JPS59116922A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS59116922A JPS59116922A JP57225676A JP22567682A JPS59116922A JP S59116922 A JPS59116922 A JP S59116922A JP 57225676 A JP57225676 A JP 57225676A JP 22567682 A JP22567682 A JP 22567682A JP S59116922 A JPS59116922 A JP S59116922A
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- resin
- recording medium
- magnetic recording
- surfactant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 229910052598 goethite Inorganic materials 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- AEIXRCIKZIZYPM-UHFFFAOYSA-M hydroxy(oxo)iron Chemical compound [O][Fe]O AEIXRCIKZIZYPM-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 229920003049 isoprene rubber Polymers 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- LXCFILQKKLGQFO-UHFFFAOYSA-N methylparaben Chemical compound COC(=O)C1=CC=C(O)C=C1 LXCFILQKKLGQFO-UHFFFAOYSA-N 0.000 description 1
- 230000001333 moisturizer Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N propylene glycol Substances CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- BHZOKUMUHVTPBX-UHFFFAOYSA-M sodium acetic acid acetate Chemical compound [Na+].CC(O)=O.CC([O-])=O BHZOKUMUHVTPBX-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/735—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer characterised by the back layer
- G11B5/7356—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer characterised by the back layer comprising non-magnetic particles in the back layer, e.g. particles of TiO2, ZnO or SiO2
Landscapes
- Paints Or Removers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
この発明は磁気記録媒体に関し、一層詳細には電気メッ
キ、化学メッキ、真空蒸着、スパッタリング、イオンブ
レーティング等により支持体上に強磁性薄膜が形成され
た薄膜系磁気記録媒体の、バック層にカーボンブラック
、グラファイト等のかわシに界面活性剤を用いることに
よってバック層の表面粗さを無視でき、しかもバンク層
の樹脂の柔軟性の効果を充分に生かすことができるよう
に改良された磁気記録媒体に関する。Detailed Description of the Invention The present invention relates to a magnetic recording medium, and more particularly to a thin film magnetic recording medium in which a ferromagnetic thin film is formed on a support by electroplating, chemical plating, vacuum evaporation, sputtering, ion blating, etc. By using a surfactant such as carbon black or graphite in the back layer of the media, the surface roughness of the back layer can be ignored and the flexibility of the resin in the bank layer can be fully utilized. The present invention relates to an improved magnetic recording medium.
現在、磁気テープはオーディオ、ビデオ、コンピュータ
ーの分野で広範囲に使用されるようになってきた。それ
に伴い、媒体に記録する情報量も年々増加し、媒体には
記録密度の高いことがますます要求されるようになった
。Magnetic tape is now widely used in audio, video, and computer applications. Along with this, the amount of information recorded on media has increased year by year, and media are increasingly required to have high recording density.
磁気ヘッドを用いる現在の記録方法においては、テープ
−ヘッド間のスペーシング損失は546T〔dB〕(d
:テープ−ヘッド間距離7人 記録波長)で表わされる
。この式かられかるように、記録密度の高い短波長記録
においてd2、スペーシングによる出力低下の割合が長
波長のそれより著しく大きくなる。従って、小さな異物
がテープ表面上にあっても、それがドロップアウトとし
て検出されることになる。In current recording methods using magnetic heads, the spacing loss between the tape and the head is 546 T [dB] (d
:Tape-head distance (recording wavelength). As can be seen from this equation, in short wavelength recording with high recording density, the rate of output reduction due to d2 and spacing is significantly larger than that in long wavelength recording. Therefore, even if a small foreign object is on the tape surface, it will be detected as a dropout.
ドロップアウトの原因として考えられるのは、繰り返し
応力がかかることによる塗膜の劣化から生ずる磁気テー
プ蒸着膜表面の磁性粉脱落あるいは、走行中にベースが
削り蝦られたものや、ホコリ等が静電的にベース面に刺
着し、さらにそれが蒸着膜面に転移したものが挙げられ
る。これらを防止するため、例えば後者の原因に対して
は、磁気テープの磁性面と反対の支持体表面(バンク面
)に、カーボンブラックあるいはグラファイト等を有機
バインダーとともに混練した塗料を塗布しベースの強l
化をはかりベースの削れを少なくする等の方法が考案さ
れている。これらの処理により、繰り返し走行に対する
ドロップアウトの増加の傾向はかなシ抑えることができ
る。しかしその程度は完全ではなく、さらにドロップア
ウトを少なくする必要がある。その発生原因を詳細に調
べだ結果を本出願人は特願昭56−54362号に記し
である。通常熱硬化樹脂が結合剤として使用される。そ
の場合、バック層が塗布された後、テープは巻き取られ
、熱硬化処理が施されることになる。しかし、塗布が終
った時点においては、バンク層中では壕だ硬化反応が始
且つておらずその塗膜は弱く、シかもバンク面と磁性面
どは密着状態であるため、バンク層塗膜中に充填された
カーボンブラック、グラファイト、あるいは他の無機充
填剤を含んだハック面塗膜表面は、それが接触している
反対側の磁性層表面に転移し易く、その転移したものが
ドロップアウトやヘッド目づまりの原因となっているこ
とがわ浄った。寸たこの現象は熱可塑性樹脂であっても
同様な現象が起りうると考えられる。バック層を設ける
ことにより、繰り返し走行によりドロップアウトの増加
を抑えることはできるが、走行回数の少友い段階におい
てドロップアウトがそれ程低くないのはこの理由のだめ
である。Possible causes of dropouts include magnetic powder falling off from the surface of the magnetic tape deposited film due to deterioration of the paint film due to repeated stress, the base being scraped off during running, or static electricity caused by dust, etc. Examples include those that stick to the base surface and then transfer to the deposited film surface. To prevent these problems, for example, for the latter cause, a paint made by mixing carbon black or graphite with an organic binder is applied to the support surface (bank surface) opposite to the magnetic surface of the magnetic tape to strengthen the base. l
Methods have been devised to reduce the amount of scratches on the scale base. Through these processes, the tendency for dropouts to increase due to repeated driving can be suppressed. However, this level is not perfect, and there is a need to further reduce dropouts. The applicant has conducted a detailed investigation into the cause of this phenomenon and has published the results in Japanese Patent Application No. 54362/1983. Usually thermoset resins are used as binders. In that case, after the backing layer is applied, the tape is wound up and subjected to a heat curing treatment. However, at the time when the coating is finished, the trench hardening reaction has not started in the bank layer, and the coating film is weak. Hacked coatings containing carbon black, graphite, or other inorganic fillers tend to transfer to the magnetic layer surface on the opposite side with which they are in contact, resulting in dropouts and I found out that it was the cause of the head clogging. It is thought that a similar phenomenon of scalloping may occur even in thermoplastic resins. By providing a backing layer, it is possible to suppress an increase in dropouts due to repeated running, but this is the reason why dropouts are not so low when the number of runs is small.
