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JPS58151487A - Tin electroplating bath made acidic with hydrochloric aicd - Google Patents

Tin electroplating bath made acidic with hydrochloric aicd

Info

Publication number
JPS58151487A
JPS58151487A JP3207082A JP3207082A JPS58151487A JP S58151487 A JPS58151487 A JP S58151487A JP 3207082 A JP3207082 A JP 3207082A JP 3207082 A JP3207082 A JP 3207082A JP S58151487 A JPS58151487 A JP S58151487A
Authority
JP
Japan
Prior art keywords
bath
hydrochloric acid
electrodeposited
plating
benzalacetone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3207082A
Other languages
Japanese (ja)
Other versions
JPH0120240B2 (en
Inventor
Shinichi Wakabayashi
信一 若林
Yoshie Hiraide
平出 よしえ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP3207082A priority Critical patent/JPS58151487A/en
Publication of JPS58151487A publication Critical patent/JPS58151487A/en
Publication of JPH0120240B2 publication Critical patent/JPH0120240B2/ja
Granted legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE:To provide a titled plating bath by which dense electrodeposited surfaces having good appearance are obtained under high-speed conditions, by adding an electrodeposited crystal control agent contg. alkylpyridinum salts and unsatd. carbonyl compds. in a basic plating soln. consisting esentially of stannous salt and hydrochloric acid. CONSTITUTION:An electrodeposited crystal control agent contg. alkylpyridinium salts such as laurylpyridinium chloride and unsatd. carbonyl compds. such as benzalacetone is added in a basic plating soln. consisting essentially of stannous salt such as stannous chloride and hydrochloric acid, whereby an acidic tin electroplating bath with hydrochloric acid which has low degrees of danger in operation, permits easy treatment of waste water, and by which dense and good electrodeposited surfaces are obtained without the formation of acicular crystals under high speed conditions such as high current density, high concn. of tin and high temp. is obtd. The laurylpyridinium chloride, etc. in the above- mentioned electrodeposited crystal control agent are enough at about 1-5g/l and the benzalacetone, etc. at about 0.01-0.1g/l in the acidic bath.

Description

【発明の詳細な説明】 本発明は塩酸酸性電気スズメッキ浴に関し、一層詳細に
は高電流密度、高スズ濃度、高温の高速度条件の下に針
状晶を生ずることなく良好な外観を有する電着面を得る
ことができる塩酸酸性電気スズメッキ浴に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a hydrochloric acid electrotin plating bath, and more particularly to a hydrochloric acid electrotin plating bath that has a good appearance without forming needles under conditions of high current density, high tin concentration, high temperature and high speed. This invention relates to a hydrochloric acid acidic electrolytic tin plating bath that can provide a deposited surface.

従来スズメッキ浴は硫酸浴、ホウフッ化浴の酸性浴、ま
たはスズ酸ナトリウム等のアルカリ浴に限られており、
ラックメッキおよびバレルメッキを中心に使用されてき
た。
Traditionally, tin plating baths have been limited to acidic baths such as sulfuric acid baths, borofluoride baths, or alkaline baths such as sodium stannate.
It has been mainly used for rack plating and barrel plating.

しかしながら、これらの浴は溶解できるスズ塩は金属ス
ズ濃度としてせいぜい30〜40 g /(程度が限界
であり高メッキ速度を得るうえて必要な高濃度が得られ
ない。また高速性のうえからは高温度で使用し、かつ−
4を必要とするが−に記の酸性浴は高温強dqの下では
2価のスズイオンが4価に酸化され、併せて沈殿物を生
成して浴寿命に達してしまう。一方、アルカリ浴の場合
には4価のスズイオンから還元電析を行うため、同一電
流密度でメッキを行うにしても必然的に酸性浴に比ベメ
ッキ速度が半減してしまい、高速浴として不向きである
。またホウフッ化浴は特殊な用途下ではl OOA /
 d mに近い高速性が得られているといわれるが、作
業者に対する安全性、フッ化物の排水処理に難点があり
、また種々の材料に対する腐食性が強く、メッキ装置の
材料選定が難しくなる等の欠点がある。
However, the tin salt that can be dissolved in these baths has a metal tin concentration of 30 to 40 g/(at most), which is the limit, and the high concentration necessary to obtain a high plating rate cannot be obtained. Use at high temperatures and -
However, in the acidic bath described in -, under high temperature and strong dq, divalent tin ions are oxidized to tetravalent tin ions, a precipitate is also formed, and the bath life is reached. On the other hand, in the case of an alkaline bath, reduction electrodeposition is performed from tetravalent tin ions, so even if plating is performed at the same current density, the plating speed is inevitably halved compared to an acidic bath, making it unsuitable as a high-speed bath. be. In addition, borofluoride baths can be used for special purposes.
Although it is said to have a high speed close to that of Dm, there are problems with worker safety and fluoride wastewater treatment, and it is highly corrosive to various materials, making it difficult to select materials for plating equipment. There are drawbacks.

