JPS59124029A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS59124029A JPS59124029A JP57229722A JP22972282A JPS59124029A JP S59124029 A JPS59124029 A JP S59124029A JP 57229722 A JP57229722 A JP 57229722A JP 22972282 A JP22972282 A JP 22972282A JP S59124029 A JPS59124029 A JP S59124029A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- radiation
- protective film
- parts
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 27
- 239000010408 film Substances 0.000 claims abstract description 34
- 229920005989 resin Polymers 0.000 claims abstract description 33
- 239000011347 resin Substances 0.000 claims abstract description 33
- 230000001681 protective effect Effects 0.000 claims abstract description 24
- 239000010409 thin film Substances 0.000 claims abstract description 17
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 13
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 28
- 238000010894 electron beam technology Methods 0.000 abstract description 20
- -1 acrylic modified urethane Chemical class 0.000 abstract description 19
- 229920001577 copolymer Polymers 0.000 abstract description 19
- 238000000576 coating method Methods 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 11
- 229920002554 vinyl polymer Polymers 0.000 abstract description 11
- 238000001723 curing Methods 0.000 abstract description 8
- 239000002904 solvent Substances 0.000 abstract description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 7
- 239000000314 lubricant Substances 0.000 abstract description 5
- 239000012298 atmosphere Substances 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 abstract description 4
- 229920006311 Urethane elastomer Polymers 0.000 abstract description 3
- 238000001035 drying Methods 0.000 abstract description 2
- 238000003847 radiation curing Methods 0.000 abstract 2
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 230000005855 radiation Effects 0.000 description 24
- 229920001971 elastomer Polymers 0.000 description 19
- 239000000806 elastomer Substances 0.000 description 16
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
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- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
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- 229920002857 polybutadiene Polymers 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 8
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- 239000002609 medium Substances 0.000 description 7
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- 230000015572 biosynthetic process Effects 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
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- 239000003822 epoxy resin Substances 0.000 description 5
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- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 239000005062 Polybutadiene Substances 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000001913 cellulose Substances 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 150000004665 fatty acids Chemical class 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920001225 polyester resin Polymers 0.000 description 4
- 239000004645 polyester resin Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000004416 thermosoftening plastic Substances 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 3
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical group CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000005056 polyisocyanate Substances 0.000 description 3
- 229920001228 polyisocyanate Polymers 0.000 description 3
- 229920002635 polyurethane Polymers 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- 229920003051 synthetic elastomer Polymers 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 2
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 231100000987 absorbed dose Toxicity 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
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- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
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- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
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- 239000011737 fluorine Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 229920003049 isoprene rubber Polymers 0.000 description 1
- 150000004668 long chain fatty acids Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- HYGXISCUUFVGQW-UHFFFAOYSA-N n,n-dimethylformamide;1,4-dioxane Chemical compound CN(C)C=O.C1COCCO1 HYGXISCUUFVGQW-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920003225 polyurethane elastomer Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 239000012758 reinforcing additive Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- WQDUMFSSJAZKTM-UHFFFAOYSA-N sodium methoxide Substances [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000375 suspending agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- IZWCGXGZGYKDHR-GRBGHKMPSA-N undecanoyl-CoA Chemical compound O[C@@H]1[C@H](OP(O)(O)=O)[C@@H](COP(O)(=O)OP(O)(=O)OCC(C)(C)[C@@H](O)C(=O)NCCC(=O)NCCSC(=O)CCCCCCCCCC)O[C@H]1N1C2=NC=NC(N)=C2N=C1 IZWCGXGZGYKDHR-GRBGHKMPSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
Landscapes
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、耐摩耗性に秀れた薄膜型磁気記録媒体に関す
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film magnetic recording medium with excellent wear resistance.
電気メッキ、化学メッキ、真空蒸着、スパッタリング、
イオンブレーティング等により支持体上に強磁性薄膜を
形成させた薄膜型磁気記録媒体は、従来の塗布型磁気記
録媒体に比べ磁性層の厚みをひと桁下げることが可能で
、ビデオ信号の記録のような高密度記録に最適のもので
あるが、強磁性薄膜は硬度大で磁気ヘッドを摩耗させ、
また自身も摩耗が太きいといった欠点を有する。そのた
め表面に何らかの保護膜を形成させることが実用上必要
であり、過酸化物を用いた熱硬化保護膜、光増感剤を用
いた紫外線硬化保護膜が提唱されている。しかし、これ
らは硬化反応触媒、光増感剤等が添加され、保護膜とし
ての樹脂の硬化は起きるもののこれら添加剤が走行性を
阻外しあるいは、硬化の過程(ロール状に巻かれた後に
もアフターキュアが生じる)でベース裏面と粘着を生じ
極端な場合には保護膜表面をかえって荒らしてしまう。Electroplating, chemical plating, vacuum deposition, sputtering,
Thin-film magnetic recording media, in which a ferromagnetic thin film is formed on a support by ion blating, etc., can reduce the thickness of the magnetic layer by an order of magnitude compared to conventional coating-type magnetic recording media, making it easier to record video signals. Although it is ideal for high-density recording, ferromagnetic thin films are extremely hard and wear out the magnetic head.
It also has the disadvantage of being subject to heavy wear. Therefore, it is practically necessary to form some kind of protective film on the surface, and a thermosetting protective film using a peroxide and an ultraviolet curing protective film using a photosensitizer have been proposed. However, in these products, curing reaction catalysts, photosensitizers, etc. are added, and although the resin as a protective film is cured, these additives may impede running properties or may interfere with the curing process (even after being wound into a roll). After-cure (occurs) causes adhesion to the back side of the base, and in extreme cases can even damage the surface of the protective film.
特に高温、多湿下ではその影響は太きい。The effect is particularly severe under high temperature and high humidity conditions.
また硬化反応速度も遅く保護膜コーティングの高速塗布
に対しても不利である。Furthermore, the curing reaction rate is slow, which is disadvantageous for high-speed application of protective film coatings.
従って本発明は、従来の保護膜を施した強磁性薄膜型磁
気記録媒体における上記の問題を解決することを目的と
する。本発明は、この種の磁気記録媒体においてすぐれ
た保護膜を提供することにより所期の目的を達成するも
のであり、保護膜は、電子線等の放射線で硬化し5る(
以下放射線感応性と言う)不飽和二重結合含有樹脂と、
熱可塑性樹脂とを含むことを特徴とする。・
本発明における保護膜は電子線等の放射線によって硬化
されるため、従来のような触媒や添加剤の使用は不要と
なり、上記した問題点が解消され、保護膜に要求される
耐摩耗性、走行安定性及び磁性薄膜の耐酸化性の効果が
発揮される。しかも、本発明においては、放射線感応性
である不飽和二重結合含有樹脂は電子線等の放射線によ
るラジカル発生虻より重合されて三次元網目構造のもの
となり、しかもか又る重合過程は瞬間的に起るためアフ
ターキュアの工程なしに簡単な工程で平滑な表面を提供
する。Therefore, it is an object of the present invention to solve the above-mentioned problems in conventional ferromagnetic thin film magnetic recording media provided with a protective film. The present invention achieves the intended purpose by providing an excellent protective film for this type of magnetic recording medium, and the protective film is cured with radiation such as an electron beam (5).