バック層形成工程での上記のような不具合を解消するだ
め、放射線感応樹脂(放射線の照射で硬化しうる樹脂)
をバインダーとして゛カーボンブラック甘たはグラファ
イトあるいは他の無機充填剤と混練した塗料でバック層
を形成した後活性エネルギー線源により・放射線を照射
し、硬化処理を施すか、あるいはそのま−1表面処理を
行った後硬化処理を施し、バック層中に三次元架橋を生
じさせ、強靭な塗膜としだ後、そのテープを巻き取るこ
とにより、上記のような原因によるドロップアウトを減
少させるものがある。この方法によればテープが巻き取
られるのは塗膜の架橋反応が終了しだ′後であるから、
巻き取りによりバック層が磁性層に密着してもバック層
から磁性層への転移は起きないとなっている。In order to eliminate the above-mentioned problems in the back layer forming process, radiation-sensitive resin (resin that can be cured by irradiation with radiation) is used.
After forming a back layer with a paint mixed with carbon black or graphite or other inorganic fillers as a binder, it is irradiated with radiation from an active energy ray source and subjected to a curing treatment, or the surface is coated as is. After the treatment, a curing treatment is performed to create three-dimensional crosslinking in the back layer, creating a strong coating film, and then winding up the tape, which reduces dropouts caused by the causes mentioned above. be. According to this method, the tape is wound up after the crosslinking reaction of the coating film has finished.
Even if the back layer comes into close contact with the magnetic layer by winding, no transition from the back layer to the magnetic layer occurs.
しかし、カーボンブラック、グラファイト等を樹脂中に
多量に入れなければ、帯電に対する効果が出ない。その
ため、バンク層の表面粗さが問題となシ、磁性層での出
力低下が起こる。However, unless a large amount of carbon black, graphite, etc. is incorporated into the resin, there will be no effect on charging. Therefore, the surface roughness of the bank layer becomes a problem, and the output of the magnetic layer decreases.
本発明はそれらの欠点を解決するため、カーボンブラン
ク、グラファイト等のかわりに、界面活性剤によシ、帯
電防止対策をとっただめ、バンク層の表面粗さが無視で
き、しかも・・ツク層の樹脂の柔軟性の効果を充分生か
すことができるため、かえって出力増加という利点が出
てきた。In order to solve these drawbacks, the present invention uses surfactants instead of carbon blanks, graphite, etc., and takes antistatic measures, so that the surface roughness of the bank layer can be ignored. Since the flexibility of the resin can be fully utilized, this has the advantage of increasing output.
本発明で用いる放射線感応樹脂とは、放射船1によりラ
ジカルを発生し架橋構造を生じるような、分子鎖中に不
飽和二重結合を2個以上含むものであり、これは−また
熱可塑性樹脂を放射線感応変性することによっても可能
である。The radiation-sensitive resin used in the present invention is one that contains two or more unsaturated double bonds in its molecular chain so that radicals are generated by the radiation vessel 1 to form a crosslinked structure, and this is also a thermoplastic resin. It is also possible to make the radiation sensitive to radiation.
放射線感応変性の具体例としては、ラブカル重合性を有
する不飽和二重結合を示すアクリル酸、メタクリル酸あ
るいはそれらのエステル化合物のようなアクリル系二重
結合、ジアリルフタレ−1・のようなアリル系二重結合
、マレイン酸、マレイン酸誘導体等の不飽和結合等の放
射線照射による架橋あるいは重合乾燥する基を分子中に
導入することである。Specific examples of radiation-sensitive modification include acrylic double bonds such as acrylic acid, methacrylic acid, or their ester compounds, which exhibit an unsaturated double bond that has Lovecal polymerizability, and allylic double bonds such as diallylphthale-1. This method involves introducing into the molecule a group that can be crosslinked or polymerized and dried by radiation irradiation, such as a double bond or an unsaturated bond such as maleic acid or a maleic acid derivative.
その他放射線照射により架橋重合する不飽和二重結合で
あれば用いることができる。Other unsaturated double bonds that can be crosslinked and polymerized by radiation irradiation can be used.
放射線感応樹脂に変性できる熱可塑性樹脂を以下に示す
。Thermoplastic resins that can be modified into radiation-sensitive resins are shown below.
(a)塩化ビニール系共重合体
塩化ヒニールー酢酸ビニールービニールアルコール共重
合体、塩化ビニール−ビニルアルコール共重合体、塩化
ビニール−ビニルアルコール−プロピオン酸ビニール共
重合体 塩化ビニール−酢酸ビニール−マレイン酸共重
合体、塩化ビニール−酢酸ビニール−末端OH側鎖アル
キル基共重合体、たとえばUCC社VROH+ VYN
C。(a) Vinyl chloride copolymer vinyl chloride-vinyl acetate-vinyl alcohol copolymer, vinyl chloride-vinyl alcohol copolymer, vinyl chloride-vinyl alcohol-vinyl propionate copolymer, vinyl chloride-vinyl acetate-maleic acid copolymer Polymer, vinyl chloride-vinyl acetate-terminal OH side chain alkyl group copolymer, such as UCC's VROH+ VYN
C.
VYEGX等寸だUCC社VERR等が挙げられる。Examples include VYEGX and UCC's VERR.
上記共重合体に後に述べる手法により、アクリル系二重
結合、マレイン酸系二重結合、アリル系二重結合を導入
し放射線感応変性を行なう。An acrylic double bond, a maleic acid double bond, and an allylic double bond are introduced into the above copolymer by a method described later to effect radiation sensitivity modification.
(b) 飽和ポリエステル樹脂
フタル酸、イソフタル酸、テレフタル酸、コハク酸、ア
ジピン酸、セバシン酸のような飽和多塩基酸とエチレン
グリコール、ジエチレングリコ−/l/ 、 りIJセ
リン、トリメチロールプロパン。(b) Saturated polyester resins Saturated polybasic acids such as phthalic acid, isophthalic acid, terephthalic acid, succinic acid, adipic acid, sebacic acid and ethylene glycol, diethylene glycol/l/l, di-IJ serine, trimethylolpropane.
12プロピレングリコール、1.3フタンジオール、ジ
プロピレングリコール、14ブタンジオール、16ヘキ
サンジオール、ペンタエリスリット、ンルビトール、グ
リセリン、ネオペンチルクリコール、14シクロヘキサ
ンジメタツールのような多価アルコールとのエステル結
合により得られる飽和ポリエステル樹脂又はこれらのポ
IJ エステル樹脂をS Oa N a等で変性した樹
脂(パイロン53S)。これらを後に述べる手法により
放射線感応変性を行なう。By ester bonding with polyhydric alcohols such as 12-propylene glycol, 1.3-phthanediol, dipropylene glycol, 14-butanediol, 16-hexanediol, pentaerythritol, nrubitol, glycerin, neopentyl glycol, 14-cyclohexane dimetatool. The resulting saturated polyester resin or a resin obtained by modifying these polyester resins with S Oa Na or the like (Pylon 53S). Radiation sensitivity degeneration is performed using the methods described below.
