obtained. In other words, the present invention is a synthetic silicon material with a uranium N magnetism of 10 ppb or less! ll! After granulating the powder into particles with a particle size of 5L and 10μ or less, the powder was granulated into powder. 11! Sprayed from the burner with the raw material and 17ooc
Heat treatment at a temperature above and cooling '4! J symptoms.

以下さらに不発明の詳細な説明する。The invention will be further explained in detail below.

本発明において原料と1−る合成珪素負戒扮未は、ハロ
r/比シリコン比合9勿寺の併発しやすい珪糸比合物及
びシラン峙を加水分解、改化′J+解あるいはアルコー
ル存仕上でアルコキッドとし加水分解することにより生
成したもので、ウラ/含付虚が1 [3ppb以下で、
その粒度は0.01〜U、5μWL程度の咳11H7エ
粒注のもので、しかもウラン遺は1Uppb以下である
ものが好ましく用いられる。な査、原料辻素質威吻木中
のウラン言W *L’ 101)I)bを越えるものは
、ウラ/含毎逍i o ppb以下の珪酸質粉末球状体
は祷られない。
In the present invention, the synthetic silicon used as a raw material is hydrolyzed, modified by silane compounds and silane compounds that tend to occur together with halo r/silicon ratio 9, modified by 'J+ solution or alcohol present. It is produced by hydrolyzing it into alcoquid in finishing, and the ura/containing void is 1 [3 ppb or less,
It is preferably used that has a particle size of 0.01~U, about 5 μWL, and has a uranium residue of 1 Uppb or less. When inspecting raw materials, the uranium content in the raw materials must not exceed 101) I) b, and silicate powder spheres with a content of less than ppb cannot be expected.

これらのウラン言宵虚か1 (J X)pb以下の珪素
負波粉末を造粒するには例えは(1)結合剤を使用し粒
子の付層・凝集を利用する方法(以下結合削成造粒法と
い5 ) 、(2)結合剤を用いず栃の圧扁や焼結を利
用する方法(以下非結合削成造粒法という)’41?用
いることができ、その粒径を500μ以下、好ましくは
200μ以下に造粒する。粒径か500μより大きくな
るとバーナーの詰りか発生する等操作か困難となり、元
金に球状および浴融も嬉しくなる。
In order to granulate these silicon negative wave powders of 1 (J (2) A method that utilizes the compression and sintering of horse chestnuts without using a binder (hereinafter referred to as the non-bonded abrasion granulation method) '41? It can be used and is granulated to a particle size of 500μ or less, preferably 200μ or less. If the particle size is larger than 500 μm, operation becomes difficult due to clogging of the burner, etc., and spherical shape and bath melting are also difficult to obtain.

結合4り式造枝法において使用する結合剤は、ウランを
実質的に言何しない尚純度0水、アルコール等の有機浴
媒、エチルシリフート、コロイダルシリカ、ポリビニル
アルコール(PVA) 咎のW機吻寺であり、具体的に
はウラン含有層かi ppb以下のものを1史用する。
The binders used in the bonding four-branching method include zero-purity water that contains virtually no uranium, organic bath media such as alcohol, ethyl silicate, colloidal silica, and polyvinyl alcohol (PVA). Specifically, the uranium-containing layer or those with less than i ppb are used for one history.

また結合削成造粒法に用いる造粒機としては公知の亀粒
機か使用できる。具体的にはウランの混入ρ)4男力少
ないようなライニング−例えはウレタンゴム咎−が幽さ
れたドラム型造粒機、回転m型fi粒憾咎の転動式造粒
機あるいはスプレードライヤー等の噴射式造粒装置等が
あげられる。これらはいずれも比較的容易に各棟の粒径
と広い粒度分イhをもつものが蓄られる利点があるので
好ましいものである。
In addition, as a granulator used in the bonded abrasion granulation method, a known granulator can be used. Specifically, a drum-type granulator with uranium-containing lining (for example, urethane rubber), a rotary M-type FI granulator, or a spray dryer. Examples include injection type granulation equipment such as . All of these are preferable because they have the advantage that particles having a wide range of grain sizes can be stored relatively easily.