発明者はこれら従来のスズメッキ浴のもつ難点に鑑み、
作業上の危険度が低く、排水処理も容易な塩酸浴を検討
することにした。しかるに従来塩酸酸性浴は電着面が粗
雑で針状晶が生じやすく、良好な外観を有する電着面を
得ることが困難であ −り工業的な実用域に達していな
かった。
In view of these drawbacks of conventional tin plating baths, the inventors
We decided to consider a hydrochloric acid bath, which is less dangerous during work and easier to treat wastewater. However, in the conventional hydrochloric acid acid bath, the electrodeposited surface was rough and acicular crystals were likely to form, and it was difficult to obtain an electrodeposited surface with a good appearance, so that it was not suitable for industrial use.

本発明の目的は作業上の危険度が低く、排水処理も容易
であるとともに、針状晶を生じることなd(密で良好な
外観を有する電着面を得ることができ、しかも高速化が
達成しつる塩酸酸性電気スズメッキ浴を提供することに
あり、その特徴とするところは、第1スズ−および塩酸
を主成分とする基本メッキ液に、塩化ラウリルピリジニ
ウム等のアルキルピリジニ゛ウム塩とベンザルアセトン
等の不飽和カルボニル化合物とを含む電析結晶調整剤を
添加したことにある。
The purpose of the present invention is to provide a method with low operational risk, easy wastewater treatment, and the ability to obtain an electrodeposited surface that is dense and has a good appearance without forming needle crystals. The objective is to provide a hydrochloric acid acidic electrolytic tin plating bath that achieves this goal by adding an alkylpyridinium salt such as laurylpyridinium chloride to a basic plating solution containing stannous tin and hydrochloric acid as main components. This is due to the addition of an electrodeposition crystal regulator containing an unsaturated carbonyl compound such as benzalacetone.

塩酸酸性浴において、塩化ラウリルピリジニウムはデン
ドライト状の析出を押え得る効果があり1〜5g/lの
範囲で充分な効果がある。しかしながら塩化ラウリルピ
リジニウムのみでは高速フローメッキを行う場合には、
電着面が黒みがかったざらざらした面しか得られず高速
化が淳成できない。ベンザルアセトンはこの高速フロー
メッキを可能にし、0.01 g /l〜0.1g/l
 の範囲・で充分なレベリング作業を奏する。
In a hydrochloric acid bath, laurylpyridinium chloride has the effect of suppressing dendrite-like precipitation, and a sufficient effect is obtained in the range of 1 to 5 g/l. However, when performing high-speed flow plating with only laurylpyridinium chloride,
Only a blackish and rough surface can be obtained on the electrodeposited surface, and high speed cannot be achieved. Benzalacetone enables this high-speed flow plating, ranging from 0.01 g/l to 0.1 g/l
Performs sufficient leveling work within the range of .

なおベンザルアセトンそのものは水に不溶であるため、
あらかじめ塩化ラウリルピリジニウム等の界面活性剤に
混合し溶解させたうえて使用する必要性がある。
Note that benzalacetone itself is insoluble in water, so
It is necessary to mix and dissolve it in a surfactant such as laurylpyridinium chloride before use.