(C)不飽和ポリエステル樹脂
分子鎖中に放射線硬化性不飽和二重結合を含有するポリ
エステル化合物、例えば第(b)項の熱可塑性樹脂とし
て記載の多塩基酸と多価アルコールのエステル結合から
成る飽和ポリエステル樹脂で多塩基酸の一部をマレイン
酸とした放射線硬化性不飽和二重結合を含有する不飽和
ポリエステル樹脂、プレポリマー、オリゴマーを挙げる
ことかできる。(C) Unsaturated polyester resin A polyester compound containing a radiation-curable unsaturated double bond in its molecular chain, for example, consisting of an ester bond between a polybasic acid and a polyhydric alcohol as described as the thermoplastic resin in item (b). Examples include unsaturated polyester resins, prepolymers, and oligomers containing radiation-curable unsaturated double bonds in which part of the polybasic acid is maleic acid in saturated polyester resins.
飽和ポリエステル樹脂の多塩基酸および多価アルコール
成分は第(ah、項に記載した各化合物を挙げることが
でき、放射線硬化性不飽和二重結合としてはマレイン酸
、フマル酸等を挙げることができる。Examples of the polybasic acid and polyhydric alcohol components of the saturated polyester resin include the compounds listed in Section (ah), and examples of the radiation-curable unsaturated double bond include maleic acid, fumaric acid, etc. .
放射線硬化性不飽和ポリエステル樹脂の製法は、多塩基
酸成分1種以上と多価アルコール成分1種以上にマレイ
ン酸、フマル酸等を加え常法、すなわち触媒存在180
〜200℃窒素雷囲気下脱水あるいは脱アルコール反応
の後、240〜280℃まで昇温し、0.5〜1■Hg
の減圧下縮合反応によりポリエステル樹脂を得ることが
できる。マレイン酸やフマル酸等の含有量は、製造時の
架橋、放射線硬化性等から酸成分中1〜40モル係で好
ましくは10〜30モルチである。The radiation-curable unsaturated polyester resin is manufactured by a conventional method by adding maleic acid, fumaric acid, etc. to one or more polybasic acid components and one or more polyhydric alcohol components, that is, in the presence of a catalyst.
After dehydration or dealcoholization under a nitrogen atmosphere at ~200℃, the temperature is raised to 240~280℃ and 0.5~1■Hg
A polyester resin can be obtained by a condensation reaction under reduced pressure. The content of maleic acid, fumaric acid, etc. in the acid component is 1 to 40 mol, preferably 10 to 30 mol, in view of crosslinking during production, radiation curability, etc.
(d)ホリヒニルアルコール樹脂
ポリビニルアルコール、ブチラール樹脂、アセタール樹
脂、ホルマール樹脂及びこれらの成分の共重合体。これ
ら樹脂中に含まれる水酸基を後に述べる手法により放射
線感応化変性を行なう。(d) Polyvinyl alcohol resin Polyvinyl alcohol, butyral resin, acetal resin, formal resin, and copolymers of these components. The hydroxyl groups contained in these resins are subjected to radiation sensitization modification by a method described later.
(e)エステル樹脂、フェノキシ樹脂
ビスフェノールAとエピクロルヒドリン、メチルエピク
ロルヒドリンの反応によるエポキシ樹脂−シエル化学製
(エピコート152,154゜828.1001.10
’04,1007)ダウケミカル製(DEN 431
、 DER732,DKR511゜DER331)、大
日本インキ製(エビクロン−400゜エビクロン−8o
o)、更に上記エポキシの高重合度樹脂であるUCC社
製フェノキシ樹脂(PKHA、pKHc、PKHH)臭
素化ヒスフェノールAとエピクロルヒドリンとの共重合
体、大日本インキ化学工業製(エビクロン145,15
2,153゜1120)等。(e) Ester resin, phenoxy resin Epoxy resin produced by the reaction of bisphenol A, epichlorohydrin, and methyl epichlorohydrin - manufactured by Ciel Chemical (Epicoat 152, 154° 828.1001.10
'04,1007) Made by Dow Chemical (DEN 431
, DER732, DKR511゜DER331), manufactured by Dainippon Ink (Ebikuron-400゜Ebikuron-8o
o), Furthermore, phenoxy resin (PKHA, pKHc, PKHH manufactured by UCC, which is a high polymerization degree resin of the above epoxy), a copolymer of brominated hisphenol A and epichlorohydrin, and a copolymer of brominated hisphenol A and epichlorohydrin, manufactured by Dainippon Ink and Chemicals (Evicron 145, 15)
2,153°1120) etc.
これら樹脂中に含まれるエポキシ基を利用して、放射線
感応変性を行なう。Radiation sensitivity modification is performed using the epoxy groups contained in these resins.
(f) 繊維素誘導体
各種分子量の繊維素系誘導体も、まだ熱可塑性プラスチ
ック成分として効果的である。その中でも、特に効果的
なものは硝化綿、セルローズアセトブチレート、エチル
セルローズ、プチルセルロ一ノ、アセチルセルローズ等
が好適であり、樹脂中の水酸基を活用して後に述べる手
法により放射線感応変性を行なう。(f) Cellulose derivatives Cellulose derivatives of various molecular weights are still effective as thermoplastic components. Among these, particularly effective ones are nitrified cotton, cellulose acetobutyrate, ethyl cellulose, butyl cellulose, acetyl cellulose, etc., and radiation sensitivity modification is carried out by utilizing the hydroxyl groups in the resin by the method described later.
その他、放射線感応変性に用いることのできる樹脂とし
ては、多官能ポリエステル樹脂、ポリエーテルエステル
樹脂、ポリビニルピロリドン樹脂及び誘導体(PVPオ
レフィン共重合体)、ポリアミド樹脂、ポリイミド樹脂
、フェノール樹脂スピロアセクール樹脂、水酸基を含有
するアクリルエステル及びメタクリルエステルを少なく
とも1種以上型合成分として含むアクIJ )し系樹脂
等も有効である。Other resins that can be used for radiation-sensitive modification include polyfunctional polyester resins, polyetherester resins, polyvinylpyrrolidone resins and derivatives (PVP olefin copolymers), polyamide resins, polyimide resins, phenolic resins, spiroacecool resins, Acrylic resins containing at least one type of acrylic ester and methacrylic ester containing hydroxyl groups as mold synthesis components are also effective.
