JPH0440454A - Resist pattern forming method - Google Patents
Resist pattern forming methodInfo
- Publication number
- JPH0440454A JPH0440454A JP2147637A JP14763790A JPH0440454A JP H0440454 A JPH0440454 A JP H0440454A JP 2147637 A JP2147637 A JP 2147637A JP 14763790 A JP14763790 A JP 14763790A JP H0440454 A JPH0440454 A JP H0440454A
- Authority
- JP
- Japan
- Prior art keywords
- color
- compounds
- recording material
- heat
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 27
- 239000000463 material Substances 0.000 claims abstract description 34
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- 239000000758 substrate Substances 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 abstract description 18
- 150000008049 diazo compounds Chemical class 0.000 abstract description 16
- 239000002243 precursor Substances 0.000 abstract description 11
- 239000002253 acid Substances 0.000 abstract description 5
- 239000003795 chemical substances by application Substances 0.000 abstract description 4
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 abstract description 2
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- -1 spiropyrans Chemical class 0.000 description 30
- 238000000576 coating method Methods 0.000 description 21
- 125000000217 alkyl group Chemical group 0.000 description 20
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- 125000004432 carbon atom Chemical group C* 0.000 description 11
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- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229920002396 Polyurea Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
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- 238000005530 etching Methods 0.000 description 3
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- 229910052751 metal Inorganic materials 0.000 description 3
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- 238000002360 preparation method Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- QNLZIZAQLLYXTC-UHFFFAOYSA-N 1,2-dimethylnaphthalene Chemical compound C1=CC=CC2=C(C)C(C)=CC=C21 QNLZIZAQLLYXTC-UHFFFAOYSA-N 0.000 description 2
- PLLCCSYEGQDAIW-UHFFFAOYSA-N 5-ethyl-1,6-dimethyl-5-phenylcyclohexa-1,3-diene Chemical compound C=1C=CC=CC=1C1(CC)C=CC=C(C)C1C PLLCCSYEGQDAIW-UHFFFAOYSA-N 0.000 description 2
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- JKRZOJADNVOXPM-UHFFFAOYSA-N Oxalic acid dibutyl ester Chemical compound CCCCOC(=O)C(=O)OCCCC JKRZOJADNVOXPM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 2
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000007754 air knife coating Methods 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- SESFRYSPDFLNCH-UHFFFAOYSA-N benzyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1=CC=CC=C1 SESFRYSPDFLNCH-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 238000003851 corona treatment Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
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- 238000003618 dip coating Methods 0.000 description 2
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- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
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- 238000007756 gravure coating Methods 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- WRKCIHRWQZQBOL-UHFFFAOYSA-N octyl dihydrogen phosphate Chemical compound CCCCCCCCOP(O)(O)=O WRKCIHRWQZQBOL-UHFFFAOYSA-N 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 229920003169 water-soluble polymer Polymers 0.000 description 2
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 1
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Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はレジストパターンの形成方法に関し、特にプリ
ント基板作製時に使用するフォトマスクフィルムとして
透明感熱記録材料を使用するレジストパターンの形成方
法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for forming a resist pattern, and more particularly to a method for forming a resist pattern using a transparent heat-sensitive recording material as a photomask film used in producing a printed circuit board.
(従来の技術)
基板上に感光性樹脂層を設け、該層上に回路パターンを
有するフォトマスクを通して露光現像及びエツチング処
理等を行うことによりプリント基板を作製する方法は良
く知られている。この場合に使用するフォトマスクを製
造する方法としては写真の原理を用いた方法が一般的で
ある。すなわち、回路パターンの原画を形成し、この原
画をマスクの本体であるフィルムに結像させ、露光する
。(Prior Art) A method of manufacturing a printed circuit board is well known by providing a photosensitive resin layer on a substrate and performing exposure, development, etching, etc. through a photomask having a circuit pattern on the layer. As a method for manufacturing a photomask used in this case, a method using the principles of photography is generally used. That is, an original image of the circuit pattern is formed, an image of this original image is formed on a film that is the main body of the mask, and the image is exposed.
その後、露光済みのフィルムを現像し、これを定着する
という過程を経て最終的にマスクが形成される。After that, the exposed film is developed and fixed, and a mask is finally formed.
(発明が解決しようとする課題)
しかしながら、上記フォトマスクの作製は露光現像に時
間、手間がかかる上、湿式処理である為作業環境に問題
があるのみならず、CAD等のデジタル信号から直接パ
ターンを形成する事ができないという欠点があった。(Problems to be Solved by the Invention) However, the production of the above-mentioned photomask not only requires time and effort for exposure and development, but also has problems in the working environment because it is a wet process. The disadvantage was that it was not possible to form
係る欠点は加熱後の急冷又は徐冷によって夫々光透過率
が低下又は向上する熱反応部材と熱吸収率に優れた透明
な熱吸収部材を一体的に形成せしめた光マスク材料(特
開昭63−177138号)によって解決され得るが、
係る材料は感度の点及び画像持続時間の点で難点があっ
た。Such drawbacks can be solved by the use of optical mask materials (JP-A-63), which are made by integrally forming a heat-reactive member whose light transmittance decreases or increases by rapid cooling or slow cooling after heating, and a transparent heat-absorbing member with excellent heat absorption rate. -177138), but
Such materials suffer from drawbacks in terms of sensitivity and image duration.
本発明者等は上記の欠点を解決すべく鋭意検討した結果
、透明性に優れた感熱記録材料がフォトマスクフィルム
の代わりになり得ること、又、それを用いることにより
、フォトマスクの作製工程をすべて乾式で行うことが可
能となる上デジタル信号を用いて直接パターンを形成す
ることができるので、レジストパターン作成工程を大巾
に改善することができ、回路の設計から最終のプリント
基板迄を一貫工程とすることもできることを見出し本発
明に到達した。As a result of intensive studies to solve the above-mentioned drawbacks, the present inventors have found that a heat-sensitive recording material with excellent transparency can be used in place of a photomask film, and that by using it, the photomask manufacturing process can be improved. Since everything can be done dry, and patterns can be formed directly using digital signals, the resist pattern creation process can be greatly improved, and the process from circuit design to the final printed circuit board can be integrated. The present invention was achieved by discovering that it can also be done as a process.
従って本発明の第1の目的は、改善されたレジストパタ
ーン形成方法を提供することにある。Accordingly, a first object of the present invention is to provide an improved method of forming resist patterns.
本発明の第2の目的は、フォトマスク作製時の湿式処理
が不要であると共に、デジタル信号を用いて作製するこ
とのできるフォトマスクフィルムを提供することにある
。A second object of the present invention is to provide a photomask film that does not require wet processing when producing a photomask and can be produced using digital signals.
(課題を解決するための手段)
本発明の上記の諸口的はプリント基板用基板上に感光性
樹脂層を形成せしめた後、該樹脂層上にフォトマスクフ
ィルムを載置して露光、現像するレジストパターンの形
成方法において、前記フォトマスクフィルムが加熱によ
り発色画像を形成せしめた透明感熱記録材料であること
を特徴とするレジストパターンの形成方法によって達成
された。(Means for Solving the Problems) The above aspects of the present invention include forming a photosensitive resin layer on a printed circuit board substrate, and then placing a photomask film on the resin layer, exposing it to light, and developing it. The present invention has been achieved by a method for forming a resist pattern, characterized in that the photomask film is a transparent heat-sensitive recording material on which a colored image is formed by heating.
本発明で使用する透明感熱記録材料は、透明支持体上に
加熱により発色する透明感熱層を有する記録材料である
。The transparent heat-sensitive recording material used in the present invention is a recording material that has a transparent heat-sensitive layer on a transparent support that develops color when heated.
本発明においては、加熱により発色する発色剤として電
子供与性染料前駆体と顕色剤の組合せ又はジアゾ化合物
とカプラーの組合せを使用することができる。In the present invention, a combination of an electron-donating dye precursor and a color developer or a combination of a diazo compound and a coupler can be used as a coloring agent that develops color upon heating.
