JPS58172242A - Treating agent for glass surface - Google Patents
Treating agent for glass surfaceInfo
- Publication number
- JPS58172242A JPS58172242A JP5371882A JP5371882A JPS58172242A JP S58172242 A JPS58172242 A JP S58172242A JP 5371882 A JP5371882 A JP 5371882A JP 5371882 A JP5371882 A JP 5371882A JP S58172242 A JPS58172242 A JP S58172242A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- reaction
- group
- water
- contg
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 45
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 21
- 229910000077 silane Inorganic materials 0.000 claims abstract description 18
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002253 acid Substances 0.000 claims abstract description 17
- 235000019353 potassium silicate Nutrition 0.000 claims abstract description 17
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 15
- -1 silane compound Chemical class 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000012756 surface treatment agent Substances 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 16
- 239000002904 solvent Substances 0.000 abstract description 13
- 239000000047 product Substances 0.000 abstract description 9
- 238000002156 mixing Methods 0.000 abstract description 5
- 239000003021 water soluble solvent Substances 0.000 abstract description 5
- 238000002310 reflectometry Methods 0.000 abstract description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000443 aerosol Substances 0.000 abstract description 2
- 235000011149 sulphuric acid Nutrition 0.000 abstract description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 238000007796 conventional method Methods 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000839 emulsion Substances 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 20
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000003921 oil Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 2
- 241000998584 Nuda Species 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 235000011941 Tilia x europaea Nutrition 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000004571 lime Substances 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910003609 H2PtCl4 Inorganic materials 0.000 description 1
- DBTDEFJAFBUGPP-UHFFFAOYSA-N Methanethial Chemical compound S=C DBTDEFJAFBUGPP-UHFFFAOYSA-N 0.000 description 1
- 229910021333 Na2Si Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- VXJCGWRIPCFWIB-UHFFFAOYSA-N hexadecasodium tetrasilicate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] VXJCGWRIPCFWIB-UHFFFAOYSA-N 0.000 description 1
- PMYUVOOOQDGQNW-UHFFFAOYSA-N hexasodium;trioxido(trioxidosilyloxy)silane Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])O[Si]([O-])([O-])[O-] PMYUVOOOQDGQNW-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- SRPSOCQMBCNWFR-UHFFFAOYSA-N iodous acid Chemical compound OI=O SRPSOCQMBCNWFR-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、ガラス表面に撥水性、撥油性、耐汚染性、低
反射性などを付与する処理剤に関し、さらに詳しく言へ
ば、ポリフルオロアルキル基含有シラン化合物又は該化
合物の部分加水分解縮合物と、あらかじめ水ガラスをプ
ロトン酸の存在下で反応させた反応生成物とからなるガ
ラス表面の処理剤に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a treatment agent that imparts water repellency, oil repellency, stain resistance, low reflectivity, etc. to a glass surface. The present invention relates to a glass surface treatment agent comprising a partially hydrolyzed condensate of a compound and a reaction product obtained by reacting water glass in the presence of a protonic acid.
ガラス板、鏡、ガラス容器、メガネレンズなどガラス製
品の表面は大気中の湿度及び温度の影響により水分が凝
縮したジ、水によって濡らされた場合、これら水分中に
ガラス成分が溶出し、アルカリ性となるため表面が容易
に浸蝕されて、いわゆる焼けを生ずることは周知である
。The surface of glass products such as glass plates, mirrors, glass containers, and eyeglass lenses has condensed moisture due to the influence of atmospheric humidity and temperature.When wet with water, glass components dissolve into this moisture and become alkaline. It is well known that the surface is easily eroded, resulting in so-called burns.
又、大気中に浮遊する微細な塵や油滴粒子が付着してガ
ラス表面を汚染したシ、特に自動車、航空機、鉄道車輛
のウィンドーにおいて雨水などの水滴が付着してガラス
の透明性あるいは透視性を阻害する。このため従来から
、ガラス表面を撥水性にするため、例えばシリコン系ワ
ックス、ボリア0キサンからなるシリコン油や界面活性
剤などを直接塗布する表面処理剤が提案されている。然
る如、これらは塗布に伴う前処1111゜
理を必要とされ2.ものが多く、且つ塗布時に発生する
塗布ムラ、あるいは処理剤自身のガラスへの接着性が低
いことによる長期の耐久性、並びに撥油性、耐汚染性忙
ついては満足し得る結果は得られていない。In addition, fine dust and oil droplets floating in the atmosphere may adhere to the glass surface and contaminate the glass surface, and water droplets such as rainwater may adhere to the windows of automobiles, aircraft, and railway vehicles, and the transparency or see-through of the glass may be affected. inhibit. For this reason, in order to make the glass surface water repellent, surface treatment agents have been proposed in which, for example, silicone waxes, silicone oils such as boria xane, surfactants, and the like are directly applied. As such, these require pretreatment prior to application.2. In addition, satisfactory results have not been obtained in terms of long-term durability, oil repellency, and stain resistance due to uneven coating that occurs during coating or the low adhesion of the treatment agent itself to glass.