ベンザルアセトン無添加浴(実施例1)とベンザルアセ
トン添加浴(実施例2)を以下番こ示す。
A benzalacetone-free bath (Example 1) and a benzalacetone-added bath (Example 2) are shown below.

実施例1 塩化第1スズ       70 g /L塩酸   
        0.5N 硫酸ヒドラジン      10 g 4塩化ラウリル
ピリジニウム  2g//!ジェット流の流速    
  3 m / B e にの浴のメッキ表面状態写真
を第1図に示す。
Example 1 Stannous chloride 70 g/L hydrochloric acid
0.5N hydrazine sulfate 10 g Laurylpyridinium tetrachloride 2 g //! jet flow velocity
A photograph of the plating surface condition in a bath of 3 m/B e is shown in FIG.

実施例2 塩化第1スズ       70g/ノ塩酸     
      0.5N 硫酸ヒドラジン      10g/l塩化ラウリルピ
リジニウム  2g/!ベンザルアセトン      
0.05g/lジェット流の流速      3’m/
secこの浴のメッキ表面状態写真を第2図シこ示す。
Example 2 Stannous chloride 70g/hydrochloric acid
0.5N hydrazine sulfate 10g/l laurylpyridinium chloride 2g/! benzalacetone
0.05g/l jet flow velocity 3'm/
Figure 2 shows a photograph of the plating surface condition of this bath.

第1図、第2図から明らかなようにベンザルアセトン無
添加浴はメッキ表面が粗くごつごつしているが、ベンザ
ルアセトン添加浴のメッキ表面は緻密で平滑であり、良
好な外観が得られる。
As is clear from Figures 1 and 2, the plating surface of the benzalacetone-free bath is rough and rugged, but the plating surface of the benzalacetone-added bath is dense and smooth, giving it a good appearance. .

硫酸ヒドラジンは高温(50°、60°C以上)下での
浴の安定化の効果を奏する。すなわち高温になるとスズ
が2価から4価に酸fbしてしまい、比重が下がってメ
ッキの密着性が悪くなるが、硫酸ヒドラジンは4価のス
ズを2価に還元する還元剤としての作用をするため浴の
安定化が図れる。
Hydrazine sulfate has the effect of stabilizing the bath at high temperatures (50°, 60°C or higher). In other words, at high temperatures, tin changes from divalent to tetravalent tin, lowering its specific gravity and impairing the adhesion of plating, but hydrazine sulfate acts as a reducing agent to reduce tetravalent tin to divalent tin. Therefore, the bath can be stabilized.

硫酸ヒドラジンの濃度は2〜50’g/lの範囲で効果
がある。なお硫酸ヒドラジンの他にハイドロキノン、次
亜リン酸、亜硫酸等の還元剤も浴の安定化に効果があり
□、これらを単独あるいは共存させて使用しうる。
Concentrations of hydrazine sulfate ranging from 2 to 50'g/l are effective. In addition to hydrazine sulfate, reducing agents such as hydroquinone, hypophosphorous acid, and sulfite are also effective in stabilizing the bath, and these may be used alone or in combination.

実施例3 塩化第1スズ       70g/l塩酸     
      0.5N 硫酸ヒドラジン       10g/ノ塩化ラウリル
ピラウリルピリジニウム 、、/lベンザルアセトン 
     0.05g//lト リ ト ン X−10
03’m  ノ/lジェット流の流速      3 
m / s e cただしトリトンX−100(商品名
):ホ。
Example 3 Stannous chloride 70g/l hydrochloric acid
0.5N hydrazine sulfate 10g/laurylpyraurylpyridinium chloride,,/l benzalacetone
0.05g//l Triton X-10
03'm/l jet flow velocity 3
m/sec However, Triton X-100 (trade name): E.

リエチレングリコールアルキルフエニルエーテル。Liethylene glycol alkyl phenyl ether.

この浴のメッキ表面状態写真を第3図Gこ示す。A photograph of the plating surface condition of this bath is shown in FIG. 3G.

