JPS5742042A - Heat development type diazo copying material - Google Patents
Heat development type diazo copying materialInfo
- Publication number
- JPS5742042A JPS5742042A JP11794180A JP11794180A JPS5742042A JP S5742042 A JPS5742042 A JP S5742042A JP 11794180 A JP11794180 A JP 11794180A JP 11794180 A JP11794180 A JP 11794180A JP S5742042 A JPS5742042 A JP S5742042A
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- copying material
- specified
- formula
- color developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
PURPOSE:To obtain a copying material developable at a low temp., having high raw stock preservability and giving a high density image by forming a photosensitive layer contg. a specified diazo compound, a specified coupling component and a specified color developing aid as principal components. CONSTITUTION:A dispersion contg. a diazo compound represented by the formula [where R is 1-5C alkyl, each of R1 and R2 is (substituted) alkyl, oxyalkyl, aralkyl or cycloalkyl, R1 and R2 may bond to each other to form a heterocyclic ring together with N, and X is an anion], a coupling component such as 3-hydroxyphenylurea having <=0.1% solubility in water at <=20 deg.C and about 0.1-10mum grain size, and fatty acid amide represented by formula R2CONH2 (where R2 is 5-24C satd. or unsatd. alkyl) as a color developing aid is applied to a support such as paper or a plastic film and dried to obtain a copying material. An original is superposed on the material and exposed to ultraviolet rays. The materials is then developed at a low temp. such as about 90-130 deg.C to obtain a high density image.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11794180A JPS5742042A (en) | 1980-08-27 | 1980-08-27 | Heat development type diazo copying material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11794180A JPS5742042A (en) | 1980-08-27 | 1980-08-27 | Heat development type diazo copying material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5742042A true JPS5742042A (en) | 1982-03-09 |
Family
ID=14724005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11794180A Pending JPS5742042A (en) | 1980-08-27 | 1980-08-27 | Heat development type diazo copying material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5742042A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0440454A (en) * | 1990-06-06 | 1992-02-10 | Fuji Photo Film Co Ltd | Resist pattern forming method |
US5691099A (en) * | 1994-09-22 | 1997-11-25 | Ricoh Company, Ltd. | Thermal developing type diazo copying material utilizing water soluble quanidine salt |
-
1980
- 1980-08-27 JP JP11794180A patent/JPS5742042A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0440454A (en) * | 1990-06-06 | 1992-02-10 | Fuji Photo Film Co Ltd | Resist pattern forming method |
JP2611031B2 (en) * | 1990-06-06 | 1997-05-21 | 富士写真フイルム株式会社 | Method of forming resist pattern |
US5691099A (en) * | 1994-09-22 | 1997-11-25 | Ricoh Company, Ltd. | Thermal developing type diazo copying material utilizing water soluble quanidine salt |
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