本発明者は、前記の如き問題点の認識に基づいて、ガラ
ス表面に撥水性、撥油性、耐汚染性などを長期間にわた
って付与し得る優れたガラス表面の処理剤を提供すべく
種々研究、検討を重ねた結果、本発明を完成したもので
ある。Based on the recognition of the above-mentioned problems, the present inventor has conducted various studies in order to provide an excellent glass surface treatment agent that can impart water repellency, oil repellency, stain resistance, etc. to glass surfaces over a long period of time. As a result of repeated studies, the present invention was completed.
即ち、本発明者の研究忙よれば、ポリフルオロアルキル
基(以下、Rf基と略す)含有化合物において、Rf基
の臨界表面張力は20 dyn/cInと低く、水けも
とよシ油類のそれよシも低いため、ガラス表面をRf基
含有化合物で覆うと撥水撥油性を付与できること、さら
にRf基含有化合物をガラス表面へ強固に接着して撥水
撥油性表どを長期にわたシ付与するためにはガラス表面
の5iOHと反応する一3i−0−R,−5i−Hal
(Halはハロゲン)の存在が好ましく、−3i−0−
Rは水の存在で加水分解し、架橋反応を起こしガラス表
面の5iOHと反応して化学的に接着することから、R
f基含有化合物とシラン化合物との反応によって得られ
るRf基含有シラン化合物が優れていること、又、該R
f基含有シラン化合物と、あらかじめ水ガラスをプロト
ン酸の存在下で反応させた反応生成物とを混合すること
(でよ少耐久性が著るしく向上するという事実を見出し
た。−!た、が\る特定の表面処理剤の薄膜をガラス表
面に形成させると、ガラス表面の反射率を低下させるこ
とができ、その結果ガラスの透視性などの阻害要因を解
消可能であるという利点も発揮される。That is, according to the research carried out by the present inventor, in compounds containing polyfluoroalkyl groups (hereinafter abbreviated as Rf groups), the critical surface tension of Rf groups is as low as 20 dyn/cIn, and the critical surface tension of Rf groups is as low as 20 dyn/cIn. Since the resistance is even lower, coating the glass surface with an Rf group-containing compound can impart water and oil repellency, and furthermore, by firmly adhering the Rf group-containing compound to the glass surface, it is possible to maintain water and oil repellency over a long period of time. In order to give it, -3i-0-R, -5i-Hal which reacts with 5iOH on the glass surface.
(Hal is a halogen) is preferably present, -3i-0-
R hydrolyzes in the presence of water, causes a crosslinking reaction, and reacts with 5iOH on the glass surface to chemically adhere.
The Rf group-containing silane compound obtained by the reaction of the f group-containing compound and the silane compound is excellent, and the R
It has been discovered that durability can be significantly improved by mixing an f group-containing silane compound with a reaction product obtained by reacting water glass in the presence of a protonic acid. By forming a thin film of a specific surface treatment agent on the glass surface, it is possible to reduce the reflectance of the glass surface, and as a result, it has the advantage of being able to eliminate impeding factors such as the transparency of the glass. Ru.
かくして、本発明は前記知見に基づいて完成されたもの
であシ、Rf基含有シラン化合物又は該化合物の部分加
水分解縮合物と、あらかじめ水ガラスをプロトン酸の存
在下で反応せしめた反応生成物とからなる新規なガラス
表面の処理剤を提供するものである。Thus, the present invention has been completed based on the above findings, and provides a reaction product obtained by reacting an Rf group-containing silane compound or a partially hydrolyzed condensate of the compound with water glass in the presence of a protonic acid. The present invention provides a novel glass surface treatment agent comprising:
而して、本発明の表面処理剤は優れた撥水撥油性、耐汚
染性、低反射性を発揮するとともに1その性能を長期間
維持させ得るものである。Thus, the surface treatment agent of the present invention exhibits excellent water and oil repellency, stain resistance, and low reflectivity, and can maintain these properties for a long period of time.
