JPS5923579A - Green color light emitting diode and manufacture thereof - Google Patents
Green color light emitting diode and manufacture thereofInfo
- Publication number
- JPS5923579A JPS5923579A JP57133457A JP13345782A JPS5923579A JP S5923579 A JPS5923579 A JP S5923579A JP 57133457 A JP57133457 A JP 57133457A JP 13345782 A JP13345782 A JP 13345782A JP S5923579 A JPS5923579 A JP S5923579A
- Authority
- JP
- Japan
- Prior art keywords
- type
- gap
- green led
- gallium phosphide
- epitaxial layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 claims description 52
- 229910005540 GaP Inorganic materials 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 18
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/814—Bodies having reflecting means, e.g. semiconductor Bragg reflectors
Landscapes
- Led Devices (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
産業上の利用分野
可視発光ダイオード(LED)はパイロットランプとし
て、あるいは数字表示素子やレベルインディケータ等の
ディスプレー素子として幅広ぐ用いられている。特にデ
ィスプレーの分野では赤。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Use Visible light emitting diodes (LEDs) are widely used as pilot lamps and as display elements such as numeric display elements and level indicators. Especially red in the field of displays.
黄、緑の3色のLEDが使用されることが多く、燐化ガ
リウム(GaP)基板上にn型とp型のエピタキシャル
層を順次成長させて形成しだGaP緑色LEDはGaP
赤色LEDとともに可視LEDの中心的地位を占めてい
る。本発明は上記ディスプレー素子として好適なGaP
緑色系LEDに関する。Three-color LEDs, yellow and green, are often used and are formed by sequentially growing n-type and p-type epitaxial layers on a gallium phosphide (GaP) substrate.
Along with red LEDs, they occupy a central position among visible LEDs. The present invention provides GaP suitable for the above-mentioned display element.
Regarding green LED.
;
従来例の構成と問題点
GaP緑色LEDは発光中心として窒素(N)を含み6
66 nmにピーク発光波長を有する黄緑色LEDと窒
素を含まず656 nmにピーク発光波長を有する純緑
色LEDの2種類がある。これらの構造はともにn型G
aP基板上にn型とp型のエピタキシャル層を順次成長
させることにより形成される。;Conventional structure and problems GaP green LEDs contain nitrogen (N) as the emission center6
There are two types: a yellow-green LED with a peak emission wavelength at 66 nm and a pure green LED that does not contain nitrogen and has a peak emission wavelength at 656 nm. Both of these structures are n-type G
It is formed by sequentially growing n-type and p-type epitaxial layers on an aP substrate.
GaP基板は一般に<111>方向にスライミングされ
ており、その面にはA面(ガリウム面)と3面(焼面)
がある。A面は化学的に安定でエソチングされにりく、
とのA面上にエピタキシャル層を形成するとまだエピタ
キシャル層中に不純物がドーピングされにくい等の性質
があるため、エピタキシャル層は通常8面上に成長され
る。この結果形成されるGaPLEDのn型面はA面と
なっている。GaP substrates are generally slimmed in the <111> direction, and have an A-plane (gallium surface) and a 3-plane (burnt surface).
There is. Side A is chemically stable and resistant to etching.
If an epitaxial layer is formed on the A-plane of the 8-plane, the epitaxial layer is still difficult to be doped with impurities, so the epitaxial layer is usually grown on the 8-plane. The n-type surface of the GaPLED thus formed is the A-plane.
第1図は、このような構造をもつ従来のGaP緑色LE
Dの断面構造を示す図であり、n型GaP基板1の上に
n型GaPエピタキシャル層2が成長させ、さらに、こ
の上にp型G a Pエピタキシャル層3が成長させる
とともに、電極4および6を設けて形成したGaP緑色
LED素子をステム等の支持体6へ固着した構造となっ
ている。ところで、上述したように、GaP基板1の8
面上にエピタキシャル層は形成されており、一方、Ga
P緑色LEDのn型面となるA面は、GaP基板1の厚
みの均一化をはかるとともに、この面での光反射率を高
めるだめに鏡面となるよう研磨されている。そしてGa
P緑色LEDにおいて、pn接合近傍で発光して外部に
放出される光は、図示するように、図中Xで示すように
直接外部へ射出される光成分と、図中Yで示すように、
一度A面で反射し、外部に放出される光成分に大別され
る。Figure 1 shows a conventional GaP green LE with such a structure.