さらに上記放射線感応変性熱可塑性樹脂に熱可塑性ニジ
ストマー又はプレポリマーをブレンドすることにより、
一層強靭な塗膜とすることができる。さらに、下記に述
べるように、これらエラストマーあるいはプレJ ’J
ママ−、同様に放射線感応性に変性された場合は、より
効果的である。以下に、上記放射線感応樹脂と組み合わ
せることのできるエラストマー又はプレポリマーを挙げ
る。Furthermore, by blending a thermoplastic nidistomer or prepolymer with the radiation-sensitive modified thermoplastic resin,
An even tougher coating film can be obtained. Furthermore, as discussed below, these elastomers or pre-J'J
Mothers are also more effective if modified to be radiosensitive. Listed below are elastomers or prepolymers that can be combined with the radiation-sensitive resin.
(g) ポリウレタンエラストマー及びプレポリマー
及びテロマー
ポリウレタンエラストマーは、師1摩耗性、PETフィ
ルムへの接着性が良い点で特に有効である。(g) Polyurethane elastomers, prepolymers, and telomers Polyurethane elastomers are particularly effective in terms of good abrasion resistance and good adhesion to PET films.
このようなウレタン化合物の例としては、インシアネー
トとして、2.4−)ルエンジイソ7アネ−l−,2,
6−トルエンジイソシアネート、13−キシレンジイソ
シアネート、14−キシレンジイソシアネート、15−
ナフタレンジイソシアネート、m−フエニレンジイソン
アネート、p−フエニレンジイソシアネー1. 331
〜ジメチル−44′−ジフエニルメタンジイソシアネー
ト、4.4.’−ジフェニルメタンシイノアアネート、
33′−7メチルビフエニレンジイソシアネート、4.
4’−ビフェニレンジイソシアネート、ヘキサメチレン
ジイソシアネート、インフオロンジイソシアネート、ジ
シクロヘキシルメタンジイソ/アネート デスモジュー
ルL デスモジュールN等の各種多価イソシアネートと
、線状飽和ポリエステル(エチレングリコール、ジエチ
レングリコール、グリセリン。Examples of such urethane compounds include 2,4-)luenediiso7ane-l-,2,
6-Toluene diisocyanate, 13-xylene diisocyanate, 14-xylene diisocyanate, 15-
Naphthalene diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate 1. 331
~Dimethyl-44'-diphenylmethane diisocyanate, 4.4. '-diphenylmethanecyinoaanate,
33'-7 methylbiphenylene diisocyanate, 4.
Various polyvalent isocyanates such as 4'-biphenylene diisocyanate, hexamethylene diisocyanate, influorone diisocyanate, dicyclohexylmethane diiso/anate Desmodur L and Desmodur N, and linear saturated polyesters (ethylene glycol, diethylene glycol, glycerin.
トリメチロールプロパン、14−ブタンジオール。Trimethylolpropane, 14-butanediol.
16−ヘキサンジオール、ペンタエリスリット。16-hexanediol, pentaerythritol.
ソルビト−ル、ネオペンチルy リ−y −/l/、
1.4=シクロヘキサンジメタツールの様な多価アル
コールと、フタル酸、イソフタル酸、テレフタル酸、コ
ハク酸、アジピン酸、セバシン酸、の様な飽和多塩基酸
との縮重合によるもの)、線状飽和ポリエーテル(ポリ
エチレングリコール、ポリプロピレングリコール、ポリ
テトラメチレングリコール)やカプロラクタム、ヒドロ
キシル含有アクリル酸エステル・ヒドロキシル含有メタ
アクリル酸エステル等の各種ポリエステル類の縮重合物
より成るポリウレタンエラストマー、プレポリマー、ゾ
ロマーが有効である。Sorbitol, neopentyl y-/l/,
1.4=Condensation polymerization of a polyhydric alcohol such as cyclohexane dimetatool with a saturated polybasic acid such as phthalic acid, isophthalic acid, terephthalic acid, succinic acid, adipic acid, and sebacic acid), line Polyurethane elastomers, prepolymers, and zolomers are made of condensation products of various polyesters such as saturated polyethers (polyethylene glycol, polypropylene glycol, polytetramethylene glycol), caprolactam, hydroxyl-containing acrylic esters, and hydroxyl-containing methacrylic esters. It is valid.
これらのエラストマーを放射線感応変性の各種熱可塑性
プラスチックスとそのまま組合せても良いが、更にウレ
タンニジストマーの末端のインシアネート基又は水酸基
と反応するアクリル系二重結合又はアリル系二重結合等
を有する単量体と反応させることにより、放射線感応性
に変性することは非常に効果的である。These elastomers may be combined as they are with various radiation-sensitive thermoplastics, but elastomers may also have an acrylic double bond or allylic double bond that reacts with the terminal incyanate group or hydroxyl group of the urethane distomer. Modification to radiosensitivity by reacting with monomers is very effective.
(h) アクリルニトリル−ブタジェン共重合エラス
“トマー
シンクレアペトロケミカル社製ポリBDリクイツドレジ
ンとして市販されている末端水酸基のあるアクリロニト
リルブタジェン共重合体プレポリマー、あるいは日本化
オン社製ハイカー14’32J等のニジストマーは、特
にツクジエン中の二重結合が放射線によりラジカルを生
じ架橋及び重合させるエラストマー成分として適する。(h) Acrylonitrile-butadiene copolymer elastomer "Acrylonitrile-butadiene copolymer prepolymer with a terminal hydroxyl group commercially available as PolyBD Liquid Resin manufactured by Thomas Sinclair Petrochemical Co., Ltd., or Hiker 14'32J manufactured by Nippon Kaon Co., Ltd. Nidistomer is particularly suitable as an elastomer component in which the double bonds in the tsukudiene generate radicals by radiation and are crosslinked and polymerized.
(1)ホリフタゾエンエラスl−マー
シンクレアペトロケミカル社製ポリBDリクイツドレジ
ンR−15等の低分子量末端水酸基を有するプレポリマ
ーが特に熱可塑性切崩との相溶性の点で好適である。R
−15プレポリマーにおいては分子末端が水酸基となっ
ている為分子末端をアクリル系不飽和二重結合を伺加す
ることにより放射線感応性を高めることが可能であり、
バインダーとして更に有利となる。(1) Holiftazoene Elas l-A prepolymer having a low molecular weight terminal hydroxyl group such as PolyBD Liquid Resin R-15 manufactured by Sinclair Petrochemical Co., Ltd. is particularly suitable from the viewpoint of compatibility with thermoplastic cleavage. R
Since the -15 prepolymer has a hydroxyl group at the end of the molecule, it is possible to increase radiation sensitivity by adding an acrylic unsaturated double bond to the end of the molecule.
It is even more advantageous as a binder.
