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JPS58139495A - Printed circuit board - Google Patents

Printed circuit board

Info

Publication number
JPS58139495A
JPS58139495A JP867182A JP867182A JPS58139495A JP S58139495 A JPS58139495 A JP S58139495A JP 867182 A JP867182 A JP 867182A JP 867182 A JP867182 A JP 867182A JP S58139495 A JPS58139495 A JP S58139495A
Authority
JP
Japan
Prior art keywords
thin film
base material
pattern
printed circuit
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP867182A
Other languages
Japanese (ja)
Inventor
茂生 戸田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suwa Seikosha KK
Original Assignee
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suwa Seikosha KK filed Critical Suwa Seikosha KK
Priority to JP867182A priority Critical patent/JPS58139495A/en
Publication of JPS58139495A publication Critical patent/JPS58139495A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明はプ11ント配線叛の導体パターンの構造に隣す
るものでTo#)、更にドしくけ光al性無電解メツか
に工り形成される(し下、フルアディティブ法と紀す・
)導体パターンC以下、パターンと紀す、)の構造に関
するもので6る・従来のフ九丁デイテイブ法にニジ形成
されるノ(ターンの構造に主に以下に配す五つな二m拳
のものがある。すなわち、第一として第1図に示すよう
に絶縁基材1のlI!面にニッケル薄膜21−設けたも
の、第二として第2図に示すように絶縁基材1の表面に
銅薄膜2を設けた本のである・前者灯、金属薄膜と絶縁
基材の間の密着瞳に優れているがパターンの解gI[が
絶縁基材の費il′l状枠に大会〈影響され、パターン
闇にり一々か生じやすいため%に細密なパターンを必曹
とするプIIント配ll1iに適用で舞ないという欠廓
がある・tた後者灯、パターンの解俸Wlニ優れている
が、金属薄膜と絶−基材の間の密着I!I−が低(、絶
縁基材の勇面歓−に工6111[のパラツdPが大食い
、また銅薄膜の厚みが増加すふにつれて銅薄膜と絶縁基
材の関にガヌがたまり、いわゆるふくれが多発し最終的
に鍵薄膜の破れにまで至ゐという欠点−AXある。
DETAILED DESCRIPTION OF THE INVENTION The present invention is adjacent to the structure of the conductor pattern of the printed wiring board (To#), and is further formed by a dosing, luminescent, electroless metal molding process. Full additive method and knowledge
) Concerning the structure of the conductor pattern C (hereinafter referred to as pattern), 6. The five two-meter fists that are formed in the conventional Fukucho date method (the five two-meter fists arranged mainly below in the turn structure) Firstly, as shown in FIG. 1, a nickel thin film 21 is provided on the lI! surface of the insulating base material 1, and secondly, as shown in FIG. The former lamp has excellent close contact between the metal thin film and the insulating base material, but the pattern solution gI [but the cost of the insulating base material does not affect the shape of the frame]. However, since pattern darkness tends to occur one by one, there is a drawback that it cannot be applied to printer layouts that require very detailed patterns. However, the adhesion I!I- between the metal thin film and the insulating base material is low (the thickness of the copper thin film increases, and the thickness of the copper thin film increases). As the process progresses, gunk accumulates between the copper thin film and the insulating base material, causing frequent so-called blistering, which eventually leads to the key thin film breaking - AX.