FIG. 2 is a diagram showing a cross-sectional structure of a portion D, in which an n-type GaP epitaxial layer 2 is grown on an n-type GaP substrate 1, a p-type GaP epitaxial layer 3 is grown on this, and electrodes 4 and 6 are grown. It has a structure in which the GaP green LED element formed by providing the LED element is fixed to a support 6 such as a stem. By the way, as mentioned above, 8 of the GaP substrate 1
An epitaxial layer is formed on the surface, while Ga
The A surface, which is the n-type surface of the P green LED, is polished to a mirror surface in order to make the thickness of the GaP substrate 1 uniform and to increase the light reflectance on this surface. And Ga
In the P green LED, the light emitted near the pn junction and emitted to the outside consists of a light component that is emitted directly to the outside, as shown by X in the figure, and a light component that is emitted directly to the outside, as shown by Y in the figure, as shown in the figure.
It is roughly divided into light components that are once reflected on the A surface and emitted to the outside.
G a P緑色LEDの発光は、GaPのバンドギャッ
プに近く、内部吸収が太きい。しだがって、GaP緑色
LED内で多重反射する光は、その殆んどが吸収され、
また、上記のようにA面で一度反射されて外部に放出さ
れる光成分Yの吸収も大きい。The light emission of the GaP green LED is close to the band gap of GaP and has strong internal absorption. Therefore, most of the light that is multiplely reflected within the GaP green LED is absorbed,
Further, as described above, the absorption of the light component Y, which is once reflected by the A plane and emitted to the outside, is also large.
このため、従来のG a P緑色LEDでは、高い発光
出力を得ることができなかった。For this reason, it has not been possible to obtain high light emission output with the conventional G a P green LED.
このような問題は、G a P黄緑色LEDでも同様に
生じていた。Such a problem also occurred in the G a P yellow-green LED.
発明の目的
本発明はGaP緑色系LEDの内部で発光した光のうち
、内部反射を経て外部へ放出される光成分の、内部吸収
による光の量を減少させ、高発光出力のGaP緑色系L
EDおよびこれを製造する方法を提供することを目的と
するものである。Purpose of the Invention The present invention reduces the amount of light emitted inside a GaP green LED by internal absorption of the light component emitted to the outside through internal reflection, thereby producing a GaP green LED with high luminous output.
It is an object of the present invention to provide an ED and a method for manufacturing the same.
発明の構成
本発明は、GaP緑色系LEDの出発材料となるG a
P基板のエツチングが困難なA面を王水でエツチング
すると、結晶欠陥によるエッチピットならびに亀甲状の
凹凸がエツチング面に生じること、すなわち、従来はエ
ツチングが困難とされていたGaP基板のA面に凹凸加
工を施すことができることの確認に基いてなされたもの
であり、GaP緑色系LEDの構造を、GaP緑色系L
EDの出発材料となるn型燐化ガリウム基板上にn型燐
化ガリウムエピタキシャル層が形成され、さらに、この
上にp型燐化ガリウムエピタキシャル層が形成されると
ともに、前記n型燐化ガリウム基板のエピタキシャル層
形成面とは逆のn型面に凹凸加工が施しだ構造とするこ
と、壕だ、この構造をうるための製造方法として、Ga
P緑色系LEDの出発材料として準備したn型燐化ガリ
ウム基板上にn型ならびにp型の燐化ガリウムエピタキ
シャル層を形成したのち、前記n型燐化ガリウム基板の
エピタキシャル層形成面側とは逆のn型面を王水でエツ
チング処理し、同n型面を凹凸とする方法を採ることを
特徴とするものである。この方法でn型面(A面)が凹
凸加工面とされたGaP緑色系LEDでは、内部で発光
した光のn型面での反射が乱反射となり、GaP緑色系
LED素子の側面からも外部へ光放出がなされ、全体的
にみて光吸収量が減り、高発光出力が得られるところと
なる。Structure of the Invention The present invention provides GaP as a starting material for a GaP green LED.