ま7に1 ポリブタジェンの環化物日本合成ゴム製cB
R−M90]も熱可塑性樹脂との組合せによりすぐれた
性能を発揮する。特に環化されたポリブタジェンは、ポ
リブタジェン本来の有する放射線による架橋重合の効率
が良く、バインダーとして優れた性質を有している。7-1 Polybutadiene cyclized product Japan Synthetic Rubber cB
R-M90] also exhibits excellent performance when combined with a thermoplastic resin. In particular, cyclized polybutadiene has good crosslinking polymerization efficiency due to the radiation inherent in polybutadiene, and has excellent properties as a binder.
その低熱可塑性エストラマー及びそのプレポリマーの系
で好適なものとしては、スチレン−ブタジェンゴム、塩
化ゴム、アクリルゴム、イソプレンゴム及びその環化物
(日本合成ゴム製0工R70]、)、エポキシ変性ゴム
、内部可塑化飽和線状ポリエステル(東洋紡バイロン亜
300)、等のニジストマーも下記に述べる放射線感応
変性処理をほどこすことにより有効に利用できる。Suitable low thermoplastic elastomer and prepolymer systems include styrene-butadiene rubber, chlorinated rubber, acrylic rubber, isoprene rubber and its cyclized product (Nippon Synthetic Rubber Co., Ltd. 0 engineering R70), epoxy modified rubber, internal Plasticized saturated linear polyester (Toyobo Vylon-A 300) and other nidistomers can also be effectively used by subjecting them to the radiation-sensitizing modification treatment described below.
壕だ高分子には放射線照射により崩壊するものと分子間
に架橋を起すものが知られている。分子間に架橋を起す
ものとしては、ポリエチレン、ポリプロピレン?ポリス
チレン、ポリアクリル酸エステル、ポリアクリルアミド
、ポリ塩化ビニル。It is known that some macromolecules disintegrate when exposed to radiation and others that cause cross-linking between molecules. Are there polyethylene or polypropylene that cause cross-linking between molecules? Polystyrene, polyacrylic ester, polyacrylamide, polyvinyl chloride.
ポリエステル、ポリビニルピロリ゛トンゴム、ポリビニ
ルアルコール、ポリアクロレインがある。この様な架橋
型ポリマーであれば上記のような変性を特に施さなくて
も、架橋反応が起るので、そのまま放射線架橋用バンク
コート樹脂として使用可能である。These include polyester, polyvinylpyrrolidone rubber, polyvinyl alcohol, and polyacrolein. If such a crosslinked polymer is used, the crosslinking reaction will occur even without the above-mentioned modification, so it can be used as it is as a bank coat resin for radiation crosslinking.
さらに寸だ、この方法によれば溶剤を使用したい無溶剤
型の樹脂であっても短時間で硬化することができるので
、この様なqt4脂をバックコート用として用いること
もできる。Furthermore, according to this method, even solvent-free resins that require the use of solvents can be cured in a short time, so such qt4 resins can also be used for back coats.
本発明に使用される帯電防止剤としての界面活性剤は、
アニオン型として、カルボン酸塩、硫酸誘導体、リン酸
誘導体、ペンタアルキルポリホスフェート−ヘキサアル
キルテトラポリホスフェート。The surfactant as an antistatic agent used in the present invention is
As anionic types, carboxylates, sulfuric acid derivatives, phosphoric acid derivatives, pentaalkylpolyphosphate-hexaalkyltetrapolyphosphate.
ジアルキルホスホン酸、スルホン酸等である。壕だカチ
オン型として、アミン、第4級アンモニウム塩、イミダ
ソリン、アミン酸化エチレン付加体、フィチン酸第4級
等である。These include dialkylphosphonic acids and sulfonic acids. Examples of the trench cation type include amines, quaternary ammonium salts, imidasolines, amine oxidized ethylene adducts, and quaternary phytic acids.
ノニオン型として、多価アルコール、多価フルコールエ
ステル、アルキルフェノール酸化エチレン付加体、脂肪
酸化エチレン伺加俸、アミド酸化エチレン付加体、アミ
ン酸化エチレン付加体、アミド等である。Nonionic types include polyhydric alcohols, polyhydric fluoric esters, alkylphenol ethylene oxide adducts, fatty acid ethylene oxide adducts, amide ethylene oxide adducts, amine oxide ethylene adducts, amides, and the like.
両性型として、カルボン酸、スルホン酸、金属塩・アル
キルベタイン等でアル。As an amphoteric type, it is alkaline with carboxylic acids, sulfonic acids, metal salts, alkyl betaines, etc.
界面活性剤の量としては、樹脂(τ対し1重量以上でな
いと、バック層の帯電防止効、果がなく、20重量部以
上になると、表面へのにじみだしが出るため望ましくな
い。If the amount of surfactant is less than 1 part by weight relative to the resin (τ), there will be no antistatic effect on the back layer, and if it is more than 20 parts by weight, it will bleed onto the surface, which is undesirable.
たものを用いた沙、潤滑剤とじてやはり末端にアクリル
系二重結合を付加することによって、CH2−CHCo
OR、CB2=CHC0NHCH2000R(Blic
、B2.、−1CnH2n−1CnH2n−1等でよい
)などを用いることによって、分散性や滑性を良好にす
ると共に、アクリル系二重結合が放射線の照射処理によ
ってラジカルを発生し、バインダー成分に生じたラジカ
ルと反応して強固に結合し、表面性が一層優れ、電磁特
性も向上する。By adding an acrylic double bond to the end of the lubricant, CH2-CHCo
OR, CB2=CHC0NHCH2000R(Blic
, B2. , -1CnH2n-1CnH2n-1, etc.), it improves dispersibility and lubricity, and the acrylic double bond generates radicals by radiation treatment, and the radicals generated in the binder component. It reacts with other materials to form a strong bond, resulting in even better surface properties and improved electromagnetic properties.
また、高湿保存下で、バック層の界面活性剤かにじみ出
し、磁性層へ転位するのを押えるために、必要に応じて
、顔料として5i02.TiO2,AL203CI’2
03.SiC,CeO2,CaCO2,酸化亜鉛、ゲー
サイト+&F C2C3+ タルク、カオリン、CaS
O4,窒化側1素、テフロン粉末、フッ化黒鉛、二硫化
モリファン、ジルコニア、Ca5i02.アスベスト、
チタンホワイト、ホワイトカーボン、クロムイエロー、
オイルイエロー、オイルブルー、オイルレットナトのも
のが適宜添加される。In addition, 5i02. TiO2, AL203CI'2
03. SiC, CeO2, CaCO2, zinc oxide, goethite + &F C2C3+ talc, kaolin, CaS
O4, 1 element on the nitriding side, Teflon powder, graphite fluoride, molyphane disulfide, zirconia, Ca5i02. asbestos,
Titanium white, white carbon, chrome yellow,
Oil yellow, oil blue, and oil letto are added as appropriate.