本発明で使用する電子供与性染料前駆体としては、電子
を供与して、又は酸等のプロトンを受容して発色する公
知の化合物の中から無色又は淡色のものを適宜選択する
。このような化合物は、ラクトン、ラクタム、サルトン
、スピロピラン、エステル、アミド等の部分骨格を有し
、顕色剤と接触してこれらの部分骨格が開環若しくは開
裂するものであり、好ましい化合物としては、例えばト
リアリールメタン系化合物、ジフェニルメタン系化合物
、キサンチン系化合物、チアジン系化合物、スピロピラ
ン系化合物等を挙げることができる。As the electron-donating dye precursor used in the present invention, a colorless or light-colored one is appropriately selected from known compounds that develop color by donating electrons or accepting protons such as acids. Such compounds have partial skeletons such as lactones, lactams, sultones, spiropyrans, esters, and amides, and these partial skeletons are ring-opened or cleaved upon contact with a color developer. Preferred compounds include Examples include triarylmethane compounds, diphenylmethane compounds, xanthine compounds, thiazine compounds, and spiropyran compounds.
特に好ましい化合物は、次の一般式で表わされる化合物
である。Particularly preferred compounds are those represented by the following general formula.
式中、R1は炭素原子数1〜8のアルキル基、R2は炭
素原子数4〜I8のアルキル基又はアルコキシル基若し
くはテトラヒドロフルフリル基、R3は水素原子又は炭
素原子数1〜15のアルキル基若しくはハロゲン原子、
R4は炭素数6〜20の置換又は無置換のアリール基を
表わす。R4の置換基としては、炭素原子数1〜5のア
ルキル基、アルコキシ基、ハロゲン化アルキル基及びハ
ロゲン原子が好ましい。In the formula, R1 is an alkyl group having 1 to 8 carbon atoms, R2 is an alkyl group having 4 to 18 carbon atoms, an alkoxyl group, or a tetrahydrofurfuryl group, and R3 is a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or halogen atom,
R4 represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms. As the substituent for R4, an alkyl group having 1 to 5 carbon atoms, an alkoxy group, a halogenated alkyl group, and a halogen atom are preferable.
本発明で使用するところの電子供与性染料前駆体との熱
溶融において発色反応を起こす顕色剤は公知のものの中
から適宜使用することができる。The color developer that causes a color-forming reaction upon thermal melting with the electron-donating dye precursor used in the present invention can be appropriately used from among known color developers.
例えば、ロイコ染料に対する顕色剤としては、フェノー
ル化合物、トリフェニルメタン系化合物、含硫フェノー
ル系化合物、カルボン酸系化合物、スルホン系化合物、
尿素系又はチオ尿素系化合物等が挙げられ、その詳細は
、例えば、紙バルブ技術タイムス(1985年)49−
54頁及び6570頁に記載されている。これらの中で
も、特に融点が50℃〜250℃の物が好ましく、中で
も60℃〜200°Cの、水に難溶性のフェノール及び
有機酸が望ましい。顕色剤を2種以上併用した場合には
溶解性が増加するので好ましい。For example, color developers for leuco dyes include phenolic compounds, triphenylmethane compounds, sulfur-containing phenolic compounds, carboxylic acid compounds, sulfone compounds,
Examples include urea-based or thiourea-based compounds, details of which can be found, for example, in Paper Valve Technology Times (1985) 49-
It is described on pages 54 and 6570. Among these, those having a melting point of 50° C. to 250° C. are particularly preferred, and phenols and organic acids that are sparingly soluble in water and having a melting point of 60° C. to 200° C. are particularly desirable. It is preferable to use two or more color developers in combination because the solubility increases.
顕色剤の使用量は通常電子供与性染料前駆体1重量部に
対して0. 3〜160重量部、好ましくは0.3〜8
0重量部である。The amount of color developer used is usually 0.00 parts by weight of the electron-donating dye precursor. 3-160 parts by weight, preferably 0.3-8
It is 0 parts by weight.
本発明で使用する顕色剤のうち特に好ましいものは、下
記一般式(13〜(IV)で表される。Among the color developers used in the present invention, particularly preferred ones are represented by the following general formulas (13 to (IV)).
R1はアルキル基、アリール基又はアラルキル基であり
特にメチル基、エチル基及びブチル基が好ましい。R1 is an alkyl group, an aryl group or an aralkyl group, with methyl, ethyl and butyl groups being particularly preferred.
m=0〜2、n=2〜11
(II)
R2はアルキル基であり、特にブチル基、ペンチル基、
ヘプチル基及びオクチル基が好ましい。m=0-2, n=2-11 (II) R2 is an alkyl group, especially a butyl group, a pentyl group,
Heptyl and octyl groups are preferred.
(IV) R3はアルキル基又はアラルキル基である。(IV) R3 is an alkyl group or an aralkyl group.
本発明に係る感熱発色素材の他の組合せに使用するジア
ゾ化合物とは、後述するカプラーと反応して所望の色相
に発色するものであり、特に、反応前に特定の波長の光
を受けると分解し、もはやカプラーが作用しても発色能
力を持たなくなる光分解性のジアゾ化合物を使用するこ
とが光定着が可能となるので好ましい。この発色系にお
ける色相は、主としてジアゾ化合物とカプラーが反応し
て生成したジアゾ色素により決定される。従って良く知
られているように、ジアゾ化合物の化学構造を変更する
か、カプラーの化学構造を変更すれば容易に発色色相を
変えることができ、組み合わせ次第で略任意の発色色相
を得ることができる。The diazo compound used in other combinations of heat-sensitive coloring materials according to the present invention is one that reacts with the coupler described below to develop a desired hue, and in particular, decomposes when exposed to light of a specific wavelength before the reaction. However, it is preferable to use a photodegradable diazo compound which no longer has color-forming ability even when a coupler acts on it, since this enables photofixing. The hue in this coloring system is mainly determined by the diazo dye produced by the reaction between the diazo compound and the coupler. Therefore, as is well known, the color hue can be easily changed by changing the chemical structure of the diazo compound or the chemical structure of the coupler, and almost any color hue can be obtained depending on the combination. .
本発明で言う光分解性のジアゾ化合物とは主として芳香
族ジアゾ化合物を意味する。具体的には芳香族ジアゾニ
ウム塩、ジアゾスルホネート化合物、ジアゾアミノ化合
物等を指す。The photodegradable diazo compound used in the present invention mainly means an aromatic diazo compound. Specifically, it refers to aromatic diazonium salts, diazosulfonate compounds, diazoamino compounds, and the like.
本発明に用いられるジアゾ化合物と組み合わせて用いら
れるカプラーは、ジアゾ化合物(ジアゾニウム塩)とカ
ップリングして色素を形成する化合物である。The coupler used in combination with the diazo compound used in the present invention is a compound that forms a dye by coupling with the diazo compound (diazonium salt).
その具体例としては、例えば、2−ヒドロキシ3−ナフ
トエ酸アニリドの他、レゾルシンを初めとし特開昭62
−146678号に記載されているものを挙げることが
できる。Specific examples include 2-hydroxy-3-naphthoic acid anilide, resorcinol, and JP-A-62
-146678 can be mentioned.
更にこれらのカプラーを2種以上併用することによって
任意の色調の画像を得ることができる。Furthermore, by using two or more of these couplers in combination, an image of any color tone can be obtained.
これらのジアゾ化合物とカプラーとのカップリング反応
は塩基性雰囲気下で起こり易い為、層内に塩基性物質を
添加してもよい。Since the coupling reaction between these diazo compounds and couplers is likely to occur in a basic atmosphere, a basic substance may be added to the layer.