When the A-side of a P substrate, which is difficult to etch, is etched with aqua regia, etch pits and hexagonal irregularities due to crystal defects are generated on the etched surface. This was done based on the confirmation that uneven processing could be applied, and the structure of the GaP green LED was changed to a GaP green LED.
An n-type gallium phosphide epitaxial layer is formed on an n-type gallium phosphide substrate, which is a starting material for ED, and a p-type gallium phosphide epitaxial layer is further formed on the n-type gallium phosphide epitaxial layer. The manufacturing method for obtaining this structure is to create a structure in which the n-type surface opposite to the epitaxial layer formation surface is textured.
After forming n-type and p-type gallium phosphide epitaxial layers on an n-type gallium phosphide substrate prepared as a starting material for a P-green LED, the epitaxial layer is formed on the n-type gallium phosphide substrate on the opposite side of the epitaxial layer formation side. The method is characterized in that the n-type surface of the substrate is etched with aqua regia to make the n-type surface uneven. In a GaP green LED whose n-type surface (A-side) is made to have a textured surface using this method, the reflection of light emitted internally on the n-type surface becomes diffuse reflection, and is reflected externally from the side of the GaP green LED element. Light is emitted, the amount of light absorbed is reduced overall, and high light output is obtained.
実施例の説明
第2図は、本発明のGaP緑色系LEDの一実施例を示
す断面図であり、基本的な構造は、第1図で示した従来
のものと同じである。DESCRIPTION OF THE EMBODIMENTS FIG. 2 is a sectional view showing an embodiment of the GaP green LED of the present invention, and its basic structure is the same as the conventional one shown in FIG.
しかしながら、図示するように、GaP緑色系LED素
子の支持体6に接着される側の面であるn型面(A面)
が凹凸面となっているため、内部で発光した光のうち、
n型面で反射する光は、この凹凸によって乱反射される
ところとなる。すなわち、n型面で反射される光は、p
型面(一方の表面)から外部に放出される光成分Yと側
面から外部へ放出される光成分Zに分かれ、しかも、そ
の大半は光成分2によって占められる。この側面から外
部へ放出される光成分Zの素子内部の通過距離は、光成
分Yのそれにくらべて短くなり、したがって、内部吸収
量は減少する。すなわち、n型面(A面)で反射された
光成分のうち、素子外部へ放出される光量が増し、Ga
P緑色系LEDの発光出力特性が従来の構造にくらべて
改善される。However, as shown in the figure, the n-type surface (A-side), which is the surface of the GaP green LED element that is bonded to the support 6,
has an uneven surface, so of the light emitted inside,
The light reflected by the n-type surface is diffusely reflected by the unevenness. In other words, the light reflected by the n-type surface is p
It is divided into a light component Y emitted to the outside from the mold surface (one surface) and a light component Z emitted to the outside from the side surface, and most of it is occupied by the light component 2. The passage distance inside the element of the light component Z emitted to the outside from this side surface is shorter than that of the light component Y, and therefore the amount of internal absorption is reduced. In other words, out of the light components reflected by the n-type surface (A-plane), the amount of light emitted to the outside of the element increases, and the Ga
The light emitting output characteristics of the P-green LED are improved compared to the conventional structure.