本発明における処理剤はRf基含有シラン化合物又は該
化合物の部分加水分解綜合物と、あらかじめ水ガラスを
プロトン酸の存在下で反応せしめた反応生成物とからな
るが、好適な実施態様では、式(RfQ ) as i
(Z) bY4−a−bのRf基含有シラン化合物が
選定される。前記式において、Rt Iri炭素数4〜
16個のパーフルオロアルキル基あるいはエーテル結合
を1個以上含むく、特にmは2〜10の整数であること
が好ましい。Qは二価の有機基であり、2は炭素数1は
低級アルキル基であわ、Yは好ましくは−C1゜−Br
、 −oc’Hs、 −0C2H5,CH3COO−+
(4H5COO−が選定される。aは1〜3の整数で
あり、bは0又は1〜2の整数である。The treatment agent in the present invention is composed of an Rf group-containing silane compound or a partially hydrolyzed composite of the compound, and a reaction product obtained by reacting water glass in the presence of a protonic acid in advance. (RfQ) as i
(Z) An Rf group-containing silane compound bY4-a-b is selected. In the above formula, Rt Iri has 4 to 4 carbon atoms.
It is particularly preferable that m is an integer of 2 to 10, including one or more of 16 perfluoroalkyl groups or ether bonds. Q is a divalent organic group, 2 is a lower alkyl group with 1 carbon number, and Y is preferably -C1°-Br
, -oc'Hs, -0C2H5,CH3COO-+
(4H5COO- is selected. a is an integer of 1 to 3, and b is 0 or an integer of 1 to 2.
而して、前記式のRf基含有シラン化合物は種々の方法
あるいは経路で入手され得るが、例えば、RfQ化合物
とR8i Y3化合物との反応を含む工程によって合成
される。かかる合成反応は活性水素をもたない溶媒を使
用してもよく、反応温度は0〜150℃、反応時間は1
〜50時間で行われる。Thus, the Rf group-containing silane compound of the above formula can be obtained by various methods or routes, but is synthesized, for example, by a process involving reaction of an RfQ compound and an R8i Y3 compound. Such a synthetic reaction may use a solvent that does not have active hydrogen, the reaction temperature is 0 to 150°C, and the reaction time is 1.
Performed in ~50 hours.
本発明において、前記式のRf基含有シラン化合物とし
ては、例えば
RfCH2CH2SiC13,RfCH2C’!%5i
Br3+RfCH2CH2Si(OCzHs)3.
RfCHzCHz81Cb。In the present invention, examples of the Rf group-containing silane compound of the above formula include RfCH2CH2SiC13, RfCH2C'! %5i
Br3+RfCH2CH2Si(OCzHs)3.
RfCHzCHz81Cb.
CH3
(RfCHzCHz)s 5iC1,Rf(CH2CH
g)+ 5i(OCHs)z。CH3 (RfCHzCHz)s 5iC1, Rf(CH2CH
g) + 5i(OCHs)z.
Rf C0NHCH1CH2NHCHg C島CH2S
i C13。Rf C0NHCH1CH2NHCHg C island CH2S
iC13.
Rf CH2CH20CONHCH2CH2CH35i
C1s 。Rf CH2CH20CONHCH2CH2CH35i
C1s.
Rf CH2CH2NHCH2CH2Si C13H3
RfSO2NC穐CH2C0NHCH2CH2CH2S
i C13゜が挙げられる。Rf CH2CH2NHCH2CH2Si C13H3 RfSO2NC穐CH2C0NHCH2CH2CH2S
i C13° is mentioned.
水ガラスはJIS−に1408.に規定されるごくあシ
ふれたものでよく、8i02 /Nag○=0.5〜4
から選定され、例えば、メタけい酸ナトリウム(Nag
5ins )及び種々の割合の水和物、オルトけい酸
ナトリウム(Na4sto4 ) 、二けい酸ナトリウ
ム(Na2 Si205 )、 四けい酸ナトリウム(
Na2Si40g)が挙げられ、それぞれを単独又は混
合したものでもよい。Water glass is JIS-1408. 8i02/Nag○=0.5~4
For example, sodium metasilicate (Nag
5ins) and hydrates in various proportions, sodium orthosilicate (Na4sto4), sodium disilicate (Na2Si205), sodium tetrasilicate (
40g of Na2Si), and each may be used alone or in combination.