々お、界面活性剤、顔料は必ずしも1種づつ使用すると
は限らず、2種、3種と混合する場合もある。Furthermore, it is not always necessary to use one type of surfactant and pigment, but two or three types may be mixed.
寸だ、本発明のバックコートの架橋に使用する活性エネ
ルギー線としては、放射線加速器を線源とした電子線
’Co 60を線源としたr−線、5r90を線源とし
た6−線、X錬発生器を紀!源としたχ−線、紫外線照
射等が使用される。The active energy ray used for crosslinking the back coat of the present invention is an electron beam using a radiation accelerator as a source.
'R-rays using Co60 as a radiation source, 6-rays using 5r90 as a radiation source, and X-ray generators! Chi-rays as a source, ultraviolet irradiation, etc. are used.
特に照剤線源としては吸収線量の制御、製造工程ライン
への導入、電離放射線のしゃ閉等の見地から放射線加熱
器によシ放射線を使用する方法が有利である。In particular, as an illuminating radiation source, it is advantageous to use radiation in a radiation heater from the viewpoint of controlling the absorbed dose, introducing it into the manufacturing process line, and blocking ionizing radiation.
バック層を硬化する際に使用する放射線特性としては、
透過力の面から加速電圧100〜750KV好ましくは
150〜300KVの放射線加速器を用い吸収線量を0
5〜20メガランドになるように照射するのが好都合で
ある。The radiation characteristics used when curing the back layer are as follows:
From the perspective of penetrating power, a radiation accelerator with an accelerating voltage of 100 to 750 KV, preferably 150 to 300 KV is used to reduce the absorbed dose to 0.
It is convenient to irradiate to between 5 and 20 Megalands.
本発明のバック層硬化に際しては、米11エナージーサ
イエンス社にて製造されている低線量タイプの放射線加
速器(エレクトロカーテンシステム)及びRP社の加速
器等がテープコーティング加エラインへあ導入、加速器
内部の2次X線の遮蔽等に極めて有利である。When curing the back layer of the present invention, a low-dose type radiation accelerator (Electro Curtain System) manufactured by 11 Energy Sciences Inc. in the US and an accelerator manufactured by RP Co., Ltd. are introduced into the tape coating processing line, and two inside the accelerator are used. This is extremely advantageous for shielding secondary X-rays.
勿論、従来より放射線加速材として広く活用されている
ところのファンデグラフ型加速器を使用しても良い。Of course, a van de Graaf type accelerator, which has been widely used as a radiation accelerating material, may also be used.
まだ、放射線架橋に際しては、N2ガス、Heガス等の
不活性ガス気流中で放射線をバック層に照射することが
重要であり、空気中で放射線を照射することは、バイン
ダー成分の架橋に際し放射線照射により生じた03等の
影響でg+)マー中に生じたラジカルが有利に架橋反応
に働く事を阻害するので極めて不利である。However, when performing radiation crosslinking, it is important to irradiate the backing layer with radiation in an inert gas stream such as N2 gas or He gas, and irradiating the back layer with radiation in the air will cause radiation irradiation during crosslinking of the binder component. This is extremely disadvantageous because the radicals generated in the g+) mer due to the influence of 03 etc. generated by the above are inhibited from working advantageously in the crosslinking reaction.
従って、活性エネルギー線を照射する部分の雰囲気は、
特に酸素濃度が最大で1%のN2 + Hθ。Therefore, the atmosphere of the area to be irradiated with active energy rays is
Especially N2 + Hθ with a maximum oxygen concentration of 1%.
CO2等の不活性ガス雰囲気に保つことが重要となる。It is important to maintain an atmosphere of an inert gas such as CO2.
紫外線照射の場合は、放射線硬化性塗料に、さらに1〜
10 重量係の光重合増感剤を含有する。In the case of ultraviolet irradiation, add 1 to
Contains a photopolymerization sensitizer of 10% by weight.
紫外線の場合は、電子線よりも不活性ガスでの影響が少
ないので、大気中での照射が可能である。In the case of ultraviolet rays, the influence of inert gas is less than that of electron beams, so irradiation in the atmosphere is possible.
顔料の量としては、多くなりすぎると塗膜がもろくなる
。そのため、200重量部以下が適当である。If the amount of pigment is too large, the coating film will become brittle. Therefore, 200 parts by weight or less is appropriate.
さらに、この様なバック層を設けるべき磁気テープとし
ては、オーディオテープ、ビデオテープ、コンピュータ
ー用テープ、エンドレステープがあるが、中でも、ドロ
ップアウトが最も重要な特性の1つであるビデオテープ
、コンピューター用テープに用いることはかなり有効で
ある。Furthermore, magnetic tapes that should be provided with such a back layer include audio tape, video tape, computer tape, and endless tape. It is quite effective to use it for tape.
磁性層の蒸着方法としては、例えばコバルト/ニッケル
(原子比8/2)の合金インゴットを準備し、真空蒸着
法により長尺の強磁性薄膜をポリエチレンテレフタレー
トのベースの上に形成する。As a method for depositing the magnetic layer, for example, a cobalt/nickel (atomic ratio 8/2) alloy ingot is prepared, and a long ferromagnetic thin film is formed on a polyethylene terephthalate base by vacuum deposition.
蒸着は電子線加熱により行ない、中心入射角が70゜の
いわゆる斜め蒸着法を採用する。ベースフィルム冷却用
に円筒キャンを用い、冷却温度を5℃に保つ。真空槽を
3X10”Paまで排気し、これに酸素ガスを圧力が6
.3X10 ”、Paになるまで導入して蒸着を行なう
。電子銃に与えるパワーとベースフィルムの駆動速度を
調節することによって膜厚が約800Aとなるようにす
る。The vapor deposition is performed by electron beam heating, and a so-called oblique vapor deposition method with a central incident angle of 70° is employed. A cylindrical can is used to cool the base film, and the cooling temperature is maintained at 5°C. Evacuate the vacuum chamber to 3X10”Pa and add oxygen gas to it at a pressure of 6
.. Vapor deposition is performed by introducing the electron beam until it reaches 3×10 ”, Pa. The film thickness is adjusted to about 800 A by adjusting the power given to the electron gun and the driving speed of the base film.
このようにして得られた強磁性薄膜は保磁力が約100
00e、B、rが約8000Gとなシ磁気記録媒体とし
て好都合なものが得られる。The ferromagnetic thin film thus obtained has a coercive force of approximately 100
00e, B, and r are about 8000G, which is advantageous as a magnetic recording medium.