塩基性物質としては、水難溶性ないしは水不溶性の塩基
性物質や加熱によりアルカリを発生する物質が用いられ
る。それらの例としては無機及び有機アンモニウム塩、
有機アミン、アミド、尿素やチオ尿素及びその誘導体、
チアゾール類、ピロール類、ピリミジン類、ピペラジン
類、グアニジン類、インドール類、イミダゾール類、イ
ミダシリン類、トリアゾール類、モルホリン類、ピペリ
ジン類、アミジン類、フォルムアジン類、ピリジン類等
の含窒素化合物が挙げられる。これらの具体例は、例え
ば特開昭61−291183号に記載されている。As the basic substance, a poorly water-soluble or water-insoluble basic substance or a substance that generates an alkali upon heating is used. Examples of these are inorganic and organic ammonium salts,
organic amines, amides, urea and thiourea and their derivatives,
Examples include nitrogen-containing compounds such as thiazoles, pyrroles, pyrimidines, piperazines, guanidines, indoles, imidazoles, imidacillines, triazoles, morpholines, piperidines, amidines, formazines, and pyridines. . Specific examples of these are described in, for example, Japanese Patent Laid-Open No. 61-291183.
塩基性物質は2種以上併用してもよい。Two or more basic substances may be used in combination.
本発明においては、発色に関与する素材の常温での接触
を防止するといった生保存性の観点(カブリ防止)、及
び希望の印加熱エネルギーで発色させるというような発
色感度の制御の観点等から、発色に必須な成分の一部を
カプセル化して用いることが好ましい。In the present invention, from the viewpoint of shelf life (fogging prevention) such as preventing contact of materials involved in color development at room temperature, and from the viewpoint of controlling color development sensitivity such as developing color with desired applied heating energy, etc. It is preferable to encapsulate a part of the components essential for color development.
この場合に使用するマイクロカプセルの種類は特に限定
されるものではないが、特に本発明において好ましいマ
イクロカプセルは、常温ではマイクロカプセル壁の物質
隔離作用によりカプセル内外の物質の接触を妨げ、ある
温度以上に加熱されている間にのみ物質の透過性が上が
るものが好ましい。この場合、カプセル壁材、カプセル
芯物質、添加剤等を適宜選ぶことにより、その透過開始
温度を自由にコントロールすることができる。この場合
の透過開始温度はカプセル壁のガラス転移温度に相当す
るものである(例;特開昭59−91438号)。The type of microcapsule used in this case is not particularly limited, but microcapsules that are particularly preferred in the present invention prevent contact between substances inside and outside the capsule due to the substance isolation effect of the microcapsule wall at room temperature, and above a certain temperature. Preferably, the permeability of the substance increases only while it is heated. In this case, the permeation start temperature can be freely controlled by appropriately selecting the capsule wall material, capsule core material, additives, etc. In this case, the transmission start temperature corresponds to the glass transition temperature of the capsule wall (eg, JP-A-59-91438).
カプセル壁固有のガラス転移点を制御するにはカプセル
壁形成剤の種類を変えることが必要であマイクロカプセ
ルの壁材料としては、ポリウレタン、ポリウレア、ポリ
エステル、ポリカーボネート、尿素−ホルムアルデヒド
樹脂、メラミン樹脂、ポリスチレン、スチレンメタクリ
レート共重合体、スチレン−アクリレート共重合体、ゼ
ラチン、ポリビニルピロリドン、ポリビニルアルコール
等が挙げられ、これらの高分子物質を2種以上併用する
こともできる。In order to control the glass transition point specific to the capsule wall, it is necessary to change the type of capsule wall forming agent. Examples of microcapsule wall materials include polyurethane, polyurea, polyester, polycarbonate, urea-formaldehyde resin, melamine resin, and polystyrene. , styrene methacrylate copolymer, styrene-acrylate copolymer, gelatin, polyvinylpyrrolidone, polyvinyl alcohol, etc., and two or more of these polymeric substances can also be used in combination.
本発明においては、上記の高分子物質のうちポリウレタ
ン、ポリウレア、ポリアミド、ポリエステル、ポリカー
ボネート等が好ましく、特にポリウレタン及びポリウレ
アが好ましい。In the present invention, among the above-mentioned polymeric substances, polyurethane, polyurea, polyamide, polyester, polycarbonate, etc. are preferable, and polyurethane and polyurea are particularly preferable.
本発明で使用するマイクロカプセルは、発色反応に直接
関与する成分(以下発色剤と総称する)の一方を含有し
た芯物質を乳化した後、その油滴の周囲に高分子物質の
壁を形成してマイクロカプセル化することが好ましく、
この場合高分子物質を形成するリアクタントを油滴の内
部及び/又は油滴の外部に添加する。The microcapsules used in the present invention emulsify a core material containing one of the components directly involved in the coloring reaction (hereinafter collectively referred to as coloring agent), and then form a wall of polymeric material around the oil droplets. It is preferable to microencapsulate the
In this case, a reactant forming a polymeric substance is added inside the oil droplet and/or outside the oil droplet.
ここで、油滴を形成するための有機溶剤は、般に高沸点
オイルの中から適宜選択することができるが、特に、発
色剤に対する溶解性が優れた有機溶剤を使用した場合に
は、熱印字の際の発色濃度と発色速度を増大せしめ、又
、カブリも少なくすることができるので好ましい。Here, the organic solvent for forming the oil droplets can generally be appropriately selected from among high-boiling point oils, but in particular, when using an organic solvent with excellent solubility in the coloring agent, it is difficult to This is preferable because it increases the color density and color development speed during printing, and also reduces fog.
マイクロカプセルを作る時、マイクロカプセル化すべき
成分を0.2重量%以上含有した乳化液から作ることが
できる。When making microcapsules, they can be made from an emulsion containing 0.2% by weight or more of the component to be microencapsulated.
ジアゾ化合物1重量部に対してカプラーは0゜1〜10
重量部、塩基性物質は0. 1〜20重量部の割合で使
用することが好ましい。一方、電子供与性染料前駆体1
重量部に対しては、顕色剤を0.3〜160重量部、好
ましくは0.3〜80重量部使用することが好ましい。The amount of coupler per 1 part by weight of the diazo compound is 0°1 to 10
Part by weight, basic substance is 0. It is preferable to use it in a proportion of 1 to 20 parts by weight. On the other hand, electron-donating dye precursor 1
It is preferable to use the color developer in an amount of 0.3 to 160 parts by weight, preferably 0.3 to 80 parts by weight.
上記の如く製造される好ましいマイクロカプセルを使用
した場合には、マイクロカプセルの芯及び外に含有され
ている反応性物質は加熱印字時にのみマイクロカプセル
壁を透過して反応し染料を形成することができる。When using the preferable microcapsules produced as described above, the reactive substances contained in the core and outside of the microcapsules can pass through the microcapsule walls and react to form dyes only during heating printing. can.
本発明では発色助剤を用いることも可能である。In the present invention, it is also possible to use a coloring aid.
本発明で用いることのできる発色助剤とは、加熱印字時
の発色濃度を高くする、もしくは最低発色温度を低くす
る物質であり、塩基性物質や発色剤の融点を下げたり、
カプセル壁の軟化点を低下せしめる作用により、ジアゾ
化合物、塩基性物質、カプラー、電子供与性染料前駆体
、顕色剤等が反応し易い状況を作るためのものである。The color development aid that can be used in the present invention is a substance that increases the color density during thermal printing or lowers the minimum color development temperature, lowers the melting point of a basic substance or color former,
This is to create a situation where diazo compounds, basic substances, couplers, electron-donating dye precursors, color developers, etc. can easily react by lowering the softening point of the capsule wall.
発色助剤としては、フェノール化合物、アルコール性化
合物、アミド化合物ζスルホンアミド化合物等があり、
具体例としては、p −tart−オクチルフェノール
、p−ベンジルオキシフェノール、p−オキシ安息香酸
フェニル、カルバニル酸ベンジル、カルバニル酸フェネ
チル、ハイドロキノン、ジヒドロキシエチルエーテル、
キシリレンジオール、N−ヒドロキシエチル−メタンス
ルホン酸アミド、N−フェニル−メタンスルホン酸アミ
ド等の化合物を挙げることができる。これらは、芯物質
中に含有させてもよいし、分散物としてマイクロカプセ
ル外に添加してもよい。Coloring aids include phenolic compounds, alcoholic compounds, amide compounds, ζ sulfonamide compounds, etc.