水ガラスと反応させるプロトン酸は、例えばH2SO4
,HCl、 HNO3,HClO4,H3PO4,HB
r、 HI。The protonic acid to be reacted with water glass is, for example, H2SO4
,HCl, HNO3,HClO4,H3PO4,HB
r, HI.
HIO2,CF2COOHが挙げられる。Examples include HIO2 and CF2COOH.
水ガラスをプロトン酸の存在下で反応させるには水ガラ
ス溶液及びプロトン酸溶液を非プロトン系水溶性溶媒、
例5..えばテトラヒドロフランに加え、室温にて1〜
10時間、好ましくは2〜5時間混合攪拌することKよ
シ行われる。水ガラスとプロトン酸の混合比率は両者m
ol / Lにおいて1:0.5〜10容量比であるの
が望ましい。反応終了後、好ましどはNaC1を加えて
二層に分離させることにより、非プロトン系水溶性溶媒
中に反応生成物が得られる。場合によっては反応生成物
を水溶性溶媒で抽出してもよい。To react water glass in the presence of protic acid, mix the water glass solution and protic acid solution with an aprotic water-soluble solvent,
Example 5. .. For example, in addition to tetrahydrofuran, 1~
The mixture is mixed and stirred for 10 hours, preferably 2 to 5 hours. The mixing ratio of water glass and protonic acid is m
A volume ratio of 1:0.5 to 10 in ol/L is desirable. After the reaction is completed, the reaction product is obtained in an aprotic water-soluble solvent, preferably by adding NaCl and separating into two layers. In some cases, the reaction product may be extracted with an aqueous solvent.
本発明の処理剤はRf基含有シラン化合物と、あらかじ
め水ガラスにプロトン酸を反応せしめた反応生成物とを
非プロトン酸系水溶性溶媒中で室温如て10分〜1時間
混合攪拌することによって得られる。Rf基含有シラン
化合物と、あらかじめ水ガラスをプロトン酸の存在下で
反応せしめた反応生成物の混合比率は1:0.1〜5重
量比から選定される。The treatment agent of the present invention is produced by mixing and stirring an Rf group-containing silane compound and a reaction product obtained by reacting water glass with a protic acid in advance at room temperature for 10 minutes to 1 hour in an aprotic acid water-soluble solvent. can get. The mixing ratio of the Rf group-containing silane compound and the reaction product obtained by reacting water glass in the presence of a protonic acid in advance is selected from a weight ratio of 1:0.1 to 5.
かくして得られる本発明の処理剤は、常法にのは非プロ
トン系水溶性溶剤の1種又は2種板チ溶液とするのが好
オしい。又、エアゾール型のものは、前記溶剤溶液にさ
らにエアゾール噴射剤を添加して適当な容器に、9項す
ればよい。The treatment agent of the present invention thus obtained is preferably prepared as a solution of one or two aprotic water-soluble solvents in a conventional manner. For an aerosol type, an aerosol propellant may be further added to the solvent solution, and the mixture may be placed in a suitable container as described in Section 9.
本発明のガラス表面の処理剤は被処理ガラス製品の形状
や前記調製形態に応じて任意の方法で被処理ガラス製品
に適用され得る。例えば、溶剤溶液型のものである場合
には、浸漬塗布、吹付けなどの如き被覆加工の既知の方
法によりガラス製品の表面に付着させる方法が採用され
得る。ガラス表面に付着後は100%相対湿度下、60
〜180℃の温度で1〜60分間処理を施こすのが好ま
しく、処理剤のガラス面への接着を強固なものとなし得
る。The glass surface treatment agent of the present invention can be applied to a glass product to be treated by any method depending on the shape of the glass product and the preparation form. For example, in the case of a solvent solution type, a method of adhering to the surface of the glass product by a known coating method such as dip coating or spraying may be employed. After adhering to the glass surface, under 100% relative humidity, 60
It is preferable to carry out the treatment at a temperature of 180° C. for 1 to 60 minutes, which can strengthen the adhesion of the treatment agent to the glass surface.
本発明の処理剤は他のRf基含有化合物、各種化合物、
その他のプレンダーなどを混合してもよく、さらに帯電
防止剤、架橋剤など適宜添加剤を添加して使用すること
も可能である。The processing agent of the present invention includes other Rf group-containing compounds, various compounds,
Other blenders may be mixed in, and additional additives such as antistatic agents and crosslinking agents may be added as appropriate.