(hereinafter referred to as radiation sensitive) unsaturated double bond-containing resin,
It is characterized by containing a thermoplastic resin. - Since the protective film of the present invention is cured by radiation such as electron beams, the use of conventional catalysts and additives is unnecessary, the above-mentioned problems are solved, and the wear resistance required for the protective film is improved. The effects of running stability and oxidation resistance of the magnetic thin film are exhibited. Moreover, in the present invention, the radiation-sensitive unsaturated double bond-containing resin is polymerized into a three-dimensional network structure by radical generation by radiation such as electron beams, and the polymerization process is instantaneous. Provides a smooth surface with a simple process without an after-cure process.
本発明者は、放射線感応性樹脂のみにより強磁性薄膜の
保護膜を構成することを試みたが、保護膜が固くなり、
硬度が増大し、磁気記録媒体のカールが激しくなり、高
域周波数において電磁特性が低下することが分った。そ
こで本発明は放射線感応性樹脂と熱硬化性樹脂とを併用
することによりこの問題のない、また従来技術よりもは
るかにすぐれた磁気記録媒体を提供することができた。The inventor attempted to construct a protective film for a ferromagnetic thin film using only a radiation-sensitive resin, but the protective film became hard.
It was found that the hardness increased, the curl of the magnetic recording medium became more severe, and the electromagnetic properties deteriorated at high frequencies. Therefore, the present invention was able to provide a magnetic recording medium that does not have this problem and is far superior to the prior art by using a radiation-sensitive resin and a thermosetting resin in combination.
このような組合せでは、放射線感応性樹脂が硬化により
保護膜の硬度を高めて剛直とするのに対し、熱可塑性樹
脂がこのような硬度及び剛直性を緩和して適度な柔軟性
を付与することができ、両種の樹脂が程良く作用して磁
気記録媒体の摩擦低下及びカール防止が達成され、磁気
ヘッド及び磁性膜の保護、走行性の向上、カール防止が
達成され、磁気ヘッドと磁気記録媒体(特にテープ)と
のへラドタッチの向上によるテープヘッド間のスペーシ
ングロス改善による短波長領域での出力及びビデオS/
Nが向上する。In such a combination, radiation-sensitive resin increases the hardness of the protective film through curing and makes it rigid, whereas thermoplastic resin softens such hardness and rigidity and imparts appropriate flexibility. The two types of resins work well together to reduce friction and prevent curling of the magnetic recording medium, and protect the magnetic head and magnetic film, improve running properties, and prevent curling. Output in the short wavelength range and video S/
N improves.
この両者の混合比率は下記に示す性質を満足させる為に
熱可塑性樹脂と放射線感応性樹脂またはエラストマーが
8対2より2対8の比率が特に望ましい。In order to satisfy the properties shown below, the mixing ratio of the thermoplastic resin and the radiation-sensitive resin or elastomer is particularly preferably 2:8 rather than 8:2.
また熱可塑a樹脂が磁性塗膜に過度な柔軟性を付与する
為には、その分子量は5000以上好ましくは8000
以上である事が分子量効果の上で必要である。In addition, in order for the thermoplastic A resin to impart excessive flexibility to the magnetic coating film, its molecular weight should be 5000 or more, preferably 8000.
The above is necessary for the molecular weight effect.
他方放射線感応性樹脂又はエラストマーとしてはそのも
の単体で放射線により架橋ないしは重合して得られたポ
リマーが合成ゴムとしてのゴム弾性、柔軟性、ポリエス
テル基体との接着性に優れた性質を有するエラストマー
ないしはそのプレポリマー、オリゴマー、テロマーを意
味する。このニジストマーは後に述べる様に放射線によ
りラジカルを生じ架橋構造な生ぜしめるべく放射線感応
変性がほどこされる。又、保護膜形成用塗料とするため
にはこの樹脂又はニジストマーは溶剤可溶性でなくては
ならない。On the other hand, radiation-sensitive resins or elastomers are elastomers or preforms of elastomers that are obtained by crosslinking or polymerizing with radiation as a single substance and have excellent rubber elasticity, flexibility, and adhesion to polyester substrates as synthetic rubbers. Refers to polymers, oligomers, and telomers. As will be described later, this nidistomer is subjected to radiation-sensitivity modification to generate radicals and a crosslinked structure when exposed to radiation. Further, in order to use it as a coating for forming a protective film, this resin or nidistomer must be soluble in a solvent.
また熱可塑性樹脂と放射線感応性エラストマーないしは
そのプレポリマー、オリゴマー、テロマーは相溶性が良
い事が望まれる。It is also desired that the thermoplastic resin and the radiation-sensitive elastomer or its prepolymer, oligomer, or telomer have good compatibility.
3−1 本発明にて有効な熱可塑性樹脂としては下記の
塗料用合成樹脂を挙げることが出来る。3-1 Examples of thermoplastic resins that are effective in the present invention include the following synthetic resins for coatings.
(I)塩化ビニール系共重合体
塩化ビニール−酢酸ビニール−ビニールアルコ/’ 共
重合体、塩化ヒニールービニルアルコール共重合体、塩
化ビニール−ビニルアルコール−プロピオン酸ビニール
共重合体、塩化ビニール−酢酸ビニール−マレイン酸共
重合体、塩化ビニール−酢酸ビニール−末端QH側鎖ア
ルキル基共重合体、たとえばUCC社VROH,VYN
C。(I) Vinyl chloride copolymer vinyl chloride-vinyl acetate-vinyl alcohol/' copolymer, vinyl chloride-vinyl alcohol copolymer, vinyl chloride-vinyl alcohol-vinyl propionate copolymer, vinyl chloride-vinyl acetate -maleic acid copolymer, vinyl chloride-vinyl acetate-terminated QH side chain alkyl group copolymer, such as UCC VROH, VYN
C.
VYMClVYEC−X、VYMS−X等、UCC社V
ERR等。VYMClVYEC-X, VYMS-X, etc., UCC company V
ERR et al.
(II)飽和ポリエステル樹脂
フタル酸、イソフタル酸、テレフタル酸、マレイン酸、
マレイン酸誘導体、コ・・り酸、アジビジ酸、セバシン
酸の様な飽和多塩基酸と、エチレングリコール、ジエチ
レングリコール、グリセリン、トリメチロールプロパン
、1.2プロピレングリコール、1,3ブタンジオール
、ジエチレングリコール、1.4ブタンジオール、1.
6ヘキサンジオール、ペンタエリスリット、ソルビトー
ル、クリセリン、ネオペンチルグリコール、1,4シク
ロヘキサンジメタツールの様な多価アルコールとのエス
テル結合により得られる飽和ポリエステル樹脂又はこれ
らのポリエステル樹脂を5Q3Na等で変性した樹脂で
平均分子量5000以上のものが特に望ましい。(東洋
紡製 パイロンV530 )(Ill)ポリビニルアル
コ−、ル系樹脂ポリビニルアルコール、ブチラール樹脂
、アセタール樹脂、ホルマール樹脂及びこれらの成分の
共重合体等も良好である。(II) Saturated polyester resin phthalic acid, isophthalic acid, terephthalic acid, maleic acid,
Saturated polybasic acids such as maleic acid derivatives, co-phosphoric acid, adividic acid, and sebacic acid, ethylene glycol, diethylene glycol, glycerin, trimethylolpropane, 1,2 propylene glycol, 1,3 butanediol, diethylene glycol, 1 .4 butanediol, 1.
Saturated polyester resins obtained by ester bonding with polyhydric alcohols such as 6-hexanediol, pentaerythritol, sorbitol, chrycerin, neopentyl glycol, and 1,4-cyclohexane dimetatool, or these polyester resins modified with 5Q3Na etc. A resin having an average molecular weight of 5000 or more is particularly desirable. (Pylon V530 manufactured by Toyobo Co., Ltd.) (Ill) Polyvinyl alcohol, polyvinyl alcohol, butyral resin, acetal resin, formal resin, and copolymers of these components are also good.