結合iすの使用量は造粒機の檀急によって異なるが、例
えばスプレードライヤーの場合は珪累X倣粉末に対し7
0重破襲以上あればよ(、また転勤式造粒機は70重、
i優以下好ましくを工5〜60貞量%であればよい。て
れら渭8!品は必ずしも乾燥する必要はないか、乾燥す
る場合は造粒と同時あるいは造Pi、後に行うこともで
きる。 。
The amount of binder used varies depending on the speed of the granulator, but for example, in the case of a spray dryer, it is
If it is 0 weight or more (and the transfer type granulator is 70 weight,
It is preferable that the amount is less than or equal to 5 to 60%. Terera Wei 8! It is not necessary to dry the product, or if it is dried, it can be done at the same time as granulation or after granulation. .

また非結合削成造粒法においてはつ・う/の混入が少な
い材質−例えばウラン言竹逮10 ppb以Fの高純度
シリカ買しンが−を1更用したロータリーキルンを始め
とする各個の加熱炉が使用できる。
In addition, in the non-bonding abrasion granulation method, each individual product, including a rotary kiln that uses a material with low concentration of hydrogen, such as uranium and high-purity silica containing less than 10 ppb F, is used. A heating furnace can be used.

加熱時の一度は14UL](3以下好ましく;は12L
l(J゛CC以下(上記以外の温度では大粒径のものが
僧られた。りするため好ましくない以上のように造粒し
て祷られた造粒品はホッパーおよび供給tc瀘を通して
町燃注気体およびtll、素とともにバーナーから竪型
炉の上部より炉内下方へ噴射して形成された1700’
U以上の4囲気丁で瞬時に熱処理する。oT燃注気体と
しては水素、グロパ/デタン、グロビレン、アセチレン
等が1史用できるが、その他に灯油、重油など成体燃料
を噴鐸化し気流状幅で1史用することもできる。
One time during heating is 14 UL] (preferably 3 or less; is 12 L)
1 (below J゛CC (at temperatures other than the above, large particle sizes will be produced).The granulated product that has been granulated as described above is not desirable because it is below J゛CC (at temperatures other than the above). 1700' formed by injecting gas, TLL, and element from the burner from the upper part of the vertical furnace to the lower part of the furnace.
Instantly heat treated in 4 enclosures of U or higher. As the oT fuel gas, hydrogen, gropa/dethane, globylene, acetylene, etc. can be used for one cycle, but it is also possible to convert solid fuel such as kerosene or heavy oil into a gas stream and use it for one cycle.

炉内へ噴射する=yr燃注気坏および酸素のηを速は艮
好な火炎の形状あるいは雰−気を形成するためのみなら
す上記気体と同時に噴射される原#+栃木の1化石央の
形成速度あるいは蒲留時間に影付するために町if生気
体Q工乱υ1t、となるよ5yよ速度好ましくは40n
t/抄以上であることが好ましい。またl!li2素は
上記1−Ij燃註気体の流速以下で噴射することか好ま
しい。
Injected into the furnace = yr fuel injection and oxygen η speed is only to form a nice flame shape or atmosphere. In order to influence the formation rate or retention time, if the raw gas Q is 1t, the speed is preferably 40n.
It is preferable that it is t/paper or more. See you again! It is preferable that the li2 element is injected at a flow rate lower than the flow rate of the above-mentioned 1-Ij combustion gas.

上記以外の流速で噴射すると粒相互の吠果か発生したり
完全なるmmが離しくな9好ましくない。
Injecting at a flow rate other than the above is undesirable as grains may crack each other or the grains may not be perfectly separated by a millimeter.

雰l1j1気の温度は珪索貞倣扮木が融化して解融石英
となる温度であれはよく具体的には17uoC以上好ま
しくは180υ〜260U″Cである。17U0C禾満
の温度では完全に解融石英を形成することができない。
The temperature of the atmosphere is the temperature at which the quartz wood melts into fused quartz. Specifically, it is 17 uoC or more, preferably 180 u to 260 U'' C. At the temperature of 17 uo C, it is completely melted. Unable to form fused silica.

炉内融化蛍での珪酸質粉末球状体の涌留時間は瞬時であ
り0.05秒以下である。その後珪酸質粉末球状体はダ
クトV3等で燃焼排ガスと共にq却され、びいでサイク
ロン、バッグフィルター吾のづ…果機で薄寒分離される
。なお燃焼νFガスはプロワ−を通して排出される。
The retention time of the silicic acid powder spheres in the furnace melting firefly is instantaneous and is less than 0.05 seconds. Thereafter, the silicic acid powder spherules are quenched together with the combustion exhaust gas through duct V3, etc., and cooled and separated using a cyclone, a bag filter, and a fruit machine. Note that the combustion νF gas is discharged through the blower.