本発明の表面処理剤で処理され得るガラス製−品は特に
限定されることなく種々の例が挙げられ、例えば、ガラ
ス板、鏡、ガラゝス容器、ガラス器具、メガネレンズな
どに適用され得る。Glass products that can be treated with the surface treatment agent of the present invention are not particularly limited, and include various examples, such as glass plates, mirrors, glass containers, glass appliances, and eyeglass lenses. .
本発明の処理剤の評価法は次の通シである。The evaluation method for the treatment agent of the present invention is as follows.
即ち、撥水性はガラス、表面上に水を置き接触角を測定
することによシ行い、撥油性は同様にヘキサデカンあ接
触角を測定することによシ行った。また、反射率は、正
反射光測定付属装置付323形(日立製作所社製の自動
記録分光光度計)を使用して、入射角5°で測定した。That is, water repellency was determined by placing water on the glass surface and measuring the contact angle, and oil repellency was similarly determined by measuring the contact angle of hexadecane. Further, the reflectance was measured at an incident angle of 5° using a model 323 (automatic recording spectrophotometer manufactured by Hitachi, Ltd.) equipped with a specular reflection light measurement accessory.
尚、塗膜の厚みは、”タリステップ” (Rank T
aylor+1obson社製)を使用し、針圧を測定
して求めた。In addition, the thickness of the coating film is "Talystep" (Rank T
aylor+1 (manufactured by Obson), and the needle pressure was measured.
次に本発明の実施例について、さらに具体的に説明する
が、この説明が本発明を限定するものでないことは勿論
である。Next, examples of the present invention will be described in more detail, but it goes without saying that this description does not limit the present invention.
合成例 1゜
CnF2n+I CH= CH2(nは6.8.1.0
.12の混合物であシ平均値は9.0’ ) 9□””
9.2 f ’(0,2モル)、(CHW2siHcl
1 s、 9 f (0,2モル)、H2PtCl4
・HzOO,052tを温度計、冷却管及び攪拌機を装
着した内容積200−の四ツロフラスコに入れ、乾燥窒
素気流下でゆっくシ攪拌しながら80℃で200時間反
応せた。反応終了後、蒸留することによシ反応生成物を
得た。反応生成物はガスクロマトグラフィー、IR,N
MRで分析するとCnF2n+□CH2CH2S i
(CH3)2’CI であり、それへの転化率は95
%であった。Synthesis example 1゜CnF2n+I CH= CH2 (n is 6.8.1.0
.. The average value for the mixture of 12 is 9.0') 9□""
9.2 f' (0,2 mol), (CHW2siHcl
1 s, 9 f (0,2 mol), H2PtCl4
- HzOO, 052 t was placed in a 200-volume four-tube flask equipped with a thermometer, cooling tube, and stirrer, and reacted at 80° C. for 200 hours while stirring slowly under a stream of dry nitrogen. After the reaction was completed, a reaction product was obtained by distillation. The reaction product was analyzed by gas chromatography, IR,N
When analyzed by MR, CnF2n+□CH2CH2S i
(CH3)2'CI and the conversion rate to it is 95
%Met.
合成例 2゜
CnF2n+、C00CH(CRs)z (nは6.
8.10.12の混合物であシ平均値は9.0)111
.2f(0,2モル)、H2N (CH2)a Si
(CH3)2 C130,3f(0,2モル)、乾燥テ
トラヒドロフラン1502を温度計、冷却管及び攪拌機
を装着した内容積500m7!の四ツロフラスコに入れ
、乾燥窒素気流下でゆつくシ攪拌しながら還流温度(約
60℃)で5時間反応させた。テトラヒドロフランを留
去し反応生成物を得た。反応生成物はガスクロマトグラ
フィー、IRXNMRで分析するとCnF2n+1CO
NH(CH2)3 Si (CHa)z C1であり、
それへの転化率は100係であった。Synthesis example 2°CnF2n+, C00CH(CRs)z (n is 6.
It is a mixture of 8.10.12 and the average value is 9.0)111
.. 2f (0.2 mol), H2N (CH2)a Si
(CH3)2 C130,3f (0.2 mol), dry tetrahydrofuran 1502 in an internal volume of 500 m7 equipped with a thermometer, cooling tube and stirrer! The mixture was placed in a four-piece flask, and reacted for 5 hours at reflux temperature (approximately 60° C.) with gentle stirring under a stream of dry nitrogen. Tetrahydrofuran was distilled off to obtain a reaction product. The reaction product was analyzed by gas chromatography and IRXNMR and was found to be CnF2n+1CO.