(IV)エポキシ系樹脂、フェノキシ樹脂ビスフェノー
ルAとエピクロルヒドリン又はメチルエピクロルヒドリ
ンの反応によるエポキシ樹脂、例えばシェル化学製(エ
ピコー)152,154゜82−8.1001.100
7 )、ダウケミカル類(DEN431、DER752
、DER511,DER331) 、大日本インキ製(
エピクロン400.エピクロンaOO)、更に上記エポ
キシの高重合度樹脂であるUCC社製7:r−/#シ樹
脂(PKHA、PKHC,PKHH)、臭素化ビスフェ
ノールAとエピクロルヒドリントノ共重合体、例えば大
日本インキ製(エピクロン145.152,153.1
120)等も有効である。(IV) Epoxy resin, phenoxy resin Epoxy resin produced by the reaction of bisphenol A and epichlorohydrin or methylepichlorohydrin, such as Shell Chemical (Epicor) 152,154°82-8.1001.100
7), Dow chemicals (DEN431, DER752
, DER511, DER331), Dainippon Ink (
Epicron 400. Epiclon aOO), the above-mentioned epoxy high polymerization resin 7:r-/# resin (PKHA, PKHC, PKHH) manufactured by UCC, and brominated bisphenol A and epichlorohydrin copolymer such as Dainippon Ink ( Epicron 145.152, 153.1
120) etc. are also effective.
(v)繊維素綿導体
各種分子量の繊維素系誘導体もまた本発明の熱可塑性プ
ラスチック成分として効果的である。その中でも特に効
果的なものは硝化綿、セルロー′ズアセトプチレート、
エチルセルローズ、ブチルセルローズ、アセチルセルロ
ーズ等が好適である。(v) Cellulose cotton conductor Cellulose derivatives of various molecular weights are also effective as the thermoplastic component of the present invention. Among them, the most effective are nitrified cotton, cellulose acetoptylate,
Ethyl cellulose, butyl cellulose, acetyl cellulose, etc. are suitable.
その地熱可塑性プラスチックスとしては、熱可塑性硬質
ポリウレタン樹脂、ポリエーテルエステル樹脂、ポリビ
ニルピロリドン樹脂及び誘導体(PVPオレフィン共重
合体)、ポリアミド樹脂、ポリイミド樹脂、フェノール
樹脂、スピロアセクール樹脂、水酸基を含有するアクリ
ルエステル及びメタクリルエステルを少くとも一種以上
重合成分として含むアクリル系樹脂等も本発明の目的に
対して有効である。The geothermal plastics include thermoplastic rigid polyurethane resins, polyether ester resins, polyvinylpyrrolidone resins and derivatives (PVP olefin copolymers), polyamide resins, polyimide resins, phenolic resins, spiroacecool resins, and hydroxyl group-containing resins. Acrylic resins containing at least one type of acrylic ester and methacrylic ester as a polymerization component are also effective for the purpose of the present invention.
3−2 他方熱可塑性樹脂と組合せるべき放射線感応性
樹脂又はプレポリマーは下記の通りである。3-2 On the other hand, the radiation-sensitive resin or prepolymer to be combined with the thermoplastic resin is as follows.
(I)ポリウレタンエラストマー及びプレポリマー及び
テロマー
この様なウレタン化合物の例としては、イソシアネート
として、2.4− )ルエンジイソシアネート、2.6
− トルエンジイソシアネート、1.3−キシレンジイ
ソシアネート、1.4−キシレンジイソシアネート、1
.5−ナフタレンジイソシアネート、m−フ二二レンジ
イソシアネート、P−フ・エニレンジイソシアネート、
3,3+−ジメチル−4,41−ジフェニルメタンジイ
ソシアネート、4.4’−ジフェニルメタンジイソシア
ネー)、3.3’−ジメチルビフェニレンジインシアネ
ート、4.4’−ビフェニレンジイソシアネート、ヘキ
サメチレンジイソシアネート、インフォロンジイソシア
ネート、ジシクロヘキシルメタンジイソシアネート、デ
スモジュールL1デスモジュールN等の各種多価インシ
アネート、線状飽和ポリエステル(エチレングリコール
、ジエチレングリコール、グリセリン、トリメチロール
プロパン、1.4−メタンジオール、1.6−ヘキサン
ジオール、ペンタエリスリット、ソルビトール、ネオペ
ンチルグリコール、1.4−ンクロヘキサンジメタノー
ルの様な多価アルコールと、フタル酸、イソフタ゛ル酸
、テレフタル酸、マレイン酸、コハク酸、アジピン酸、
セバシン酸、の様な飽和多塩基との縮重合によるもの)
、線状飽和ポリエーテル(ポリエチレングリコール、ポ
リプ 10ピレングリコール、ポリテトラエチレン
グリコール)やカプロラクタム、ヒドロキシン含有アク
リル酸エステル、ヒドロキシン含有メタアクリル酸エス
テル等の各種ポリエステル類との縮重合物より成るポリ
ウレタンエラストマー、プレポリマー、テロマーが有効
である。(I) Polyurethane elastomers and prepolymers and telomers Examples of such urethane compounds include, as isocyanates, 2.4-) luene diisocyanate, 2.6
- Toluene diisocyanate, 1.3-xylene diisocyanate, 1.4-xylene diisocyanate, 1
.. 5-naphthalene diisocyanate, m-phenyl diisocyanate, P-phenyl diisocyanate,
3,3+-dimethyl-4,41-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate), 3,3'-dimethylbiphenylene diisocyanate, 4,4'-biphenylene diisocyanate, hexamethylene diisocyanate, infron diisocyanate, Dicyclohexylmethane diisocyanate, various polyhydric incyanates such as Desmodur L1 and Desmodur N, linear saturated polyesters (ethylene glycol, diethylene glycol, glycerin, trimethylolpropane, 1.4-methanediol, 1.6-hexanediol, pentaerylene glycol, etc.) Slit, sorbitol, neopentyl glycol, polyhydric alcohols such as 1,4-chlorohexanedimethanol, phthalic acid, isophthalic acid, terephthalic acid, maleic acid, succinic acid, adipic acid,
(by condensation polymerization with a saturated polybase such as sebacic acid)
, polyurethane consisting of condensation products with various polyesters such as linear saturated polyethers (polyethylene glycol, polypyrene glycol, polytetraethylene glycol), caprolactam, hydroxyl-containing acrylic esters, hydroxyl-containing methacrylic esters, etc. Elastomers, prepolymers, and telomers are effective.
(n)アクリルニトリル−ブタジェン共重合エラストマ
ー
シンクレアペトロケミカル社製ポリBDリクイツドレン
ジとして市販されている末端水酸基のあるアクリルニト
リルブタジェン共重合体プレポリマー、あるいは日本ゼ
オン社製ハイカー1432J等のエラストマーは、特に
ブタジェン中の二重結合が電子線によりラジカルを生じ
架橋及び重合させるエラストマー成分として適する。(n) Acrylonitrile-butadiene copolymer elastomer Elastomers such as the acrylonitrile-butadiene copolymer prepolymer with a terminal hydroxyl group commercially available as PolyBD liquid range manufactured by Sinclair Petrochemical Co., Ltd., or Hiker 1432J manufactured by Nippon Zeon Co., Ltd. The double bond in butadiene is suitable as an elastomer component for crosslinking and polymerization by generating radicals with electron beams.