本発明にかかる欠点を除去したもので、その目的はフル
アディティブ法に1り形成される導体パターンの解11
[が優れ、η・つ絶縁基材との閣の智着彊屓を充分に大
きくすることにある・なお本−一に適用できる絶縁基材
としてに、ガラスーエポキシ基管、紙−フエノール基管
、プラスチツタフィルム、狭面fll!lit処理した
金′141/Ilなど一般のプリント配5III7Iに
適用される全ての基材が上げられゐ・ 以下実施−に従って本命−を詳しく説明する・〈実織−
〉 本apt−zフルアディティブ法にニジ形成される金属
薄膜でニッケル薄膜の密着強度と銅薄膜のパターン解g
IIIfに着目している〇 第5図に示すLうにガラス−エポキシ基1#1(ム)會
塩什スズ(4)水溶酔(濃度1g@rl)41(浸漬し
て表面にスス0[)イオン層2を設け* (B)・これ
にフォトマスクSを重ねて紫外線露資し光照射部分をス
:R(転)イオンとし7?: (c)、これを塩化パラ
ジウム(船水溶11 (il[2g @/−1)に浸漬
してパラジウム@媒核4を形威しφ)ホルムアルデヒド
系の還元剤含有のアルカリ性無電解鋼メッキ諦に浸漬さ
せ厚さ5〜toosmli!駅の銅パターン5を形威し
九01)・これを塩化パラジウム0[)水溶液(濃[2
g・/ ”)に浸漬して銅の表面にパラジウム@媒核4
を形成した後便)、次亜リン酸系の還元剤を含む無璽解
ニッケルメッキ渉中に浸漬して銅の弐面にニッケル7を
析出させた(G)・なお、ここで−薄膜の厚みを5〜1
00雪と限?したのけ、5w以下であるとパターンが光
分に解倫で舞ずパターン切れが生じてしまい、1θO−
以上であると先述のふくれが生じ申すくまたニッケル層
を形成しても密着強度の向上がみられないことによる・
本実織−によるト銅−ニッケル層とガラス−エポキシ基
管の間の密着強度は平均t8麺e51″″lであシ、規
格のa8麺・am″″1をけるかに上回シ、従来のガラ
ス−エポキシ基管と鋼のみの密着強度平均17 Kg−
ox″″富よシも太きく向上がみられた・またパターン
解會度は銅のみのパターン形成と同様の最低30μ臘ま
で可能であった・ 以上のように本発明によれば解像度の優れ良細密で基材
との密着性の強いプIIント配線蓼の製造を可能にする
ことができる◎なお本命−が応用できるガとしては、ウ
ォッチ、電卓、カメラ、コンピュータなどの様々な電子
機器中寂電用品の回瞥基aS上げられる。
This invention eliminates the drawbacks of the present invention, and its purpose is to improve the solution of conductive patterns formed by the fully additive method.
The purpose of this article is to sufficiently increase the degree of interaction with the insulating base material.In addition, glass-epoxy base tube, paper-phenol base material, which can be applied to this article, are Tube, plastic ivy film, narrow side full! All the base materials applied to general print layouts 5III7I, such as lit-treated gold '141/Il, are listed below.
〉 Adhesion strength of nickel thin film and pattern resolution of copper thin film in metal thin film formed by this apt-z fully additive method
Focusing on IIIf 〇L shown in Figure 5 Sea urchin glass-epoxy group 1 #1 (mu) Salt tin (4) Water soluble (concentration 1 g @ rl) 41 (soot on the surface after immersion 0 [) An ion layer 2 is provided* (B) - A photomask S is placed on top of this and exposed to ultraviolet rays, and the irradiated area becomes S:R (trans) ions.7? (c), This was immersed in palladium chloride (11 (il[2 g @/-1) to form palladium @ medium nucleus 4), and was then plated on alkaline electroless steel containing a formaldehyde-based reducing agent. Soak it to a thickness of 5~toosmli! Shape the copper pattern 5 of the station 901) and add it to a palladium chloride 0 [) aqueous solution (concentrated [2
palladium @ medium nucleus 4 on the copper surface by immersing it in
(G), nickel 7 was deposited on the second side of the copper by immersing it in an unsealed nickel plating solution containing a hypophosphorous acid-based reducing agent (G). 5 to 1
00 snow and limited? However, if it is less than 5W, the pattern will not dance to the light and the pattern will break, resulting in 1θO-
If this is the case, the blistering described above will occur, and even if a nickel layer is formed, no improvement in adhesion strength will be observed.
The adhesion strength between the copper-nickel layer and the glass-epoxy base tube by this actual weaving is on average T8 noodles e51""l, far exceeding the standard A8 noodles am""1, Average adhesion strength between conventional glass-epoxy base tube and steel only: 17 kg-
A significant improvement was observed in ox"" wealth. Also, pattern resolution was possible down to a minimum of 30μ, which is the same as pattern formation using only copper.As described above, the present invention has excellent resolution. It makes it possible to manufacture printed circuit boards with high precision and strong adhesion to the base material.The main application is in various electronic devices such as watches, calculators, cameras, and computers. Jakuden supplies circular aS has been raised.