Specific examples include p-tart-octylphenol, p-benzyloxyphenol, phenyl p-oxybenzoate, benzyl carbanylate, phenethyl carbanylate, hydroquinone, dihydroxyethyl ether,
Compounds such as xylylene diol, N-hydroxyethyl-methanesulfonic acid amide, and N-phenyl-methanesulfonic acid amide can be mentioned. These may be contained in the core material or may be added outside the microcapsules as a dispersion.
本発明では、以上の素材の他に酸安定剤としてクエン酸
、酒石酸、シュウ酸、ホウ酸、リン酸、ピロリン酸等を
添加することができる。In the present invention, in addition to the above materials, citric acid, tartaric acid, oxalic acid, boric acid, phosphoric acid, pyrophosphoric acid, etc. can be added as acid stabilizers.
本発明においては、感熱記録層を透明にするために顕色
剤又はカプラーを水に難溶又は不溶性の有機溶剤に溶解
せしめた後、これを界面活性剤を含有し水溶性高分子を
保護コロイドとして有する水相と混合して乳化分散した
分散物を使用する(例えば特開昭63−92489号)
。In the present invention, in order to make the heat-sensitive recording layer transparent, a color developer or coupler is dissolved in an organic solvent that is sparingly soluble or insoluble in water, and then this is used as a protective colloid containing a surfactant to protect water-soluble polymers. (e.g., JP-A No. 63-92489).
.
顕色剤又はカプラーを溶解する有機溶剤は、高沸点のオ
イルの中から適宜選択することができる。The organic solvent for dissolving the color developer or coupler can be appropriately selected from high boiling point oils.
中でも好ましいオイルとしては、エステル類の他、下記
一般式(V)〜(■)で表される化合物及びトリアリル
メタン(例えば、トリトルイルメタントルイルジフェニ
ールメタン)、ターフェニル化合物(例えば、ターフェ
ニル)、アルキル化ジフェニルエーテル(例えば、プロ
ピルジフェニルエーテル、水添ターフェニル(例えば、
ヘキサヒドロターフェニル)、ジフェニルエーテル等カ
挙Lfられる。In addition to esters, preferred oils include compounds represented by the following general formulas (V) to (■), triallylmethane (e.g., tritolylmethanetolyldiphenylmethane), terphenyl compounds (e.g., terphenyl ), alkylated diphenyl ethers (e.g. propyl diphenyl ether, hydrogenated terphenyl (e.g.
(hexahydroterphenyl), diphenyl ether and the like.
本発明においては、これらの中でもエステル類を使用す
ることが、顕色剤の溶解性及び顕色剤の乳化分散物の乳
化安定性の観点から特に好ましい。In the present invention, among these, it is particularly preferable to use esters from the viewpoint of the solubility of the color developer and the emulsion stability of the emulsified dispersion of the color developer.
(V)
式中、R+は水素又は炭素数l〜IBのアルキル基を、
R2は炭素数1〜18のアルキル基を表わす。pl及び
qlは1〜4の整数を表し、且つアルキル基の総和は4
個以内とする。(V) In the formula, R+ represents hydrogen or an alkyl group having 1 to IB carbon atoms,
R2 represents an alkyl group having 1 to 18 carbon atoms. pl and ql represent integers from 1 to 4, and the total number of alkyl groups is 4.
No more than 100 pieces.
なお、R1及びRzのアルキル基は炭素数1〜8のアル
キル基であることが好ましい。In addition, it is preferable that the alkyl group of R1 and Rz is a C1-C8 alkyl group.
(Vl)
式中、R3は水素原子又は炭素数1〜12のアルキル基
、R4は炭素数1〜12のアルキル基、nは1又は2を
表わす。(Vl) In the formula, R3 represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, R4 represents an alkyl group having 1 to 12 carbon atoms, and n represents 1 or 2.
pl及びq!は1〜4の整数を表わす。n=1の場合に
は、アルキル基の総和は4個以内であり、n=2のとき
アルキル基の総和は6個以内である。pl and q! represents an integer from 1 to 4. When n=1, the total number of alkyl groups is 4 or less, and when n=2, the total number of alkyl groups is 6 or less.
(■)
式中、R5及びR6は水素原子又は、炭素数1〜18の
、同種もしくは異種のアルキル基を表わす。mは1〜1
3の整数を表わす。p3及びq3は1〜3の整数を表し
、かつアルキル基の総和は3個以内である。(■) In the formula, R5 and R6 represent a hydrogen atom or the same or different alkyl groups having 1 to 18 carbon atoms. m is 1~1
Represents an integer of 3. p3 and q3 represent integers of 1 to 3, and the total number of alkyl groups is 3 or less.
なお、R5及びR6のアルキル基は炭素数2〜4のアル
キル基であることが特に好ましい。In addition, it is particularly preferable that the alkyl group of R5 and R6 is an alkyl group having 2 to 4 carbon atoms.
式、(V)で表わされる化合物例としては、ジメチルナ
フタレン、ジエチルナフタレン、ジイソプロピルナフタ
レンが挙げられる。Examples of the compound represented by formula (V) include dimethylnaphthalene, diethylnaphthalene, and diisopropylnaphthalene.
式(Vl)で表される化合物例としては、ジメチルビフ
ェニル、ジエチルビフェニル、ジイソプロピルビフェニ
ル、ジイソブチルビフェニルが挙ケられる。Examples of the compound represented by formula (Vl) include dimethylbiphenyl, diethylbiphenyl, diisopropylbiphenyl, and diisobutylbiphenyl.
式(■)で表わされる化合物例としては、エステル−1
−ジメチルフェニル−1−フェニルメタン、1−エチル
−1−ジメチルフェニル−1フエニルメタン、1−プロ
ピル−1−ジメチルフェニル−1−フェニルメタンが挙
げられる。Examples of compounds represented by formula (■) include ester-1
-dimethylphenyl-1-phenylmethane, 1-ethyl-1-dimethylphenyl-1-phenylmethane, and 1-propyl-1-dimethylphenyl-1-phenylmethane.
エステル類としては、燐酸エステルWI(例えば、燐酸
トリフェニル、燐酸トリクレジル、燐酸ブチル、燐酸オ
クチル、燐酸タレジルジフェニル)、フタル酸エステル
(フタル酸ジブチル、フタル酸2−エチルヘキシル、フ
タル酸エチル、フタル酸オクチル、フタル酸ブチルベン
ジル)テトラヒドロフタル酸ジオクチル、安息香酸エス
テル(安息香酸エチル、安息香酸プロピル、安息香酸ブ
チル、安息香酸イソペンチル、安息香酸ベンジル)、ア
ビエチン酸エステル(アビエチン酸エチル、アビエチン
酸ベンジル)、アジピン酸ジオクチル、コハク酸イソデ
シル、アゼライン酸ジオクチル、シュウ酸エステル(シ
ュウ酸ジブチル、シュウ酸ジペンチル)、マロン酸ジエ
チル、マレイン酸エステル(マレイン酸ジメチル、マレ
イン酸ジエチル、マレイン酸ジブチル)、クエン酸トリ
ブチル、ソルビン酸エステル(ソルビン酸メチル、ソル
ビン酸エチル、ソルビン酸ブチル)、セバシン酸エステ
ル(セバシン酸ジブチル、セバシン酸ジオクチル)、エ
チレングリコールエステル類(ギ酸モノエステル及びジ
エステル、酪酸モノエステル及びジエステル、ラウリン
酸モノエステル及びジエステル、パルミチン酸モノエス
テル及びジエステル、ステアリン酸モノエステル及びジ
エステル、オレイン酸モノエステル及びジエステル)、
トリアセチン、炭酸ジエチル、炭酸ジフェニル、炭酸エ
チレン、炭酸プロピレン、ホウ酸エステル(ホウ酸トリ
ブチル、ホウ酸トリペンチル)等が挙げられる。これら
の中でも、燐酸トリクレジルを単独又は混合して使用し
た場合には顕色剤又はカプラーの乳化分散安定性が特に
良好であり好ましい。Examples of esters include phosphate esters WI (e.g., triphenyl phosphate, tricresyl phosphate, butyl phosphate, octyl phosphate, talesyl diphenyl phosphate), phthalate esters (dibutyl phthalate, 2-ethylhexyl phthalate, ethyl phthalate, phthalate). octyl, butyl benzyl phthalate) dioctyl tetrahydrophthalate, benzoate ester (ethyl benzoate, propyl benzoate, butyl benzoate, isopentyl benzoate, benzyl benzoate), abietate ester (ethyl abietate, benzyl abietate), Dioctyl adipate, isodecyl succinate, dioctyl azelaate, oxalate esters (dibutyl oxalate, dipentyl oxalate), diethyl malonate, maleate esters (dimethyl maleate, diethyl maleate, dibutyl maleate), tributyl citrate, Sorbate esters (methyl sorbate, ethyl sorbate, butyl sorbate), sebacate esters (dibutyl sebacate, dioctyl sebacate), ethylene glycol esters (formate monoesters and diesters, butyrate monoesters and diesters, lauric acid monoesters) esters and diesters, palmitic acid monoesters and diesters, stearic acid monoesters and diesters, oleic acid monoesters and diesters),
Examples include triacetin, diethyl carbonate, diphenyl carbonate, ethylene carbonate, propylene carbonate, boric acid esters (tributyl borate, tripentyl borate), and the like. Among these, it is preferable to use tricresyl phosphate alone or in combination because the emulsion dispersion stability of the color developer or coupler is particularly good.