又末端水酸基を有するものはジイソシアネート等を介し
てアクリル系不飽和二重結合を付加する事により放射−
感応性を更に高める上で有効である。In addition, those with terminal hydroxyl groups can be radioactive by adding an acrylic unsaturated double bond via diisocyanate, etc.
This is effective in further increasing sensitivity.
(II[)ポリブタジエンエラストマーシンクレアペト
ロケミカル社製ポリBDリクイツドレジンR−15等の
低分子量末端水酸基を有するプレポリマーが特に熱可塑
性プラスチックとの相溶性の上で好適である。R−15
プレポリマーにおいては分子末端が水酸基となっている
為分子末端をアクリル系不飽和二重結合を付加する事に
より、放射線感応性を高める事が可能でありバインダー
として更に有利となる。(II[) Polybutadiene Elastomer A prepolymer having a low molecular weight terminal hydroxyl group such as PolyBD Liquid Resin R-15 manufactured by Sinclair Petrochemical Co., Ltd. is particularly suitable from the viewpoint of compatibility with thermoplastic plastics. R-15
Since the prepolymer has a hydroxyl group at the end of the molecule, it is possible to increase the radiation sensitivity by adding an acrylic unsaturated double bond to the end of the molecule, making it even more advantageous as a binder.
またポリブタジェンの環化物日本合成ゴム製CB、R−
M 9101も熱可塑性プラスチックスとの組合せによ
りすぐれた性能を発揮する。特に環化されたポリブタジ
ェンは、ポリブタジェン本来の有する不飽和結合のラジ
カルによる放射線による架橋重合の効率が良く、バイン
ダーとして優れた性質を有している。In addition, polybutadiene cyclized products Nippon Synthetic Rubber CB, R-
M 9101 also exhibits excellent performance in combination with thermoplastics. In particular, cyclized polybutadiene has high efficiency in crosslinking polymerization by radiation using radicals of unsaturated bonds inherent in polybutadiene, and has excellent properties as a binder.
その地熱可塑性エラストマー及びそのプレポリマーの系
で好適なものとしては、塩化ゴム、アクリルゴム、イソ
プレンゴム及びその環化物(日本合成ゴム製ClR70
1)、エポキシ変性ゴム、内部可塑化飽和線状ポリエス
テル(東洋紡バイロン+3OO)、等のエラストマーも
下記に述べる放射線感応変性処理をほどこすことにより
本発明に対して有効である。Suitable geothermal plastic elastomers and prepolymers are chlorinated rubber, acrylic rubber, isoprene rubber, and their cyclized products (ClR70 manufactured by Nippon Synthetic Rubber Co., Ltd.).
Elastomers such as 1), epoxy-modified rubber, internally plasticized saturated linear polyester (Toyobo Vylon +3OO), etc. are also effective in the present invention when subjected to the radiation-sensitive modification treatment described below.
3−3 前述の感電子化変性の具体例としては、ラジカ
ル重合性を有する不飽和二重結合を有するアクリル酸、
メタクリル酸あるいはそれらのエステル化合物のような
アクリル系二重結合、ジアリルフタレートの様なアリル
型二重結合、マレイン酸、マレイン酸誘導体等の不飽和
結合等の放射線照射による架橋あるいは重合する基を分
子中に導入する事である。3-3 Specific examples of the electrosensitive modification described above include acrylic acid having an unsaturated double bond with radical polymerizability;
Molecules with groups that can be crosslinked or polymerized by radiation irradiation, such as acrylic double bonds such as methacrylic acid or their ester compounds, allylic double bonds such as diallyl phthalate, and unsaturated bonds such as maleic acid and maleic acid derivatives. It is to be introduced inside.
その他放射線照射により架橋重合する不飽和二重結合で
あれば用いる事が出来る。Other unsaturated double bonds that can be crosslinked and polymerized by radiation irradiation can be used.
更に具体的な放射線感応変性の手法としては分子中に水
酸基を1個以上有する上記の熱可塑性樹脂又はそのプレ
ポリマー1分子に1分子以上のポリイソシアネート化合
物のイソシアネート基を反応させ、次にイソシアネート
基と反応する基及び放射線硬化性を有する不飽和二重結
合を有する単量体1分子以上との反応物、例えば、線状
ポリカプロラクトンpcP−2ooo(チッソ社製)の
水酸基1個描りにトルエンジイソシアネート1分子を反
応させ、その後1分子の2−ヒドロキシエチルメタクリ
ートを反応させて得た末端にアクリル系二重結合を2個
以上有する樹脂又はそのプレポリマー、オリゴマー、テ
ロマーを挙げることができる。A more specific method of radiation sensitivity modification is to react one molecule of the above thermoplastic resin or its prepolymer having one or more hydroxyl groups in the molecule with one or more molecules of isocyanate groups of a polyisocyanate compound, and then react the isocyanate groups of one or more molecules of a polyisocyanate compound. A reaction product with one or more molecules of a monomer having a group that reacts with a group and one or more molecules of a monomer having an unsaturated double bond having radiation curability, for example, linear polycaprolactone pcP-2ooo (manufactured by Chisso Corporation) with toluene added to one hydroxyl group. Examples include resins having two or more acrylic double bonds at the terminals obtained by reacting one molecule of diisocyanate and then one molecule of 2-hydroxyethyl methacrylate, or prepolymers, oligomers, and telomers thereof.
また、こNで使用されるポリイソシアネート化合物とし
ては、2.4− トルエンジインシアネート、2、6−
トルエンジイソシアネート、1.3−キシレンジイン
シアネート、1.4−キシレンジイソシアネート、m−
フェニレンジイソシアネー)、P−フェニレンジインシ
アネート、ヘキサメチレンジイソシアネート、インホロ
ンジインシアネートやデスモジュールL、fスモジュー
ルIL(西ドイツバイエル社製)等がある。In addition, the polyisocyanate compounds used in this N include 2,4-toluene diincyanate, 2,6-
Toluene diisocyanate, 1.3-xylene diisocyanate, 1.4-xylene diisocyanate, m-
phenylene diisocyanate), P-phenylene diisocyanate, hexamethylene diisocyanate, inphorone diisocyanate, desmodur L, fsmodur IL (manufactured by Bayer AG, West Germany), and the like.
インシアネート基と反応する基および放射線硬化性不飽
和二重結合を有する単量体としては、アクリル酸あるい
はメタクリル酸の2−ヒドロキシエチルエステル、2−
ヒドロキシプロピルエステル、2−ヒドロキシオクチル
エステル等水酸基を有するエステル類ニアクリルアマイ
ド、メタクリルアマイド、N−メチロールアクリルアマ
イド等のイソシアネート基と反応する活性水素を持ちか
つアクリル系二重結合を含有する単量体;更に、アリル
アルコール、マレイン酸多価アルコールエステル化合物
、不飽和二重結合を有する長鎖脂肪酸のモノあるいはジ
グリセリド等インシアネート基と反応する活性水素を持
ちかつ放射線硬化性を有する不飽和二重結合を含有する
単量体も含まれる。Monomers having a group that reacts with an incyanate group and a radiation-curable unsaturated double bond include 2-hydroxyethyl ester of acrylic acid or methacrylic acid, 2-hydroxyethyl ester of acrylic acid or methacrylic acid;
Esters with a hydroxyl group such as hydroxypropyl ester and 2-hydroxyoctyl ester Monomers that have an active hydrogen that reacts with isocyanate groups and contain an acrylic double bond such as niacrylamide, methacrylamide, N-methylol acrylamide, etc. Furthermore, allyl alcohol, maleic acid polyhydric alcohol ester compounds, mono- or diglycerides of long-chain fatty acids having unsaturated double bonds, and other unsaturated double bonds having active hydrogen that reacts with incyanate groups and having radiation curability. Also included are monomers containing.