NH(CH2)3Si(CHa)zC1,
The conversion rate thereto was 100.
合成例3゜
(0,1モル)、H1’N (CHj)3 Si (O
C2H5)322.1 ?(0,1モル)、乾燥テトラ
ヒドロフラン1502を合成例2と同様の方法で反応さ
せ反応生成物を得た。反応生成物は、ガスクロマトグラ
フィー、IR,NMRで分析すると
であり、それへの転化率は100チであった。Synthesis example 3゜(0.1 mol), H1'N(CHj)3Si(O
C2H5)322.1? (0.1 mol) and dry tetrahydrofuran 1502 were reacted in the same manner as in Synthesis Example 2 to obtain a reaction product. The reaction product was analyzed by gas chromatography, IR, and NMR, and the conversion rate thereof was 100%.
実施例 1゜
二けい酸ナトリウム(Na2 Si205) 1モル
/lの水溶液25−1H2so、0.7モル/lの水溶
液50ffi7!、テトラヒドロフラン40−を攪拌機
全装着したフラスコに入れ、室温で4時間攪拌して反応
させた。反応終了後、NaC’120fを添加して液を
二層に分離させた。反応生成物が溶解しているテトラヒ
ドロフラン溶液を分取し、攪拌機を装着した1tの三ツ
ロフラスコに入れ、次に合成例1の反応生成物CnF’
2n+I c)I2CH25i(CH3)2 C11,
09F を添加して室温にて攪拌しながら30分間反
応させた。反応液にアセトン450−1水50−を加え
て溶剤溶液を調製した。Example 1゜Sodium disilicate (Na2Si205) 1 mol/l aqueous solution 25-1H2so, 0.7 mol/l aqueous solution 50ffi7! , tetrahydrofuran (40°C) was placed in a flask fully equipped with a stirrer, and the mixture was stirred at room temperature for 4 hours to react. After the reaction was completed, NaC'120f was added to separate the liquid into two layers. The tetrahydrofuran solution in which the reaction product was dissolved was separated and put into a 1 t Mitsuro flask equipped with a stirrer, and then the reaction product CnF' of Synthesis Example 1 was collected.
2n+I c) I2CH25i(CH3)2 C11,
09F was added, and the mixture was allowed to react for 30 minutes with stirring at room temperature. A solvent solution was prepared by adding 450 parts of acetone and 50 parts of water to the reaction solution.
別に、洗剤及びアセトンで洗浄し1チ塩酸溶液に浸漬後
、乾燥したガラス板(ンーダ石灰ガラス)を用意して、
表面に調製済みの溶剤溶液をアプリケーターで塗布し、
10011b相対湿度中、160℃、20分間キユアリ
ングした。この表面に水を滴下して水の接触角を、ヘキ
サデカンを滴下してヘキサデカンの接触角をそれぞれ測
定した。測定結果を第一1表に示す。Separately, prepare a glass plate (Nuda lime glass) that has been washed with detergent and acetone, immersed in 1T hydrochloric acid solution, and then dried.
Apply the prepared solvent solution to the surface with an applicator,
10011b Cured at 160° C. for 20 minutes in relative humidity. The contact angle of water was measured by dropping water on this surface, and the contact angle of hexadecane was measured by dropping hexadecane. The measurement results are shown in Table 11.
実施例2〜3
合成例2の反応生成物CnF2n+、C0NH(CH2
)s 5l(CH3)2C1141?又は合成例3の生
成物90fを用いた他は実施例1と同様の方法で溶剤溶
液を調製し、実施例1と同様の方法でガラス表面に塗布
、処理後、水及びヘキサデカンの接触角を測定した。測
定結果を第1表に示す。Examples 2-3 Reaction products of Synthesis Example 2 CnF2n+, C0NH(CH2
)s 5l(CH3)2C1141? Alternatively, a solvent solution was prepared in the same manner as in Example 1, except that the product 90f of Synthesis Example 3 was used, and after coating and treating the glass surface in the same manner as in Example 1, the contact angles of water and hexadecane were determined. It was measured. The measurement results are shown in Table 1.