本発明においては、上記の有機溶剤に、更に、低沸点の
溶解助剤として補助溶剤を加えることもできる。このよ
うな補助溶剤として、例えば酢酸エチル、酢酸イソプロ
ピル、酢酸ブチル及びメチレンクロライド等を特に好ま
しいものとして挙げることができる。In the present invention, an auxiliary solvent may be added to the above organic solvent as a low boiling point dissolution aid. Particularly preferred examples of such co-solvents include ethyl acetate, isopropyl acetate, butyl acetate and methylene chloride.
顕色剤又はカプラーを溶解した油相と混合する水相に、
保護コロイドとして含有せしめる水溶性高分子は、公知
のアニオン性高分子、ノニオン性高分子、両性高分子の
中から適宜選択することができるが、ポリビニルアルコ
ール、ゼラチン、セルロース誘導体等が好ましい。an aqueous phase which is mixed with an oil phase in which a color developer or coupler is dissolved;
The water-soluble polymer to be contained as a protective colloid can be appropriately selected from known anionic polymers, nonionic polymers, and amphoteric polymers, but polyvinyl alcohol, gelatin, cellulose derivatives, etc. are preferable.
又、水相に含有せしめる界面活性剤としては、アニオン
性、ノニオン性又は両性の界面活性剤の中から、上記保
護コロイドと作用して沈澱や凝集を起こさないものを適
宜選択して使用することができる。好ましい界面活性剤
としては、アルキルベンゼンスルホン酸ソーダ(例えば
、ドデシルベンゼンスルホン酸ソーダ)、アルキル硫酸
ナトリウム、スルホコハク酸ジオクチルナトリウム塩、
ポリアルキレングリコール(例えば、ポリオキシエチレ
ンノニルフェニルエーテル)等を挙げることができる。In addition, as the surfactant to be included in the aqueous phase, one should be appropriately selected from anionic, nonionic, or amphoteric surfactants that do not interact with the protective colloid to cause precipitation or aggregation. I can do it. Preferred surfactants include sodium alkylbenzenesulfonate (e.g., sodium dodecylbenzenesulfonate), sodium alkylsulfate, dioctyl sodium sulfosuccinate,
Examples include polyalkylene glycol (eg, polyoxyethylene nonylphenyl ether).
本発明における顕色剤又はカプラーの乳化分散物は、顕
色剤又はカプラーを含有する油相と保護コロイド及び界
面活性剤を含有する水相を、高速撹拌、超音波分散等、
通常の微粒子乳化に用いられる手段を使用して混合分散
せしめ容易に得ることができる。The emulsified dispersion of a color developer or coupler in the present invention is prepared by mixing an oil phase containing the color developer or coupler and an aqueous phase containing a protective colloid and a surfactant by high-speed stirring, ultrasonic dispersion, etc.
It can be easily obtained by mixing and dispersing using the means used for ordinary fine particle emulsification.
この乳化分散物には、適宜顕色剤やカプラーの融点降下
剤を添加することもできる。このような融点降下剤の中
の一部は前記カプセル壁のガラス転移点調節剤の機能を
も有する。このような化合物としては、例えば、ヒドロ
キシ化合物、カルバミン酸エステル化合物、スルホンア
ミド化合物、芳香族メトキシ化合物等があり、それらの
詳細は、例えば特願昭59−244190号に記載され
ている。A color developer and a coupler melting point depressant may be added to this emulsified dispersion as appropriate. Some of these melting point depressants also have the function of controlling the glass transition point of the capsule wall. Examples of such compounds include hydroxy compounds, carbamate ester compounds, sulfonamide compounds, and aromatic methoxy compounds, the details of which are described in, for example, Japanese Patent Application No. 59-244190.
これらの融点降下剤は、融点を降下せしめる顕色剤1重
量部に対し0.1〜2重量部、好ましくは0.5〜1重
量部の範囲で適宜使用することができるが、融点降下剤
とそれによって融点が降下する顕色剤やカプラー等は同
一の箇所に使用することが好ましい。異なった個所に添
加する場合には、上記の添加量の1〜3倍量を添加する
ことが好ましい。These melting point depressants can be used in an amount of 0.1 to 2 parts by weight, preferably 0.5 to 1 part by weight, per 1 part by weight of the color developer that lowers the melting point. It is preferable to use the color developer, coupler, etc. whose melting point decreases at the same location. When adding to different locations, it is preferable to add 1 to 3 times the above amount.
本発明の感熱記録材料は適当なバインダーを用いて塗工
することができる。The heat-sensitive recording material of the present invention can be coated using a suitable binder.
バインダーとしてはポリビニルアルコール、メチルセル
ロース、カルボキシメチルセルロース、ヒドロキシプロ
ピルセルロース、アラビヤゴム、ゼラチン、ポリビニル
ピロリドン、カゼイン、スチレン−ブタジェンラテック
ス、アクリロニトリル−フタジエンラテックス、ポリ酢
酸ビニル、ポリアクリル酸エステル、エチレン−酢酸ビ
ニル共重合体等の各種エマルジョンを用いることができ
る。使用量は固形分として0.5〜5g10fである。Binders include polyvinyl alcohol, methylcellulose, carboxymethylcellulose, hydroxypropylcellulose, gum arabic, gelatin, polyvinylpyrrolidone, casein, styrene-butadiene latex, acrylonitrile-phtadiene latex, polyvinyl acetate, polyacrylic acid ester, ethylene-vinyl acetate, etc. Various emulsions such as polymers can be used. The amount used is 0.5 to 5g10f as solid content.
本発明のを熱記録材料は、電子供与性染料前駆体又はジ
アゾ化合物を内包したマイクロカプセル及び少なくとも
顕色剤又はカプラーを乳化分散した分散物、バインダー
等その他の添加物を含有した塗布液を作り、透明な合成
樹脂フィルム支持体の上にバー塗布、ブレード塗布、エ
アナイフ塗布、グラビア塗布、ロールコーティング塗布
、スプレー塗布、デイツプ塗布等の塗布法により塗布乾
燥して、固形分が2.5〜25g/ifの感熱層を設け
ることによって製造される。The thermal recording material of the present invention is prepared by preparing a coating liquid containing microcapsules encapsulating an electron-donating dye precursor or a diazo compound, a dispersion in which at least a color developer or a coupler is emulsified and dispersed, and other additives such as a binder. , coated on a transparent synthetic resin film support by a coating method such as bar coating, blade coating, air knife coating, gravure coating, roll coating, spray coating, dip coating, etc., and dried to a solid content of 2.5 to 25 g. /if heat-sensitive layer.