【図面の簡単な説明】[Brief explanation of the drawing]

! 111tjフルアデイ予イブ沫によシ飴鋒基村上に
ニッケル11勝のパターンを」成し7六4t>の断謬図
、第2図打フルアデイ千イブ法により絶緩基材上に−*
*のパターンを形成したものの断W図・第5IltjA
〜Gけ本W−プリントIP曽蓼の一造工lj!身びa#
jy来膨の蒙1図、蒙21との片較を示−t−IF断謬
である。 以上 出−人 株を会社 −訪精工◆ 伏テ人 弁理士 最上  務 手続補正書(自発) 昭和5g年3 月31日 特許庁長官殿 1、事件の表示 昭和57年特許願第 8671号 2、発明の名称 プリント配S* 3、補正をする者 事件との関係 出願人 1、 4粁請求の範囲を別紙の如く補正する。 2、 明細1#5頁12行目 「表面にスス(1)イオン層2」とあるt「表面にスズ
璽イオン層2」に補正する。 五 明細書 4頁4行目 「5〜100編と限定したのは、5mm以下でるると」
とめるを 「5〜1100nと限定したのは%5nm以下で6ろと
」に補正する。 屯 明細書 4頁6行目 「100II8以上であると」とあるt「100nJn
以よで6ると」に補正する。 以上 %tfl求のm囲 光選択性無電解メッキで導体パターンを形成して製造さ
れるプリント配線機において、光選択性無電解メッキに
19絶縁基材上に形成される導体パターンが厚さ5〜1
100nの馳−の鋼博展、その表面にニッケル薄膜とい
う二層構造を有していることt特徴とす、るプリント配
置載 443
! 111tj full day pre-event method, Ame Feng Motoki Murakami made a pattern of 11 nickel wins, 764t> fault diagram, figure 2, full day 1,000-day method on a super soft base material-*
*Cross-sectional diagram of the pattern formed 5th IltjA
~G Kemoto W-Print IP Sotai's Ichizukou lj! body a#
Figure 1 and Figure 21 of the expansion of JY are shown as a partial comparison with the t-IF error. The above-mentioned person shares the company - Visit Seiko ◆ Patent attorney Mogami Written amendment of administrative procedures (voluntary) March 31, 1950 To the Commissioner of the Japan Patent Office 1, Indication of the case Patent Application No. 8671 of 1986 2, Name of the invention Print S* 3. Person making the amendment Relationship to the case Applicants 1 and 4 amend the scope of the claims as shown in the attached sheet. 2. Specification 1#5, line 12, ``Soot (1) ion layer 2 on the surface'' is corrected to ``Tin seal ion layer 2 on the surface.'' 5. Specification, page 4, line 4, “Limited to 5 to 100 pieces when the size is 5 mm or less.”
The limit is corrected to ``5 to 1100n, but %5nm or less is 6.'' Tun Specification, page 4, line 6, it says “100II8 or more” t “100nJn
Corrected to ``Moyo de 6 Toto''. In a printed wiring machine manufactured by forming a conductor pattern using photo-selective electroless plating, the conductor pattern formed on the insulating base material has a thickness of 5 m or more. ~1
100n long steel exhibition, printed layout 443 featuring a two-layered structure with a thin nickel film on its surface.

Claims (1)

【特許請求の範囲】[Claims] 資選折性無雪解メッキで導体パターンを形成して製造さ
れるプ11ント配線蓼において讐實選折性無電解メッキ
にエフ艶縁基材上に形成される導体パターンが厚さ5〜
100−のsi+の銅薄膜、その表面にニッケル薄膜と
いう二層構造を膚していることt%徴とするプリント配
線管〇
In printed circuit boards manufactured by forming a conductor pattern using selective foldable electroless plating, the conductor pattern formed on the F gloss base material using selective foldable electroless plating has a thickness of 5~
Printed wiring tube characterized by a two-layer structure consisting of a 100-si+ copper thin film and a nickel thin film on its surface.
JP867182A 1982-01-22 1982-01-22 Printed circuit board Pending JPS58139495A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP867182A JPS58139495A (en) 1982-01-22 1982-01-22 Printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP867182A JPS58139495A (en) 1982-01-22 1982-01-22 Printed circuit board

Publications (1)

Publication Number Publication Date
JPS58139495A true JPS58139495A (en) 1983-08-18

Family

ID=11699391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP867182A Pending JPS58139495A (en) 1982-01-22 1982-01-22 Printed circuit board

Country Status (1)

Country Link
JP (1) JPS58139495A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63159410A (en) * 1986-11-07 1988-07-02 モンサント カンパニー Selective catalytic activation of polymer film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63159410A (en) * 1986-11-07 1988-07-02 モンサント カンパニー Selective catalytic activation of polymer film

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