比較例1〜3
合成例1〜6の反応生成物単独の溶剤溶液(20重量%
アセトン溶液)を調製し、実施例1と同様の方法でガラ
ス表面に塗布し、処理後、水及びヘキサデカンの接触角
を測定した。測定結果を第1表に示す。Comparative Examples 1 to 3 Solvent solutions of the reaction products of Synthesis Examples 1 to 6 alone (20% by weight)
Acetone solution) was prepared and applied to the glass surface in the same manner as in Example 1, and after treatment, the contact angles of water and hexadecane were measured. The measurement results are shown in Table 1.
第 1 表
実施例 4゜
実施例1における第1表記載の組成物5fを、トリクロ
ロトリフルオロエタン/アセトンの混合溶媒(3/1)
で稀釈して500tとし、溶剤溶液を調製した。別に洗
剤及びアセトンで洗浄し、1チ塩酸溶液に浸漬後乾燥し
たガラス板(ンーダ石灰ガラス)を用意した。このガラ
ス板を前記溶剤溶液中に浸漬し、引上速度50ctn/
分で引き上げ、160℃で1時間乾燥した。Table 1 Example 4゜Composition 5f described in Table 1 in Example 1 was mixed with a mixed solvent of trichlorotrifluoroethane/acetone (3/1).
The solution was diluted to 500 t to prepare a solvent solution. Separately, a glass plate (Nuda lime glass) was prepared which was washed with a detergent and acetone, immersed in a 1T hydrochloric acid solution, and then dried. This glass plate was immersed in the solvent solution, and the pulling rate was 50 ctn/
It was pulled up for 1 minute and dried at 160°C for 1 hour.
膜厚は0.1μであり、反射率は1.0%であった(光
の波長540mμ)。尚、未処理ガラス板の反射率は4
.2%であった。The film thickness was 0.1μ, and the reflectance was 1.0% (light wavelength 540mμ). The reflectance of the untreated glass plate is 4.
.. It was 2%.
実施例 5゜
実施例4において、実施例1の組成物の代シに実施−2
の組成物を使用した他は、同様に処理し、膜厚0.1μ
の薄膜をガラス板表面に形成した。反射率は1.1俤で
あった。Example 5 In Example 4, the composition of Example 1 was replaced with -2
Processing was performed in the same manner except that the composition of
A thin film of was formed on the surface of a glass plate. The reflectance was 1.1.
実施例6゜
実施例4において、実施例1の組成物の代シに実施例6
の組成物を使用した他は同様に処理したガラス板の反射
率は1.0俤であった。Example 6 In Example 4, Example 6 was substituted for the composition of Example 1.
The reflectance of a glass plate treated in the same manner except that the composition was used was 1.0.
実施例7〜8
水ガラス1号又は水ガラス3号を用いた他は実施例1と
同様の方法で溶剤溶液を調製し−、実施例1と同様の方
法で接触角を測定した。測定結果を第2表に示す。Examples 7 to 8 Solvent solutions were prepared in the same manner as in Example 1, except that Water Glass No. 1 or Water Glass No. 3 was used, and contact angles were measured in the same manner as in Example 1. The measurement results are shown in Table 2.
第 2 表
実施例 9〜11
プロトン酸をHCl + H3PO4’、 CF3 C
○○Hとした他は実施例1と同様の方法で溶剤溶液を調
製し、実施例1と同様の方法で接触角を測定した。測定
結果を第3表に示す。Table 2 Examples 9-11 Protonic acid HCl + H3PO4', CF3C
A solvent solution was prepared in the same manner as in Example 1, except that ○○H was used, and the contact angle was measured in the same manner as in Example 1. The measurement results are shown in Table 3.
第 3 表
Rf基含有シラン化合物を異にする他は実施例1と同様
の方法で溶剤溶液を調製し、実施例1と同様の方法で接
触1:角、・:鄭測定した。測定結果を第4表に示す。Table 3 A solvent solution was prepared in the same manner as in Example 1, except that the Rf group-containing silane compound was different, and contact 1: angle, .: Zheng measurement was performed in the same manner as in Example 1. The measurement results are shown in Table 4.
Claims (5)
は該化合物の部分加水分解縮合物と、あらかじめ水ガラ
スをプロトン酸の存在下で反応せしめた反応生成物とか
らなるガラス表面の処理剤。(1) A glass surface treatment agent comprising a polyfluoroalkyl group-containing silane compound or a partially hydrolyzed condensate of the compound and a reaction product obtained by reacting water glass in the presence of a protonic acid.