このようにして製造した感熱材料の感熱層は、極めて良
好な透明性を有する。The heat-sensitive layer of the heat-sensitive material produced in this way has extremely good transparency.
本発明においては透明感熱層の上部に、更に、該感熱層
で使用した電子供与性染料前駆体又はジアゾ化合物を含
有するマイクロカプセルを含む層を設けても良い。この
場合更に顕色剤又はカプラーの乳化分散物を必要に応じ
て含有せしめることができるが、その量は該層全重量の
20重景%以下とすることが必要である。このように顕
色剤乳化分散物の量が少ない層を設けることにより、本
感熱記録材料の接着性を低下せしめることができる上、
この層に含有されている電子供与性染料前駆体も発色に
寄与し得るのでこの層を設けることによって熱感度が低
下することはない。In the present invention, a layer containing microcapsules containing the electron-donating dye precursor or diazo compound used in the heat-sensitive layer may be further provided on top of the transparent heat-sensitive layer. In this case, an emulsified dispersion of a color developer or a coupler may be further included if necessary, but the amount thereof must be 20% or less of the total weight of the layer. By providing a layer containing a small amount of color developer emulsified dispersion in this way, the adhesiveness of the heat-sensitive recording material can be reduced, and
Since the electron-donating dye precursor contained in this layer can also contribute to color development, the provision of this layer does not reduce thermal sensitivity.
本発明においては、感熱層の中に、熱ヘツドに対するス
ティッキングの防止や筆記性を改良する目的で、シリカ
、硫酸バリウム、酸化チタン、水酸化アルミニウム、酸
化亜鉛、炭酸カルシウム等の顔料や、スチレンビーズ、
尿素−メラミン樹脂等の微粉末を添加することができる
が、感熱層の透明性を維持するために、感熱層の上に主
として保存性と安全性を目的とする保護層を公知の方法
により設け、この保護層に添加することが好ましい。保
護層についての詳細は、例えばr紙パルプ技術タイムス
J (1985年、9月号)2〜4頁に記載されてい
る。In the present invention, pigments such as silica, barium sulfate, titanium oxide, aluminum hydroxide, zinc oxide, calcium carbonate, etc., and styrene beads are added to the heat-sensitive layer for the purpose of preventing sticking to the heat head and improving writing properties. ,
Fine powder such as urea-melamine resin can be added, but in order to maintain the transparency of the heat-sensitive layer, a protective layer is provided on the heat-sensitive layer by a known method mainly for the purpose of preservation and safety. , is preferably added to this protective layer. Details about the protective layer are described, for example, in R Paper and Pulp Technology Times J (September issue, 1985), pages 2-4.
特に、ケイ素変性ポリビニルアルコールとコロイダルシ
リカの組合せを主成分とする保護層を使用した場合には
、保護層の透明性が極めて良好となり、ひいては感熱記
録材料の透明性を著しく改善することができるので好ま
しい。In particular, when a protective layer containing a combination of silicon-modified polyvinyl alcohol and colloidal silica is used as a main component, the transparency of the protective layer becomes extremely good, and as a result, the transparency of the heat-sensitive recording material can be significantly improved. preferable.
保護層中にはスティッキング防止のためにワックス類や
金属石鹸類を添加することもできる。これらの使用量は
0.2〜7g/n(である。Waxes and metal soaps can also be added to the protective layer to prevent sticking. The amount used is 0.2 to 7 g/n.
ワックス類としては、パラフィンワックス、カルナバロ
ウワックス、マイクロクリスタリンワックス、ポリエチ
レンワックスの他、高級脂肪酸アミド、例えば、ステア
リン酸アミド、エチレンビスステアロアミド、高級脂肪
酸エステル等が挙げられる。Examples of waxes include paraffin wax, carnauba wax, microcrystalline wax, polyethylene wax, and higher fatty acid amides such as stearic acid amide, ethylene bisstearamide, and higher fatty acid esters.
金属石鹸としては、高級脂肪酸多価金属塩、例えばステ
アリン酸亜鉛、ステアリン酸アルミニウム、ステアリン
酸カルシウム、オレイン酸亜鉛等が挙げられる。Examples of metal soaps include polyvalent metal salts of higher fatty acids, such as zinc stearate, aluminum stearate, calcium stearate, and zinc oleate.
又、感熱層の塗布量は3g/rrr〜20g/ボ、特に
5g/if〜15g/rrfの間にあることが好ましい
。3g/rd以下では十分な感度が得られず、20g/
rrf以上塗布しても品質の向上は見られないのでコス
ト的に不利になる。Further, the coating amount of the heat-sensitive layer is preferably between 3 g/rrr and 20 g/rr, particularly between 5 g/if and 15 g/rrf. Sufficient sensitivity cannot be obtained below 3g/rd;
Even if the coating is applied over rrf, no improvement in quality will be observed, which will be disadvantageous in terms of cost.
支持体となる透明な合成樹脂フィルムは、耐摩耗性、耐
水性、耐薬品性に優れ、感熱層の塗布によってカールを
生じない程度の厚み及び/又は剛性を有し、現像過程で
の加熱等に対しても変形せず、寸法安定性を有する公知
の材料の中から任意に選択することができる。このよう
なフィルムとしてはポリエチレンテレフタレートやポリ
ブチレンテレフタレート等のポリエステルフィルム、三
i[セルロースフィルム等のセルロース誘導体フィルム
、ポリスチレンフィルム、ポリプロピレンフィルム、ポ
リエチレン等のポリオレフィンフィルム等が挙げられ、
これらを単体で或いは貼り合わせて用いることができる
。The transparent synthetic resin film that serves as the support has excellent abrasion resistance, water resistance, and chemical resistance, and has a thickness and/or rigidity that does not cause curling when the heat-sensitive layer is applied. Any known material can be selected from among known materials that do not deform and have dimensional stability. Examples of such films include polyester films such as polyethylene terephthalate and polybutylene terephthalate, cellulose derivative films such as cellulose film, polystyrene films, polypropylene films, polyolefin films such as polyethylene, etc.
These can be used alone or in combination.
支持体の厚みとしては20〜200μmのものが好まし
く、特に約50〜100μmのものが好ましい。The thickness of the support is preferably 20 to 200 μm, particularly preferably about 50 to 100 μm.
本発明においては、プラスチックフィルムと感熱層の接
着を高めるために両層の間に下塗層を設けることができ
る。下塗層の素材としては、ゼラチンや合成高分子ラテ
ックス、ニトロセルロース等が用いられる。下塗層の塗
布量は0.18/m′〜2.0g/m’の範囲にあるこ
とが好ましく、特に0.2 g/m” 〜1.Og/m
”の範囲が好ましい。0.1g/m2より少ないとフィ
ルムと感熱層との接着が十分でなく、又2.Og/m2
以上にふやしてもフィルムと感熱層との接着力は飽和に
達しているのでコスト的に不利となる。In the present invention, an undercoat layer can be provided between the plastic film and the heat-sensitive layer to enhance adhesion between the two layers. Gelatin, synthetic polymer latex, nitrocellulose, etc. are used as the material for the undercoat layer. The coating amount of the undercoat layer is preferably in the range of 0.18/m' to 2.0 g/m', particularly 0.2 g/m' to 1.0 g/m'
" is preferably within the range of
Even if it is increased above, the adhesive force between the film and the heat-sensitive layer has reached saturation, which is disadvantageous in terms of cost.
下塗層は、感熱層がその上に塗布された時に感熱層中に
含まれる水により下塗層が膨潤することがあるので、硬
膜剤を用いて硬化させることが望ましい。It is desirable to harden the undercoat layer using a hardening agent since the undercoat layer may swell due to water contained in the heat-sensitive layer when the heat-sensitive layer is applied thereon.
