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JPS5727126A - Vapor growth device for compound semiconductor - Google Patents

Vapor growth device for compound semiconductor

Info

Publication number
JPS5727126A
JPS5727126A JP10135980A JP10135980A JPS5727126A JP S5727126 A JPS5727126 A JP S5727126A JP 10135980 A JP10135980 A JP 10135980A JP 10135980 A JP10135980 A JP 10135980A JP S5727126 A JPS5727126 A JP S5727126A
Authority
JP
Japan
Prior art keywords
vapor growth
chamber
substrate
inp
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10135980A
Other languages
Japanese (ja)
Inventor
Kuniaki Konno
Masami Iwamoto
Tatsuro Beppu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10135980A priority Critical patent/JPS5727126A/en
Publication of JPS5727126A publication Critical patent/JPS5727126A/en
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE: To provide a vapor growth device for compound semiconductors which provide composition changes between different composition layers by providing an opening part to a partition plate dividing a vapor growth reaction chamber to two or more parts, rotating a substrate support means supporting rotary type semiconductor substrates connected to the revolving shaft in the opening part, and causing vapor growth alternately in the respective reaction chambers.
CONSTITUTION: A vapor growth reaction chamber is divided to reaction chambers 3, 4 by a partition plate 5, and for example, an InP substrate 6 is fixed to a support means 8 by way of an operating rod 7. First, InCl3, and PH3 are carried from the upper stream side of the chamber 3 to a crystal deposition area A, where vapor growth of InP is accomplished on the substrate 6. Next, InCl3, GaCl3, PH3 and AsH3 are carried by hydrogen to the crystal deposition area A of the chamber 4; at the same time, the rod 7 is operated on the outside of a reaction tube 2 to move the substrate 6 grown with the InP layer into the chamber 4, where vapor growth of InGaAsP is accomplished.
COPYRIGHT: (C)1982,JPO&Japio
JP10135980A 1980-07-25 1980-07-25 Vapor growth device for compound semiconductor Pending JPS5727126A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10135980A JPS5727126A (en) 1980-07-25 1980-07-25 Vapor growth device for compound semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10135980A JPS5727126A (en) 1980-07-25 1980-07-25 Vapor growth device for compound semiconductor

Publications (1)

Publication Number Publication Date
JPS5727126A true JPS5727126A (en) 1982-02-13

Family

ID=14298632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10135980A Pending JPS5727126A (en) 1980-07-25 1980-07-25 Vapor growth device for compound semiconductor

Country Status (1)

Country Link
JP (1) JPS5727126A (en)

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