6−4 本発明は溶剤を使用する場合には、アセトン、
メチルエチルケトン、メチルインブチルケトン、シクロ
ヘキサノン等のケトン類、メタノール、エタノール、イ
ンプロパツール、ブタノール等のインシアネート、熱硬
化では使用出来なかったアルコール類、テトラヒドロフ
ラン、ジオキサン等のエーテル結合を有するものジメチ
ルフォルムアミド、ビニルピロリドン、ニトロプロパン
等ノ溶剤、トルエン、キシレン等の芳香族炭火水素の希
釈済ないしは溶剤を用いる。6-4 When using a solvent in the present invention, acetone,
Ketones such as methyl ethyl ketone, methyl imbutyl ketone, and cyclohexanone, incyanates such as methanol, ethanol, impropatol, butanol, alcohols that cannot be used in heat curing, and substances with ether bonds such as tetrahydrofuran and dioxane dimethyl formamide , vinylpyrrolidone, nitropropane, etc., and diluted aromatic hydrocarbons or solvents such as toluene, xylene, etc. are used.
コーティングに使用する基体としては、現在磁気記録媒
体用基材として広く活用されているポリエチレンテレフ
タレート系フィルム及び更に耐熱性を要求される用途と
しては、ポリイミドフィルム、ポリアミドイミドフィル
ム等が活用され、特にポリエステル系フィルムにおいて
は薄物ベースでは軸延伸、2軸延伸処理をほどこして利
用するケースも多い。As substrates used for coating, polyethylene terephthalate films, which are currently widely used as substrates for magnetic recording media, and polyimide films, polyamide-imide films, etc., are used for applications that require further heat resistance, and in particular polyester In the case of thin film, axial stretching or biaxial stretching is often applied.
本発明より成る放射線硬化型保護膜は当該用途にて通常
使用される各種帯電防止剤、潤滑剤、分散剤、塗膜強度
補強添加剤等を用途に合わせて適宜活用することは有効
である。For the radiation-curable protective film of the present invention, it is effective to use various antistatic agents, lubricants, dispersants, coating film strength reinforcing additives, etc. that are commonly used in the application as appropriate depending on the application.
電子線硬化性樹脂と組合わせて使用する潤滑剤としては
CnH2n+3COOI((n−14〜22)の高級脂
肪酸、CnH2n+108 (n = 14〜22)の
高級脂肪アルコール、上記脂肪酸、脂肪族アルコールの
エステル、酸アミド等が有効である。Lubricants used in combination with the electron beam curable resin include CnH2n+3COOI ((n-14 to 22) higher fatty acids, CnH2n+108 (n = 14 to 22) higher fatty alcohols, esters of the above fatty acids and aliphatic alcohols, Acid amides etc. are effective.
また、シリコーンオリゴマー、脂肪酸変性シリコンオイ
ル、フッ素オイル、フッ化ポリ王−テル(Dupont
、 クライトワクス、バリダックス、モンテエジソ
ン社製フオンプリン)等が有効である。In addition, silicone oligomers, fatty acid-modified silicone oils, fluorine oils, fluorinated polyesters (Dupont
, Krytowax, Validax, Monte Edison's Huonpurin), etc. are effective.
本開発の保護膜の架橋に使用する活性エネルギー線とし
ては、電子線加速器を線源とした電子線が下記に述べる
理由で特に有利である。As the active energy ray used for crosslinking the protective film of the present invention, an electron beam using an electron beam accelerator as a ray source is particularly advantageous for the reasons described below.
しかしその他にもCo60 を線源としたγ−線、Br
90 を線源としたβ−線、X線発生器を線源とした
X−線等も使用する。However, there are also γ-rays using Co60 as a source, Br
β-rays using a ray source of 90 mm, X-rays using an X-ray generator as a ray source, etc. are also used.
照射線源としては吸収線量の制御、製造工程ラインへの
導入の為の電離放射線の自己じゃ閉、工程ライン諸設備
とのシーケンス制御との接続のし易さ等の点で電子線加
速器の利用が有利である。As an irradiation source, electron beam accelerators are used for the reasons of controlling the absorbed dose, self-closing ionizing radiation for introduction into the manufacturing process line, and ease of connection for sequence control with various process line equipment. is advantageous.
電子線加速器は従来コツククロフト型、バンプグラフ型
、共撮変圧器型、鉄心絶縁変圧器型、リンアアクセレレ
ーター型等主として高電圧を得る方式の差により各種の
加速器が実用化されている。Conventionally, various types of electron beam accelerators have been put into practical use, such as the Kotscroft type, the bump graph type, the shared transformer type, the iron-core insulated transformer type, and the linear accelerator type, depending mainly on the method of obtaining high voltage.
保護膜を硬化する際に使用する電子線特性としては、透
過力の面から加速電圧100〜750KVの電子線加速
器を用い、吸収線量を0.1〜5メガランドになる様に
照射するのが好都合である。Regarding the characteristics of the electron beam used when curing the protective film, in terms of penetrating power, it is convenient to use an electron beam accelerator with an accelerating voltage of 100 to 750 KV and irradiate at an absorbed dose of 0.1 to 5 megaland. It is.
特に磁気テープの場合、硬化すべき塗膜厚が小さいので
、米国エナージーサイエンス社にて製造されている低m
Hタイプの電子線加速器(エレクトロカーテンシステム
)等がテープコーティング加エラインへの導入、加速器
内部の2次X線の連間等に極めて有利である。In particular, in the case of magnetic tape, the coating thickness to be cured is small, so the low-m
An H-type electron beam accelerator (electrocurtain system) or the like is extremely advantageous for introduction into a tape coating processing line, for continuous secondary X-rays inside the accelerator, etc.
もちろん、従来より電子線加速器として広く活用されて
いるファンデグラフ型加速器を使用しても良い。Of course, a van de Graaff accelerator, which has been widely used as an electron beam accelerator, may also be used.
また、電子線硬化に際してN ガス、Heガス等の不活
性ガス気流中で電子線を保護塗膜に照射することか重要
であり、空気中で電子線を照射することは、塗膜の架橋
に際し、電子線照射により生じた02等の影響でポリマ
ー中に生じたラジカルが有効に架橋反応に働くことを阻
害する。その影響は磁性保護層表面に特に顕著に影響す
る。従って放射線を照射する部分の算囲気はN H
e、1
C02等の不活性ガス雰囲気に保つことが重要となる。In addition, during electron beam curing, it is important to irradiate the protective coating with an electron beam in an inert gas stream such as N gas or He gas; , inhibits radicals generated in the polymer due to the influence of 02, etc. generated by electron beam irradiation from effectively working on the crosslinking reaction. The effect is particularly noticeable on the surface of the magnetic protective layer. Therefore, the surrounding atmosphere of the part to be irradiated with radiation is N H
e, 1 It is important to maintain an inert gas atmosphere such as C02.
次に実施例により本発明を具体的に説明する。Next, the present invention will be specifically explained with reference to Examples.