ところで、このような構造を有する本発明のGaP緑色
系LEDは、以下に述べる方法によって形成される。先
ず、n型GaP基板上にn型ならびにp型のエピタキシ
ャル層を順次液層成長させる。次いで、このエピタキシ
ャル成長ずみGaP基板のn型面側を所定の厚さだけ研
磨除去したのち、研磨面のみを露出させ、王水で数分間
エツチングする。このエツチング処理により、n型面(
A面)は第2図で示したように凹凸面となり、こののち
、電極の形成、支持体への素子の接着を経て第2図で示
したような構造のG a P緑色光LEDが形成される
。By the way, the GaP green LED of the present invention having such a structure is formed by the method described below. First, n-type and p-type epitaxial layers are sequentially grown in a liquid layer on an n-type GaP substrate. Next, the n-type side of the epitaxially grown GaP substrate is removed by polishing to a predetermined thickness, and then only the polished surface is exposed and etched with aqua regia for several minutes. Through this etching process, the n-type surface (
Side A) becomes an uneven surface as shown in Fig. 2, and after this, electrodes are formed and the element is adhered to the support, and a G a P green light LED with the structure shown in Fig. 2 is formed. be done.
第3図は、以上説明した本発明の効果確認のために、n
型面を鏡面研磨して形成した従来構造のG a P純緑
色LEDと、n型面が王水によるエツチングで凹凸加工
して形成した本発明のG a P純緑色LEDの発光出
力を比較を示す図である。FIG. 3 shows n to confirm the effect of the present invention explained above.
Compare the light emitting output of a GaP pure green LED with a conventional structure formed by mirror polishing the mold surface and a GaP pure green LED of the present invention whose n-type surface is formed by etching with aqua regia to create unevenness. FIG.
図示するように、本発明の構造によれば、発光出力が従
来の構造にくらべておよそ20係大きくなり、高発光出
力化がはかられている。As shown in the figure, according to the structure of the present invention, the light emission output is approximately 20 times larger than that of the conventional structure, and a high light emission output is achieved.
なお、GaP黄緑色LEDに本発明を適用した場合にも
同様の結果が得られた。Note that similar results were obtained when the present invention was applied to a GaP yellow-green LED.
発明の効果
本発明によれば、G a P緑色光LEDの基本構造な
らびに基本製造4工程に大幅な変更をもたらすことなく
、G a P緑色光LEDの高発光出力化をはかること
ができ、GaPLEDのディスプレー分野への適用範囲
を拡大する効果が奏される。Effects of the Invention According to the present invention, it is possible to increase the light emitting output of a GaP green LED without making any major changes to the basic structure or four basic manufacturing steps of the GaP green LED. This has the effect of expanding the scope of application to the display field.
第1図はn型面を鏡面に研磨した従来のG a P緑色
光LEDの構造を示す断面図、第2図は王水エツチング
によりn型面を凹凸状にした本発明のGaP緑色LED
の構造を示す断面図、第3図は従来のGaP純緑色LE
Dと本発明のG a P純緑色LEDとの発光出力の比
較を示す図である。
1・・・・・・n型GaP基板、2・・・・・・n型G
aPエピタキシャル層、3・・・・・・p型GaPエピ
タキシャル層、4・・・・・・n型面側電極、6・・・
・・・p型面側電極、6・・・・・・支持体(ステム)
。
代理人の氏名 弁理士 中 尾 敏 男 ほか1老醜
1 図
m2図
第3図Fig. 1 is a cross-sectional view showing the structure of a conventional GaP green light LED whose n-type surface is mirror-polished, and Fig. 2 is a GaP green LED of the present invention whose n-type surface is made uneven by aqua regia etching.
Figure 3 is a cross-sectional view showing the structure of a conventional GaP pure green LE.
FIG. 4 is a diagram showing a comparison of the light emission outputs of the G a P pure green LED of the present invention and the G a P pure green LED of the present invention. 1...n-type GaP substrate, 2...n-type G
aP epitaxial layer, 3... p-type GaP epitaxial layer, 4... n-type surface side electrode, 6...