一方、前記樹脂組成物(a)(g)のM E K /
)ルエン(1/1 ) 0.3’wt%溶液に3wt%
のステアリン酸を加えたものを用意し これを上記強磁
性薄膜の上に、グラビア塗布法にて塗布する。塗布後熱
風と赤外線ランプにより溶剤を乾燥させ、表面平滑化処
理した後、エナジーサイエンス社製エレクトロカーテン
タイプ電子線加速器を使用して、加速電圧150KV電
極電流20mA、、全照射量10Mradの条件でN2
ガス君囲気下にて電子線を照射し、塗膜を硬化させる。On the other hand, M E K / of the resin compositions (a) and (g)
) Luene (1/1) 3wt% in 0.3'wt% solution
of stearic acid is prepared, and this is applied onto the ferromagnetic thin film using a gravure coating method. After coating, the solvent was dried using hot air and an infrared lamp, and the surface was smoothed. Using an electrocurtain type electron beam accelerator manufactured by Energy Sciences, N2 was applied at an acceleration voltage of 150 KV, an electrode current of 20 mA, and a total irradiation dose of 10 Mrad.
The coating film is cured by irradiating it with an electron beam under a gas atmosphere.
膜からなるビデオテープを得る(試料A)。本方法によ
る保護膜の架橋はアクリル二重結合のラジカル化による
架橋と塩化ビニル酢酸ビニル系樹脂分子鎖中に生じたラ
ジカル(脱HCI化と考えられるが明らかで々い)によ
る架橋との両者が作用していると考えられる。A videotape consisting of a film is obtained (sample A). The cross-linking of the protective film by this method involves both cross-linking due to radicalization of acrylic double bonds and cross-linking due to radicals generated in vinyl chloride vinyl acetate resin molecular chains (which is thought to be due to de-HCI conversion, but is not obvious). It is thought that it is working.
一方、バック層には、前述のように潤滑剤を適宜用途に
合わせて活用することも有効である。On the other hand, it is also effective to use a lubricant in the back layer depending on the purpose as described above.
光増感剤としては、例えばベンゾイン、ベンゾインメチ
ルエーテル、ベンゾインエチルエーテル。Examples of photosensitizers include benzoin, benzoin methyl ether, and benzoin ethyl ether.
ペンゾインイングロビルエーテル9.J、−メチルベン
等のアントラキノA合物、ベンジル゛ジアセチル:アセ
トフェノン、ベンゾフェノン等の7エニルケトン化合物
、ジフェニルジスルフィド、テトラメチルチウラムスル
フィド等のスルフィド化合物ニス−クロルメチルナフタ
リン゛アントラセンおよびヘキサクロロブタジェン、ペ
ンタクロロブタジェンなどのハロゲン化炭化水素などを
挙げることができる。光重合増感剤は、樹脂固形分に対
し、01〜10%の範囲が望ましい。Penzoin inglobil ether9. J, anthraquino A compounds such as methylben, benzyl diacetyl: 7-enyl ketone compounds such as acetophenone and benzophenone, sulfide compounds such as diphenyl disulfide and tetramethylthiuram sulfide, nis-chloromethylnaphthalene, anthracene and hexachlorobutadiene, pentachlorobutane Examples include halogenated hydrocarbons such as gen. The photopolymerization sensitizer is desirably in a range of 01 to 10% based on the solid content of the resin.
以下実施例について述べる。Examples will be described below.
〔実施例1〕
アクリル変性ポリウレタンエラストマー (g)
40 部第4級アンモニウム塩
7部混合溶剤 Goo部
上記混合物をボールミル中5時間分散させ、磁性面が形
成されているポリエステルフィルムの裏面に乾燥厚0.
1/L4になるように塗布し、エレクトロカーテンタイ
プ電子線加速器を用いて加速電圧150KV、電極電流
IQmA、吸収線量5Mracl、 N2ガス中で電子
線をバンク層に照射し、硬化を行なった後巻き取り、]
//2′ビデオrl、コに切断し、VHSデツキにて感
度(4MHz )を測定した。[Example 1] Acrylic modified polyurethane elastomer (g)
40 parts quaternary ammonium salt
7 parts mixed solvent Goo part The above mixture was dispersed in a ball mill for 5 hours, and the back side of the polyester film on which the magnetic surface was formed was coated with a dry thickness of 0.
The bank layer was coated at a ratio of 1/L4 and cured by irradiating the bank layer with an electron beam using an electrocurtain type electron beam accelerator at an acceleration voltage of 150 KV, an electrode current of IQmA, and an absorbed dose of 5 Mracl in N2 gas. take,]
The video was cut into //2' video rl, and the sensitivity (4 MHz) was measured using a VHS deck.
〔比較例1〕
実施例1にて、第4吸アンモニウム塩のかわりにS ]
、 02100重量部添加した。[Comparative Example 1] In Example 1, S was used instead of the quaternary ammonium salt]
, 02100 parts by weight were added.
表1に示すとおり、
バンク層が放射線感応性樹脂と界面活性剤よりなる場合
は、感度のアンプがあることがわかる。バンク層の影響
が顕著に異なることかわかる。As shown in Table 1, it can be seen that when the bank layer is made of a radiation-sensitive resin and a surfactant, there is an amplifier in sensitivity. It can be seen that the influence of the bank layer is significantly different.
〔実施例2〕
アクリル変性ポリエステル(η・1脂 ] 00
部アルコールより耽るリン酸エステル誘導体
2部混合溶剤 600部0
2、A塗布
〔実施例3〕
塩化ビニル、酸酢ビニノげルコール共重合体 60部ア
クリル変性ポリウレタンエラス1゛マー 40部第3
級アミン 1脂部混合溶剤
600部表 2
01μ塗布
実施例3において、高温多湿保存下に短期間1〜2日保
存では問題はなかっだが、3日間以上になるとバンク層
中の界面活性剤かにしみたし、粘着か出て来て好ましく
なかった。そこで顔料5i02を添加してみると、粘着
も押さえられ、出力低下もわずかで済んだ。そのため、
必要に応じ顔料を添加することは効果的である。実施例
4で示す。[Example 2] Acrylic modified polyester (η・1 fat) 00
Phosphate ester derivatives that are more addictive than alcohol
2 parts mixed solvent 600 parts 0
2. Coating A [Example 3] Vinyl chloride, acid-acetate vinyl alcohol copolymer 60 parts Acrylic modified polyurethane elastomer 40 parts 3rd
grade amine 1 fat mixed solvent
600 copies Table 2 In 01μ coating Example 3, there was no problem when stored for a short period of 1 to 2 days under high temperature and high humidity, but if it was stored for more than 3 days, the surfactant in the bank layer would seep into the bank layer and adhesive would appear. I didn't like it when I came. When Pigment 5i02 was added, the adhesion was suppressed and there was only a slight decrease in output. Therefore,
It is effective to add pigments if necessary. This is shown in Example 4.