硬膜剤としては、グルタルアルデヒド、2.3ジヒドロ
キシ−1,4−ジオキサン等のジアルデヒド類及びホウ
酸が好ましい。As the hardening agent, glutaraldehyde, dialdehydes such as 2,3 dihydroxy-1,4-dioxane, and boric acid are preferred.
これらの硬膜剤の添加量は、下塗素材の重量に対して、
0.20重重量から3.0重量%の範囲で、塗布方法や
希望の硬化度に合わせて適切な添加量を選ぶことができ
る。The amount of these hardeners added is based on the weight of the base coat material.
An appropriate addition amount can be selected in the range of 0.20% by weight to 3.0% by weight depending on the coating method and desired degree of curing.
又、塗布時に発生する泡を消すために、消泡剤を添加す
る事も、或いは、液のレベリングを良くして塗布筋の発
生を防止するために活性剤を添加する事も可能である。It is also possible to add an antifoaming agent to eliminate foam generated during coating, or to add an activator to improve liquid leveling and prevent coating streaks.
又、必要に応じて帯電防止剤を添加することも可能であ
る。It is also possible to add an antistatic agent if necessary.
更に、下塗層を塗布する前には、フィルムの表面を公知
の方法により活性化処理する事が望ましい。活性化処理
の方法としては、酸によるエツチング処理、ガスバーナ
ーによる火焔処理、或いはコロナ処理、グロー放電処理
等が用いられるが、コストの面或いは簡便さの点から、
米国特許第2゜715.075号、同第2,846,7
27号、同第3,549,406号、同第3,590,
107号等に記載されたコロナ放電処理が最も好んで用
いられる。Furthermore, before applying the undercoat layer, it is desirable to activate the surface of the film by a known method. As the method of activation treatment, etching treatment with acid, flame treatment with gas burner, corona treatment, glow discharge treatment, etc. are used, but from the point of view of cost or simplicity,
U.S. Patent No. 2,715.075, U.S. Patent No. 2,846,7
No. 27, No. 3,549,406, No. 3,590,
The corona discharge treatment described in No. 107 and the like is most preferably used.
本発明において、カール矯正、帯電防止、滑り性改善を
目的として支持体の裏面にバック層を設けても良い。バ
ック層の構成成分としては、保護層のものと同様の成分
を用いるのが好ましい。In the present invention, a back layer may be provided on the back surface of the support for the purpose of curl correction, antistatic properties, and improved slipperiness. As the constituent components of the back layer, it is preferable to use the same components as those of the protective layer.
本発明に係る塗布液は、一般によく知られた塗布方法、
例えばデイツプコート法、エアーナイフコート法、カー
テンコート法、ローラーコート法、ドクターコート法、
ワイヤーバーコード法、スライドコート法、グラビアコ
ート法、或いは米国特許第2,681,294号明細書
に記載のホッパーを使用するエクストルージョンコート
法等により塗布することが出来る。必要に応じて、米国
特許第2,761,791号、同第3,508,947
号、同第2,941,898号、及び同第3゜526.
528号明細書、原崎勇次著「コーティング工学」25
3頁(1973年朝倉書店発行)等に記載された方法等
により2層以上に分けて、同時に塗布することも可能で
あり、塗布量、塗布速度等に応じて適切な方法を選ぶこ
とができる。The coating liquid according to the present invention can be applied by a generally well-known coating method,
For example, dip coating method, air knife coating method, curtain coating method, roller coating method, doctor coating method,
Coating can be performed by a wire barcode method, a slide coating method, a gravure coating method, or an extrusion coating method using a hopper as described in US Pat. No. 2,681,294. U.S. Pat. No. 2,761,791 and U.S. Pat. No. 3,508,947 as appropriate.
No. 2,941,898, and No. 3゜526.
Specification No. 528, Yuji Harasaki, "Coating Engineering" 25
It is also possible to apply the coating simultaneously in two or more layers using the method described in page 3 (published by Asakura Shoten in 1973), etc., and an appropriate method can be selected depending on the amount of coating, coating speed, etc. .
更に、塗液中に、顔料分散剤、増粘剤、流動変性剤、消
泡剤、抑泡剤、離型剤、着色剤を必要に応じて適宜配合
することができる。Furthermore, a pigment dispersant, a thickener, a flow modifier, an antifoaming agent, a foam inhibitor, a mold release agent, and a coloring agent can be appropriately blended into the coating liquid as required.
本発明においては、以上の如くして得られた透明感熱記
録材料に、サーマルヘッドやレーザービーム等によって
回路パターンを形成せしめる。特に発色剤としてジアゾ
化合物とカプラーの組合せを採用している場合には、パ
ターン作成後、感熱記録材料全面に紫外線を照射して、
非画像部のジアゾ化合物を分解し、これによって回路パ
ターンを定着せしめることが好ましい。In the present invention, a circuit pattern is formed on the transparent thermosensitive recording material obtained as described above using a thermal head, a laser beam, or the like. In particular, when a combination of a diazo compound and a coupler is used as a coloring agent, after pattern creation, the entire surface of the heat-sensitive recording material is irradiated with ultraviolet rays.
It is preferable to decompose the diazo compound in the non-image area and thereby fix the circuit pattern.
上記の如くして得られた透明感熱記録材料の回路パター
ンをフォトマスクとして使用し、常法に従ってレジスト
パターンを作成することができる。Using the circuit pattern of the transparent heat-sensitive recording material obtained as described above as a photomask, a resist pattern can be prepared according to a conventional method.
(発明の効果)
以上詳述した如く、本発明で使用するフォトマスクは感
熱記録材料であるので、マスクの作成はすべて乾式で行
うことができるのみならず、デジタル信号から直接パタ
ーンを作成することができる。従って、従来のフォトマ
スク作成工程における湿式作業を不要とする観点からの
みならず、フォトマスク作成を大巾に簡単化されるので
、レジストパターンの形成方法自体も大巾に改善される
。(Effects of the Invention) As detailed above, since the photomask used in the present invention is a heat-sensitive recording material, not only can all masks be created by a dry process, but also patterns can be created directly from digital signals. I can do it. Therefore, not only from the viewpoint of eliminating the need for wet work in the conventional photomask production process, but also because the photomask production is greatly simplified, the resist pattern forming method itself is also greatly improved.
(実施例)
以下本発明を実施例によって更に詳述するが、本発明は
これによって限定されるものではない。(Example) The present invention will be explained in more detail below with reference to Examples, but the present invention is not limited thereto.
実施例1゜
スルホールメツキが施された銅張り積層板に感光性樹脂
フィルム(富士写真フィルム■製 VANXA450)
を貼り合わせ、以下の方法により作製した透明感熱フィ
ルムにCAD用コンピューターにて作成した画像をプリ
ントアウトしフォトマスクとして重ね合わせ、露光、現
像によりエツチングレジストパターンを形成し、次いで
エツチングにより回路を形成した。Example 1 Photosensitive resin film (VANXA450 manufactured by Fuji Photo Film ■) on a copper-clad laminate plated with through-hole plating
An image created using a CAD computer was printed out on a transparent thermosensitive film produced by the following method, superimposed as a photomask, exposed and developed to form an etching resist pattern, and then etched to form a circuit. .
得られた回路は断線、導通もな(良好な品質であった。The obtained circuit had no disconnections or continuity (it was of good quality).