また第4図にトリトンX−100の濃度をそオ゛1゜ぞ
れ1ml  /ノ、10mノ/ノGこした場合σつメッ
キ表面状態写真を示す。
Further, FIG. 4 shows photographs of the plating surface condition when the concentration of Triton X-100 is 1ml/g and 10m/g.

トリトンX−100は、塩化ラウリルビ1ノジニウムの
添加による液の黄色化、および長時間使用による液の濁
りを押さえ、浴を安定化し浴り命を伸ばす効果がある。
TRITON

さらにトリトンX−100は結晶の急激な成長を抑;l
Il]シ、メッキ速度σ)高速fL剤としての役割りも
奏し、表1に示す如く、添IJ11の有無により良好な
メッキ面を有する最高電流密度範囲が変化する。
Furthermore, Triton X-100 suppresses the rapid growth of crystals;
It also plays a role as a high-speed fL agent, and as shown in Table 1, the maximum current density range that provides a good plating surface changes depending on the presence or absence of additive IJ11.

表1 実施例4 塩化第1スズ       70g/を塩酸     
      0.5N ハイドロキノン        5g/ノ塩化ラウリル
ピリジニウム  2g/ノシンナムアルデヒド    
 0.05g/。
Table 1 Example 4 Stannous chloride 70g/hydrochloric acid
0.5N Hydroquinone 5g/Laurylpyridinium Nochloride 2g/Nocinnamaldehyde
0.05g/.

ツイーン80        3 m l /1ジェッ
ト流め流速      3 m / s e c浴温 
          。、o。
Tween 80 3 ml/1 Jet flow rate 3 m/sec Bath temperature
. ,o.

ツイーン80−(商品名):(ポリオキシェチレンソル
ビタンモ 本実施例6.おい、5□記実m% 3 (!: @ユ。
Tween 80- (Product Name): (Polyoxyethylene Sorbitanmo This Example 6. Hey, 5 □ Actual m% 3 (!: @Yu.

7ツキ速度、メ2キ外観が得られた。7 plating speed and 2-ply appearance were obtained.

以上のように本発明によれば、塩化ラウリルピリジニウ
ム、ベンザルアセトン等の電析結晶調整剤を添加するこ
とによって、従来粗雑な外観しが得られなかった塩酸酸
性スズメッキ浴においても平滑、かつ線審なメッキ表面
を高速で得ることができるという著効を奏する。
As described above, according to the present invention, by adding an electrodeposited crystal modifier such as laurylpyridinium chloride or benzalacetone, even in a hydrochloric acid acidic tin plating bath, where a rough appearance could not be obtained conventionally, smooth and line-deposited crystals can be obtained. It has the remarkable effect of being able to obtain a plated surface at high speed.

またメッキ浴中に金属スズとして30〜100g/〕と
従来より高濃度に溶解させることができ、しかも洛中の
スズイオンを2価から4価に酸化させることなく高温で
使用が可能で今り、さらにトリトンX−100,ツイー
ン80等のポリオキシエチレン系界面活性剤の添加によ
って50〜130A / dmxの高電流密度範囲を使
用できるから、従来のスズメッキ浴の電流密度範囲は高
速メッキ法を用いてもせいぜい10〜20 A / d
 m’であったことを考えるとメッキ時間はl/6以下
に短縮でキ、極めて短時間で行われるスポット銀メッキ
と同一のメツキラインに組込むことも可能となるなどの
著効を奏する。
In addition, metal tin can be dissolved in a plating bath at a higher concentration than before (30 to 100 g/), and it can be used at high temperatures without oxidizing tin ions from divalent to tetravalent. By adding polyoxyethylene surfactants such as Triton 10-20 A/d at most
Considering that the plating time was m', the plating time can be shortened to 1/6 or less, and it is possible to incorporate the method into the same plating line as spot silver plating, which is performed in an extremely short time.

なおまた本発明においては高速フローメッキの装置メッ
キば゛かりでなく、通常の浴メッキにおいてもl 5 
A / d’m程度の高電流密度を採用可能であり、や
はりメッキ時間を従来の1 / 6以下に短縮できる。
Furthermore, the present invention is applicable not only to high-speed flow plating equipment, but also to ordinary bath plating.
A high current density of about A/d'm can be adopted, and the plating time can also be shortened to 1/6 or less of the conventional plating time.