実施例:放射線感応性塗料合成例
a) ウレタンエラストマーアクリル変性体の合成(
感電子化エラストマー)
末端インシアネートのジフェニルメタンジイソシアネー
ト(MDI)系ウレタンプレポリマー(日本ポリウレタ
ン製ニッポラン4040)250部、2−ヒドロキシエ
チルメタアクリレート(HEMA)32.5部、ハイド
ロキ/ ン0.07部、オクチル酸スズ0009部を反
応缶に入れ80°Cに加熱溶解後トリレンジイソシアネ
ート43.5部を反応缶内の温度が80〜90℃となる
様に冷却しながら滴下し、滴下終了後80℃でNC0反
応率95%以上となるまで反応せしめる。Example: Synthesis example of radiation-sensitive paint a) Synthesis of acrylic modified urethane elastomer (
Electrosensitive elastomer) 250 parts of diphenylmethane diisocyanate (MDI)-based urethane prepolymer with terminal incyanate (Nipporan 4040 manufactured by Nippon Polyurethane), 32.5 parts of 2-hydroxyethyl methacrylate (HEMA), 0.07 part of hydroquine, Put 0,009 parts of tin octylate into a reaction can, heat and dissolve at 80°C, then add 43.5 parts of tolylene diisocyanate dropwise while cooling so that the temperature inside the reaction can becomes 80-90°C. The reaction is allowed to proceed until the NC0 reaction rate reaches 95% or more.
b)ポリエーテル系末端ウレタン変性エラストマーアク
リル変性体の合成(感電子化エラストマー)
日本ポリウレタン社製ポリエーテルP’l’G−500
250部、2HHMA32.5部、ハイドロキノン0、
007部、オクチル酸スズ0.009部を反応缶に入れ
80℃に加熱溶解後T D I 43.5部を反応缶内
の温度が80〜90℃となる様に冷却しながら滴下し、
滴下終了後80℃でNCO反応率95チ以上となるまで
反応せしめる。b) Synthesis of acrylic modified polyether-based urethane-terminated elastomer (electrosensitive elastomer) Polyether P'l'G-500 manufactured by Nippon Polyurethane Co., Ltd.
250 parts, 2HHMA 32.5 parts, hydroquinone 0,
007 parts of tin octylate and 0.009 parts of tin octylate were placed in a reaction can, heated and dissolved at 80°C, and then 43.5 parts of TDI was added dropwise while cooling the reaction can so that the temperature within the can became 80 to 90°C.
After the dropwise addition was completed, the reaction was allowed to proceed at 80° C. until the NCO reaction rate reached 95% or more.
C)ポリブタジェンエラストマーアクリル変性体の合成
(感電子化エラストマー)
シンクレアペトロケミカル社製低分子量末端水酸基ポリ
ブタジェンポリBDリクイットレジンR−15250部
、28部MAI 2.5部、ハイドロキ/ニア0.00
7部、オクチル酸スズ0.009 部全反応缶に入れ8
0℃に加熱溶解後’r D I 43.5部を反応缶内
の温度が80〜90℃となる様に冷却しながら滴下し、
滴下終了後80℃でNCO反応率95チ以上となるまで
反応せしめる。C) Synthesis of acrylic modified polybutadiene elastomer (electrosensitive elastomer) Low molecular weight terminal hydroxyl group polybutadiene polyBD liquid resin R-15 manufactured by Sinclair Petrochemical Co., Ltd. 250 parts, 28 parts, MAI 2.5 parts, Hydroxy/Nia 0.00
Add 7 parts and 0.009 parts of tin octylate to the entire reaction vessel.8
After heating and dissolving at 0°C, 43.5 parts of 'r DI was added dropwise while cooling so that the temperature inside the reaction vessel was 80 to 90°C.
After the dropwise addition was completed, the reaction was allowed to proceed at 80° C. until the NCO reaction rate reached 95% or more.
d)ポリカプロラクタム系アクリル変性体の合成ポリオ
ールPCP−0200(チッソ社製ポリカプロラクトン
)250部、2−ヒドロキシエチルメタクリレート12
22部、ハイドロキノン0024部、オクチル酸スズ0
063部を反応缶に入れ、80℃に加熱溶解後、TD1
165.乙部を反応缶内の温度が80〜90℃となる様
に冷却しながら滴下し、滴下終了後80℃でNC0反応
率95%以上となるまで反応せしめる。d) Synthesis of polycaprolactam-based acrylic modified polyol PCP-0200 (polycaprolactone manufactured by Chisso Corporation) 250 parts, 2-hydroxyethyl methacrylate 12
22 parts, 0024 parts of hydroquinone, 0 tin octylate
Pour 063 parts into a reaction can, heat and melt at 80°C, and TD1
165. The second part is added dropwise while being cooled so that the temperature inside the reaction vessel becomes 80 to 90°C, and after the completion of dropping, the reaction is allowed to occur at 80°C until the NC0 reaction rate reaches 95% or more.
この樹脂の分子量は1140である。The molecular weight of this resin is 1140.
e)不飽和ポリエステル系BBC性樹脂合成例セパチン
酸ジメチル166部、アジピン酸ジメチル12.2部、
マレイン酸ジメチル648部、ネ ・オベンチルグリ
コール76部、1.6−ヘキサンジオール74部、テト
ラ−n−ブチルチタネート10部を反応缶に仕込みN2
気流中180℃で脱メタノール反応後240〜260℃
まで昇温し、01〜lmHgの減圧下縮合反応により、
内部可塑化されたエラストマーに近い樹脂を得た。e) Synthesis example of unsaturated polyester BBC resin: 166 parts of dimethyl sepatate, 12.2 parts of dimethyl adipate,
648 parts of dimethyl maleate, 76 parts of neobentyl glycol, 74 parts of 1,6-hexanediol, and 10 parts of tetra-n-butyl titanate were charged into a reaction vessel and N2
240-260℃ after demethanol reaction at 180℃ in air flow
By raising the temperature to
A resin close to an internally plasticized elastomer was obtained.
実施例1
コバルト/ニッケル(原子比8/2)の合金インゴット
を準備し、真空蒸着法により長尺の強磁性薄膜をポリエ
チレンテレフタレートのベースの上に形成した。蒸着は
電子線加熱により行な℃・、中心入射角が70°のいわ
ゆる斜め蒸着法を採用した。ベースフィルム冷却用に円
筒キャンを用℃・、冷却温度を5℃に保った。真空槽を
3 X 10−3Paまで排気し、これに酸素ガスを圧
力が6.3X10−2Pa になるまで導入して蒸着を
行なった。電子銃に与えるパワーとベースフィルムの駆
動速度を調整することによって膜厚が約800人となる
ようにした。Example 1 A cobalt/nickel (atomic ratio 8/2) alloy ingot was prepared, and a long ferromagnetic thin film was formed on a polyethylene terephthalate base by vacuum evaporation. The vapor deposition was carried out by electron beam heating, using the so-called oblique vapor deposition method at a central incidence angle of 70°. A cylindrical can was used to cool the base film, and the cooling temperature was maintained at 5°C. The vacuum chamber was evacuated to 3.times.10@-3 Pa, and oxygen gas was introduced into the chamber until the pressure reached 6.3.times.10@-2 Pa for vapor deposition. By adjusting the power given to the electron gun and the driving speed of the base film, the film thickness was made to be approximately 800 mm.