本発明によって得られる珪酸質粉末球状体は一粒径bU
Oμ以下のものであるので、樹脂九項削として1更用す
る場合はそのまま、または聞分4をして所望の粒l徒分
曲となるように調整′3−れはよい。
The silicate powder spheroid obtained by the present invention has a particle size bU
Since the particle size is less than Oμ, when it is used once again as a resin cutter, it can be used as is, or it can be adjusted to obtain the desired grain size.

なお、500μ以上の粒径のものはこれを含有させた1
解崩組成物を1更用した′電子部品の耐止作粟時に釡型
のデート詰り等作業車に問題が生ずるためる。また結合
削式遣柁法によるものは、次1角改質かなされ餌脂と碕
れやすいものが得られる。
In addition, for particles with a particle size of 500μ or more, 1 containing this
If the disintegrating composition is used once more, problems may occur in work vehicles, such as clogging of pot-shaped dates, when manufacturing electronic parts to prevent millet. In addition, when using the combined cutting method, it is possible to obtain a product that undergoes the following one-sided modification and easily breaks up with bait fat.

以上説明したように本発明はウラン言佇賞1Oppb以
下の合成珪素′X威初木を造粒して粒住bU0μ以丁の
ものとし、これを可燃性気体と酸素と共に炉内に噴倒し
M@する方法であり、本発明によれはウラン笠の不純物
か混入しない球状体が祷られるので、樹脂と混合する際
、流動性が良く成形時の応力の低い成形体が伺られ、こ
れを半導体封止vc使用するとソフトエラーが低減でき
る。
As explained above, the present invention involves granulating synthetic silicon' According to the present invention, a spherical body that does not contain any impurities from the uranium cap is desired, so when mixed with resin, a molded body with good fluidity and low stress during molding can be obtained, and this can be used as a semiconductor. Using sealed VC can reduce soft errors.

また、結合削の存在下鹸融する方法においては球状体の
表面改・Kかでき、輌脂と藺れやずいものか得られる。
In addition, in the method of saponification in the presence of bond cutting, the surface of the spherical bodies can be modified and K can be obtained, resulting in the formation of linseed fat, soybean oil, and soybean oil.

以″l−夷θ= ++llをあげてさらに具体的に説明
する。
Hereinafter, a more specific explanation will be given using "l-yi θ=++ll".

実姉l+I11 日本アエロゾル(株)襞間品名[アエロゾル」1Lln
ltsにイオン55換しさらに蒸留し梢製した純水9U
車量部を加えポリウレタンゴム(大阪ゴム工業(株)の
内張りのミキサーで攪拌混合し固形分10厘jt%のス
ラリーを作成する。このスラリーゼ1υKy / Hr
の供給速度で熱風温度約3Ll[J゛Cのスグレードラ
イヤー(三菱化工機装)に鈑送し噴楕乾繰させ粒径14
9μ下100%44μ下78.5係り造粒品を得た。こ
の造粒品を水素ガス50 Nm’/Hr (45−9m
/sec )、1後素ガス15Nm3/ Hr (8,
5m / sec )のガスMArltで透明石英製バ
ーナーを用いlj貢出させ温度1850 ’Oで、浴融
させ製品をイ0だ。製品の粒度外孔、ウラ/遺、長′)
fl径比乞表に示す。面記光填削450重駄都にフレ・
戸−ルノボラックエポキシ位(11i!(チノマガイヤ
ー社簡品名「gcN−1280J )100貞量都、フ
ェノールノボラック便脂(チ/マガイギー社問Ilb名
rHT−94!、’OJ )50ffi逮肯3、−一ラ
ンディシルイミダゾール(硬化促進削)2止置部)カル
ナバワックス6電−郡を加え、ミキシング30−ルで1
0分+iJJ混練後冷却固化し切砕した。〆に流!!l
II性、樹脂応力を測定するためこの助砕品を成形温度
160 ’0截形圧力フ Q kg/ mm”で成形し
た。6111定結果を表に示す。
Real sister l + I11 Japan Aerosol Co., Ltd. Fold product name [Aerosol] 1Lln
9U of pure water made by exchanging 55 ions to lts and distilling it further.
Add the volume of polyurethane rubber (Osaka Rubber Industries Co., Ltd.) and stir and mix with a mixer lined with lining to create a slurry with a solid content of 10 ljt%.This slurry is 1υKy/Hr.
The hot air temperature was approximately 3L at a supply rate of
A granulated product with a ratio of 100% under 9μ to 78.5μ under 44μ was obtained. This granulated product was heated with hydrogen gas at 50 Nm'/Hr (45-9m
/sec), 1 post-prime gas 15Nm3/Hr (8,
The product was melted in a bath at a temperature of 1850'O using a transparent quartz burner with a gas MArlt of 5m/sec) to melt the product. Product particle size outer pores, back/end, length')
The fl diameter comparison table shows. 450 light filler on the frame.
Door-Runovolac epoxy position (11i! (Cinoma Geyer's simple product name "gcN-1280J") 100 days, Phenol novolac stool fat (CH/Mageigy company's Ilb name rHT-94!,'OJ) 50ffi approval 3, - 1) Landisyl imidazole (hardening accelerating cutting) 2) Add 6 parts of carnauba wax, and mix with 30 parts.
After kneading for 0 minutes + iJJ, the mixture was cooled, solidified, and chopped. Flow to the end! ! l
In order to measure the properties and resin stress, this auxiliary crushed product was molded at a molding temperature of 160' and a cutting pressure of Q kg/mm''.The results are shown in the table.