〔実施例4〕
実施例3に対し、
5i02 20M量部1/A塗
布
表 3
5段階で1が一番良い。[Example 4] In contrast to Example 3, 5i02 20M Amount Part 1/A Application Table 3 Out of 5 grades, 1 is the best.
〔実施例5〕
実施例4に対し、
ベンゾインエチルエーテル 03部上記組成物
を紫外線照射した。塗布厚が17になるようにしだ。[Example 5] In contrast to Example 4, the above composition containing 03 parts of benzoin ethyl ether was irradiated with ultraviolet rays. The coating thickness was set to 17.
表 4
なお、顔料を増加させていくと、電磁変換特開も低−1
斗、200重量部を越えると塗膜がもろくなることがわ
かった。200重量部以内なら、感度が+Q、46F以
上であり、良好であった。Table 4 Furthermore, as the amount of pigment increases, the electromagnetic conversion patent application also decreases by -1.
It was found that when the amount exceeds 200 parts by weight, the coating film becomes brittle. When the amount was within 200 parts by weight, the sensitivity was +Q, 46F or higher, which was good.
まだ、必要に応じ、潤渭剤等を入れて、潤滑効果を生か
すことも効果的である。However, if necessary, it is also effective to add a moisturizer or the like to take advantage of the lubricating effect.
以上本発明につき好適な実施例を挙げて種々説明したが
、本発明はこの実施例に限定されるものでは々く、発明
の精神を逸脱しない範囲内で多くの改変を施し得るのは
もちろんのことである。Although the present invention has been variously explained above with reference to preferred embodiments, the present invention is not limited to these embodiments, and it goes without saying that many modifications can be made without departing from the spirit of the invention. That's true.
特許出願人
東京電気化学工業株式会社
代表者素野福次部
弓蕎萌ネMJE書
特許庁長官着接 和夫殿
1、事件の表示
■訓57年特許願第225676号
2、発明の名称
磁気記録媒体
3、補正をする者
事件との関係 特許出願人
4、 イセ駄
自発
8、補正の内容
I〉明細書第2頁第19行目の「要求されるようになっ
た。」の後に次の文章を加入する。Patent Applicant Tokyo Denki Kagaku Kogyo Co., Ltd. Representative Sono Fukujibe Yumiso Moe Ne MJE Letter Interview with the Commissioner of the Japan Patent Office Mr. Kazuo 1. Indication of the case ■Kun 1957 Patent Application No. 225676 2. Name of the invention Magnetic recording Medium 3, Relationship with the case of the person making the amendment Patent applicant 4, Iseda Voluntary 8, Contents of the amendment I> The following after “It has become required” on page 2, line 19 of the specification: Add text.
「その種類として、ビデオテープ、コンピュータテープ
、高性能オーディオテープ、多重コードテープ、磁気デ
ィスク、フロッピィディスク。``The types include video tape, computer tape, high performance audio tape, multiplexed code tape, magnetic disk, and floppy disk.
磁気カードなどの磁気記録媒体がある。」2)明細書第
3頁第11行目の「塗膜」を「金属薄膜」と補正する。There are magnetic recording media such as magnetic cards. 2) "Coating film" on page 3, line 11 of the specification is corrected to "metal thin film."
3)明細書第3頁第12行目の「磁性粉脱落」を「薄膜
削れ」と補正する。3) "Magnetic powder falling off" on page 3, line 12 of the specification is corrected to "thin film scraping".
4)明細書第25頁第2行目の「酸酢」を「酢酸」と補
正する。4) "Acidic acid vinegar" in the second line of page 25 of the specification is corrected to "acetic acid."
1111
Claims (1)
ック層を設けた磁気記録媒体において、バック層が放射
線感応樹脂を含む結合材中に充填材として界面活性剤お
よび必要に応じ顔料を分散し硬化してなることを特徴と
する磁気記録媒体。 2、顔料が、5iOz、 Ti0z、 A1203.0
r203+5IC9CeO2,CaCO3,酸化亜鉛、
グーサイ)、JFe203.タルク、カオリン、 C
a S O4。 窒化硼素、テフロン粉末、フッ化黒鉛、二硫化モリブデ
ン、ジルコニア、 Ca5iO□、アスベスト、チタン
ホワイト、ホワイトカーボン。 クロムイエロー、オイルイエロー、オイルブルー又はオ
イルレッドである特許請求の範囲第1項記載の磁気記録
媒体。 3、放射線が電子線である特許請求の範囲第1項又は第
2項記載の磁気記録媒体。 4、結合材中の放射線硬化塗料がさらに1〜10重量%
の光重合増感剤を含有し、紫外線照射によりバック層が
形成さ些た特許請求の範囲第1項又は第2項記載の磁気
記録媒体。[Claims] 1. In a magnetic recording medium in which a ferromagnetic thin film layer is provided on one side of a support and a back layer is provided on the other side, the back layer is used as a filler in a binder containing a radiation-sensitive resin. A magnetic recording medium characterized by being formed by dispersing and curing a surfactant and, if necessary, a pigment. 2. Pigment is 5iOz, Ti0z, A1203.0
r203+5IC9CeO2, CaCO3, zinc oxide,
Gusai), JFe203. Talc, kaolin, C
aS O4. Boron nitride, Teflon powder, graphite fluoride, molybdenum disulfide, zirconia, Ca5iO□, asbestos, white titanium, white carbon. The magnetic recording medium according to claim 1, which is chrome yellow, oil yellow, oil blue, or oil red. 3. The magnetic recording medium according to claim 1 or 2, wherein the radiation is an electron beam. 4. Further 1 to 10% by weight of radiation curing paint in the binder
3. A magnetic recording medium according to claim 1 or 2, wherein the magnetic recording medium contains a photopolymerizable sensitizer and a back layer is formed by irradiation with ultraviolet rays.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57225676A JPS59116922A (en) | 1982-12-22 | 1982-12-22 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57225676A JPS59116922A (en) | 1982-12-22 | 1982-12-22 | Magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59116922A true JPS59116922A (en) | 1984-07-06 |
Family
ID=16833031
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57225676A Pending JPS59116922A (en) | 1982-12-22 | 1982-12-22 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59116922A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2771415A1 (en) * | 1998-10-01 | 1999-05-28 | Paulette Tourangeau | Coloured powders useful as pigments |
CN110016262A (en) * | 2019-01-05 | 2019-07-16 | 国网山东省电力公司电力科学研究院 | Outdoor waterproof super-amphiphobic coating and its preparation process |
-
1982
- 1982-12-22 JP JP57225676A patent/JPS59116922A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2771415A1 (en) * | 1998-10-01 | 1999-05-28 | Paulette Tourangeau | Coloured powders useful as pigments |
CN110016262A (en) * | 2019-01-05 | 2019-07-16 | 国网山东省电力公司电力科学研究院 | Outdoor waterproof super-amphiphobic coating and its preparation process |
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