このようにして得られた強磁性薄膜は保磁力が約100
0Qe、残留磁束Brが約s o o o Gsとなり
磁気記録媒体として好都合なものが得られた。The ferromagnetic thin film thus obtained has a coercive force of approximately 100
0 Qe, and the residual magnetic flux Br was about so o o Gs, which is favorable as a magnetic recording medium.
一方、前記樹脂の中から選ばれた次の組成の配合物を用
意した。On the other hand, a blend having the following composition selected from the above resins was prepared.
この樹脂組成物のMEK/)ルエン(1/1)0、3
wt%溶液に3wt%の一ステアリン酸を加えたものを
用意し、これを上記強磁性薄膜の上に、グラビア塗布法
にて塗布した。塗布後熱風と赤外線ラングにより溶剤を
乾燥させ、表面平滑化処理した後、エナージサイエンス
社製エレクトロカーテンタイプ電子線加速器を使用して
、加速電圧150KV電極電流iomA、全照射量5M
rad の条件でN ガス雰囲気下にて電子線を照射し
、塗膜を硬化させた。MEK of this resin composition/) Luene (1/1) 0, 3
A solution prepared by adding 3 wt % of monostearic acid to the wt % solution was prepared and applied onto the above-mentioned ferromagnetic thin film using a gravure coating method. After coating, the solvent was dried with hot air and infrared rays, and the surface was smoothed. Using an electrocurtain type electron beam accelerator manufactured by Energy Sciences, the acceleration voltage was 150 KV, the electrode current was iomA, and the total irradiation amount was 5 M.
The coating film was cured by irradiation with an electron beam under N 2 gas atmosphere under rad conditions.
得られたテープを1インチ幅に切断し強磁性薄膜からな
るビデオテープを得た(試料A)比較例1
次に実施例1にて使用した塩化ビニール、ピルルアルコ
ール共重合体に電子線感応性アクリル二重結合導入を導
入した。The obtained tape was cut into 1-inch width to obtain a videotape consisting of a ferromagnetic thin film (Sample A) Comparative Example 1 Next, the vinyl chloride and pirul alcohol copolymer used in Example 1 had electron beam sensitivity. Acrylic double bond introduction was introduced.
アクリル二重結合導入塩化ビニール、ビニルアルコール
共重合体 50重量部アクリル二重結合
導入ポリエーテルウレタンエラストマー(b )、
50重量部潤滑剤(画級脂肪酸
変性シリコンオイル) 3重量部性2)こ〜で使
用したアクリル二重結合導入塩化ビニールビニルアルコ
ール共重合体の合成は下記の手順に沿って作成した。Acrylic double bond-introduced vinyl chloride, vinyl alcohol copolymer 50 parts by weight Acrylic double bond-introduced polyether urethane elastomer (b),
50 parts by weight Lubricant (Grade fatty acid modified silicone oil) 3 parts by weight 2) The acrylic double bond-introduced vinyl chloride vinyl alcohol copolymer used in the above was synthesized according to the following procedure.
注1)実施例1及び比較例1の原料として使用した塩化
ビニールビニルアルコール共重合体は下記の合成法で作
成された。Note 1) The vinyl chloride vinyl alcohol copolymer used as the raw material in Example 1 and Comparative Example 1 was produced by the following synthesis method.
1)塩化ビニールビニルアルコール共重合体の製法
(塩化ビニル基/酢酸ビニル基)の比が75725で、
平均重合度n = 400の塩化ビニール−酢酸ビニル
共重合体を原料とし、これをMIBK(メチルイソブチ
ルケトン等の溶剤と水との混合分散媒体中に懸濁させ、
攪拌機等による機械的分散により、樹脂を膨潤させたス
ラリーに近い@濁物を作る。1) Production method of vinyl chloride vinyl alcohol copolymer (vinyl chloride group/vinyl acetate group) ratio is 75725,
A vinyl chloride-vinyl acetate copolymer with an average degree of polymerization n = 400 is used as a raw material, and this is suspended in a mixed dispersion medium of MIBK (a solvent such as methyl isobutyl ketone and water).
By mechanical dispersion using a stirrer, etc., a cloudy substance similar to a slurry of swollen resin is created.
次にこれに、力性ソーダーナトリウムメチラートを触媒
として添加し、かつ温度を80℃近辺に保ち、酢酸ビニ
ルのアセチル基を水酸基にケン化する。Next, sodium sodium methylate is added as a catalyst, and the temperature is maintained at around 80°C to saponify the acetyl groups of vinyl acetate to hydroxyl groups.
なお、脱@酸防止のための安定剤や、均一に懸濁させる
ための懸濁剤を使用してもよし・。In addition, you may use a stabilizer to prevent acid removal or a suspending agent to ensure uniform suspension.
次に脱離したアセチル基より生成する酢酸や触媒を、ケ
ン化の終了したスラリーを水洗することにより除去し、
樹脂の安定性を高める。この場合、必簀に応じて、ケン
化時の着色を消すため、塩素イオン等を取り除く脱色工
ゝ程を付加してもよい。Next, acetic acid and catalyst generated from the released acetyl groups are removed by washing the saponified slurry with water.
Increases resin stability. In this case, a decoloring step for removing chlorine ions, etc. may be added, depending on necessity, in order to erase the coloration during saponification.
上述のケン化法1によって°得られた塩化ビニル−ビニ
ルアルコール共重合体の特性は次のようなものであった
。The properties of the vinyl chloride-vinyl alcohol copolymer obtained by the saponification method 1 described above were as follows.
塩化ビニル基 87%
酢酸ビニル基 06%以下
ビニルアルコール基 126%重合度 36
0
注2)上記塩化ビニール−ビニルアルコール共重合体7
50部とトルエン1250部シクロヘキサノン500部
を51Aつロフラスコに仕込み加熱浴解し80℃昇温昇
温ジトリレンジイソシアネート−ヒドロキシエチルメタ
アクリレートアダクトを614部加え、更にオクチル酸
スズo、o12g、ハイドロキノン0.012部加え8
0℃でN2気流中NCO反応率が90%以上となるまで
反応せしめる。反応終了後取却しメチルエチルケトン1
250部を加え稀釈する。Vinyl chloride group 87% Vinyl acetate group 06% or less Vinyl alcohol group 126% Polymerization degree 36
0 Note 2) Above vinyl chloride-vinyl alcohol copolymer 7
50 parts of toluene, 1250 parts of cyclohexanone, and 500 parts of cyclohexanone were placed in a 51A flask and dissolved in a heating bath, and the temperature was raised to 80°C. 614 parts of ditolylene diisocyanate-hydroxyethyl methacrylate adduct were added, and further, 12 g of tin octylate, 12 g of tin octylate, and 0.5 g of hydroquinone were added. 012 copies added 8
The reaction is allowed to proceed at 0° C. in a N2 stream until the NCO reaction rate reaches 90% or more. After the reaction is complete, remove methyl ethyl ketone 1.
Add 250 parts to dilute.
毫)トリレンジイソンアネート(TDI)の2−ヒドロ
キシエチルメタクリレート(2HEMA)アダクトの製
法
トリレンジイソシアネート348部をN2気流中1ノの
4つ目フラスコ内で80℃に加熱後、2−へキサエチレ
ンメタアクリレート260部、オクチル酸スズO,07
部、ハイドロキノ10.05部を反応缶内の温度が80
〜85℃となる様に冷却コントロールしながら滴下終了
後80’Cで3時間攪拌し反応を完結させる。反応終了
後取り出して冷却後白色ペースト状のTDIの2 HH
MA を得た。) Preparation of 2-hydroxyethyl methacrylate (2HEMA) adduct of tolylene diisocyanate (TDI) After heating 348 parts of tolylene diisocyanate to 80°C in a fourth flask in a N2 stream, 2-hexane 260 parts of ethylene methacrylate, tin octylate O.07
10.05 parts of hydroquino at a temperature of 80% in the reaction vessel.