笑帽例2 四塩化ケイ素100貞瀘部にイオン父換しさらに蒸留し
た純水200重屋Sを常温で〃口えグ9ル比させる。そ
の後純水で−が6〜7になるまで水洗、洗浄を繰り返し
た後濾過する。侍られたケ9ル’!’ 7JD熱炉で温
度700“(EK加熱し尚純度シリカ内張りのロータリ
ーキルンに供給し粒径200μ下98係44μ丁65.
2%、の造粒品を傅た。この造粒品を実bt=例1と同
一の条件下で熱処理した。
Example 2: 100% silicon tetrachloride was added to 100% pure water and 200% pure water was distilled to 90% pure water at room temperature. Thereafter, washing with pure water is repeated until the - value becomes 6 to 7, followed by filtration. I was served! Heated in a 7JD heat furnace at a temperature of 700" (EK) and then fed to a rotary kiln lined with pure silica, with a particle size of 200μ or less, 98 μm, 44μ, 65.
A granulated product of 2% was prepared. This granulated product was heat treated under the same conditions as in Example 1.

実弛汐u6 四塩化ケイ素を酸素、水素ガスで加水分解して慴られた
絃初未シリカ100M量部に蒸留梢装しく、Hx −y
−/I/ 7 A/ コ−A/ 15 LJ厘量部を噴
楕しながらポリウレタンゴム〔大阪ゴム工業(株8内張
のドラム逍粒磯で造粒し粒径149μ′F92%44μ
ド80.2%(7)繍粒品しイ科だ。この造粒品をプロ
パンガス10 Nm3/Hr (12,’orn/、s
ec )、[素カス5Nm3/ Hr (6−2rn/
sec )のガス組成で温度1ソLIDCでm1させg
!品をイqた。
100M parts of silica obtained by hydrolyzing silicon tetrachloride with oxygen and hydrogen gas is added by distillation to Hx -y
-/I/ 7 A/ Co-A/ 15 While blowing the LJ volume part, polyurethane rubber [Osaka Rubber Industries Co., Ltd. Granulated in a drum granulation stone with 8 lining, particle size 149μ'F92% 44μ
80.2% (7) It's a grain product and it's a family. This granulated product was heated with propane gas 10 Nm3/Hr (12,'orn/, s
ec ), [raw scrap 5Nm3/Hr (6-2rn/
sec ) with a gas composition of
! I cum.

比時)C汐り 1 1本アエロゾル(4未)商品名「アエロジル」5゜爪虐
部と冥加レリ1と同様の配合で組成物を作成し、その(
頻回を演1Jポした。
A composition was prepared using the same formulation as C Shiori 1 1 bottle of Aerosol (4), trade name ``Aerosil'' 5゜ Tsukuobubu and Meikareli 1, and its (
I often performed 1J po.

比較例2 日本アエロジル<th)商品名「アエロゾル」を高純度
シリカ質ルツボ円で戚、水素ガスを1更用し透明石英製
バーナーで1850 ’Cに加熱しm、融さぜた。その
後m融物を収り出しポリウレタンゴムライニングのボー
ルミルで共すりeJ砕を行い篩分けし粉砕品を得た。
Comparative Example 2 Nippon Aerosil <th) trade name "Aerosol" was placed in a high-purity silica crucible and heated to 1850'C with a transparent quartz burner using hydrogen gas once to melt it. Thereafter, the melt was collected, subjected to co-grinding using a ball mill lined with polyurethane rubber, and sieved to obtain a pulverized product.