、式 %式% 〔但し、上記式において、Rfは炭素数4〜16個のポ
リフルオロアルキル基であってエーテゲン、アルコキシ
基、又はRCO〇−(Rは水素原子又は低級アルキル基
)、aは1〜3の整数、bは0又は1〜2の整数を示す
。〕で表わされる特許請求の範囲第1項記載の処理剤。(2) The polyfluoroalkyl group-containing silane compound has the formula % formula % [However, in the above formula, Rf is a polyfluoroalkyl group having 4 to 16 carbon atoms, and is an etegen, alkoxy group, or RCO〇-(R is a hydrogen atom or a lower alkyl group), a is an integer of 1 to 3, and b is an integer of 0 or 1 to 2. ] The processing agent according to claim 1.
ツバ−フルオロアルキル基である特許請求の範囲第1項
又は第2項記載の処理剤。(3) The processing agent according to claim 1 or 2, wherein the polyfluoroalkyl group is a fluoroalkyl group having 4 to 16 carbon atoms.
記載の処理剤。(4) The processing agent according to claim 1 or 2, wherein the polyfluoroalkyl group is an integer of 1 or more.
、あらかじめ水ガラスをプロトン酸の存在下で反応せし
めた反応生成物とが1:0.1〜5重量比である特許請
求の範囲第1項記載の処理剤。(5) The polyfluoroalkyl group-containing silane compound and the reaction product obtained by reacting water glass in the presence of a protonic acid in advance at a weight ratio of 1:0.1 to 5. Processing agent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5371882A JPS58172242A (en) | 1982-04-02 | 1982-04-02 | Treating agent for glass surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5371882A JPS58172242A (en) | 1982-04-02 | 1982-04-02 | Treating agent for glass surface |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58172242A true JPS58172242A (en) | 1983-10-11 |
Family
ID=12950602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5371882A Pending JPS58172242A (en) | 1982-04-02 | 1982-04-02 | Treating agent for glass surface |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58172242A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02311485A (en) * | 1989-05-26 | 1990-12-27 | Shin Etsu Chem Co Ltd | Fluorine-containing organosilicon compound and its production |
JPH0377893A (en) * | 1989-08-21 | 1991-04-03 | Shin Etsu Chem Co Ltd | Fluorine-containing cyclic organic silicon compound and its preparation |
JPH0377892A (en) * | 1989-08-21 | 1991-04-03 | Shin Etsu Chem Co Ltd | Fluorine-containing organic silicon compound and its preparation |
JPH0517489A (en) * | 1991-07-04 | 1993-01-26 | Shin Etsu Chem Co Ltd | Siloxane compound |
US5562952A (en) * | 1993-11-11 | 1996-10-08 | Nissin Electric Co., Ltd. | Plasma-CVD method and apparatus |
US6403225B1 (en) | 1998-11-10 | 2002-06-11 | Nissan Motor Co., Ltd. | Article superior in slipping waterdrops down surface thereof |
US6939613B2 (en) | 2002-03-18 | 2005-09-06 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
US7150917B2 (en) | 2002-08-02 | 2006-12-19 | Hoya Corporation | Optical member |
-
1982
- 1982-04-02 JP JP5371882A patent/JPS58172242A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02311485A (en) * | 1989-05-26 | 1990-12-27 | Shin Etsu Chem Co Ltd | Fluorine-containing organosilicon compound and its production |
JPH0377893A (en) * | 1989-08-21 | 1991-04-03 | Shin Etsu Chem Co Ltd | Fluorine-containing cyclic organic silicon compound and its preparation |
JPH0377892A (en) * | 1989-08-21 | 1991-04-03 | Shin Etsu Chem Co Ltd | Fluorine-containing organic silicon compound and its preparation |
JPH0517489A (en) * | 1991-07-04 | 1993-01-26 | Shin Etsu Chem Co Ltd | Siloxane compound |
US5562952A (en) * | 1993-11-11 | 1996-10-08 | Nissin Electric Co., Ltd. | Plasma-CVD method and apparatus |
US6403225B1 (en) | 1998-11-10 | 2002-06-11 | Nissan Motor Co., Ltd. | Article superior in slipping waterdrops down surface thereof |
US6939613B2 (en) | 2002-03-18 | 2005-09-06 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
US7150917B2 (en) | 2002-08-02 | 2006-12-19 | Hoya Corporation | Optical member |
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