... p-type surface side electrode, 6 ... support body (stem)
. Name of agent: Patent attorney Toshio Nakao and 1 other person
1 Figure m2 Figure 3
Claims (1)
タキシャル層が形成され、さらに、この上にp型燐化ガ
リウムエピタキシャル層が形成されるとともに、前記n
型燐化ガリウム基板のエピタキシャル層形成面とは逆の
n型面に凹凸加工が施されていることを特徴とする緑色
系発光ダイオード。 (2)n型燐化ガリウム基板上にn型ならびにp型の燐
化ガリウムエピタキシャル層を形成したのち、前記n型
燐化ガリウム基板のエピタキシャル層形成面側とは逆の
n型面を王水でエツチング処理し、同n型面を凹凸面と
することを特徴とする緑色系発光ダイオードの製造方法
。[Scope of Claims] (1) An n-type gallium phosphide epitaxial layer is formed on an n-type gallium phosphide substrate, and further, a p-type gallium phosphide epitaxial layer is formed on the n-type gallium phosphide epitaxial layer, and
A green light-emitting diode characterized in that the n-type surface of the gallium phosphide substrate, which is opposite to the surface on which the epitaxial layer is formed, is textured. (2) After forming n-type and p-type gallium phosphide epitaxial layers on an n-type gallium phosphide substrate, the n-type surface opposite to the epitaxial layer formation side of the n-type gallium phosphide substrate is coated with aqua regia. 1. A method for manufacturing a green light emitting diode, which comprises etching the n-type surface to have an uneven surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57133457A JPS5923579A (en) | 1982-07-29 | 1982-07-29 | Green color light emitting diode and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57133457A JPS5923579A (en) | 1982-07-29 | 1982-07-29 | Green color light emitting diode and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5923579A true JPS5923579A (en) | 1984-02-07 |
JPH0441516B2 JPH0441516B2 (en) | 1992-07-08 |
Family
ID=15105224
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57133457A Granted JPS5923579A (en) | 1982-07-29 | 1982-07-29 | Green color light emitting diode and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5923579A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5032539A (en) * | 1988-07-08 | 1991-07-16 | Kabushiki Kaisha Toshiba | Method of manufacturing green light emitting diode |
WO2000052795A1 (en) | 1999-02-26 | 2000-09-08 | The Furukawa Electric Co., Ltd. | Semiconductor light-emitting device |
JP2003069075A (en) * | 2001-08-28 | 2003-03-07 | Nichia Chem Ind Ltd | Gallium nitride compound semiconductor device |
JP2004281445A (en) * | 2003-03-12 | 2004-10-07 | Sanyo Electric Co Ltd | Laminated light emitting diode element |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51112194A (en) * | 1976-03-08 | 1976-10-04 | Toshiba Corp | Gap light emmision element |
JPS5221875A (en) * | 1975-08-08 | 1977-02-18 | Illinois Tool Works | Wheel rpm sensor provided with exciter ring runnout compensator |
-
1982
- 1982-07-29 JP JP57133457A patent/JPS5923579A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5221875A (en) * | 1975-08-08 | 1977-02-18 | Illinois Tool Works | Wheel rpm sensor provided with exciter ring runnout compensator |
JPS51112194A (en) * | 1976-03-08 | 1976-10-04 | Toshiba Corp | Gap light emmision element |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5032539A (en) * | 1988-07-08 | 1991-07-16 | Kabushiki Kaisha Toshiba | Method of manufacturing green light emitting diode |
WO2000052795A1 (en) | 1999-02-26 | 2000-09-08 | The Furukawa Electric Co., Ltd. | Semiconductor light-emitting device |
JP2003069075A (en) * | 2001-08-28 | 2003-03-07 | Nichia Chem Ind Ltd | Gallium nitride compound semiconductor device |
JP2004281445A (en) * | 2003-03-12 | 2004-10-07 | Sanyo Electric Co Ltd | Laminated light emitting diode element |
Also Published As
Publication number | Publication date |
---|---|
JPH0441516B2 (en) | 1992-07-08 |
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