After completion of the dropwise addition, the mixture was stirred at 80'C for 3 hours while cooling was controlled to reach ~85°C to complete the reaction. After the reaction is complete, take it out and cool it, then add 2HH of TDI in the form of a white paste.
Obtained an MA.
実施例1と同様の条件で製造した。It was manufactured under the same conditions as in Example 1.
ドロップアウト、スチール耐久時間、摩擦係数、カール
、電磁特性を評価したところ表1のような結果が得られ
た。When dropout, steel durability time, friction coefficient, curl, and electromagnetic properties were evaluated, the results shown in Table 1 were obtained.
表1においてドロップアウトは松下電幸産業製のVH8
を用いて、いわゆる3段階波を記録し、再生した時のド
ロップアウトの1分あたりの個数である。スチル耐久時
間は同、じデツキと信号を用いスチル再生を行なった時
に再生画面が、全(見えな(なるまでに要する時間であ
る。この場合主な原因は磁性層の劣化と目づまりと考え
られるが、3サンプルとも30分以上このような現象は
発生しなかった。In Table 1, the dropout is VH8 manufactured by Matsushita Denko Sangyo.
This is the number of dropouts per minute when a so-called 3-step wave is recorded and played back using . The still durability time is the time it takes for the playback screen to become fully (visible) when playing stills using the same deck and signal. In this case, the main cause is considered to be deterioration and clogging of the magnetic layer. However, such a phenomenon did not occur for more than 30 minutes in all three samples.
摩擦係数μは、ステンレス製のピンの前後でのテンショ
ンからオイラーの式を用いて算出しり値である。カール
は目視判定である。The friction coefficient μ is a calculated value using Euler's equation from the tension before and after the stainless steel pin. Curl is determined visually.
上記のように、本発明によるとカールのない、摩擦係数
の小さく・、ドロップアウトの少ない、スチール時間の
長い強力な表面を有する磁気記録媒体が提供できた。As described above, according to the present invention, a magnetic recording medium can be provided that has a strong surface that is free from curling, has a small friction coefficient, little dropout, and has a long steel time.
実施例2
飽和ポリエステル樹脂 20重量部(ダイナ
ミートノーベル社製L−411)アクリル二重結合導入
ポリ力プロラクタムウレタンプレポリマー(d)
80重量部溶剤(MEK/TOL
so/so)潤滑剤(高級脂肪酸変性シリコンオイル)
10重量部実施例3
フェノキシ樹脂
(ユニオンカーバイト社製PKHH) 40重
量部アクリル二重結合導入
ポリブタジェンエラストマーtc) 60
重量部実施例4
エポキシ樹脂
(シェル化学エピコート152) 50]
ii部ポリブタジェンエラストマーアクリル変性体(c
)50重量部実施例1と同様の条件で装造した。Example 2 Saturated polyester resin 20 parts by weight (L-411 manufactured by Dynamite Nobel) Acrylic double bond-introduced polyprolactam urethane prepolymer (d)
80 parts by weight of solvent (MEK/TOL
so/so) Lubricant (higher fatty acid modified silicone oil)
10 parts by weight Example 3 Phenoxy resin (PKHH manufactured by Union Carbide) 40 parts by weight Acrylic double bond-introduced polybutadiene elastomer TC) 60
Parts by weight Example 4 Epoxy resin (Shell Chemical Epicoat 152) 50]
Part ii Polybutadiene elastomer acrylic modified product (c
) 50 parts by weight Packaging was carried out under the same conditions as in Example 1.
これらの実施例も実施例1と同様に緒特性がすぐれてお
り、電磁特性もすぐれていることカ分ル。Similar to Example 1, these examples also have excellent magnetic characteristics and electromagnetic characteristics.
紫外線硬化エポキシ樹脂アゾカウルトラセットB613
6J80重量部と塩化ビニールビニルアルコール共重合
体(重合度6oo)2o重量部をMEK/)ルエン(1
/1)の0.3 wt%溶液として良く溶解゛し、更に
触媒溶gPS−33をB6136J固形分に対し3wt
%添加し実施例1で用〜・たのと同じ強磁性薄膜の上に
グラビア塗布を行なった。UV curing epoxy resin Azoka Ultraset B613
80 parts by weight of 6J and 20 parts by weight of vinyl chloride vinyl alcohol copolymer (degree of polymerization 6oo) were added to MEK/) luene (1
/1) dissolved well as a 0.3 wt% solution, and further added catalyst solution gPS-33 to 3 wt% of B6136J solid content.
Gravure coating was carried out on the same ferromagnetic thin film as used in Example 1.
加熱乾燥後2KWと3KWの紫外線ランプ各一本を有し
た紫外線硬化システムにより形成された塗膜の硬化を行
なった。これを−インチ幅に切断しビデオテープを得た
。After heating and drying, the coating film formed was cured using an ultraviolet curing system having one each of 2KW and 3KW ultraviolet lamps. This was cut to -inch width to obtain a videotape.
表6
比較例2は紫外線硬化エポキシ樹脂を保護膜として用い
ても所期の結果が得られないことを示す。Table 6 Comparative Example 2 shows that the desired results cannot be obtained even when a UV-cured epoxy resin is used as a protective film.
代理人の氏名 倉 内 基 弘Agent's name: Motohiro Kurauchi
Claims (1)
線で硬化しうる不飽和二重結合を有する樹脂と熱可塑性
樹脂とを含有した保護膜を形成したことを特徴とする磁
気記録媒体。 2、保護膜は滑性を有する化合物を含有している前記第
1項記載の磁気記録媒体。[Claims] t. A ferromagnetic thin film is formed on a support, and a protective film containing a radiation-curable resin having an unsaturated double bond and a thermoplastic resin is formed on the surface of the ferromagnetic thin film. Features of magnetic recording media. 2. The magnetic recording medium according to item 1 above, wherein the protective film contains a compound having slipperiness.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57229722A JPS59124029A (en) | 1982-12-29 | 1982-12-29 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57229722A JPS59124029A (en) | 1982-12-29 | 1982-12-29 | Magnetic recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59124029A true JPS59124029A (en) | 1984-07-18 |
JPH0412526B2 JPH0412526B2 (en) | 1992-03-04 |
Family
ID=16896671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57229722A Granted JPS59124029A (en) | 1982-12-29 | 1982-12-29 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59124029A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2449528A (en) * | 2007-05-25 | 2008-11-26 | Daido Metal Co | Producing resin coated metal sliding component, using radiation |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57143728A (en) * | 1981-02-27 | 1982-09-06 | Fuji Photo Film Co Ltd | Magnetic recording medium |
-
1982
- 1982-12-29 JP JP57229722A patent/JPS59124029A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57143728A (en) * | 1981-02-27 | 1982-09-06 | Fuji Photo Film Co Ltd | Magnetic recording medium |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2449528A (en) * | 2007-05-25 | 2008-11-26 | Daido Metal Co | Producing resin coated metal sliding component, using radiation |
GB2449528B (en) * | 2007-05-25 | 2012-01-25 | Daido Metal Co | Method for producing resin-coated sliding member |
Also Published As
Publication number | Publication date |
---|---|
JPH0412526B2 (en) | 1992-03-04 |
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