〔カプセル液の調製]
下記構造式で表されるロイコ色素
タケネートD−11ON(成田薬品■製カプセル壁材)
20gを1−フェニル−1−キシリルエタン12gと、
メチレンクロライド20gの混合溶媒に添加し、溶解し
た。このロイコ染料の溶液を、PVA217C(クラレ
■製)及びイオン交換水を用いた8%のポリビニルアル
コール水溶液60gとイオン交換水20gの水溶液に混
合し、日本精機■製のエースホモジナイザーで10.0
100yPで5分間乳化し、更にイオン交換水120g
を加えて、40°Cで3時間反応させてカプセルサイズ
1.0μのカプセル液を製造した。[Preparation of capsule liquid] Leuco dye Takenate D-11ON represented by the following structural formula (capsule wall material manufactured by Narita Pharmaceutical ■)
20g with 12g of 1-phenyl-1-xylylethane,
It was added to a mixed solvent containing 20 g of methylene chloride and dissolved. This leuco dye solution was mixed with an aqueous solution of 60 g of 8% polyvinyl alcohol aqueous solution using PVA217C (manufactured by Kuraray ■) and ion-exchanged water and 20 g of ion-exchanged water, and mixed with an aqueous solution of 20 g of ion-exchanged water using an Ace homogenizer manufactured by Nippon Seiki ■.
Emulsify at 100yP for 5 minutes, then add 120g of ion-exchanged water.
was added and reacted at 40°C for 3 hours to produce a capsule liquid with a capsule size of 1.0μ.
尚、上記のクラレPVA217Cはナトリウムイオン量
を低減させたものである。Note that the above-mentioned Kuraray PVA217C has a reduced amount of sodium ions.
下記構造式で表わされる顕色剤(a)5 g、 (b)
2 g及び(c)8gを1−フェニル−1−キシリルエ
タン1gと酢酸エチル7gに溶解した。得られた顕色剤
の溶液を、PVA217C及びイオン交換水を用いた8
%のポリビニルアルコール水溶液37gとイオン交換水
35g1及びドデシルベンゼンスルホン酸トリエタノー
ルアミン酸(界面活性剤)0.2gの水溶液に混合し、
日本精機■製のエースホモジナイザーを用いて、10.
00Orpm常温で5分間乳化し、粒子サイズ1.5μ
の乳化分散物を得た。Color developer represented by the following structural formula (a) 5 g, (b)
2 g and 8 g of (c) were dissolved in 1 g of 1-phenyl-1-xylylethane and 7 g of ethyl acetate. The obtained developer solution was mixed with PVA217C and ion-exchanged water.
% polyvinyl alcohol aqueous solution, 35 g of ion-exchanged water, and 0.2 g of dodecylbenzenesulfonic acid triethanolamine acid (surfactant).
10. Using an Ace homogenizer manufactured by Nippon Seiki ■.
Emulsify at room temperature for 5 minutes at 00Orpm, particle size 1.5μ
An emulsified dispersion was obtained.
顕色剤(a)
顕色剤(ロ)
顕色剤(C)
〔感熱記録材料の作製〕
上記カプセル液5.0g、顕色剤乳化分散物10、Og
、及びイオン交換水5.0gを撹拌混合し、厚さ75μ
の透明なポリエチレンテレフタレ−) (PET)支持
体の片面に、固形分が6g/m”になるように塗布し乾
燥して感熱層を形成し、次いで下記の組成の保護層を、
イオン交換水を用いて感熱記録層の上に固形分が2.5
g/m”となるように塗布した。尚、カオブライトはそ
の水分散液をイオン交換樹脂アーバンライトMB3(オ
ルガノ■製)によりイオン交換処理した。Color developer (a) Color developer (b) Color developer (C) [Preparation of heat-sensitive recording material] 5.0 g of the above capsule liquid, 10 g of color developer emulsion dispersion, Og
, and 5.0 g of ion-exchanged water were stirred and mixed to a thickness of 75 μm.
A heat-sensitive layer was formed by coating on one side of a transparent polyethylene terephthalate (PET) support with a solid content of 6 g/m'' and drying, and then a protective layer having the following composition:
Using ion-exchanged water, the solid content is 2.5% on the heat-sensitive recording layer.
g/m''.The aqueous dispersion of Kaobrite was subjected to ion exchange treatment using an ion exchange resin Urbanite MB3 (manufactured by Organo ■).
ポリビニルアルコール 2 重1部(クラ
レ■製PVA217C)
カオブライト(Thiele社) 4重量部
ホウ酸 0. 1重量部ステア
リン酸Zn分散物 0. 2重量部(中東油脂■
製)
ラウリル硫酸アンモニウム 0.05重量部得られた
透明感熱記録材料をマクベス透過濃度針(可視域)で測
定したところ、波長360nmにおける透過率が90%
であり、最大発色濃度は1.53であった。Polyvinyl alcohol 2 parts by weight (PVA217C manufactured by Kuraray ■) Kaobrite (Thiele) 4 parts by weight Boric acid 0. 1 part by weight Zn stearate dispersion 0. 2 parts by weight (Middle East oil and fat■
When the obtained transparent heat-sensitive recording material was measured with a Macbeth transmission density needle (visible range), the transmittance at a wavelength of 360 nm was 90%.
The maximum color density was 1.53.
特許出願人 富士写真フィルム株式会社代 理 人Patent applicant: Fuji Photo Film Co., Ltd. Reason Man
Claims (1)
た後、該樹脂層上にフォトマスクフィルムを載置して露
光、現像するレジストパターンの形成方法において、前
記フォトマスクフィルムが加熱により発色画像を形成せ
しめた透明感熱記録材料であることを特徴とするレジス
トパターンの形成方法。 2)透明感熱記録材料の波長360nmにおける透過率
が70%以上で、最大発色濃度が1.0以上である請求
項1に記載のレジストパターンの形成方法。[Scope of Claims] 1) A method for forming a resist pattern in which a photosensitive resin layer is formed on a substrate for a printed circuit board, and then a photomask film is placed on the resin layer and exposed and developed. A method for forming a resist pattern, characterized in that the mask film is a transparent heat-sensitive recording material in which a colored image is formed by heating. 2) The method for forming a resist pattern according to claim 1, wherein the transparent thermosensitive recording material has a transmittance of 70% or more at a wavelength of 360 nm and a maximum color density of 1.0 or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14763790A JP2611031B2 (en) | 1990-06-06 | 1990-06-06 | Method of forming resist pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14763790A JP2611031B2 (en) | 1990-06-06 | 1990-06-06 | Method of forming resist pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0440454A true JPH0440454A (en) | 1992-02-10 |
JP2611031B2 JP2611031B2 (en) | 1997-05-21 |
Family
ID=15434840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14763790A Expired - Fee Related JP2611031B2 (en) | 1990-06-06 | 1990-06-06 | Method of forming resist pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2611031B2 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5742042A (en) * | 1980-08-27 | 1982-03-09 | Ricoh Co Ltd | Heat development type diazo copying material |
JPS61116587A (en) * | 1984-11-12 | 1986-06-04 | Ricoh Co Ltd | Transparent thermal recording material suitable for intermediate print |
JPS6370859A (en) * | 1986-09-13 | 1988-03-31 | Toyota Autom Loom Works Ltd | Method and device for generating pattern mask for circuit board by thermal transfer system |
JPH01229662A (en) * | 1988-03-10 | 1989-09-13 | Brother Ind Ltd | image recording device |
JPH021388A (en) * | 1988-06-09 | 1990-01-05 | Ricoh Co Ltd | Color thermal transfer recording medium |
-
1990
- 1990-06-06 JP JP14763790A patent/JP2611031B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5742042A (en) * | 1980-08-27 | 1982-03-09 | Ricoh Co Ltd | Heat development type diazo copying material |
JPS61116587A (en) * | 1984-11-12 | 1986-06-04 | Ricoh Co Ltd | Transparent thermal recording material suitable for intermediate print |
JPS6370859A (en) * | 1986-09-13 | 1988-03-31 | Toyota Autom Loom Works Ltd | Method and device for generating pattern mask for circuit board by thermal transfer system |
JPH01229662A (en) * | 1988-03-10 | 1989-09-13 | Brother Ind Ltd | image recording device |
JPH021388A (en) * | 1988-06-09 | 1990-01-05 | Ricoh Co Ltd | Color thermal transfer recording medium |
Also Published As
Publication number | Publication date |
---|---|
JP2611031B2 (en) | 1997-05-21 |
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