以上本発明につき好適な実施例を挙げて種々説明したが
、本発明は上記実施例に限定されるものではなく、例え
ば塩化鉛、塩化亜鉛等の他の金属塩を添加すればこれら
の合金浴としての機能もはたし得るなど発明の精神を逸
脱しない範囲内で多くの改変を施し得るのはもちろんの
ことである。
Although the present invention has been variously explained above with reference to preferred embodiments, the present invention is not limited to the above embodiments. For example, by adding other metal salts such as lead chloride and zinc chloride, these alloy baths It goes without saying that many modifications can be made without departing from the spirit of the invention, such as allowing it to function as a.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はベンザルアセトン無添加浴の、第2図、はベン
ザルアセトン添加済の、第3図はトリトンX−100の
添加済の、第4図はトリトンX−100の濃度を変化さ
せた場合の、それぞれメッキ表面状態を示すSEM写真
である。 特許出願人 新光電気工業株式会社 5 条、 ― 、二 C\ q、′ q\゛ 、ゝ ・ン 、\ 、ペ ミ \ 弧羽 、ゞ 1斗 6゜ 第3層 Pつ0rvXo 8’7倍
Figure 1 shows the bath without benzalacetone added, Figure 2 shows the bath with benzalacetone added, Figure 3 shows the bath with Triton X-100 added, and Figure 4 shows the bath with varying concentrations of Triton X-100. These are SEM photographs showing the plating surface condition in each case. Patent applicant Shinko Electric Industry Co., Ltd. Article 5, -, 2C\ q, ' q\゛, ゝ・n, \, Pemi\ Akuwa, ゞ1▗6゜3rd layer Ptsu0rvXo 8'7 times

Claims (1)

【特許請求の範囲】[Claims] 1o第1スズ塩および塩酸を主成分とする基本メッキ液
に、塩化ラウリルピリジニウム等のアルキルピリジニウ
ム塩とベンザルアセトン等の、不飽和カルボニル化合物
とを含む電析結晶調整剤を添加したことを特徴とする塩
酸酸性電気スズメッキ浴。
1o A deposited crystal modifier containing an alkylpyridinium salt such as laurylpyridinium chloride and an unsaturated carbonyl compound such as benzalacetone is added to a basic plating solution containing stannous salt and hydrochloric acid as main components. Hydrochloric acid acid electrolytic tin plating bath.
JP3207082A 1982-03-01 1982-03-01 Tin electroplating bath made acidic with hydrochloric aicd Granted JPS58151487A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3207082A JPS58151487A (en) 1982-03-01 1982-03-01 Tin electroplating bath made acidic with hydrochloric aicd

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3207082A JPS58151487A (en) 1982-03-01 1982-03-01 Tin electroplating bath made acidic with hydrochloric aicd

Publications (2)

Publication Number Publication Date
JPS58151487A true JPS58151487A (en) 1983-09-08
JPH0120240B2 JPH0120240B2 (en) 1989-04-14

Family

ID=12348612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3207082A Granted JPS58151487A (en) 1982-03-01 1982-03-01 Tin electroplating bath made acidic with hydrochloric aicd

Country Status (1)

Country Link
JP (1) JPS58151487A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106222710A (en) * 2016-08-29 2016-12-14 昆明理工大学 A kind of acid half bright tin plating solution and preparation method thereof
CN109652828A (en) * 2019-02-26 2019-04-19 中南大学 A kind of pcb board is tin plating-move back tin system and application method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106222710A (en) * 2016-08-29 2016-12-14 昆明理工大学 A kind of acid half bright tin plating solution and preparation method thereof
CN109652828A (en) * 2019-02-26 2019-04-19 中南大学 A kind of pcb board is tin plating-move back tin system and application method
CN109652828B (en) * 2019-02-26 2020-05-05 中南大学 Tin plating-stripping system for PCB and application method

Also Published As

Publication number Publication date
JPH0120240B2 (en) 1989-04-14

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