比較例6 茜純度インド属珪石をポリウレタンライニングのボール
ミルで共ずり粉砕し200μ以下に調整した品を用いた
以外は実@例1と同僚に行った。
Comparative Example 6 The same procedure as in Example 1 was carried out by a colleague, except that madder purity Indian silica stone was co-pulverized in a polyurethane-lined ball mill and adjusted to 200μ or less.

ただし表にボした谷、易性の測定は次のようlL力l去
で行った。
However, the troughs and easiness of the table were measured using the following method.

(1)流動性の側矩(スパイラルフロー)EMM工規俗
に準じた金型を使用し成形温度160℃成形圧力フ 0
 kg / 1+1142で側足した。Cインチ〕(2
) ウラン量 螢光光度法による。Cppbl +21 +*I脂応力の測定 応力により抵抗11If0)変比するビニ・l抵抗を牛
導体チッグに成形したものン14ビンICフレームにダ
イボンドし、Au稼でワイヤーボンドレ外部′電極に接
続した菓子の初期抵抗値(Ro)ヲ+1111 f L
、この菓子を160℃、7 [1kg /an2成形時
間6分の条件で樹脂刺止した後の抵抗値CR)を測定し
、(R−Ro ) / Roを樹脂応力としブこ。
(1) Fluid side rectangle (spiral flow) Using a mold that complies with EMM engineering regulations, molding temperature: 160°C, molding pressure: 0
I did side leg at kg/1+1142. C inch] (2
) Uranium content by fluorophotometry. Cppbl +21 +*I Resistance 11 If0) Measurement of stress Resistor 11 If0) Resistor that changes ratio was molded into a cow conductor chig. It was die-bonded to the 14-bin IC frame and connected to the external electrode with a wire bond using Au. Initial resistance value (Ro) of confectionery +1111 f L
The resistance value (CR) after this confectionery was pierced with resin at 160°C and 7 [1 kg/an2 molding time of 6 minutes] was measured, and (R-Ro)/Ro was defined as the resin stress.

Claims (1)

【特許請求の範囲】[Claims] ウラン言膏童が10 ppb以下の合成珪素1XtIl
+!粉末な粒径500μ以下に造粒した後、これを可燃
性気体と1夜素と共にバーナーから噴射し1700”C
以上の温度で熱処理し0却することを特許とするウレン
含何重の少ない珪ば質粉末球状体の製造方法
Synthetic silicon 1XtIl with uranium content of 10 ppb or less
+! After granulating the powder to a particle size of 500μ or less, it is injected from a burner together with a flammable gas and heated to 1700"C.
A method for manufacturing siliceous powder spherical bodies with a low urene content, which is patented by heat treatment at a temperature above and reduced to zero.
JP58236421A 1983-12-16 1983-12-16 Manufacture of silicic acid powder sphere Pending JPS60131868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58236421A JPS60131868A (en) 1983-12-16 1983-12-16 Manufacture of silicic acid powder sphere

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58236421A JPS60131868A (en) 1983-12-16 1983-12-16 Manufacture of silicic acid powder sphere

Publications (1)

Publication Number Publication Date
JPS60131868A true JPS60131868A (en) 1985-07-13

Family

ID=17000502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58236421A Pending JPS60131868A (en) 1983-12-16 1983-12-16 Manufacture of silicic acid powder sphere

Country Status (1)

Country Link
JP (1) JPS60131868A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0259416A (en) * 1988-08-25 1990-02-28 Nippon Chem Ind Co Ltd Fine fused spherical silica and its manufacturing method
US5028360A (en) * 1989-04-17 1991-07-02 Nitto Chemical Industries Co., Ltd. Method of manufacturing spherical silica particles
JP2006071296A (en) * 2004-08-31 2006-03-16 Aichi Tokei Denki Co Ltd Water flow detection sensor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0259416A (en) * 1988-08-25 1990-02-28 Nippon Chem Ind Co Ltd Fine fused spherical silica and its manufacturing method
JPH0696445B2 (en) * 1988-08-25 1994-11-30 日本化学工業株式会社 Fine fused spherical silica and method for producing the same
US5028360A (en) * 1989-04-17 1991-07-02 Nitto Chemical Industries Co., Ltd. Method of manufacturing spherical silica particles
JP2006071296A (en) * 2004-08-31 2006-03-16 Aichi Tokei Denki Co Ltd Water flow detection sensor

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